Graphene on gallium nitride (GaN) will be quite useful when the graphene is used as transparent electrodes to improve the performance of gallium nitride devices. In this work, we report the direct synthesis of graph...Graphene on gallium nitride (GaN) will be quite useful when the graphene is used as transparent electrodes to improve the performance of gallium nitride devices. In this work, we report the direct synthesis of graphene on GaN without an extra catalyst by chemical vapor deposition. Raman spectra indicate that the graphene films are uniform and about 5-6 layers in thickness. Meanwhile, the effects of growth temperatures on the growth of graphene films are systematically studied, of which 950 ℃ is found to be the optimum growth temperature. The sheet resistance of the grown graphene is 41.1 Ω/square, which is close to the lowest sheet resistance of transferred graphene reported. The mechanism of graphene growth on GaN is proposed and discussed in detail. XRD spectra and photoluminescence spectra indicate that the quality of GaN epi-layers will not be affected after the growth of graphene.展开更多
Zinc oxide (ZnO) is one of the most promising and frequently used semiconductor materials. In-doped nanos- tructure ZnO thin films are grown on p-type gallium nitride substrates by employing the simultaneous rf and ...Zinc oxide (ZnO) is one of the most promising and frequently used semiconductor materials. In-doped nanos- tructure ZnO thin films are grown on p-type gallium nitride substrates by employing the simultaneous rf and dc magnetron co-sputtering technique. The effect of In-doping on structural, morphological and electrical properties is studied. The different dopant concentrations are accomplished by varying the direct current power of the In target while keeping the fixed radio frequency power of the ZnO target through the co-sputtering deposition technique by using argon as the sputtering gas at ambient temperature. The structural analysis confirms that all the grown thin films preferentially orientate along the c-axis with the wurtzite hexagonal crystal structure without having any kind of In oxide phases. The presenting Zn, 0 and In elements' chemical compositions are identified with EDX mapping analysis of the deposited thin films and the calculated M ratio has been found to decrease with the increasing In power. The surface topographies of the grown thin films are examined with the atomic force microscope technique. The obtained results reveal that the grown film roughness increases with the In power. The Hall measurements ascertain that all the grown films have n-type conductivity and also the other electrical parameters such as resistivity,mobility and carrier concentration are analyzed.展开更多
The strong polarization effect of GaN-based materials is widely used in high-performance devices such as white-lightemitting diodes(white LEDs),high electron mobility transistors(HEMTs),and GaN polarization superjunct...The strong polarization effect of GaN-based materials is widely used in high-performance devices such as white-lightemitting diodes(white LEDs),high electron mobility transistors(HEMTs),and GaN polarization superjunctions.However,the current researches on the polarization mechanism of GaN-based materials are not sufficient.In this paper,we studied the influence of polarization on electric field and energy band characteristics of Ga-face GaN bulk materials by using a combination of theoretical analysis and semiconductor technology computer-aided design(TCAD) simulation.The selfscreening effect in Ga-face bulk GaN under ideal and non-ideal conditions is studied respectively.We believe that the formation of high-density two-dimensional electron gas(2 DEG) in GaN is the accumulation of screening charges.We also clarify the source and accumulation of the screening charges caused by the GaN self-screening effect in this paper and aim to guide the design and optimization of high-performance GaN-based devices.展开更多
High electron mobility transistor(HEMT)based on gallium nitride(GaN)is one of the most promising candidates for the future generation of high frequencies and high-power electronic applications.This research work aims ...High electron mobility transistor(HEMT)based on gallium nitride(GaN)is one of the most promising candidates for the future generation of high frequencies and high-power electronic applications.This research work aims at designing and characterization of enhancement-mode or normally-off GaN HEMT.The impact of variations in gate length,mole concentration,barrier variations and other important design parameters on the performance of normally-off GaN HEMT is thoroughly investigated.An increase in the gate length causes a decrease in the drain current and transconductance,while an increase in drain current and transconductance can be achieved by increasing the concentration of aluminium(Al).For Al mole fractions of 23%,25%,and 27%,within Al gallium nitride(AlGaN)barrier,the GaN HEMT devices provide a maximum drain current of 347,408 and 474 mA/μm and a transconductance of 19,20.2,21.5 mS/μm,respectively.Whereas,for Al mole fraction of 10%and 15%,within AlGaN buffer,these devices are observed to provide a drain current of 329 and 283 mA/μm,respectively.Furthermore,for a gate length of 2.4,3.4,and 4.4μm,the device is observed to exhibit a maximum drain current of 272,235,and 221 mA/μm and the transconductance of 16.2,14,and 12.3 mS/μm,respectively.It is established that a maximum drain current of 997 mA/μm can be achieved with an Al concentration of 23%,and the device exhibits a steady drain current with enhanced transconductance.These observations demonstrate tremendous potential for two-dimensional electron gas(2DEG)for securing of the normally-off mode operation.A suitable setting of gate length and other design parameters is critical in preserving the normally-off mode operation while also enhancing the critical performance parameters at the same time.Due to the normallyon depletion-mode nature of GaN HEMT,it is usually not considered as suitable for high power levels,frequencies,and temperature.In such settings,a negative bias is required to enter the blocking condition;however,in the before-mentioned normally-off devices,the negative bias can be avoided and the channel can be depleted without applying a negative bias.展开更多
