Fluid-chemical modeling of the near-cathode sheath formation process in a high current broken in DC air circuit breaker

When the contacts of a medium-voltage DC air circuit breaker(DCCB) are separated, the energy distribution of the arc is determined by the formation process of the near-electrode sheath. Therefore, the voltage drop through the near-electrode sheath is an important means to build up the arc voltage, which directly determines the current-limiting performance of the DCCB. A numerical model to describe the near-electrode sheath formation process can provide insight into the physical mechanism of the arc formation, and thus provide a method for arc energy regulation. In this work, we establish a two-dimensional axisymmetric time-varying model of a medium-voltage DCCB arc when interrupted by high current based on a fluid-chemical model involving 16 kinds of species and 46 collision reactions. The transient distributions of electron number density, positive and negative ion number density, net space charge density, axial electric field, axial potential between electrodes, and near-cathode sheath are obtained from the numerical model. The computational results show that the electron density in the arc column increases, then decreases, and then stabilizes during the near-cathode sheath formation process, and the arc column's diameter gradually becomes wider. The 11.14 V–12.33 V drops along the17 μm space charge layer away from the cathode(65.5 k V/m–72.5 k V/m) when the current varies from 20 k A–80 k A.The homogeneous external magnetic field has little effect on the distribution of particles in the near-cathode sheath core,but the electron number density at the near-cathode sheath periphery can increase as the magnetic field increases and the homogeneous external magnetic field will lead to arc diffusion. The validity of the numerical model can be proven by comparison with the experiment.

OES study of the gas phase during diamond films deposition in high power DC arc plasma jet CVD system

This paper used optical emission spectroscopy （OES） to study the gas phase in high power DC arc plasma jet chemical vapour deposition （CVD） during diamond films growth processes. The results show that all the deposition parameters （methane concentration, substrate temperature, gas flow rate and ratio of H2/Ar） could strongly influence the gas phase. C2 is found to be the most sensitive radical to deposition parameters among the radicals in gas phase. Spatially resolved OES implies that a relative high concentration of atomic H exists near the substrate surface, which is beneficial for diamond film growth. The relatively high concentrations of C2 and CH are correlated with high deposition rate of diamond. In our high deposition rate system, C2 is presumed to be the main growth radical, and CH is also believed to contribute the diamond deposition.

Diagnosis of gas phase near the substrate surface in diamond film deposition by high-power DC arc plasma jet CVD

Optical emission spectroscopy （OES） was used to study the gas phase composition near the substrate surface during diamond deposition by high-power DC arc plasma jet chemical vapor deposition （CVD）. C2 radical was determined as the main carbon radical in this plasma atmosphere. The deposition parameters, such as substrate temperature, anode-substrate distance, methane concentration, and gas flow rate, were inspected to find out the influence on the gas phase. A strong dependence of the concentrations and distribution of radicals on substrate temperature was confirmed by the design of experiments （DOE）. An explanation for this dependence could be that radicals near the substrate surface may have additional ionization or dissociation and also have recombination, or are consumed on the substrate surface where chemical reactions occur.

基于法拉第效应的宽频光学电流传感器研制及其性能研究

当前智能电网和新型电力系统中存在大量高频暂态电流分量。高频暂态电流是反映电力系统扰动及故障过程的重要信息,对其波形、频率、幅值等信息参数进行实时观测是预防和确保电网安全稳定运行的前提。而传统电流测量方式存在频带窄、易受电磁干扰、绝缘配合难度大等问题,难以对暂态电流进行有效检测。故提出并设计了一种具有抗干扰能力的螺线管式宽频光学电流传感器,基于传感器性能测试平台,研究了传感器的灵敏度、线性度以及频率特性,结果表明目前传感器的灵敏度为62.57 mV/A且带宽可以达到1 MHz以上;此外搭建了直流电弧实验平台对直流电弧进行了测量。试验结果表明,该传感器可实现对直流至高频电弧分量的有效测量,其测量结果与标准电流探头的线性相关度可达0.9971,多次实验结果表明相关系数的相对变化率小于2%,具有一定工程使用价值。

