Surface passivation with acidic （NH4）2S solution is shown to be effective in improving the interfacial and electrical properties of HfOE/GaSb metal oxide semiconductor devices. Compared with control samples, the sam...Surface passivation with acidic （NH4）2S solution is shown to be effective in improving the interfacial and electrical properties of HfOE/GaSb metal oxide semiconductor devices. Compared with control samples, the samples treated with acidic （NH4）2S solution show great improvements in gate leakage current, frequency dispersion, border trap density, and interface trap density. These improvements are attributed to the enhancing passivation of the substrates, according to analysis from the perspective of chemical mechanism, X-ray photoelectron spectroscopy, and high-resolution cross-sectional transmission electron microscopy.展开更多
Various biaxial compressive strained GaSb p-channel metal-oxide-semiconductor field-effect transistors （MOSFETs） are experimentally and theoretically investigated, The biaxial compressive strained GaSb MOSFETs show ...Various biaxial compressive strained GaSb p-channel metal-oxide-semiconductor field-effect transistors （MOSFETs） are experimentally and theoretically investigated, The biaxial compressive strained GaSb MOSFETs show a high peak mobility of 638 cm2/V.s, which is 3.86 times of the extracted mobility of the fabricated GaSb MOSFETs without strain. Meanwhile, first principles calculations show that the hole effective mass of GaSb depends on the biaxial compressive strain. The biaxiai compressive strain brings a remarkable enhancement of the hole mobility caused by a significant reduction in the hole effective mass due to the modulation of the valence bands.展开更多
GaSb p-channel metal-oxide-semiconductor field-effect transistors （MOSFETs） with an atomic layer deposited Al2O3 gate dielectric and a self-aligned Si-implanted source/drain are experimentally demonstrated. Temperat...GaSb p-channel metal-oxide-semiconductor field-effect transistors （MOSFETs） with an atomic layer deposited Al2O3 gate dielectric and a self-aligned Si-implanted source/drain are experimentally demonstrated. Temperature dependent electrical characteristics are investigated. Different electrical behaviors are observed in two temperature regions, and the un- derlying mechanisms are discussed. It is found that the reverse-bias pn junction leakage of the drain/substrate is the main component of the off-state drain leakage current, which is generation-current dominated in the low temperature regions and is diffusion-current dominated in the high temperature regions. Methods to further reduce the off-state drain leakage current are given.展开更多
We experimentally demonstrate a diode-pumped passively mode-locked femtosecond laser with yb3＋-doped yttrium lanthanum oxide ceramic. Mode-locking is achieved by using a semiconductor saturable absorber mirror, and i...We experimentally demonstrate a diode-pumped passively mode-locked femtosecond laser with yb3＋-doped yttrium lanthanum oxide ceramic. Mode-locking is achieved by using a semiconductor saturable absorber mirror, and intraeavity dispersion is compensated by a pair of SF6 prisms. Laser pulses as short as 357 fs at a central wavelength of 1 075 nm are obtained. The maximum average output power is 670 mW under 4.5 W of pumping power with a slope efficiency of 20%. To the best of our knowledge, this is the shortest pulse generated from Yb-doped yttrium lanthanum oxide ceramic lasers with a sub-500 fs pulse duration.展开更多
基金supported by the State Key Development Program for Basic Research of China(Grant No.2011CBA00602)the Major Project of the NationalScience and Technology of China(Grant No.2011ZX02708-002)
文摘Surface passivation with acidic （NH4）2S solution is shown to be effective in improving the interfacial and electrical properties of HfOE/GaSb metal oxide semiconductor devices. Compared with control samples, the samples treated with acidic （NH4）2S solution show great improvements in gate leakage current, frequency dispersion, border trap density, and interface trap density. These improvements are attributed to the enhancing passivation of the substrates, according to analysis from the perspective of chemical mechanism, X-ray photoelectron spectroscopy, and high-resolution cross-sectional transmission electron microscopy.
基金Project supported by the National Basic Research Program of China(Grant No.2011CBA00602)the National Science and Technology Major Project of the Ministry of Science and Technology of China(Grant No.2011ZX02708-002)
文摘Various biaxial compressive strained GaSb p-channel metal-oxide-semiconductor field-effect transistors （MOSFETs） are experimentally and theoretically investigated, The biaxial compressive strained GaSb MOSFETs show a high peak mobility of 638 cm2/V.s, which is 3.86 times of the extracted mobility of the fabricated GaSb MOSFETs without strain. Meanwhile, first principles calculations show that the hole effective mass of GaSb depends on the biaxial compressive strain. The biaxiai compressive strain brings a remarkable enhancement of the hole mobility caused by a significant reduction in the hole effective mass due to the modulation of the valence bands.
基金Project supported by the National Basic Research Program of China(Grant No.2011CBA00602)the National Science and Technology Major Project of the Ministry of Science and Technology of China(Grant No.2011ZX02708-002)
文摘GaSb p-channel metal-oxide-semiconductor field-effect transistors （MOSFETs） with an atomic layer deposited Al2O3 gate dielectric and a self-aligned Si-implanted source/drain are experimentally demonstrated. Temperature dependent electrical characteristics are investigated. Different electrical behaviors are observed in two temperature regions, and the un- derlying mechanisms are discussed. It is found that the reverse-bias pn junction leakage of the drain/substrate is the main component of the off-state drain leakage current, which is generation-current dominated in the low temperature regions and is diffusion-current dominated in the high temperature regions. Methods to further reduce the off-state drain leakage current are given.
基金supported by the National Natural Science Foundation of China (Nos. 10874237, 10804128,and 60808007)the National "863" Program of China(No. 2011AA030205)the Fundamental Research Funds for the Central Universities (No. K50511050001)
文摘We experimentally demonstrate a diode-pumped passively mode-locked femtosecond laser with yb3＋-doped yttrium lanthanum oxide ceramic. Mode-locking is achieved by using a semiconductor saturable absorber mirror, and intraeavity dispersion is compensated by a pair of SF6 prisms. Laser pulses as short as 357 fs at a central wavelength of 1 075 nm are obtained. The maximum average output power is 670 mW under 4.5 W of pumping power with a slope efficiency of 20%. To the best of our knowledge, this is the shortest pulse generated from Yb-doped yttrium lanthanum oxide ceramic lasers with a sub-500 fs pulse duration.