We introduce the first domestic in-situ multi-information measurement system for a gallium nitride (GaN) photo- cathode. This system can successfully fulfill heat cleaning and activation for GaN in an ultrahigh vacu...We introduce the first domestic in-situ multi-information measurement system for a gallium nitride (GaN) photo- cathode. This system can successfully fulfill heat cleaning and activation for GaN in an ultrahigh vacuum environment and produce a GaN photocathode with a negative electron affinity (NEA) status. Information including the heat clean- ing temperature, vacuum degree, photocurrent, electric current of cesium source, oxygen source, and the most important information about the spectral response, or equivalently, the quantum efficiency (QE) can be obtained during prepa- ration. The preparation of a GaN photocathode with this system indicates that the optimal heating temperature in a vacuum is about 700 ~C. We also develop a method of quickly evaluating the atomically clean surface with the vacuum degree versus wavelength curve to prevent possible secondary contamination when the atomic level cleaning surface is tested with X-ray photoelectron spectroscopy. The photocurrent shows a quick enhancement when the current ratio between the cesium source and oxygen source is 1.025. The spectral response of the GaN photocathode is flat in a wavelength range from 240 nm to 365 nm, and an abrupt decline is observed at 365 nm, which demonstrates that with the in-si$u multi-information measurement system the NEA GaN photocathode can be successfully prepared.展开更多
The decarboxylative Minisci reaction is a versatile tool for the direct C-H alkylation of heteroarenes,where stoichiometric amounts of oxidants or expensive,precious metal reagents are commonly used.Herein,we reported...The decarboxylative Minisci reaction is a versatile tool for the direct C-H alkylation of heteroarenes,where stoichiometric amounts of oxidants or expensive,precious metal reagents are commonly used.Herein,we reported a photodriven decarboxylative Minisci reaction enabled by a gallium nitride-based heterogeneous photocatalyst under mild conditions.This method can be effectively applied to a broad substrate scope of acids,including primary,secondary,and tertiary carboxylic acids and N-heteroarenes effectively.The practicability and robustness of the approach are demonstrated for the functionalization of biologically active compounds.展开更多
White light-emitting diodes(LEDs)are becoming an alternative general light source,with huge energy savings compared to conventional lighting.However,white LEDs using phosphor(s)suffer from unavoidable Stokes energy co...White light-emitting diodes(LEDs)are becoming an alternative general light source,with huge energy savings compared to conventional lighting.However,white LEDs using phosphor(s)suffer from unavoidable Stokes energy converting losses,higher manufacturing cost,and reduced thermal stability.Here,we demonstrate electrically driven,phosphor-free,white LEDs based on three-dimensional gallium nitride structures with double concentric truncated hexagonal pyramids.The electroluminescence spectra are stable with varying current.The origin of the emission wavelength is studied by cathodoluminescence and high-angle annular dark field scanning transmission electron microscopy experiments.Spatial variation of the carrier injection efficiency is also investigated by a comparative analysis between spatially resolved photoluminescence and electroluminescence.展开更多
In this paper,the feasibility of a high laser damage threshold liquid crystal spatial light modulator based on gallium nitride(GaN)transparent conductive electrodes is proved.The laser-induced damage threshold(LIDT)is...In this paper,the feasibility of a high laser damage threshold liquid crystal spatial light modulator based on gallium nitride(GaN)transparent conductive electrodes is proved.The laser-induced damage threshold(LIDT)is measured,and a high LIDT reflective optically addressed liquid crystal light valve(OALCLV)based on GaN is designed and fabricated.The proper work mode of the OALCLV is determined;the OALCLV obtained a maximum reflectivity of about 55%and an on–off ratio of 55:1,and an image response is demonstrated.展开更多
The geometric,electronic and optical properties of the graphene-like gallium nitride(GaN) monolayer paired with WS_2 or WSe_2 were studied systematically using the first-principles calculations.GaN interacts with WS2 ...The geometric,electronic and optical properties of the graphene-like gallium nitride(GaN) monolayer paired with WS_2 or WSe_2 were studied systematically using the first-principles calculations.GaN interacts with WS2 or WSe_2 via van der Waals interaction and all the most stable configurations of these two nanocomposites exhibit direct band gap characteristics.Meanwhile,the type-Ⅱ heterojunctions are formed because the conduction band minimums and valence band maximums are respectively contributed by WS_2(or WSe_2) and GaN.The imaginary parts of the dielectric function and the absorption spectra of the heterostructures were also calculated and the relatively improved optical properties were observed because of the new interband transitions.In addition,the band offsets as well as the intrinsic electric fields resulting from the interlayer charge transfer indicate that the electron-hole pairs recombination can be effectively inhibited,which is conducive for the photocatalysis process.Moreover,the band gaps of the heterostructures can be modulated by applying biaxial strains and even shift away the conduction band edge potential from the H^+/H_2potential in a certain range,which further enhances the photocatalyst performance.The results indicate that GaN/WS2 or GaN/WSe_2 nanocomposites are good candidate materials for photocatalyst or photoelectronic applications.展开更多
Growing graphene on gallium nitride (GaN) at temperatures greater than 900℃ is a challenge that must be overcome to obtain high quality of GaN epi-layers. We successfully met this challenge using C2H2 as the carbon...Growing graphene on gallium nitride (GaN) at temperatures greater than 900℃ is a challenge that must be overcome to obtain high quality of GaN epi-layers. We successfully met this challenge using C2H2 as the carbon source. We demonstrated that graphene can be grown both on copper and directly on GaN epi-layers. The Raman spectra indicated that the graphene films were about 4-5 layers thick. Meanwhile, the effects of the growth temperature on the growth of the graphene films were systematically studied, and 830℃ was found to be the optimum growth temperature. We successfully grew high-quality graphene films directly on gallium nitride.展开更多
