ZnO-based thin film transistors(TFTs)with high bias stability are challenging due to the intrinsic defects and overhigh interface trap density.In this work,we fabricated Hf-doped ZnO films with different cycle ratio o...ZnO-based thin film transistors(TFTs)with high bias stability are challenging due to the intrinsic defects and overhigh interface trap density.In this work,we fabricated Hf-doped ZnO films with different cycle ratio of Zn/Hf via atomic layer deposition and subsequent annealing treatment.The results show that the cycle ratio of Zn/Hf is optimized to be 10:1,and the corresponding atomic ratio is 2.24%.The threshold voltage and subthreshold swing of the devices are improved as the annealing temperature increases,owning to the decrease of the oxygen vacancies and interface trap density.Furthermore,we developed Hf-doped ZnO TFT with high bias stability by introducing HfO_(2)intermediate layer between the active layer and SiO_(2)dielectric layer,and the shift of threshold voltage is as low as-0.273 V,showing high bias stability.Also,the device has the high field-effective mobility of 52.4 cm^(2)/Vs,low subthreshold swing of 0.68 V/dec and high Ion/Ioff of 3.6×10^(8).The results indicate a promising fabrication method for highperformance ZnO-based TFTs,which may be applied in logic circuits,radio frequency identification and so on.展开更多
Crystal structures and electronic structures of hafnium doping anatase TiO2 were calculated by first principles with the plane-wave ultrasoft pseudopotential method based on the density functional theory within the ge...Crystal structures and electronic structures of hafnium doping anatase TiO2 were calculated by first principles with the plane-wave ultrasoft pseudopotential method based on the density functional theory within the generalized gradient approximation. The calculated results show that the lattice parameters a and c of Hf-doped anatase TiO2 are larger than those of intrinsic TiO2 under the same calculated condition. The calculated band structure and density of states show that the conduction band width of Hf-doped TiO2 is broadened which results in the band gap of Hf-doped being smaller than the band gap of TiO2.展开更多
基金the National Key R&D Program of China(No.2020YFB2008701)。
文摘ZnO-based thin film transistors(TFTs)with high bias stability are challenging due to the intrinsic defects and overhigh interface trap density.In this work,we fabricated Hf-doped ZnO films with different cycle ratio of Zn/Hf via atomic layer deposition and subsequent annealing treatment.The results show that the cycle ratio of Zn/Hf is optimized to be 10:1,and the corresponding atomic ratio is 2.24%.The threshold voltage and subthreshold swing of the devices are improved as the annealing temperature increases,owning to the decrease of the oxygen vacancies and interface trap density.Furthermore,we developed Hf-doped ZnO TFT with high bias stability by introducing HfO_(2)intermediate layer between the active layer and SiO_(2)dielectric layer,and the shift of threshold voltage is as low as-0.273 V,showing high bias stability.Also,the device has the high field-effective mobility of 52.4 cm^(2)/Vs,low subthreshold swing of 0.68 V/dec and high Ion/Ioff of 3.6×10^(8).The results indicate a promising fabrication method for highperformance ZnO-based TFTs,which may be applied in logic circuits,radio frequency identification and so on.
文摘Crystal structures and electronic structures of hafnium doping anatase TiO2 were calculated by first principles with the plane-wave ultrasoft pseudopotential method based on the density functional theory within the generalized gradient approximation. The calculated results show that the lattice parameters a and c of Hf-doped anatase TiO2 are larger than those of intrinsic TiO2 under the same calculated condition. The calculated band structure and density of states show that the conduction band width of Hf-doped TiO2 is broadened which results in the band gap of Hf-doped being smaller than the band gap of TiO2.