直流电弧等离子体炬数值模拟与诊断

直流电弧等离子体炬内部物理过程复杂且具动态性,较难对其进行准确描述与深入研究,且其工作温度较高,其状态参数难以使用常规方式测量。针对直流电弧等离子体炬,建立流动、传热和电磁相互耦合的数值模型,基于Fluent软件对直流电弧等离子体炬进行三维数值模拟和特性分析,设计并搭建了一套热焓探针实验系统,完成对直流电弧等离子体炬射流参数的测量分析。结果表明:建立的数值模型模拟结果与实验测量结果吻合较好,误差在10%以内;炬内温度与速度最大值与工作气流量呈正相关,均出现在靠近阴极区域,且沿轴线逐渐降低;等离子体炬内高温区与高电流密度区重合。

UHVDC故障下紧急直流功率支援方案研究

采用EEAC法分析了特高压直流输电系统在大扰动下进行紧急直流功率支援的机理,紧急直流功率支援可以有效改善系统的暂态稳定性。借助PSD-BPA详细直流模型,针对云广特高压直流输电工程大扰动情况下进行仿真,得到合适的功率支援开始时刻,适当提升速率、适当支援量,同时能够掌握回降的时间及速率,将极大提高直流功率支援的效果。

Study of Multi-Function Micro-Plasma Spraying Technology

A multi-functional micro-arc plasma spraying system was developed according to aerodynamics and plasma spray theory. The soft switch IGBT （Insulated Gate Bipolar Transistor） invert technique, micro-computer control technique, convergent-divergent nozzle structure and axial powder feeding techniques have been adopted in the design of the micro-arc plasma spraying system. It is not only characterized by a small volume, a light weight, highly accurate control, high deposition efficiency and high reliability, but also has multi-functions in plasma spraying, welding and quenching. The experimental results showed that the system can produce a supersonic flame at a low power, spray Al2O3 particles at an average speed up to 430 m/s, and make nanostructured AT13 coatings with an average bonding strength of 42.7 MPa. Compared to conventional 9M plasma spraying with a higher power, the coatings with almost the same properties as those by conventional plasma spray can be deposited by multi-functional micro-arc plasma spraying with a lower power plasma arc due to an improved power supply design, spray gun structure and powder feeding method. Moreover, this system is suitable for working with thin parts and undertaking on site repairs, and as a result, the application of plasma spraying will be greatly extended.

Design and characteristics of a new type laminar plasma torch for materials processing

Laminar plasma jet(LPJ)generated by laminar plasma torch(LPT)has a favorable temperature and velocity distribution.Thus,it is superior to the turbulent plasma jet in material processing.However,most of the reported LPTs usually operate at a relatively low output power with a relatively low arc voltage and thermal efficiency,which limits its capabilities.In this context,this paper attempts to design a new type of high-power LPT with a relatively low arc current and a high thermal efficiency.In the first section,the design principle of the main components is studied and discussed in detail,and a new high-power LPT is proposed.Then,the experimental characteristics of the proposed high-power LPT are examined.Experimental results reveal the following characteristics of the proposed LPT.(1)The max jet length of the proposed LPT reaches at 540 mm.(2)Its mean arc voltage is higher than 290 V when the LPT works with arc currents lower than 200 A.leading to an output power greater than 50 kW.(3)The mean thermal efficiency is higher than 509f.Lastly,the proposed LPT has been applied to spheroidize the aluminum oxide powers.The experiment results for the production of spherical powders show that the proposed LPT hits a good characteristic for material processing.

特高压直流高速开关研发关键技术研究

直流高速开关(high speed switch,HSS)是多端直流输电系统中的关键设备。HSS的性能参数直接影响到多端直流系统的送电能力和运行灵活性。为了研制性能参数更优的±800 kV HSS产品,提出在长时直流耐受、直流小电流开断和直流燃弧耐受3大关键性能方面需解决的问题。结合内外绝缘仿真优化和样机绝缘验证,实现样机具备DC1224 kV/1 h湿耐受的绝缘性能;通过小电流开断的磁流体动力学仿真,获得了HSS开断小直流电流时灭弧室内部的温度、压力分布规律;试制了小直流开断实验样机,样机实验在1 kV恢复电压下最大开断电流达到350 A。通过长时燃弧的磁流体动力学仿真,获得了4000 A直流电流开断过程中灭弧室内部的温度、压力分布规律。该研究为性能参数更优的±800 kV HSS产品研制奠定坚实基础,对提高多端直流输电系统功率连续性和安全稳定运行具有重要意义。