We investigate the transverse mode pattern in GaN quantum-well (QW) laser diode (LD) by numerical calculation. We optimize the current GaN LD structure by varying the n-GaN layer thickness. The n-type GaN layer is...We investigate the transverse mode pattern in GaN quantum-well (QW) laser diode (LD) by numerical calculation. We optimize the current GaN LD structure by varying the n-GaN layer thickness. The n-type GaN layer is an important factor to determine the optical mode. Finally, we discuss the lasing performance of the GaN LD based on the transverse optical modes.展开更多
In this work,the GaN thin films were directly deposited on multilayer graphene(MLG)by plasma-enhanced atomic layer deposition.The deposition was carried out at a low temperature using triethylgallium(TEGa)precursor an...In this work,the GaN thin films were directly deposited on multilayer graphene(MLG)by plasma-enhanced atomic layer deposition.The deposition was carried out at a low temperature using triethylgallium(TEGa)precursor and Ar/N2/H2 plasma.Chemical properties of the bulk GaN and GaN-graphene interface were analyzed using X-ray photoelectron spectroscopy.The sharp interface between GaN and graphene was verified via X-ray reflectivity and transmission electron microscope.The microstructures and the nucleation behaviors of the GaN grown on graphene have been also studied.The results of grazing incidence X-ray diffraction and Raman spectrum indicate that the as-deposited sample is polycrystalline with wurtzite structure and has a weakly tensile stress.Optical properties of the sample were investigated by photoluminescence(PL)at room temperature.The successful growth of GaN on MLG at a low temperature opens up the possibility of ameliorating the performance of electronic and optical devices based on GaN/graphene heterojunction.展开更多
With technology computer-aided design(TCAD)simulation software,we design a new structure of gallium oxide on gallium-nitride Schottky barrier diode(SBD).The parameters of gallium oxide are defined as new material para...With technology computer-aided design(TCAD)simulation software,we design a new structure of gallium oxide on gallium-nitride Schottky barrier diode(SBD).The parameters of gallium oxide are defined as new material parameters in the material library,and the SBD turn-on and breakdown behavior are simulated.The simulation results reveal that this new structure has a larger turn-on current than Ga2O3 SBD and a larger breakdown voltage than Ga N SBD.Also,to solve the lattice mismatch problem in the real epitaxy,we add a Zn O layer as a transition layer.The simulations show that the device still has good properties after adding this layer.展开更多
In this research,the growth of GaN thin films on c-plane sapphire(0001) substrates via two-step method without the assist of buffer layer and catalysts was demonstrated.First,gallium oxide(Ga_2O_3) thin films were...In this research,the growth of GaN thin films on c-plane sapphire(0001) substrates via two-step method without the assist of buffer layer and catalysts was demonstrated.First,gallium oxide(Ga_2O_3) thin films were deposited on sapphire substrates by radio frequency magnetron sputtering method.The deposited Ga_2O_3 thin films were then nitridated at various temperatures.In this research,attention is focused on the influence of nitridation temperatures on the structural and optical properties of the synthesized GaN thin films.It is revealed that 950 ℃ is the optimal nitridation temperature for synthesizing hexagonal wurtzite GaN thin film with preferential(0002) growth direction.展开更多
Elucidating the complex interactions between the work material and abrasives during grinding of gallium nitride(GaN)single crystals is an active and challenging research area.In this study,molecular dynamics simulatio...Elucidating the complex interactions between the work material and abrasives during grinding of gallium nitride(GaN)single crystals is an active and challenging research area.In this study,molecular dynamics simulations were performed on double-grits interacted grinding of GaN crystals;and the grinding force,coefficient of friction,stress distribution,plastic damage behaviors,and abrasive damage were systematically investigated.The results demonstrated that the interacted distance in both radial and transverse directions achieved better grinding quality than that in only one direction.The grinding force,grinding induced stress,subsurface damage depth,and abrasive wear increase as the transverse interacted distance increases.However,there was no clear correlation between the interaction distance and the number of atoms in the phase transition and dislocation length.Appropriate interacted distances between abrasives can decrease grinding force,coefficient of friction,grinding induced stress,subsurface damage depth,and abrasive wear during the grinding process.The results of grinding tests combined with cross-sectional transmission electron micrographs validated the simulated damage results,i.e.amorphous atoms,high-pressure phase transition,dislocations,stacking faults,and lattice distortions.The results of this study will deepen our understanding of damage accumulation and material removal resulting from coupling between abrasives during grinding and can be used to develop a feasible approach to the wheel design of ordered abrasives.展开更多
There is a significantly increasing demand of developing augmented reality and virtual reality(AR and VR) devices,where micro-LEDs(μLEDs) with a dimension of ≤ 5 μm are the key elements. Typically, μLEDs are fabri...There is a significantly increasing demand of developing augmented reality and virtual reality(AR and VR) devices,where micro-LEDs(μLEDs) with a dimension of ≤ 5 μm are the key elements. Typically, μLEDs are fabricated by dry-etching technologies, unavoidably leading to a severe degradation in optical performance as a result of dry-etching induced damages. This becomes a particularly severe issue when the dimension of LEDs is ≤ 10 μm. In order to address the fundamental challenge, the Sheffield team has proposed and then developed a direct epitaxial approach to achievingμLEDs, where the dry-etching technologies for the formation of μLED mesas are not needed anymore. This paper provides a review on this technology and then demonstrates a number of monolithically integrated devices on a single chip using this technology.展开更多
