通过热丝化学气相沉积法(Hot Wire Chemical Vapor Deposition,HWCVD),采用间歇供应硅烷气体,持续通入氢气的方式控制硅薄膜的生长,发现该方法在有机衬底上生长的薄膜结构为多晶相占主导地位。此外,研究了不同间歇周期条件下薄膜的形貌...通过热丝化学气相沉积法(Hot Wire Chemical Vapor Deposition,HWCVD),采用间歇供应硅烷气体,持续通入氢气的方式控制硅薄膜的生长,发现该方法在有机衬底上生长的薄膜结构为多晶相占主导地位。此外,研究了不同间歇周期条件下薄膜的形貌和结构,并对生长机理进行了解释和讨论。展开更多
Horizontal air-cooled low-pressure hot-wall CVD (LP-HWCVD) system is developed to get highly qualitical 4H-SiC epilayers.Homoepitaxial growth of 4H-SiC on off-oriented Si-face (0001) 4H-SiC substrates is performed at ...Horizontal air-cooled low-pressure hot-wall CVD (LP-HWCVD) system is developed to get highly qualitical 4H-SiC epilayers.Homoepitaxial growth of 4H-SiC on off-oriented Si-face (0001) 4H-SiC substrates is performed at 1500℃ with a pressure of 1.3×103Pa by using the step-controlled epitaxy.The growth rate is controlled to be about 1.0μm/h.The surface morphologies and structural and optical properties of 4H-SiC epilayers are characterized with Nomarski optical microscope,atomic force microscopy (AFM),X-ray diffraction,Raman scattering,and low temperature photoluminescence (LTPL).N-type 4H-SiC epilayers are obtained by in-situ doping of NH 3 with the flow rate ranging from 0.1 to 3sccm.SiC p-n junctions are obtained on these epitaxial layers and their electrical and optical characteristics are presented.The obtained p-n junction diodes can be operated at the temperature up to 400℃,which provides a potential for high-temperature applications.展开更多
采用热丝化学气相沉积(HWCVD)技术制备n型纳米晶硅(nc-Si∶H)薄膜,系统地研究了沉积参数,特别是掺杂浓度对薄膜微结构、电学性质和缺陷态的影响,获得了器件质量的n型nc-Si∶H薄膜。制备了nc-Si∶H/c-Si HIT(Heterojunction with Intrins...采用热丝化学气相沉积(HWCVD)技术制备n型纳米晶硅(nc-Si∶H)薄膜,系统地研究了沉积参数,特别是掺杂浓度对薄膜微结构、电学性质和缺陷态的影响,获得了器件质量的n型nc-Si∶H薄膜。制备了nc-Si∶H/c-Si HIT(Heterojunction with Intrinsic Thin-layer)结构太阳电池,研究了异质结结构参数对电池性能的影响,初步得到电池性能参数如下:Voc=483mV、Jsc=29.5mA/cm2、FF=70%、η=10.2%。展开更多
A heat transfer study was conducted,in the framework of Computational Fluid Dynamics(CFD),on a Hot-Wire Chemical Vapour Deposition(HWCVD)reactor chamber to determine a safe deposition distance for atomic hydrogen prod...A heat transfer study was conducted,in the framework of Computational Fluid Dynamics(CFD),on a Hot-Wire Chemical Vapour Deposition(HWCVD)reactor chamber to determine a safe deposition distance for atomic hydrogen produced by HWCVD.The objective of this study was to show the feasibility of using heat transfer simulations in determining a safe deposition distance for deposition of this kind.All CFD simulations were set-up and solved within the framework of the CFD packages of OpenFOAM namely;snappyHexMesh for mesh generation,buoyantSimpleFoam and rhoSimpleFoam as the solvers and paraView as the post-processing tool.Using a standard set of deposition parameters for the production of atomic hydrogen by HWCVD,plots of the gas temperature in the deposition region were produced.From these plots,we were able to determine a safe deposition distance in the HWCVD reactor to be in the range between 3 and 4 cm from the filament.展开更多
Boron-doped hydrogenated microcrystalline Germanium （lac-Ge：H） films were deposited by hot-wire CVD. H2 diluted G-ell4 and B2H6 were used as precursors and the substrate temperature was kept at 300 ℃. The properti...Boron-doped hydrogenated microcrystalline Germanium （lac-Ge：H） films were deposited by hot-wire CVD. H2 diluted G-ell4 and B2H6 were used as precursors and the substrate temperature was kept at 300 ℃. The properties of the samples were analyzed by XRD, Raman spectroscopy, Fourier transform infrared spectrometer and Hall Effect measurement with Van der Pauw method. It is found that the films are partially crystallized, with crystalline fractions larger than 45% and grain sizes smaller than 50 nm. The B-doping can enhance the crystallization but reduce the grain sizes, and also enhance the preferential growth of Ge （220）. The conductivity of the films increases and tends to be saturated with increasing diborane-to-germane ratio RB2H6. All the Hall mobilities of the samples are larger than 3.8 cmZV-1·s-1. A high conductivity of展开更多
