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Influence of Microwave Power on the Properties of Hydrogenated Diamond-Like Carbon Films Prepared by ECR Plasma Enhanced DC Magnetron Sputtering 被引量:2
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作者 汝丽丽 黄建军 +1 位作者 高亮 齐冰 《Plasma Science and Technology》 SCIE EI CAS CSCD 2010年第5期551-555,共5页
Electron cyclotron resonance (ECR) plasma was applied to enhance the direct current magnetron sputtering to prepare hydrogenated diamond-like carbon (H-DLC) films. For different microwave powers, both argon and hy... Electron cyclotron resonance (ECR) plasma was applied to enhance the direct current magnetron sputtering to prepare hydrogenated diamond-like carbon (H-DLC) films. For different microwave powers, both argon and hydrogen gas are introduced separately as the ECR working gas to investigate the influence of microwave power on the microstructure and electrical property of the H-DLC films deposited on P-type silicon substrates. A series of characterization methods including the Raman spectrum and atomic force microscopy are used. Results show that, within a certain range, the increase in microwave power affects the properties of the thin films, namely the sp3 ratio, the hardness, the nanoparticle size and the resistivity all increase while the roughness decreases with the increase in microwave power. The maximum of resistivity amounts to 1.1×10^9 Ω.cm. At the same time it is found that the influence of microwave power on the properties of H-DLC films is more pronounced when argon gas is applied as the ECR working gas, compared to hydrogen gas. 展开更多
关键词 hydrogenated diamond-like carbon films ECR plasma magnetron sputtering microwave power
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表面波等离子体制备碳膜的膜厚分布及工艺优化 被引量:1
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作者 徐均琪 上坂裕之 梅原德次 《西安工业大学学报》 CAS 2007年第1期1-5,共5页
表面波等离子体(surface-wave-sustained plasma,SWP)是近年发展起来的一种新型低压,高密度等离子体.应用这种技术,采用物理气相沉积(PVD)方法,很容易实现镀膜过程中的离子束辅助沉积(IBAD),从而制备出性能优异的无氢碳膜.采用一种新型... 表面波等离子体(surface-wave-sustained plasma,SWP)是近年发展起来的一种新型低压,高密度等离子体.应用这种技术,采用物理气相沉积(PVD)方法,很容易实现镀膜过程中的离子束辅助沉积(IBAD),从而制备出性能优异的无氢碳膜.采用一种新型的SWP源沉积出无氢碳膜,用郎缪尔探针测试了不同工艺条件下的等离子体密度分布.采用正交实验设计方法,研究了沉积薄膜的膜厚分布特性,分析了膜厚分布与等离子体密度分布的关系,并对制备的工艺参数进行了优化.结果表明,这种新型的SWP源,能够产生高达1011~1014cm-3的等离子体密度.薄膜在整个圆周方向都具有良好的均匀性,沿轴向约为75 mm(膜厚差值±5%).研究中同时获得了影响表面波等离子体膜厚均匀性的显著因素和制备薄膜均匀性最好的工艺条件. 展开更多
关键词 表面波 无氢碳膜 工艺参数 等离子体密度 正交实验
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无氢类金刚石薄膜的过滤式阴极电弧沉积
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作者 朱纪军 陆祖宏 +1 位作者 左敦稳 王珉 《机械科学与技术》 CSCD 北大核心 2000年第1期125-126,共2页
研制了一套过滤式阴极电弧沉积设备 ,并利用该设备成功地获得了类金刚石薄膜。扫描电镜分析表明 :获得的薄膜在硅基片上是光滑和致密的。喇曼光谱研究表明 ,这种薄膜是典型的无氢类金刚石薄膜。膜层的摩擦试验表明 :无氢类金刚石薄膜的... 研制了一套过滤式阴极电弧沉积设备 ,并利用该设备成功地获得了类金刚石薄膜。扫描电镜分析表明 :获得的薄膜在硅基片上是光滑和致密的。喇曼光谱研究表明 ,这种薄膜是典型的无氢类金刚石薄膜。膜层的摩擦试验表明 :无氢类金刚石薄膜的摩擦系数较低 。 展开更多
关键词 无氢 类金刚石薄膜 过滤式 阴极电弧沉积
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Running-in behavior of a H‒DLC/Al_(2)O_(3) pair at the nanoscale
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作者 Pengfei SHI Junhui SUN +4 位作者 Yunhai LIU Bin ZHANG Junyan ZHANG Lei CHEN Linmao QIAN 《Friction》 SCIE EI CAS CSCD 2021年第6期1464-1473,共10页
Diamond-like carbon(DLC)film has been developed as an extremely effective lubricant to reduce energy dissipation;however,most films should undergo running-in to achieve a super-low friction state.In this study,the run... Diamond-like carbon(DLC)film has been developed as an extremely effective lubricant to reduce energy dissipation;however,most films should undergo running-in to achieve a super-low friction state.In this study,the running-in behaviors of an H–DLC/Al_(2)O_(3) pair were investigated through a controllable single-asperity contact study using an atomic force microscope.This study presents direct evidence that illustrates the role of transfer layer formation and oxide layer removal in the friction reduction during running-in.After 200 sliding cycles,a thin transfer layer was formed on the Al2O3 tip.Compared with a clean tip,this modified tip showed a significantly lower adhesion force and friction force on the original H–DLC film,which confirmed the contribution of the transfer layer formation in the friction reduction during running-in.It was also found that the friction coefficient of the H–DLC/Al_(2)O_(3) pair decreased linearly as the oxygen concentration of the H–DLC substrate surface decreased.This phenomenon can be explained by a change in the contact surface from an oxygen termination with strong hydrogen bond interactions to a hydrogen termination with weak van der Waals interactions.These results provide new insights that quantitatively reveal the running-in mechanism at the nanoscale,which may help with the design optimization of DLC films for different environmental applications. 展开更多
关键词 hydrogenated diamond-like carbon(H–DLC)film RUNNING-IN NANOSCALE oxide film transfer layer
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