Gallium nitride(GaN)/porous silicon(PSi)film was prepared using a pulsed laser deposition method and 1064 nm Nd:YAG laser for optoelectronic applications and a series of Psi substrates were fabricated using a photoele...Gallium nitride(GaN)/porous silicon(PSi)film was prepared using a pulsed laser deposition method and 1064 nm Nd:YAG laser for optoelectronic applications and a series of Psi substrates were fabricated using a photoelectrochemical etching method assisted by laser at different etching times for 2.5–15 min at 2.5 min intervals.X-ray diffraction,room-temperature photoluminescence,atomic force microscopy and field emission scanning electron microscopy images,and electrical characteristics in the prepared GaN on the Psi film were investigated.The optimum Psi substrate was obtained under the following conditions:10 min,10 mA/cm^(2),and 24%hydrofluoric acid.The substrate exhibited two highly cubic crystalline structures at(200)and(400)orientations and yellow visible band photoluminescence,and homogeneous pores formed over the entire surface.The pores had steep oval shapes and were accompanied by small dark pores that appeared topographically and morphologically.The GaN/Psi film fabricated through PLD exhibited a high and hexagonal crystallographic texture in the(002)plane.Spectroscopic properties results revealed that the photoluminescence emission of the deposited nano-GaN films was in the ultraviolet band(374 nm)related to GaN material and in the near-infrared band(730 nm)related to the Psi substrate.The topographical and morphological results of the GaN films confirmed that the deposited film contained spherical grains with an average diameter of 51.8 nm and surface roughness of 4.8 nm.The GaN/Psi surface showed a cauliflower-like morphology,and the built-in voltage decreased from 3.4 to 2.7 eV after deposition.The fabricated GaN/Psi film exhibited good electrical characteristics.展开更多
Aim To study the relationship between the substrate temperature and the morphology and properties of GaN. Methods\ Applying the hydride chemical vapor deposition method, GaN films were deposited on different kinds of...Aim To study the relationship between the substrate temperature and the morphology and properties of GaN. Methods\ Applying the hydride chemical vapor deposition method, GaN films were deposited on different kinds of substrates, including sapphire, Si(111),Si(100),GaAs and GaP(111) both on the P face and the Ga face. The growth was performed at low temperatures of below 700℃. XRD, Hall measurement, cathodoluminescence (CL) and atomic force microscopy (AFM) were used to characterise the film properties. Results\ It was found that the temperature and the nature of substrate materials influence the layer morphology. Conclusion\ The analysis shows that no apparent relationship exists between the optical properties and layer morphology.展开更多
Large quantities of CaN nanorods are successfully synthesized on Si(111) substrates by ammoniating the films of Ga2O3/ZnO at 950℃ in a quartz tube. The structure, morphology and optical properties of the as-prepare...Large quantities of CaN nanorods are successfully synthesized on Si(111) substrates by ammoniating the films of Ga2O3/ZnO at 950℃ in a quartz tube. The structure, morphology and optical properties of the as-prepared CaN nanorods are studied by x-ray diffraction, scanning electron microscopy, high-resolution transmission electron microscopy, Fourier transform infrared spectroscopy, and photoluminescence. The results show that the CaN nanorods have a hexagonal wurtzite structure with lengths of several micrometres and diameters from 80 nm to 300hm, which could supply an attractive potential to harmonically incorporate future GaN optoelectronic devices into Si-based large-scale integrated circuits. The growth mechanism is also briefly discussed.展开更多
As an important wide-bandgap semiconductor,gallium nitride(GaN)has attracted considerable attention.This paper describes the use of confocal Raman spectroscopy to characterize undoped GaN,n-type GaN,and p-type GaN thr...As an important wide-bandgap semiconductor,gallium nitride(GaN)has attracted considerable attention.This paper describes the use of confocal Raman spectroscopy to characterize undoped GaN,n-type GaN,and p-type GaN through depth profiling using 405-,532-,and 638-nm wavelength lasers.The Raman signal intensity of the sapphire substrate at different focal depths is studied to analyze the depth resolution.Based on the shift of the E2 H mode of the GaN epitaxial layer,the interfacial stress for different types of GaN is characterized and calculated.The results show that the maximum interfacial stress appears approximately at the junction of the GaN and the sapphire substrate.Local interfacial stress analysis between the GaN epitaxial layer and the substrate will be very helpful in furthering the applications of GaN devices.展开更多
基金supported by the National Natural Science Foundation of China(Grant Nos.61274040 and 51102226)the National Basic Research Program of China(Grant No.2011CB301904)+2 种基金the National High Technology Program of China(Grant Nos.2011AA03A103 and 2011AA03A105)the National Science Foundation of China(Grant Nos.10774032 and 90921001)the Key Knowledge Innovation Project of the Chinese Academy of Sciences on Water Science Research,Instrument Developing Project of the Chinese Academy of Sciences(Grant No.Y2010031)
文摘Graphene on gallium nitride (GaN) will be quite useful when the graphene is used as transparent electrodes to improve the performance of gallium nitride devices. In this work, we report the direct synthesis of graphene on GaN without an extra catalyst by chemical vapor deposition. Raman spectra indicate that the graphene films are uniform and about 5-6 layers in thickness. Meanwhile, the effects of growth temperatures on the growth of graphene films are systematically studied, of which 950 ℃ is found to be the optimum growth temperature. The sheet resistance of the grown graphene is 41.1 Ω/square, which is close to the lowest sheet resistance of transferred graphene reported. The mechanism of graphene growth on GaN is proposed and discussed in detail. XRD spectra and photoluminescence spectra indicate that the quality of GaN epi-layers will not be affected after the growth of graphene.
