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Quantification of trace amounts of impurities in high purity cobalt by high resolution inductively coupled plasma mass spectrometry 被引量:10
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作者 XIE Hualin HUANG Kelong +1 位作者 NIE Xidu TANG Yougen 《Rare Metals》 SCIE EI CAS CSCD 2007年第3期286-291,共6页
A An analytical method using high resolution inductively coupled plasma mass spectrometry (HR-ICP-MS) for rapid simultaneous determination of 24 elements (Be, Mg, A1, Ti, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, As, Se, ... A An analytical method using high resolution inductively coupled plasma mass spectrometry (HR-ICP-MS) for rapid simultaneous determination of 24 elements (Be, Mg, A1, Ti, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, As, Se, Mo, Ag, Cd, Sn Sb, Ba, Pt, Au, and Pb) in high purity cobalt was described. Sample digestions were performed in closed microwave vessels using HNO3 and HCI. The matrix effects because of the presence of excess HCI and Co were evaluated. The usefulness of high mass resolution for overcoming some spectral interference was demonstrated. The optimum conditions for the determination were tested and discussed. The standard addition method was employed for quantitative analysis. The detection limits were 0.016-1.50 ].tg·g^-1, the recovery ratios were 92.2%-111.2%, and the RSD was less than 3.6%. The method was accurate, quick, and convenient. It was applied to the determination of trace impurities in high purity cobalt with satisfactory results. 展开更多
关键词 high resolution inductively coupled plasma mass spectrometry high purity cobalt trace impurities matrix effect standard addition method
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Quantification of Trace Amounts of Impurities in High Purity Cobalt by High Resolution Inductively Coupled Plasma Mass Spectrometry 被引量:3
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作者 Hua Lin XIE Xi Du NIE You Gen TANG 《Chinese Chemical Letters》 SCIE CAS CSCD 2006年第8期1077-1080,共4页
An analytical method using high resolution inductively coupled plasma mass spectrometry (HR-ICP-MS) for rapid simultaneous determination of Be, Mg, Al, Ti, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, As, Se, Mo, Ag, Cd, Sn, ... An analytical method using high resolution inductively coupled plasma mass spectrometry (HR-ICP-MS) for rapid simultaneous determination of Be, Mg, Al, Ti, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, As, Se, Mo, Ag, Cd, Sn, Sb, Ba, Pt, Au and Pb in high purity cobalt was described. Sample digestions were performed in closed microwave vessels using HNO3 and HCl. The matrix effects due to the presence of excess HCl and Co were evaluated. The usefulness of high mass resolution for overcoming some spectral interference was demonstrated. The optimum conditions for the determination was tested and discussed. Correction for matrix effects, Sc, Rh and Bi were used as internal standards. The detection limits is 0.003-0.57 μg/g, the recovery ratio is 92.2%-111.2%, and the RSD is less than 3.6%. The method is accurate, quick and convenient. It has been applied to the determination of trace impurities in high purity cobalt with satisfactory results. 展开更多
关键词 high resolution inductively coupled plasma mass spectrometry high purity cobalt trace impurities matrix effect spectral interference internal standards.
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Determination of trace elements in high purity nickel by high resolution inductively coupled plasma mass spectrometry 被引量:11
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作者 聂西度 梁逸曾 +1 位作者 唐有根 谢华林 《Journal of Central South University》 SCIE EI CAS 2012年第9期2416-2420,共5页
The contents of Mg,Al,Si,Ti,Cr,Mn,Fe,Co,Cu,Ga,As,Se,Cd,Sb,Pb and Bi in high purity nickel were determined by high resolution inductively coupled plasma mass spectrometry(HR-ICP-MS).The sample was dissolved in HNO3 and... The contents of Mg,Al,Si,Ti,Cr,Mn,Fe,Co,Cu,Ga,As,Se,Cd,Sb,Pb and Bi in high purity nickel were determined by high resolution inductively coupled plasma mass spectrometry(HR-ICP-MS).The sample was dissolved in HNO3 and HCl by microwave digestion.Most of the spectral interferences could be avoided by measuring in the high resolution mode.The matrix effects because of the presence of excess HCl and nickel were evaluated.Correction for matrix effects was made using Sc,Rh and Tl as internal standards.The optimum conditions for the determination were tested and discussed.The detection limits range from 0.012 to 1.76 μg/g depending on the type of elements.The applicability of the proposed method is also validated by the analysis of high purity nickel reference material(NIST SRM 671).The relative standard deviation(RSD) is less than 3.3%.Results for determination of trace elements in high purity nickel were presented. 展开更多
关键词 电感耦合等离子体质谱法 高分辨率模式 痕量元素 高纯镍 镍测定 ICP-MS 最佳工艺条件 相对标准偏差
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高分辨等离子体质谱法直接测定高纯镓中的痕量元素 被引量:15
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作者 谢华林 聂西度 唐有根 《分析化学》 SCIE EI CAS CSCD 北大核心 2006年第11期1570-1574,共5页
建立高分辨电感耦合等离子体质谱法(HR-ICP.MS)测定高纯镓样品中Be、Mg、Al、Si、Ti、V、Cr、Mn、Fe、Co、Ni、cu、zn、Ge、As、Mo、Ag、Cd、In、Sb、Ba、Ph、Bi等痕量元素的方法。样品用HNO,+HCl经微波消解后,试液直接进样用HR-I... 建立高分辨电感耦合等离子体质谱法(HR-ICP.MS)测定高纯镓样品中Be、Mg、Al、Si、Ti、V、Cr、Mn、Fe、Co、Ni、cu、zn、Ge、As、Mo、Ag、Cd、In、Sb、Ba、Ph、Bi等痕量元素的方法。样品用HNO,+HCl经微波消解后,试液直接进样用HR-ICP-MS法同时测定上述元素,在高分辨质谱测量模式下避免了大量的质谱干扰。详细地研究了HCl和高纯镓所产生的基体效应,以Sc、Rh、Tl作为内标元素校正了基体效应.讨论和确定了实验的最佳测定条件。结果表明,23种痕量元素的检出限在0.001.0.21μg/L之间;回收率在89.8%~111.6%之间,相对标准偏差(RSD)小于3.3%。 展开更多
关键词 高分辨电感耦合等离子体质谱 高纯镓 痕量元素 质谱干扰 基体效应 内标
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电感耦合等离子体质谱法测定高纯镓中痕量杂质 被引量:8
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作者 岳晓云 蔡绍勤 +2 位作者 邵荣珍 刘玉龙 鲁亦强 《分析化学》 SCIE EI CAS CSCD 北大核心 2001年第11期1307-1310,共4页
采用电感耦合等离子体质谱 (ICP MS)测定高纯镓中痕量杂质元素 ,以Rh作为内标补偿校正镓基体的抑制效应 ,采用异丙醚萃取分离镓与ICP MS技术联用 ,拓展分析方法应用范围 ,可满足99 9999%~ 99.99999%超高纯镓分析方法要求。方法检出限为... 采用电感耦合等离子体质谱 (ICP MS)测定高纯镓中痕量杂质元素 ,以Rh作为内标补偿校正镓基体的抑制效应 ,采用异丙醚萃取分离镓与ICP MS技术联用 ,拓展分析方法应用范围 ,可满足99 9999%~ 99.99999%超高纯镓分析方法要求。方法检出限为 0 .0 0 6~ 0 .0 6 2 μg L ;加标回收率为86 8%~ 12 1.4%之间 ;RSD为 1.1%~ 8.6 % 展开更多
关键词 电感耦合等离子体质谱 高纯镓 杂质 基体效应 内标 溶剂萃取 痕量分析 半导体材料
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