Surface metallization of glass fiber(GF)/polyetheretherketone(PEEK)[GF/PEEK] is conducted by coating copper using electroplating and magnetron sputtering and the properties are determined by X-ray diffraction(XRD), sc...Surface metallization of glass fiber(GF)/polyetheretherketone(PEEK)[GF/PEEK] is conducted by coating copper using electroplating and magnetron sputtering and the properties are determined by X-ray diffraction(XRD), scanning electron microscopy(SEM), and electron backscatter diffraction(EBSD).The coating bonding strength is assessed by pull-out tests and scribing in accordance with GB/T 9286-1998.The results show that the Cu coating with a thickness of 30 μm deposited on GF/PEEK by magnetron sputtering has lower roughness, finer grain size, higher crystallinity, as well as better macroscopic compressive stress,bonding strength, and electrical conductivity than the Cu coating deposited by electroplating.展开更多
Sputtering is a crucial technology in fields such as electric propulsion, materials processing and semiconductors. Modeling of sputtering is significant for improving thruster design and designing material processing ...Sputtering is a crucial technology in fields such as electric propulsion, materials processing and semiconductors. Modeling of sputtering is significant for improving thruster design and designing material processing control algorithms. In this study we use the hierarchical clustering analysis algorithm to perform cluster analysis on 17 descriptors related to sputtering. These descriptors are divided into four fundamental groups, with representative descriptors being the mass of the incident ion, the formation energy of the incident ion, the mass of the target and the formation energy of the target. We further discuss the possible physical processes and significance involved in the classification process, including cascade collisions, energy transfer and other processes. Finally, based on the analysis of the above descriptors, several neural network models are constructed for the regression of sputtering threshold E_(th), maximum sputtering energy E_(max) and maximum sputtering yield SY_(max). In the regression model based on 267 samples, the four descriptor attributes showed higher accuracy than the 17 descriptors(R^(2) evaluation) in the same neural network structure, with the 5×5 neural network structure achieving the highest accuracy, having an R^(2) of 0.92. Additionally, simple sputtering test data also demonstrated the generalization ability of the 5×5 neural network model, the error in maximum sputtering yield being less than 5%.展开更多
Pure cobalt(Co)thin films were fabricated by direct current magnetron sputtering,and the effects of sputtering power and pres-sure on the microstructure and electromagnetic properties of the films were investigated.As...Pure cobalt(Co)thin films were fabricated by direct current magnetron sputtering,and the effects of sputtering power and pres-sure on the microstructure and electromagnetic properties of the films were investigated.As the sputtering power increases from 15 to 60 W,the Co thin films transition from an amorphous to a polycrystalline state,accompanied by an increase in the intercrystal pore width.Simultaneously,the resistivity decreases from 276 to 99μΩ·cm,coercivity increases from 162 to 293 Oe,and in-plane magnetic aniso-tropy disappears.As the sputtering pressure decreases from 1.6 to 0.2 Pa,grain size significantly increases,resistivity significantly de-creases,and the coercivity significantly increases(from 67 to 280 Oe),which can be attributed to the increase in defect width.Corres-pondingly,a quantitative model for the coercivity of Co thin films was formulated.The polycrystalline films sputtered under pressures of 0.2 and 0.4 Pa exhibit significant in-plane magnetic anisotropy,which is primarily attributable to increased microstress.展开更多