基金Supported by the RU Top-Down under Grant No 1001/CSS/870019
文摘Zinc oxide (ZnO) is one of the most promising and frequently used semiconductor materials. In-doped nanos- tructure ZnO thin films are grown on p-type gallium nitride substrates by employing the simultaneous rf and dc magnetron co-sputtering technique. The effect of In-doping on structural, morphological and electrical properties is studied. The different dopant concentrations are accomplished by varying the direct current power of the In target while keeping the fixed radio frequency power of the ZnO target through the co-sputtering deposition technique by using argon as the sputtering gas at ambient temperature. The structural analysis confirms that all the grown thin films preferentially orientate along the c-axis with the wurtzite hexagonal crystal structure without having any kind of In oxide phases. The presenting Zn, 0 and In elements' chemical compositions are identified with EDX mapping analysis of the deposited thin films and the calculated M ratio has been found to decrease with the increasing In power. The surface topographies of the grown thin films are examined with the atomic force microscope technique. The obtained results reveal that the grown film roughness increases with the In power. The Hall measurements ascertain that all the grown films have n-type conductivity and also the other electrical parameters such as resistivity,mobility and carrier concentration are analyzed.
基金Project supported by the Key Research and Development Program of Guangdong Province,China(Grant No.2020B010174003)。
文摘The strong polarization effect of GaN-based materials is widely used in high-performance devices such as white-lightemitting diodes(white LEDs),high electron mobility transistors(HEMTs),and GaN polarization superjunctions.However,the current researches on the polarization mechanism of GaN-based materials are not sufficient.In this paper,we studied the influence of polarization on electric field and energy band characteristics of Ga-face GaN bulk materials by using a combination of theoretical analysis and semiconductor technology computer-aided design(TCAD) simulation.The selfscreening effect in Ga-face bulk GaN under ideal and non-ideal conditions is studied respectively.We believe that the formation of high-density two-dimensional electron gas(2 DEG) in GaN is the accumulation of screening charges.We also clarify the source and accumulation of the screening charges caused by the GaN self-screening effect in this paper and aim to guide the design and optimization of high-performance GaN-based devices.
文摘High electron mobility transistor(HEMT)based on gallium nitride(GaN)is one of the most promising candidates for the future generation of high frequencies and high-power electronic applications.This research work aims at designing and characterization of enhancement-mode or normally-off GaN HEMT.The impact of variations in gate length,mole concentration,barrier variations and other important design parameters on the performance of normally-off GaN HEMT is thoroughly investigated.An increase in the gate length causes a decrease in the drain current and transconductance,while an increase in drain current and transconductance can be achieved by increasing the concentration of aluminium(Al).For Al mole fractions of 23%,25%,and 27%,within Al gallium nitride(AlGaN)barrier,the GaN HEMT devices provide a maximum drain current of 347,408 and 474 mA/μm and a transconductance of 19,20.2,21.5 mS/μm,respectively.Whereas,for Al mole fraction of 10%and 15%,within AlGaN buffer,these devices are observed to provide a drain current of 329 and 283 mA/μm,respectively.Furthermore,for a gate length of 2.4,3.4,and 4.4μm,the device is observed to exhibit a maximum drain current of 272,235,and 221 mA/μm and the transconductance of 16.2,14,and 12.3 mS/μm,respectively.It is established that a maximum drain current of 997 mA/μm can be achieved with an Al concentration of 23%,and the device exhibits a steady drain current with enhanced transconductance.These observations demonstrate tremendous potential for two-dimensional electron gas(2DEG)for securing of the normally-off mode operation.A suitable setting of gate length and other design parameters is critical in preserving the normally-off mode operation while also enhancing the critical performance parameters at the same time.Due to the normallyon depletion-mode nature of GaN HEMT,it is usually not considered as suitable for high power levels,frequencies,and temperature.In such settings,a negative bias is required to enter the blocking condition;however,in the before-mentioned normally-off devices,the negative bias can be avoided and the channel can be depleted without applying a negative bias.
