本文采用离散谱折射率法对深蚀刻、Ga As/ Ga Al As多层脊形光波导模式特性进行了具体分析和设计 ,获得了较大截面、低损耗的单模脊形光波导 .利用这种横向具有最大折射率差的深蚀刻脊形光波导不但可以提高多模干涉 (MMI)型器件的性能 ...本文采用离散谱折射率法对深蚀刻、Ga As/ Ga Al As多层脊形光波导模式特性进行了具体分析和设计 ,获得了较大截面、低损耗的单模脊形光波导 .利用这种横向具有最大折射率差的深蚀刻脊形光波导不但可以提高多模干涉 (MMI)型器件的性能 ,而且在设计和制作弯曲波导、分支结构时 ,具有结构紧凑。展开更多
The resolution characteristic can be obtained by the modulation transfer function （MTF） of a GaAs/GaA1As photocathode. After establishing the theoretical model of GaAs（100）-oriented atomic configuration and the fo...The resolution characteristic can be obtained by the modulation transfer function （MTF） of a GaAs/GaA1As photocathode. After establishing the theoretical model of GaAs（100）-oriented atomic configuration and the formula for the ionized impurity scattering of the non-equilibrium carriers, this paper calculates the trajectories of photoelectrons in a photocathode. Thus the distribution of photoelectron spots on the emit-face is obtained, which is namely the point spread function. The MTF is obtained by Fourier transfer of the line spread function obtained from the point spread function. The MTF obtained from these calculations is shown to depend heavily on the electron diffusion length, and enhanced considerably by decreasing the electron diffusion length and increasing the doping concentration. Furthermore, the resolution is enhanced considerably by increasing the active-layer thickness, especially at high spatial frequencies. The best spatial resolution is 860 lp/mm, for the GaAs photocathode of doping concentration 1 ×10^19 cm 3 electron diffusion length 3.6 μm and the active-layer thickness 2 μm, under the 633-nm light irradiated. This research will contribute to the future improvement of the cathode＇s resolution for preparing a high performance GaAs photocathode, and improve the resolution of a low light level image intensifier.展开更多
采用离散谱折射率法对深刻蚀 Ga As/ Ga Al As多层脊形光波导的特性作了详细的理论分析 ,并对所获得的较大截面、低损耗的单模脊形光波导的制作容差性作了进一步的分析 .计算表明 ,用离散谱折射率法获得的单模脊形光波导具有较大的制作...采用离散谱折射率法对深刻蚀 Ga As/ Ga Al As多层脊形光波导的特性作了详细的理论分析 ,并对所获得的较大截面、低损耗的单模脊形光波导的制作容差性作了进一步的分析 .计算表明 ,用离散谱折射率法获得的单模脊形光波导具有较大的制作容差性 .展开更多
提出一种新型 Ga As/ Ga Al As子带间光吸收的红外光电导探测机理 ,利用 MOCVD系统进行器件材料的生长 ,研制了 2 0 0μm× 2 0 0μm的台面形式单管 ,测到了明显的红外光电流信号及阱间共振遂穿效应造成的负阻震荡现象 ,对器件的性...提出一种新型 Ga As/ Ga Al As子带间光吸收的红外光电导探测机理 ,利用 MOCVD系统进行器件材料的生长 ,研制了 2 0 0μm× 2 0 0μm的台面形式单管 ,测到了明显的红外光电流信号及阱间共振遂穿效应造成的负阻震荡现象 ,对器件的性能测试结果表明 ,器件的光电流响应和信噪比随着阱数增加而增加 ,器件噪声比常规 Ga As/ Ga Al展开更多
Electrolyte electroreflectance (EER) has been widely employed to investigate the electronic energy band structure and related physical properties of semiconductors. The electrolyte electroreflectance (EER) method comb...Electrolyte electroreflectance (EER) has been widely employed to investigate the electronic energy band structure and related physical properties of semiconductors. The electrolyte electroreflectance (EER) method combined with electrochemical anodic dissolution was used to study GaAs/GaAlAs multilayer structural materials. According to variation of the EER spectra during anodic dissolution the characteristics of GaAs/GaAlAs multilayer structural materials such as properties of the interface, p-n junction positions and Al content profiles were obtained.展开更多