文摘通过热丝化学气相沉积法(Hot Wire Chemical Vapor Deposition,HWCVD),采用间歇供应硅烷气体,持续通入氢气的方式控制硅薄膜的生长,发现该方法在有机衬底上生长的薄膜结构为多晶相占主导地位。此外,研究了不同间歇周期条件下薄膜的形貌和结构,并对生长机理进行了解释和讨论。
文摘Horizontal air-cooled low-pressure hot-wall CVD (LP-HWCVD) system is developed to get highly qualitical 4H-SiC epilayers.Homoepitaxial growth of 4H-SiC on off-oriented Si-face (0001) 4H-SiC substrates is performed at 1500℃ with a pressure of 1.3×103Pa by using the step-controlled epitaxy.The growth rate is controlled to be about 1.0μm/h.The surface morphologies and structural and optical properties of 4H-SiC epilayers are characterized with Nomarski optical microscope,atomic force microscopy (AFM),X-ray diffraction,Raman scattering,and low temperature photoluminescence (LTPL).N-type 4H-SiC epilayers are obtained by in-situ doping of NH 3 with the flow rate ranging from 0.1 to 3sccm.SiC p-n junctions are obtained on these epitaxial layers and their electrical and optical characteristics are presented.The obtained p-n junction diodes can be operated at the temperature up to 400℃,which provides a potential for high-temperature applications.
文摘采用热丝化学气相沉积(HWCVD)技术制备n型纳米晶硅(nc-Si∶H)薄膜,系统地研究了沉积参数,特别是掺杂浓度对薄膜微结构、电学性质和缺陷态的影响,获得了器件质量的n型nc-Si∶H薄膜。制备了nc-Si∶H/c-Si HIT(Heterojunction with Intrinsic Thin-layer)结构太阳电池,研究了异质结结构参数对电池性能的影响,初步得到电池性能参数如下:Voc=483mV、Jsc=29.5mA/cm2、FF=70%、η=10.2%。
文摘A heat transfer study was conducted,in the framework of Computational Fluid Dynamics(CFD),on a Hot-Wire Chemical Vapour Deposition(HWCVD)reactor chamber to determine a safe deposition distance for atomic hydrogen produced by HWCVD.The objective of this study was to show the feasibility of using heat transfer simulations in determining a safe deposition distance for deposition of this kind.All CFD simulations were set-up and solved within the framework of the CFD packages of OpenFOAM namely;snappyHexMesh for mesh generation,buoyantSimpleFoam and rhoSimpleFoam as the solvers and paraView as the post-processing tool.Using a standard set of deposition parameters for the production of atomic hydrogen by HWCVD,plots of the gas temperature in the deposition region were produced.From these plots,we were able to determine a safe deposition distance in the HWCVD reactor to be in the range between 3 and 4 cm from the filament.
基金Funded by the National High-tech Research and Development Program of China(863 Program)(No.2006AA03Z219)Graduate Innovation Plan of Nanjing University of Aeronautics and Astronautics(No.BCXJ08-10)the National Natural Science Foundation of China(No.61306084)
文摘Boron-doped hydrogenated microcrystalline Germanium （lac-Ge：H） films were deposited by hot-wire CVD. H2 diluted G-ell4 and B2H6 were used as precursors and the substrate temperature was kept at 300 ℃. The properties of the samples were analyzed by XRD, Raman spectroscopy, Fourier transform infrared spectrometer and Hall Effect measurement with Van der Pauw method. It is found that the films are partially crystallized, with crystalline fractions larger than 45% and grain sizes smaller than 50 nm. The B-doping can enhance the crystallization but reduce the grain sizes, and also enhance the preferential growth of Ge （220）. The conductivity of the films increases and tends to be saturated with increasing diborane-to-germane ratio RB2H6. All the Hall mobilities of the samples are larger than 3.8 cmZV-1·s-1. A high conductivity of
