High temperature oxidation resistance and microstructure change of aluminized coating on copper substrate

The outermost coating with single phase Ni2Al3 was obtained on copper surface by electrodepositing nickel followed by slurry pack aluminizing at 800 °C for 12 h. The oxidation resistance and microstructure of the coating oxidized in ambient air at 1000 °C for 25-250 h were investigated using SEM, X-ray diffraction and optical microscope methods. The results show that the copper with single phase Ni2Al3 coating possesses the best high temperature oxidation resistance, and the mass gain of the coating is 1/15 that of pure copper and 1/2 that of nickel coating, respectively. The specimen surface after being oxidized for 25 h still comprises Ni2Al3 phase. However, when the time of oxidizing treatment increases to 50 h, the Ni Al phase is formed. It is also found that the Ni2Al3 phase completely turns into Ni Al phase after oxidizing treatment for 100 h and above. The Ni Al coating shows excellent high temperature oxidation resistance when oxidation time is 250 h.

Microstructure and high temperature oxidation resistance of Si-Y co-deposition coatings prepared on TiAl alloy by pack cementation process

In order to improve the high temperature oxidation resistance of TiAl alloy, Y modified silicide coatings were prepared by pack cementation process at 1030, 1080 and 1130 °C, respectively, for 5 h. The microstructures, phase constitutions and oxidation behavior of these coatings were studied. The results show that the coating prepared by co-depositing Si?Y at 1080 °C for 5 h has a multiple layer structure: a superficial zone consisting of Al-rich (Ti,Nb)5Si4 and (Ti,Nb)5Si3, an out layer consisting of (Ti,Nb)Si2, a middle layer consisting of (Ti,Nb)5Si4 and (Ti,Nb)5Si3, and aγ-TiAl inner layer. Co-deposition temperature imposes strong influences on the coating structure. The coating prepared by Si?Y co-depositing at 1080 °C for 5 h shows relatively good oxidation resistance at 1000 °C in air, and the oxidation rate constant of the coating is about two orders of magnitude lower than that of the bare TiAl alloy.

Microstructure and corrosion resistance of sputtered TiN coatings on surface of Zr-4 alloy

To improve the oxidation resistance and corrosion resistance of Zr-4 alloy, titanium nitride （TIN） coatings were prepared on the Zr-4 alloy with a TiN ceramic target with different ratios of N2. Microstructure and high-temperature properties of the TiN coated samples were studied by scanning electron microscopy （SEM）, energy dispersive spectrometer （EDS）, X-ray diffraction meter （XRD）, X-ray photoelectron spectroscopy （XPS）, heat treatment furnace and autoclaves, respectively. The x value of the TiN coatings （TiN） ranges from 0.96 to 1.33. After the introduction of N2, TiN coating exhibits a weak （200） plane and a preferred （111） orientation. The coating prepared with an N2 flow ratio of 15% shows an optimal oxidation resistance in the atmospheric environment at 800 ℃. In either 1 200 ℃ steam environment for one hour, or deionized water at 360 ℃ and a pressure of 18.6 Mpa for 16 d, the opitimized TiN coated samples have no delamination or spallation; and the gains in the masses of samples are much smaller than Zr-4 alloy. These results demonstrate the effectiveness of the optimized TiN coating as the protective coating on the Zr-4 alloy under extreme conditons.

Oxidation behavior of TiAlZrCr/(Ti,Al,Zr,Cr)N gradient films deposited by multi-arc ion plating

The two Ti-Al-Zr targets and one pure Cr target were used to prepare the TiAlZrCr/（Ti, Al, Zr, Cr）N gradient films on high speed steel （WlSCr4V） substrates by multi-arc ion plating technique. Short-term isothermal （at 600 ℃, 700 ℃, 800℃ and 900 ℃ for 4 h） and long-terra cyclic （at 700℃ and 800℃ for 100 h） high temperature oxidation behavior of the gradient films were studied. Then the oxide scales formed on the film specimens were characterized by scanning electron microscopy （SEM）, energy dispersion X-ray spectroscopy （EDS） and X-ray diffraction （XRD）. It was showed that, under short-term isothermal condition, the high temperature oxidation resistance of the gradient film was excellent up to 800 ℃ and an oxide scale comprising TiO2 was observed. On the other hand, under long-term cyclic high temDerature condition, the oxidation resistance of the gradient film was excellent at about 700 ℃.