A GaAs/GaAlAs transmission photocathode surface topography is examined with a scanning electron microscope(SEM) in the secondary emission mode.The contributions of photocathode surface topography to mean transverse en...A GaAs/GaAlAs transmission photocathode surface topography is examined with a scanning electron microscope(SEM) in the secondary emission mode.The contributions of photocathode surface topography to mean transverse energy of electrons emitted from the photocathode are calculated. Measurement is made of the variation of mean transverse emission energy with activating time during the course of activation. It is shown that the scattering of the photoelectrons in the Cs/O layer is the primary cause of the unexpectant high values of the mean transverse energy of electrons emitted from GaAs/GaAlAs photocathode. A method is proposed for the reduction of the mean transverse energy of electrons emitted from the photocathode.展开更多
文摘本文采用离散谱折射率法对深蚀刻、Ga As/ Ga Al As多层脊形光波导模式特性进行了具体分析和设计 ,获得了较大截面、低损耗的单模脊形光波导 .利用这种横向具有最大折射率差的深蚀刻脊形光波导不但可以提高多模干涉 (MMI)型器件的性能 ,而且在设计和制作弯曲波导、分支结构时 ,具有结构紧凑。
基金Project supported by the National Natural Science Foundation of China (Grant No. 60678043)the Research and Innovation Plan for Graduate Students of Jiangsu Higher Education Institutions,China (Grant No. CX09B 096Z)
文摘The resolution characteristic can be obtained by the modulation transfer function （MTF） of a GaAs/GaA1As photocathode. After establishing the theoretical model of GaAs（100）-oriented atomic configuration and the formula for the ionized impurity scattering of the non-equilibrium carriers, this paper calculates the trajectories of photoelectrons in a photocathode. Thus the distribution of photoelectron spots on the emit-face is obtained, which is namely the point spread function. The MTF is obtained by Fourier transfer of the line spread function obtained from the point spread function. The MTF obtained from these calculations is shown to depend heavily on the electron diffusion length, and enhanced considerably by decreasing the electron diffusion length and increasing the doping concentration. Furthermore, the resolution is enhanced considerably by increasing the active-layer thickness, especially at high spatial frequencies. The best spatial resolution is 860 lp/mm, for the GaAs photocathode of doping concentration 1 ×10^19 cm 3 electron diffusion length 3.6 μm and the active-layer thickness 2 μm, under the 633-nm light irradiated. This research will contribute to the future improvement of the cathode＇s resolution for preparing a high performance GaAs photocathode, and improve the resolution of a low light level image intensifier.
文摘提出一种新型 Ga As/ Ga Al As子带间光吸收的红外光电导探测机理 ,利用 MOCVD系统进行器件材料的生长 ,研制了 2 0 0μm× 2 0 0μm的台面形式单管 ,测到了明显的红外光电流信号及阱间共振遂穿效应造成的负阻震荡现象 ,对器件的性能测试结果表明 ,器件的光电流响应和信噪比随着阱数增加而增加 ,器件噪声比常规 Ga As/ Ga Al
文摘Electrolyte electroreflectance (EER) has been widely employed to investigate the electronic energy band structure and related physical properties of semiconductors. The electrolyte electroreflectance (EER) method combined with electrochemical anodic dissolution was used to study GaAs/GaAlAs multilayer structural materials. According to variation of the EER spectra during anodic dissolution the characteristics of GaAs/GaAlAs multilayer structural materials such as properties of the interface, p-n junction positions and Al content profiles were obtained.
文摘A GaAs/GaAlAs transmission photocathode surface topography is examined with a scanning electron microscope(SEM) in the secondary emission mode.The contributions of photocathode surface topography to mean transverse energy of electrons emitted from the photocathode are calculated. Measurement is made of the variation of mean transverse emission energy with activating time during the course of activation. It is shown that the scattering of the photoelectrons in the Cs/O layer is the primary cause of the unexpectant high values of the mean transverse energy of electrons emitted from GaAs/GaAlAs photocathode. A method is proposed for the reduction of the mean transverse energy of electrons emitted from the photocathode.
