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Fabrication and characteristics of a 4H-SiC junction barrier Schottky diode 被引量:2
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作者 陈丰平 张玉明 +3 位作者 吕红亮 张义门 郭辉 郭鑫 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2011年第6期33-35,共3页
4H-SiC junction barrier Schottky(JBS)diodes with four kinds of design have been fabricated and characterized using two different processes in which one is fabricated by making the P-type ohmic contact of the anode i... 4H-SiC junction barrier Schottky(JBS)diodes with four kinds of design have been fabricated and characterized using two different processes in which one is fabricated by making the P-type ohmic contact of the anode independently,and the other is processed by depositing a Schottky metal multi-layer on the whole anode.The reverse performances are compared to find the influences of these factors.The results show that JBS diodes with field guard rings have a lower reverse current density and a higher breakdown voltage,and with independent P-type ohmic contact manufacturing,the reverse performance of 4H-SiC JBS diodes can be improved effectively. Furthermore,the P-type ohmic contact is studied in this work. 展开更多
关键词 4H-SIC junction barrier Schottky field guard ring
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1.4 kV 4H-SiC PiN diode with a robust non-uniform floating guard ring termination 被引量:1
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作者 陈思哲 盛况 王珏 《Journal of Semiconductors》 EI CAS CSCD 2014年第5期32-35,共4页
This paper presents the design and fabrication of an effective, robust and process-tolerant floating guard ring termination on high voltage 4H-SiC PiN diodes. Different design factors were studied by numerical simulat... This paper presents the design and fabrication of an effective, robust and process-tolerant floating guard ring termination on high voltage 4H-SiC PiN diodes. Different design factors were studied by numerical simulations and evaluated by device fabrication and measurement. The device fabrication was based on a 12 μm thick drift layer with an N-type doping concentration of 8 × 10^15 cm^-3. P^+ regions in the termination structure and anode layer were formed by multiple aluminum implantations. The fabricated devices present a highest breakdown voltage of 1.4 kV, which is higher than the simulated value. For the fabricated 15 diodes in one chip, all of them exceeded the breakdown voltage of 1 kV and six of them reached the desired breakdown value of 1.2 kV. 展开更多
关键词 silicon carbide PiN diode field guarding rings edge termination
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