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基于硝酸钾溶液的GaN电化学刻蚀技术 被引量:3
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作者 李昂 王伟凡 +2 位作者 周桃飞 王建峰 徐科 《半导体技术》 CAS 北大核心 2019年第10期778-782,812,共6页
采用基于硝酸钾溶液的电化学刻蚀工艺,通过横向刻蚀牺牲层的方法,在金属有机化学气相沉积法生长的氮化镓(GaN)外延层上实现了纳米孔与纳米薄膜两种结构。通过扫描电子显微镜(SEM)对GaN的表面和截面进行了对比表征。结果表明,由于在刻蚀... 采用基于硝酸钾溶液的电化学刻蚀工艺,通过横向刻蚀牺牲层的方法,在金属有机化学气相沉积法生长的氮化镓(GaN)外延层上实现了纳米孔与纳米薄膜两种结构。通过扫描电子显微镜(SEM)对GaN的表面和截面进行了对比表征。结果表明,由于在刻蚀过程中氧气的产生,相比于稳定性很好的SiO2,易于氧化剥落的光刻胶在大电压刻蚀下存在着明显的缺陷;在刻蚀电压为12~22 V时牺牲层可以被刻蚀出纳米孔结构,且随着电压的增加刻蚀孔也会增大;在刻蚀电压为23 V及以上电压时牺牲层被完全去除;刻蚀过程中刻蚀速率逐渐降低,100μm的纳米薄膜可在270 s时制作完成。 展开更多
关键词 电化学刻蚀 硝酸钾 gan纳米孔 横向刻蚀 gan纳米薄膜(NMS)
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GaN-based light emitting diodes on nano-hole patterned sapphire substrate prepared by three-beam laser interference lithography 被引量:1
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作者 桑伟华 林露 +3 位作者 王龙 闵嘉华 朱建军 王敏锐 《Optoelectronics Letters》 EI 2016年第3期178-181,共4页
Nano-hole patterned sapphire substrates (NHPSSs) were successfully prepared using a low-cost and high-efficiency approach, which is the laser interference lithography (LIL) combined with reactive ion etching (RIE... Nano-hole patterned sapphire substrates (NHPSSs) were successfully prepared using a low-cost and high-efficiency approach, which is the laser interference lithography (LIL) combined with reactive ion etching (RIE) and inductively coupled plasma (ICP) techniques. Gallium nitride (GaN)-based light emitting diode (LED) structure was grown on NHPSS by metal organic chemical vapor deposition (MOCVD). Photoluminescence (PL) measurement was conducted to compare the luminescence efficiency of the GaN-based LED structure grown on NHPSS ('NHPSS-LED) and that on unpatterned sapphire substrates (UPSS-LED). Electroluminescence (EL) measurement shows that the output power of NHPSS-LED is 2.3 times as high as that of UPSS-LED with an injection current of 150 mA. Both PL and EL results imply that NHPSS has an advantage in improving the crystalline quality of Gab/epilayer and light extraction efficiency of LEDs at the same time. 展开更多
关键词 蓝宝石衬底 发光二极管 光刻技术 激光干涉 图案化 gan 纳米 制备
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