基金Project supported by the National Natural Science Foundation of China (Grant No. 60871012)the Natural Science Foundation of Shandong Province,China (Grant No. ZR2011FQ027)
文摘We introduce the first domestic in-situ multi-information measurement system for a gallium nitride (GaN) photo- cathode. This system can successfully fulfill heat cleaning and activation for GaN in an ultrahigh vacuum environment and produce a GaN photocathode with a negative electron affinity (NEA) status. Information including the heat clean- ing temperature, vacuum degree, photocurrent, electric current of cesium source, oxygen source, and the most important information about the spectral response, or equivalently, the quantum efficiency (QE) can be obtained during prepa- ration. The preparation of a GaN photocathode with this system indicates that the optimal heating temperature in a vacuum is about 700 ~C. We also develop a method of quickly evaluating the atomically clean surface with the vacuum degree versus wavelength curve to prevent possible secondary contamination when the atomic level cleaning surface is tested with X-ray photoelectron spectroscopy. The photocurrent shows a quick enhancement when the current ratio between the cesium source and oxygen source is 1.025. The spectral response of the GaN photocathode is flat in a wavelength range from 240 nm to 365 nm, and an abrupt decline is observed at 365 nm, which demonstrates that with the in-si$u multi-information measurement system the NEA GaN photocathode can be successfully prepared.
文摘The decarboxylative Minisci reaction is a versatile tool for the direct C-H alkylation of heteroarenes,where stoichiometric amounts of oxidants or expensive,precious metal reagents are commonly used.Herein,we reported a photodriven decarboxylative Minisci reaction enabled by a gallium nitride-based heterogeneous photocatalyst under mild conditions.This method can be effectively applied to a broad substrate scope of acids,including primary,secondary,and tertiary carboxylic acids and N-heteroarenes effectively.The practicability and robustness of the approach are demonstrated for the functionalization of biologically active compounds.
基金supported by the National Research Foundation(NRF-2013R1A2A1A01016914,NRF-2013R1A1A2011750)the Ministry of Education,the Industrial Strategic Technology Development Program(10041878)+1 种基金the Ministry of Knowledge Economy,the Climate Change Research Hub of KAIST(Grant No.N01150041)the GRC project of KAIST Institute for the NanoCentury.
文摘White light-emitting diodes(LEDs)are becoming an alternative general light source,with huge energy savings compared to conventional lighting.However,white LEDs using phosphor(s)suffer from unavoidable Stokes energy converting losses,higher manufacturing cost,and reduced thermal stability.Here,we demonstrate electrically driven,phosphor-free,white LEDs based on three-dimensional gallium nitride structures with double concentric truncated hexagonal pyramids.The electroluminescence spectra are stable with varying current.The origin of the emission wavelength is studied by cathodoluminescence and high-angle annular dark field scanning transmission electron microscopy experiments.Spatial variation of the carrier injection efficiency is also investigated by a comparative analysis between spatially resolved photoluminescence and electroluminescence.
基金supported by the Strategic Priority Research Program of the Chinese Academy of Sciences(No.XDA25020303)。
文摘In this paper,the feasibility of a high laser damage threshold liquid crystal spatial light modulator based on gallium nitride(GaN)transparent conductive electrodes is proved.The laser-induced damage threshold(LIDT)is measured,and a high LIDT reflective optically addressed liquid crystal light valve(OALCLV)based on GaN is designed and fabricated.The proper work mode of the OALCLV is determined;the OALCLV obtained a maximum reflectivity of about 55%and an on–off ratio of 55:1,and an image response is demonstrated.
基金supported by the National Natural Science Foundation of China(51303033)Guangxi Natural Science Foundation(2014GXNSFCB118004)+2 种基金Guangxi Key Laboratory Foundation of Manufacturing Systems and Advanced Manufacturing Technology(15-140-30-002Z)Guilin Science and Technology Development Foundation(20140103-3)supported by the Innovation Project of Guangxi Graduate Education(YCSZ2015142)
文摘The geometric,electronic and optical properties of the graphene-like gallium nitride(GaN) monolayer paired with WS_2 or WSe_2 were studied systematically using the first-principles calculations.GaN interacts with WS2 or WSe_2 via van der Waals interaction and all the most stable configurations of these two nanocomposites exhibit direct band gap characteristics.Meanwhile,the type-Ⅱ heterojunctions are formed because the conduction band minimums and valence band maximums are respectively contributed by WS_2(or WSe_2) and GaN.The imaginary parts of the dielectric function and the absorption spectra of the heterostructures were also calculated and the relatively improved optical properties were observed because of the new interband transitions.In addition,the band offsets as well as the intrinsic electric fields resulting from the interlayer charge transfer indicate that the electron-hole pairs recombination can be effectively inhibited,which is conducive for the photocatalysis process.Moreover,the band gaps of the heterostructures can be modulated by applying biaxial strains and even shift away the conduction band edge potential from the H^+/H_2potential in a certain range,which further enhances the photocatalyst performance.The results indicate that GaN/WS2 or GaN/WSe_2 nanocomposites are good candidate materials for photocatalyst or photoelectronic applications.
