GaInP/GaAs/Ge triple-junction solar cells were irradiated with 50 keV and 100 keV protons at fluences of 5 × 10^10 cm^-2, 1 × 10^11 cm^-2,1 × 10^12 cm^-2, and 1 × 10^13 cm^-2. Their performance deg...GaInP/GaAs/Ge triple-junction solar cells were irradiated with 50 keV and 100 keV protons at fluences of 5 × 10^10 cm^-2, 1 × 10^11 cm^-2,1 × 10^12 cm^-2, and 1 × 10^13 cm^-2. Their performance degradation is analyzed using current-voltage characteristics and spectral response measurements, and then the changes in Isc, Voc, Pmax and the spectral response of the cells are observed as functions of proton irradiation fluence and energy. The results show that the spectral response of the top cell degrades more significantly than that of the middle cell, and 100 keV proton-induced degradation rates of Isc, Voc and Pmax are larger compared with 50 keV proton irradiation.展开更多
Displacement damage dose (Dd) approach was applied to analyze the electron irradiation-induced degradation of GaInP/ GaAs/Ge space solar cells by effective 1 MeV electron Dd, the electron irradiation-induced maximum p...Displacement damage dose (Dd) approach was applied to analyze the electron irradiation-induced degradation of GaInP/ GaAs/Ge space solar cells by effective 1 MeV electron Dd, the electron irradiation-induced maximum power Pmax degradation of the solar cells is plotted as a function of the effective 1 MeV electron Dd , and the result shows that all the measured electron data can be represented by a single curve using displacement damage dose. Obviously, the displacement damage dose approach simplifies the description of electron irradiation-induced degradation of GaInP/GaAs/Ge space solar cells, and also offers an alternative for handling the case where degradation occurs as a result of combined electron and proton irradiation.展开更多
引入移位损伤剂量,对国产空间用GaAs/Ge太阳电池电子的辐射效应进行研究分析。首先计算电子在电池中的非电离能损(non-ionizing energy loss,NIEL)值,再用其与电子辐射注量的相乘,得到相应的移位损伤剂量(displacement damage dose,Dd)...引入移位损伤剂量,对国产空间用GaAs/Ge太阳电池电子的辐射效应进行研究分析。首先计算电子在电池中的非电离能损(non-ionizing energy loss,NIEL)值,再用其与电子辐射注量的相乘,得到相应的移位损伤剂量(displacement damage dose,Dd),并对不同能量电子辐射下GaAs/Ge太阳电池最大输出功率Pmax随Dd的衰降曲线进行修正。分析结果表明:用Dd代替辐射注量,可使不同能量电子辐射引起的GaAs/Ge太阳电池Pmax的衰降能用单一曲线来描述。由此,通过NIEL值的计算和相对少的电子实验数据,就可确定太阳电池Pmax的衰降曲线,能够方便地预测在轨任务太阳电池的工作寿命。展开更多
应用PC1D程序拟合1 Me V电子辐照后Ga In P/Ga As/Ge太阳电池的光谱响应得到少数载流子扩散长度随辐照电子注量的变化关系.结果表明:少数载流子(少子)扩散长度随辐照电子注量增加而减小,少数载流子扩散长度的缩短是太阳电池短路电流退...应用PC1D程序拟合1 Me V电子辐照后Ga In P/Ga As/Ge太阳电池的光谱响应得到少数载流子扩散长度随辐照电子注量的变化关系.结果表明:少数载流子(少子)扩散长度随辐照电子注量增加而减小,少数载流子扩散长度的缩短是太阳电池短路电流退化的主要原因.展开更多
In the present paper, some novel opportunities for the development of high-efficient Si and III-V-based solar cells are considered: energy-saving environment friendly low-temperature technology of forming p-n junction...In the present paper, some novel opportunities for the development of high-efficient Si and III-V-based solar cells are considered: energy-saving environment friendly low-temperature technology of forming p-n junctions in Si (1), elaboration of structurally perfect GaAs/Ge/Si epitaxial substrates (2) and application of protective antireflecting coatings based on cubic zirconia (3). As a result: 1) New technique of forming p-n junctions in silicon has been elaborated. The technique provided easy and comparatively cheap process of production of semiconductor devices such as solar cells. The essence of the technique under the study is comprised in formation p-n junctions in silicon by a change of conductivity in the bulk of the sample occurring as a result of redistribution of the impurities, which already exists in the sample before its processing by ions. It differs from the techniques of diffusion and ion doping where change of conductivity and formation of p-n junction in the sample occur as a result of introduction of atoms of the other dopants from the outside;2) The conditions for synthesis of GaAs/Ge/Si epitaxial substrates with a thin (200 nm) Ge buffer layer featured with (1 - 2) × 105 cm-2 density of the threading dislocation in the GaAs layer. Ge buffer was obtained by chemical vapor deposition with a hot wire and GaAs layer of 1 μm thick was grown by the metal organic chemical vapor deposition. Root mean square surface roughness of GaAs layers of the less than 1 nm and good photoluminescence properties along with their high uniformity were obtained;3) The conditions ensuring the synthesis of uniform functional (buffer, insulating and protective) fianite layers on Si and GaAs substrates by means of magnetron and electron-beam sputtering have been determined. Fianite films have been shown to be suitable for the use as an ideal anti-reflecting material with high protective and anticorrosive properties.展开更多