应用于混合式直流断路器的电流转移方法

电流转移是混合式直流断路器能够成功开断电流的前提,针对混合式直流断路器的电流转移特性展开了研究。首先通过试验测量具有不同触头结构及触头材料的真空电弧电压。试验结果表明电流为0~1 k A时,电弧电压约16~22 V;且改变触头结构、触头材料及触头开距等无法有效提高电弧电压,所以提高真空电弧电压以驱动电流转移的方法并不可行。为此,首次提出了一种应用换流驱动电路的电流转移方法。对换流驱动电路建立了数学模型,并通过试验验证了仿真模型。最后,针对基于换流驱动电路的混合式直流断路器,设计试验回路并进行了电流转移等效模拟试验。试验结果表明:该电流转移方法能够保证混合式直流断路器中电流在200μs时间内可靠转移。该试验结果验证了基于换流驱动电路的电流转移方法应用于混合式直流断路器的有效性。

外部磁场对直流电弧等离子体放电特性的影响及其机理

通过外部磁场驱动电弧旋转产生相对均匀的等离子体是一种可能的改进等离子体放电特性的有效手段。利用高速摄像技术和虚拟仪器技术,观察并测量了大气条件下、非均匀磁场驱动的直流电弧等离子体阳极弧根运动以及电弧电压波动。结果发现:相比无外部磁场,非均匀外部磁场驱动下的直流电弧等离子体在旋转力和稳弧力的作用下阳极弧根旋转,均匀性提高;其电弧电压波动幅度增大,放电模式发生改变;伏安特性曲线向上平移,电弧等离子体炬放电功率提高。另外,由于等离子体射流的高速运动而引起的等离子体射流在喷口处径向扩张,使等离子体射流横截面扩大,进一步提高了射流的均匀性。从结果中可以看出,外部磁场改善了直流电弧等离子体炬的基本特性,对直流电弧等离子体炬应用效率的提高具有重要的意义。

改进型地铁用直流断路器

直流断路器是地铁供电系统中切除故障的关键设备。目前,我国地铁供电系统中采用的直流断路器多为强制拉弧,故障电流可高达数万安培,从而导致直流断路器烧毁。该文首先在分析电弧数学模型的基础上,结合Matlab软件中的Mayr模型,建立了传统直流断路器的仿真模型,仿真结果表明,因断路器电流过大从而导致传统直流断路器易损坏。针对传统直流断路器的不足,文中提出了传统直流断路器的改进方案,给出了电路结构,并建立了仿真模型。仿真结果表明,改进型直流断路器具有良好的熄弧特性,不易遭受损坏,具有良好的应用前景。

强直电流伸展弧CVD硬质合金金刚石涂层工具

采用自行研制的强电流直流扩展电弧设备对酸浸和渗硼预处理的YG6刀片进行了金刚石薄膜涂层沉积,并对放于不同位置的沉积刀片表面涂层的激光Raman谱和SEM形貌进行了分析、研究.结果表明:渗硼预处理工艺优于酸浸预处理工艺;在渗硼处理的GY6刀片上,沉积的金刚石薄膜涂层具有大面积、均匀性好和质量高的特点.

大面积高光学质量金刚石自支撑膜的制备

介绍了一种新型的磁控／流体动力学控制的大口径长通道直流电弧等离子体炬，并据此设计建 造了 １００千瓦级高功率 ＤＣ Ａｒｃ Ｐｌａｓｍａ Ｊｅｔ ＣＶＤ金刚石膜沉积系统 讨论了该系统采用的半封闭式 气体循环系统的工作原理。

金刚石自支撑膜的高温红外透过性能

由于金刚石具有低吸收和优异的力学与导热性能使其成为长波(8~12μm)红外光学窗口材料的重要选择。对于许多极端条件的应用,化学气相沉积(CVD)金刚石自支撑膜的高温光学性质至关重要。应用直流电弧等离子喷射法制备光学级金刚石自支撑膜进行变化温度的红外光学透过性能研究,采用光学显微镜、X射线衍射、激光拉曼和傅里叶变换红外-拉曼光谱仪检测CVD金刚石膜的表面形貌、结构特征和红外光学性能。结果表明:在27℃时金刚石膜长波红外8~12μm之间的平均透过率达到65.95%,在500℃时8~12μm处的平均透过率为52.5%。透过率下降可分为3个阶段。对应于透过率随温度的下降,金刚石膜的吸收系数随温度的升高而增加。金刚石自支撑膜表面状态的变化,对金刚石膜光学性能的影响显著大于内部结构的影响。

