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The Effect of Pressure on the Dissociation of H_2/CH_4Gas Mixture during Diamond Films Growth via Chemical Vapor Deposition 被引量:1
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作者 赵庆勋 辛红丽 +2 位作者 韩佳宁 文钦若 杨景发 《Plasma Science and Technology》 SCIE EI CAS CSCD 2002年第1期1113-1118,共6页
Monte Carlo simulations are adopted to study the electron motion in the mixture of H2 and CH4 during diamond synthesis via Glow Plasma-assisted Chemical Vapor Deposition (GPCVD). The non-uniform electric field is used... Monte Carlo simulations are adopted to study the electron motion in the mixture of H2 and CH4 during diamond synthesis via Glow Plasma-assisted Chemical Vapor Deposition (GPCVD). The non-uniform electric field is used and the avalanche of electrons is taken into account in this simulation. The average energy distribution of electrons and the space distribution of effective species such as CH3, CH+3, CH+ and H at various gas pressures are given in this paper, and optimum experimental conditions are inferred from these results. 展开更多
关键词 The Effect of Pressure on the Dissociation of h2/ch4gas Mixture during Diamond Films Growth via chemical Vapor Deposition ch
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