文摘Growing graphene on gallium nitride (GaN) at temperatures greater than 900℃ is a challenge that must be overcome to obtain high quality of GaN epi-layers. We successfully met this challenge using C2H2 as the carbon source. We demonstrated that graphene can be grown both on copper and directly on GaN epi-layers. The Raman spectra indicated that the graphene films were about 4-5 layers thick. Meanwhile, the effects of the growth temperature on the growth of the graphene films were systematically studied, and 830℃ was found to be the optimum growth temperature. We successfully grew high-quality graphene films directly on gallium nitride.
基金supported by the"973"Program of China(No.TG2007CB307004)the"863"Program of China(No.863-2006AA03A113)the National Natural Science Foundation of China(No.60276034,60577030,and 60607003).
文摘We investigate the transverse mode pattern in GaN quantum-well (QW) laser diode (LD) by numerical calculation. We optimize the current GaN LD structure by varying the n-GaN layer thickness. The n-type GaN layer is an important factor to determine the optical mode. Finally, we discuss the lasing performance of the GaN LD based on the transverse optical modes.
基金supported financially by the National Natural Science Foundation of China (No.110751402347)the Beijing Natural Science Foundation (Nos.4173077 and 2184112)+2 种基金the Fundamental Research Funds for the Central Universities,China (Nos.FRF-BR-16-018A,FRF-TP-17-022A1,FRF-TP-17-069A1 and 06400071)the China Postdoctoral Science Foundation (No. 2018M631333)the Youth Innovation Promotion Association of Chinese Academy of Sciences (No.2015387)
文摘In this work,the GaN thin films were directly deposited on multilayer graphene(MLG)by plasma-enhanced atomic layer deposition.The deposition was carried out at a low temperature using triethylgallium(TEGa)precursor and Ar/N2/H2 plasma.Chemical properties of the bulk GaN and GaN-graphene interface were analyzed using X-ray photoelectron spectroscopy.The sharp interface between GaN and graphene was verified via X-ray reflectivity and transmission electron microscope.The microstructures and the nucleation behaviors of the GaN grown on graphene have been also studied.The results of grazing incidence X-ray diffraction and Raman spectrum indicate that the as-deposited sample is polycrystalline with wurtzite structure and has a weakly tensile stress.Optical properties of the sample were investigated by photoluminescence(PL)at room temperature.The successful growth of GaN on MLG at a low temperature opens up the possibility of ameliorating the performance of electronic and optical devices based on GaN/graphene heterojunction.
文摘With technology computer-aided design(TCAD)simulation software,we design a new structure of gallium oxide on gallium-nitride Schottky barrier diode(SBD).The parameters of gallium oxide are defined as new material parameters in the material library,and the SBD turn-on and breakdown behavior are simulated.The simulation results reveal that this new structure has a larger turn-on current than Ga2O3 SBD and a larger breakdown voltage than Ga N SBD.Also,to solve the lattice mismatch problem in the real epitaxy,we add a Zn O layer as a transition layer.The simulations show that the device still has good properties after adding this layer.
基金financial support from the FRGS Grant(Account No:203/PFIZIK/6711282)
文摘In this research,the growth of GaN thin films on c-plane sapphire(0001) substrates via two-step method without the assist of buffer layer and catalysts was demonstrated.First,gallium oxide(Ga_2O_3) thin films were deposited on sapphire substrates by radio frequency magnetron sputtering method.The deposited Ga_2O_3 thin films were then nitridated at various temperatures.In this research,attention is focused on the influence of nitridation temperatures on the structural and optical properties of the synthesized GaN thin films.It is revealed that 950 ℃ is the optimal nitridation temperature for synthesizing hexagonal wurtzite GaN thin film with preferential(0002) growth direction.
基金supported by the National Natural Science Foundation of China(52375420,52005134 and51675453)Natural Science Foundation of Heilongjiang Province of China(YQ2023E014)+5 种基金Self-Planned Task(No.SKLRS202214B)of State Key Laboratory of Robotics and System(HIT)China Postdoctoral Science Foundation(2022T150163)Young Elite Scientists Sponsorship Program by CAST(No.YESS20220463)State Key Laboratory of Robotics and System(HIT)(SKLRS-2022-ZM-14)Open Fund of Key Laboratory of Microsystems and Microstructures Manufacturing(HIT)(2022KM004)Fundamental Research Funds for the Central Universities(Grant Nos.HIT.OCEF.2022024 and FRFCU5710051122)。
文摘Elucidating the complex interactions between the work material and abrasives during grinding of gallium nitride(GaN)single crystals is an active and challenging research area.In this study,molecular dynamics simulations were performed on double-grits interacted grinding of GaN crystals;and the grinding force,coefficient of friction,stress distribution,plastic damage behaviors,and abrasive damage were systematically investigated.The results demonstrated that the interacted distance in both radial and transverse directions achieved better grinding quality than that in only one direction.The grinding force,grinding induced stress,subsurface damage depth,and abrasive wear increase as the transverse interacted distance increases.However,there was no clear correlation between the interaction distance and the number of atoms in the phase transition and dislocation length.Appropriate interacted distances between abrasives can decrease grinding force,coefficient of friction,grinding induced stress,subsurface damage depth,and abrasive wear during the grinding process.The results of grinding tests combined with cross-sectional transmission electron micrographs validated the simulated damage results,i.e.amorphous atoms,high-pressure phase transition,dislocations,stacking faults,and lattice distortions.The results of this study will deepen our understanding of damage accumulation and material removal resulting from coupling between abrasives during grinding and can be used to develop a feasible approach to the wheel design of ordered abrasives.
