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Multi-objective Optimal Design of High Frequency Probe for Scanning Ion Conductance Microscopy 被引量:2
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作者 GUO Renfei ZHUANG Jian +2 位作者 MA Li LI Fei YU Dehong 《Chinese Journal of Mechanical Engineering》 SCIE EI CAS CSCD 2016年第1期195-203,共9页
Scanning ion conductance microscopy(SICM) is an emerging non-destructive surface topography characterization apparatus with nanoscale resolution. However, the low regulating frequency of probe in most existing modul... Scanning ion conductance microscopy(SICM) is an emerging non-destructive surface topography characterization apparatus with nanoscale resolution. However, the low regulating frequency of probe in most existing modulated current based SICM systems increases the system noise, and has difficulty in imaging sample surface with steep height changes. In order to enable SICM to have the capability of imaging surfaces with steep height changes, a novel probe that can be used in the modulated current based bopping mode is designed. The design relies on two piezoelectric ceramics with different travels to separate position adjustment and probe frequency regulation in the Z direction. To fiarther improve the resonant frequency of the probe, the material and the key dimensions for each component of the probe are optimized based on the multi-objective optimization method and the finite element analysis. The optimal design has a resonant frequency of above 10 kHz. To validate the rationality of the designed probe, microstructured grating samples are imaged using the homebuilt modulated current based SICM system. The experimental results indicate that the designed high frequency probe can effectively reduce the spike noise by 26% in the average number of spike noise. The proposed design provides a feasible solution for improving the imaging quality of the existing SICM systems which normally use ordinary probes with relatively low regulating frequency. 展开更多
关键词 scanning ion conductance microscopy(SICM) multi-objective optimization high frequency probe finite element analysis imaging quality
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Automated Calibration of RF On-Wafer Probing and Evaluation of Probe Misalignment Effects Using a Desktop Micro-Factory
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作者 F. T. von Kleist-Retzow T. Tiemerding +1 位作者 P. Elfert O. C. Haenssler 《Journal of Computer and Communications》 2016年第3期61-67,共7页
A fully automatic setup for on-wafer contact probing will be presented. This setup consists of six automatable nano positioning axes used as tool holder and a sample holder. With this setup a fully automatic one-port ... A fully automatic setup for on-wafer contact probing will be presented. This setup consists of six automatable nano positioning axes used as tool holder and a sample holder. With this setup a fully automatic one-port SOL calibration for a Vector Network Analyzer is done. Furthermore a fully automated on-wafer contact probing is performed. Afterwards, the effects of a misalignment of the three tips of a GSG-probe are examined. Additionally the error on the calibration is calculated to determine its effect on the measurement. The results show, that a misalignment of the probe has a high impact on the measurement of the VNA. Hence a fully automated on-wafer probing presented in this paper is a good way to detect these misalignments and correct them if necessary. 展开更多
关键词 CALIBRATION On-Wafer Measurements MISALIGNMENT Automation high frequency (HF) probe Ground-Signal-Ground (GSG) probe
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