高压断路器SF_6电弧电流零区动态特征和衰减行为的研究综述

高压SF6断路器开断故障电流的成功与否与电弧在电流零区的动态特征和衰减行为紧密相关,涉及到一个介质状态从导电到绝缘转变的过程,包含大量的基础科学问题。电弧现象是一个多物理场相互耦合变化的复杂过程,其研究涉及的学科领域广,交叉性强。由于实验和理论研究中存在的困难,目前对SF6电弧电流零区动态衰减特性的了解尚不完善清晰;相关研究属于电器研究领域的难点之一,是定量预测断路器开断性能的技术瓶颈。以高压断路器SF6电弧为对象,从理论研究、实验测试层面以及宏观、微观角度,综述了国内外高压断路器SF6电弧等离子体特性,特别是非平衡态下电弧电流零区动态特征和衰减行为的研究进展,并对未来的研究工作进行了展望。

强电流直流扩展弧金刚石沉积技术的研究

采用自行研制的Q-500金刚石涂层沉积设备,同时采用两种不同结构的等离子体炬对经酸碱二步法处理后的硬质合金钻杆(YF06)分别进行了金刚石涂层的沉积,并对沉积后的样品表面进行了分析和研究。初步的研究结果表明:等离子体炬的结构对金刚石涂层的沉积影响很大,改进前的等离子体炬所产生的弧柱不稳,导致沉积温度波动幅度大,而改进后的等离子体炬能产生稳定的弧柱,沉积温度变化不大并且沉积的金刚石涂层具有大面积、均匀性好和高质量的特点。

芯棒涂覆H-PRTV长棒形瓷绝缘子直流污闪特性

外形结构和材料对绝缘子的污秽闪络特性有较大影响。为此,采用恒压升降法,在高海拔地区进行了大吨位长棒形瓷绝缘子的直流人工污秽试验,通过测量泄漏电流和污闪电压,拍摄电弧发展照片,对比研究了芯棒涂覆强疏水型长效防污闪涂料H-PRTV对长棒形瓷绝缘子直流污闪特性的影响。结果表明,芯棒涂覆H-PRTV后,长棒形瓷绝缘子直流污闪电压明显提高,电弧发展过程明显缩短,临闪前大幅值泄漏电流脉冲减少,整个污秽闪络过程有延缓的趋势。

强电流直流伸展电弧CVD纳米金刚石涂层微型工具

本文研制了强直流伸展电弧金刚石涂层沉积设备,它可产生长达400 mm的等离子体弧柱,可沉积金刚石涂层的区域大,能够在复杂形状硬质合金刀具上沉积金刚石涂层,有利于实现金刚石涂层硬质合金工具的产业化生产。在直径1 mm的微型铣刀上沉积了纳米金刚石涂层,研究了沉积压力对金刚石涂层组织的影响,沉积压力对金刚石涂层的晶粒尺寸和表面形貌有显著影响。随着沉积压力的降低,沉积的金刚石涂层晶粒尺寸减小,当沉积压力为0.80 kPa时,可沉积出纳米金刚石涂层。涂层的厚度均匀,其表面光滑、平整,且与硬质合金基体之间有较好的附着力。用激光Ram an对金刚石涂层进行了表征。

沉积温度对硬质合金表面沉积的SiC薄膜的影响

采用强电流直流伸展电弧等离子体CVD技术,以Ar、H2和四甲基硅烷(TMS)为先驱气体,在YG6硬质合金衬底表面制备了SiC薄膜。实验结果表明:随着沉积温度的升高,薄膜的致密性和平整度提高;但当沉积温度过高时,SiC薄膜的表面开始具有含非晶碳球和呈花瓣状的疏松结构。在合适的沉积温度下,SiC薄膜的致密性和平整度较好,且其具有较好的附着力和一定的强度,而这样的SiC薄膜可以阻止在金刚石涂层沉积过程中硬质合金中含有的Co对金刚石相沉积过程的有害作用。