基金Project supported by the Engineering and Physical Sciences Research Council (EPSRC),U.K.,via EP/P006973/1,EP/T013001/1,and EP/M015181/1。
文摘There is a significantly increasing demand of developing augmented reality and virtual reality(AR and VR) devices,where micro-LEDs(μLEDs) with a dimension of ≤ 5 μm are the key elements. Typically, μLEDs are fabricated by dry-etching technologies, unavoidably leading to a severe degradation in optical performance as a result of dry-etching induced damages. This becomes a particularly severe issue when the dimension of LEDs is ≤ 10 μm. In order to address the fundamental challenge, the Sheffield team has proposed and then developed a direct epitaxial approach to achievingμLEDs, where the dry-etching technologies for the formation of μLED mesas are not needed anymore. This paper provides a review on this technology and then demonstrates a number of monolithically integrated devices on a single chip using this technology.
文摘Gallium nitride(GaN)/porous silicon(PSi)film was prepared using a pulsed laser deposition method and 1064 nm Nd:YAG laser for optoelectronic applications and a series of Psi substrates were fabricated using a photoelectrochemical etching method assisted by laser at different etching times for 2.5–15 min at 2.5 min intervals.X-ray diffraction,room-temperature photoluminescence,atomic force microscopy and field emission scanning electron microscopy images,and electrical characteristics in the prepared GaN on the Psi film were investigated.The optimum Psi substrate was obtained under the following conditions:10 min,10 mA/cm^(2),and 24%hydrofluoric acid.The substrate exhibited two highly cubic crystalline structures at(200)and(400)orientations and yellow visible band photoluminescence,and homogeneous pores formed over the entire surface.The pores had steep oval shapes and were accompanied by small dark pores that appeared topographically and morphologically.The GaN/Psi film fabricated through PLD exhibited a high and hexagonal crystallographic texture in the(002)plane.Spectroscopic properties results revealed that the photoluminescence emission of the deposited nano-GaN films was in the ultraviolet band(374 nm)related to GaN material and in the near-infrared band(730 nm)related to the Psi substrate.The topographical and morphological results of the GaN films confirmed that the deposited film contained spherical grains with an average diameter of 51.8 nm and surface roughness of 4.8 nm.The GaN/Psi surface showed a cauliflower-like morphology,and the built-in voltage decreased from 3.4 to 2.7 eV after deposition.The fabricated GaN/Psi film exhibited good electrical characteristics.
文摘Aim To study the relationship between the substrate temperature and the morphology and properties of GaN. Methods\ Applying the hydride chemical vapor deposition method, GaN films were deposited on different kinds of substrates, including sapphire, Si(111),Si(100),GaAs and GaP(111) both on the P face and the Ga face. The growth was performed at low temperatures of below 700℃. XRD, Hall measurement, cathodoluminescence (CL) and atomic force microscopy (AFM) were used to characterise the film properties. Results\ It was found that the temperature and the nature of substrate materials influence the layer morphology. Conclusion\ The analysis shows that no apparent relationship exists between the optical properties and layer morphology.
基金Supported by the National Natural Science Foundation of China under Grant No 90201025 and 90201002.
文摘Large quantities of CaN nanorods are successfully synthesized on Si(111) substrates by ammoniating the films of Ga2O3/ZnO at 950℃ in a quartz tube. The structure, morphology and optical properties of the as-prepared CaN nanorods are studied by x-ray diffraction, scanning electron microscopy, high-resolution transmission electron microscopy, Fourier transform infrared spectroscopy, and photoluminescence. The results show that the CaN nanorods have a hexagonal wurtzite structure with lengths of several micrometres and diameters from 80 nm to 300hm, which could supply an attractive potential to harmonically incorporate future GaN optoelectronic devices into Si-based large-scale integrated circuits. The growth mechanism is also briefly discussed.
基金the National Natural Science Foundation of China(Grant Nos.51575389 and 51761135106)the National Key Research and Development Program of China(Grant No.2016YFB1102203)+1 种基金the State Key Laboratory of Precision Measuring Technology and Instruments(Pilt1705)the‘111’Project of the State Administration of Foreign Experts Affairs and the Ministry of Education of China(Grant No.B07014).
文摘As an important wide-bandgap semiconductor,gallium nitride(GaN)has attracted considerable attention.This paper describes the use of confocal Raman spectroscopy to characterize undoped GaN,n-type GaN,and p-type GaN through depth profiling using 405-,532-,and 638-nm wavelength lasers.The Raman signal intensity of the sapphire substrate at different focal depths is studied to analyze the depth resolution.Based on the shift of the E2 H mode of the GaN epitaxial layer,the interfacial stress for different types of GaN is characterized and calculated.The results show that the maximum interfacial stress appears approximately at the junction of the GaN and the sapphire substrate.Local interfacial stress analysis between the GaN epitaxial layer and the substrate will be very helpful in furthering the applications of GaN devices.