基金supported by National Natural Science Foundation of China(Nos.10675023,11075018)the Fundamental Research Funds for the Central Universities of China
文摘GaInP/GaAs/Ge triple-junction solar cells were irradiated with 50 keV and 100 keV protons at fluences of 5 × 10^10 cm^-2, 1 × 10^11 cm^-2,1 × 10^12 cm^-2, and 1 × 10^13 cm^-2. Their performance degradation is analyzed using current-voltage characteristics and spectral response measurements, and then the changes in Isc, Voc, Pmax and the spectral response of the cells are observed as functions of proton irradiation fluence and energy. The results show that the spectral response of the top cell degrades more significantly than that of the middle cell, and 100 keV proton-induced degradation rates of Isc, Voc and Pmax are larger compared with 50 keV proton irradiation.
基金supported by the National Natural Science Foundation of China (Grant Nos. 10675023 and 11075018)the Fundamental Research Funds for the Central Universities
文摘Displacement damage dose (Dd) approach was applied to analyze the electron irradiation-induced degradation of GaInP/ GaAs/Ge space solar cells by effective 1 MeV electron Dd, the electron irradiation-induced maximum power Pmax degradation of the solar cells is plotted as a function of the effective 1 MeV electron Dd , and the result shows that all the measured electron data can be represented by a single curve using displacement damage dose. Obviously, the displacement damage dose approach simplifies the description of electron irradiation-induced degradation of GaInP/GaAs/Ge space solar cells, and also offers an alternative for handling the case where degradation occurs as a result of combined electron and proton irradiation.
文摘引入移位损伤剂量,对国产空间用GaAs/Ge太阳电池电子的辐射效应进行研究分析。首先计算电子在电池中的非电离能损(non-ionizing energy loss,NIEL)值,再用其与电子辐射注量的相乘,得到相应的移位损伤剂量(displacement damage dose,Dd),并对不同能量电子辐射下GaAs/Ge太阳电池最大输出功率Pmax随Dd的衰降曲线进行修正。分析结果表明:用Dd代替辐射注量,可使不同能量电子辐射引起的GaAs/Ge太阳电池Pmax的衰降能用单一曲线来描述。由此,通过NIEL值的计算和相对少的电子实验数据,就可确定太阳电池Pmax的衰降曲线,能够方便地预测在轨任务太阳电池的工作寿命。
文摘In the present paper, some novel opportunities for the development of high-efficient Si and III-V-based solar cells are considered: energy-saving environment friendly low-temperature technology of forming p-n junctions in Si (1), elaboration of structurally perfect GaAs/Ge/Si epitaxial substrates (2) and application of protective antireflecting coatings based on cubic zirconia (3). As a result: 1) New technique of forming p-n junctions in silicon has been elaborated. The technique provided easy and comparatively cheap process of production of semiconductor devices such as solar cells. The essence of the technique under the study is comprised in formation p-n junctions in silicon by a change of conductivity in the bulk of the sample occurring as a result of redistribution of the impurities, which already exists in the sample before its processing by ions. It differs from the techniques of diffusion and ion doping where change of conductivity and formation of p-n junction in the sample occur as a result of introduction of atoms of the other dopants from the outside;2) The conditions for synthesis of GaAs/Ge/Si epitaxial substrates with a thin (200 nm) Ge buffer layer featured with (1 - 2) × 105 cm-2 density of the threading dislocation in the GaAs layer. Ge buffer was obtained by chemical vapor deposition with a hot wire and GaAs layer of 1 μm thick was grown by the metal organic chemical vapor deposition. Root mean square surface roughness of GaAs layers of the less than 1 nm and good photoluminescence properties along with their high uniformity were obtained;3) The conditions ensuring the synthesis of uniform functional (buffer, insulating and protective) fianite layers on Si and GaAs substrates by means of magnetron and electron-beam sputtering have been determined. Fianite films have been shown to be suitable for the use as an ideal anti-reflecting material with high protective and anticorrosive properties.
