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Simultaneous quantification of longitudinal and transverse ocular chromatic aberrations with Hartmann-Shack wavefront sensor 被引量:1
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作者 Yangchun Deng Junlei Zhao +1 位作者 Yun Dai Yudong Zhang 《Journal of Innovative Optical Health Sciences》 SCIE EI CAS 2018年第4期81-91,共11页
A simple method to objectively and simultaneously measure eye's longitudinal and transverse chromatic aberrations was proposed.A dual-wavelength wavefront measurement system using two Hartmann-Shack wavefront sens... A simple method to objectively and simultaneously measure eye's longitudinal and transverse chromatic aberrations was proposed.A dual-wavelength wavefront measurement system using two Hartmann-Shack wavefront sensors was developed.The wavefronts of the red(639.1 nm)and near-infrared(786.0 nm)lights were measured simultaneously for different positions in the model eye.The chromatic wavefronts were converted into Zernike polynomials.The Zernike tilt cofficient(irst term)was used to calculate the transverse chromatic aberration along the ax-direction,while the Zernike defocus coefficient(fourth term)was used to calculate the longi-tudinal chromatic aberration.The measurement and simulation data were consistent. 展开更多
关键词 Chromatic aberration hartmann-shack wavefront sensor SIMULTANEITY Zernike coefficient
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基于Hartmann-Shack波前检测原理的微透镜阵列焦距测量 被引量:7
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作者 朱咸昌 伍凡 +1 位作者 曹学东 吴时彬 《光学精密工程》 EI CAS CSCD 北大核心 2013年第5期1122-1128,共7页
基于哈特曼波前传感器检测原理,结合图像清晰度定焦技术,提出了一种测量微透镜阵列焦距的方法,介绍了测量系统的组成和原理。首先利用平行光管的出射平面波前在被测微透镜阵列焦面上成像,利用标准透镜产生的球面波前在微透镜阵列焦面附... 基于哈特曼波前传感器检测原理,结合图像清晰度定焦技术,提出了一种测量微透镜阵列焦距的方法,介绍了测量系统的组成和原理。首先利用平行光管的出射平面波前在被测微透镜阵列焦面上成像,利用标准透镜产生的球面波前在微透镜阵列焦面附近成像。然后,根据平面波前和球面波前经过微透镜阵列成像时微透镜阵列焦面上光斑的偏移量,计算相应的微透镜阵列子单元的焦距。最后,基于图像清晰度定焦技术,通过不确定度分析和实验测量验证了该方法检测微透镜阵列焦距的可行性。测量结果表明,该方法对微透镜阵列焦距检测精度可达到3%;同时,一次测量可完成微透镜阵列多个子单元的焦距标定。相对于传统的检测方法,该方法具有较高的检测精度和效率。 展开更多
关键词 微透镜阵列 焦距测量 波前检测 哈特曼波前传感器 图像清晰度
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基于HSS的人眼波前像差测量成像系统分析
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作者 徐安成 饶丰 朱锡芳 《电子质量》 2016年第8期10-13,共4页
哈特曼-夏克传感器已经应用于人眼波前像差的客观测量中,但是对于该系统,采样点大小对结果精度的影响的研究还未见报道。该文根据人眼波前像差测量成像系统的光学结构,得到了全系统的点扩散函数数学模型,分析Airy斑大小对系统精度的影... 哈特曼-夏克传感器已经应用于人眼波前像差的客观测量中,但是对于该系统,采样点大小对结果精度的影响的研究还未见报道。该文根据人眼波前像差测量成像系统的光学结构,得到了全系统的点扩散函数数学模型,分析Airy斑大小对系统精度的影响。研究表明,从眼视网膜上发出的理想光源,成像在HSS面上所形成的Airy斑的几何尺寸远小于实验中所用的HSS采样点的大小,因此,可以忽略Airy斑对系统精度的影响。该研究从理论及实验上证明了基于HSS的人眼波前像差测量结果是准确可靠的。 展开更多
关键词 哈特曼- 夏克传感器 波前像差 成像系统 视觉
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Effect of ion-beam assisted deposition on the film stresses of TiO_2 and SiO_2 and stress control 被引量:2
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作者 Yu-Qiong Li Hua-Qing Wang +3 位作者 Wu-Yu Wang Zhi-Nong Yu He-Shan Liu Gang Jin 《Acta Mechanica Sinica》 SCIE EI CAS CSCD 2012年第5期1382-1388,共7页
Based on Hartmann-Shack sensor technique, an online thin film stress measuring system was introduced to measure the film stresses of TiO2 and SiO2, and comparison was made between the film stresses prepared respective... Based on Hartmann-Shack sensor technique, an online thin film stress measuring system was introduced to measure the film stresses of TiO2 and SiO2, and comparison was made between the film stresses prepared respectively by the conventional process and the ion-beam assisted deposition. The effect of ion-beam assisted deposition on the film stresses of TiO2 and SiO2 was investigated in details, and the stress control methodologies using on-line adjustment and film doping were put forward. The results show that the film stress value of TiO2 prepared by ion-beam assisted deposition is 40 MPa lower than that prepared by conventional process, and the stress of TiO2 film changes gradually from tensile stress into compressive stress with increasing ion energy; while the film stress of SiO2 is a tensile stress under ion-beam assisted deposition because of the ion-beam sputtering effect, and the film refractive index decreases with increasing ion energy. A dynamic film stress control can be achieved through in-situ adjustment of the processing parameters based on the online film stress measuring technique, and the intrinsic stress of film can be effectively changed through film doping. 展开更多
关键词 Film stress Stress controlling Ion-beam as-sisted deposition hartmann-shack sensor
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