Plasma ammonia treatment at 400 ℃ leads to de-passivation of a fully hydrogenated Si-SiO2 interface, and to passivation of a fully de-hydrogenated Si-SiO2 interface. Plasma NH3 exposure causes irreversible Si surface...Plasma ammonia treatment at 400 ℃ leads to de-passivation of a fully hydrogenated Si-SiO2 interface, and to passivation of a fully de-hydrogenated Si-SiO2 interface. Plasma NH3 exposure causes irreversible Si surface damage and degradation of thermal stability. Atomic hydrogen exposure, although it results in similar effects on the Si-SiO2 interface, does not introduce additional defects or a decrease of the Si surface thermal stability. The difference between plasma NH3 exposure and atomic H exposure is speculated to be due to either the nitridation of Si-SiO2 interface or radiation damage resulting from plasma NH3 exposure. EPR measurements indicate changes of the paramagnetic defect properties and an increase in the paramagnetic defect density generated by plasma NH3 exposure.展开更多
Vertically aligned γ-AlOOH nanosheets （NSs） have been successfully fabricated on flexible Al foils via a solvothermal route without morphology-directing agents. Three different reaction temperature （25, 80, and 1...Vertically aligned γ-AlOOH nanosheets （NSs） have been successfully fabricated on flexible Al foils via a solvothermal route without morphology-directing agents. Three different reaction temperature （25, 80, and 120 ℃） and time （30 min, 45 min, and 24 h） are discussed for the growth period, which efficiently tune the density and size of theγ-AlOOH NSs. Meanwhile, the growth speed of the nanosheets confirms that dominant growth stage is seen in the initial 45 min. Furthermore, the interlayer of the γ-AlOOH NSs displays an average height of 140 nm and superhydrophilicity. By dynamic adsorption, the as- synthesized γ-AlOOH NSs exhibit an outstanding NH3 adsorption capacity of up to 146 mg/g and stably excellent regeneration for 5 cycles. The mechanism of NH3 adsorption on the in-plane of the γ-AlOOH NSs is explained by the Lewis acid/base theory. The H-bond interactions among the NH3 molecules and the edge groups （-OH） further improve the capture ability of the nanosheets.展开更多
基金This project was financially supported by the Australian Research Council (DP0557398).
文摘Plasma ammonia treatment at 400 ℃ leads to de-passivation of a fully hydrogenated Si-SiO2 interface, and to passivation of a fully de-hydrogenated Si-SiO2 interface. Plasma NH3 exposure causes irreversible Si surface damage and degradation of thermal stability. Atomic hydrogen exposure, although it results in similar effects on the Si-SiO2 interface, does not introduce additional defects or a decrease of the Si surface thermal stability. The difference between plasma NH3 exposure and atomic H exposure is speculated to be due to either the nitridation of Si-SiO2 interface or radiation damage resulting from plasma NH3 exposure. EPR measurements indicate changes of the paramagnetic defect properties and an increase in the paramagnetic defect density generated by plasma NH3 exposure.
基金supported by the National Natural Science Foundation of China(21002006,20452002)Special Program for Key Basic Research of the Ministry of Science and Technology,China(2004-973-36)~~
文摘Vertically aligned γ-AlOOH nanosheets （NSs） have been successfully fabricated on flexible Al foils via a solvothermal route without morphology-directing agents. Three different reaction temperature （25, 80, and 120 ℃） and time （30 min, 45 min, and 24 h） are discussed for the growth period, which efficiently tune the density and size of theγ-AlOOH NSs. Meanwhile, the growth speed of the nanosheets confirms that dominant growth stage is seen in the initial 45 min. Furthermore, the interlayer of the γ-AlOOH NSs displays an average height of 140 nm and superhydrophilicity. By dynamic adsorption, the as- synthesized γ-AlOOH NSs exhibit an outstanding NH3 adsorption capacity of up to 146 mg/g and stably excellent regeneration for 5 cycles. The mechanism of NH3 adsorption on the in-plane of the γ-AlOOH NSs is explained by the Lewis acid/base theory. The H-bond interactions among the NH3 molecules and the edge groups （-OH） further improve the capture ability of the nanosheets.