Magnetron sputtering deposition with regulated Cu target power was used for depositing Cu-containing high-entropy alloy nitride(Cu-(HEA)N)films on TC4 titanium alloy substrates.The microscopic morphologies,surface com...Magnetron sputtering deposition with regulated Cu target power was used for depositing Cu-containing high-entropy alloy nitride(Cu-(HEA)N)films on TC4 titanium alloy substrates.The microscopic morphologies,surface compositions,and thicknesses of the films were characterized using SEM+EDS;the anti-corrosion,wear resistance and antibacterial properties of the films in simulated seawater were investigated.The experimental results show that all four Cu-(HEA)N films are uniformly dense and contained nanoparticles.The film with Cu doping come into contact with oxygen in the air to form cuprous oxide.The corrosion resistance of the(HEA)N film without Cu doping on titanium alloy is better than the films with Cu doping.The Cu-(HEA)N film with Cu target power of 16 W shows the best wear resistance and antibacterial performance,which is attributed to the fact that Cu can reduce the coefficient of friction and exacerbate corrosion,and the formation of cuprous oxide has antibacterial properties.The findings of this study provide insights for engineering applications of TC4 in the marine field.展开更多
This study delves into ion behavior at the substrate position within RF magnetron discharges utilizing an indium tin oxide(ITO)target.The positive ion energies exhibit an upward trajectory with increasing RF power,att...This study delves into ion behavior at the substrate position within RF magnetron discharges utilizing an indium tin oxide(ITO)target.The positive ion energies exhibit an upward trajectory with increasing RF power,attributed to heightened plasma potential and initial emergent energy.Simultaneously,the positive ion flux escalates owing to amplified sputtering rates and electron density.Conversely,negative ions exhibit broad ion energy distribution functions(IEDFs)characterized by multiple peaks.These patterns are clarified by a combination of radiofrequency oscillation of cathode voltage and plasma potential,alongside ion transport time.This elucidation finds validation in a one-dimensional model encompassing the initial ion energy.At higher RF power,negative ions surpassing 100 e V escalate in both flux and energy,posing a potential risk of sputtering damages to ITO layers.展开更多
The mechanical and frictional properties of ta-C coatings deposited on the substrate surface affect applications in the field of cutting tools and wear-resistant components.In this paper,the effect of bias parameters ...The mechanical and frictional properties of ta-C coatings deposited on the substrate surface affect applications in the field of cutting tools and wear-resistant components.In this paper,the effect of bias parameters on the performance of ta-C coatings was investigated based on high power impulse magnetron sputtering(HiPIMS)technology.The results show that bias voltage has a significant effect on the deposition rate,structure,and wear resistance of the coating.In the range of bias voltage−50 V to−200 V,the ta-C coating performance was the best under bias voltage−150 V.The thickness reached 530.4 nm,the hardness value reached 35.996 GPa,and the bonding force in-creased to 14.2 N.The maximum sp3 bond content was 59.53% at this condition.展开更多
为探究陕西眉县所产猕猴桃中矿物质含量及评价其相关营养价值。利用电感耦合等离子体发射光谱(ICP-OES)法对陕西眉县主产的徐香、翠香、红心、黄心四个品种猕猴桃中9种矿物质含量进行测定,并采用营养质量指数法(Index of nutritional qu...为探究陕西眉县所产猕猴桃中矿物质含量及评价其相关营养价值。利用电感耦合等离子体发射光谱(ICP-OES)法对陕西眉县主产的徐香、翠香、红心、黄心四个品种猕猴桃中9种矿物质含量进行测定,并采用营养质量指数法(Index of nutritional quality,INQ)对矿物质元素进行营养评价,同时应用SPSS软件对9种矿物质和能量进行相关性分析。陕西眉县四个品种猕猴桃矿物质均以钾、磷、钙、镁四种元素为主,约占总矿物质的99.8%,四个品种中INQ均大于1的矿物质有钙、钾、镁、铜,其中钾的INQ最高在3.89~5.19。矿物总量最高的品种为翠香328 mg/100g,但营养质量指数最高的为徐香16.78(INQ_(总))。通过相关性分析表明各元素间存在着不同程度的相关性,其中钾与能量的相关系数最高为0.982。猕猴桃是一种高钾低钠的优质食品,不同品种猕猴桃矿物质元素的营养价值差异明显,矿物质营养密度最高的为翠香,其次为红心、黄心、徐香,但从营养价值指数方面来看,徐香最高,翠香次之,红心和黄心猕猴桃矿物营养水平稍逊。展开更多
增益(Gain)校正有助于消除MC-ICP-MS不同高阻放大器之间的阻值差异,进而提高同位素分析的精度和准确度,但有关Gain的偏移和校正频率对同位素测试的影响和作用原理还缺乏系统认识。本研究结合本实验室Neptune Plus MC-ICP-MS的Gain校正数...增益(Gain)校正有助于消除MC-ICP-MS不同高阻放大器之间的阻值差异,进而提高同位素分析的精度和准确度,但有关Gain的偏移和校正频率对同位素测试的影响和作用原理还缺乏系统认识。本研究结合本实验室Neptune Plus MC-ICP-MS的Gain校正数据,以实际测试的汞同位素数据为例,评估了放大器Gain校正系数偏移对同位素测试的影响。结果显示,当测试标样和样品的校正系数偏移幅度一致时,汞同位素测试结果基本无变化;当偏移幅度存在明显差异且单一放大器校正系数的相对偏移幅度超过–0.070‰~0.058‰时,汞同位素的测试结果大于分析误差。Gain校正系数单日的相对变化幅度(–0.028‰~0.028‰)可保证汞同位素测试结果小于分析误差,但长期的偏移却会导致汞同位素变化远超分析误差。此外,仪器的硬件、温度和真空度等也是Gain校正系数变化的重要影响因素,因此建议定期维护仪器,并每日进行Gain校正,以保证测试结果的稳定和准确。展开更多
稀土元素会对橡胶的性能造成影响,需加强监控。通过系统分析消解试剂、消解温度以及消解时间等因素对检测分析的影响,对设备工作功率、步距深度、冷却气流速、辅助气流速、雾化气流速等质谱参数进行优化筛选,利用在线内标手段校正基体...稀土元素会对橡胶的性能造成影响,需加强监控。通过系统分析消解试剂、消解温度以及消解时间等因素对检测分析的影响,对设备工作功率、步距深度、冷却气流速、辅助气流速、雾化气流速等质谱参数进行优化筛选,利用在线内标手段校正基体效应和信号漂移等问题,利用微敞开石墨消解技术结合电感耦合等离子体质谱仪,构建了测定天然橡胶制品中16种稀土元素含量的方法。微敞开石墨消解橡胶制品的较优处理条件以6 mL HNO_(3)、1 mL HClO_(4)和4 mL HF为消解试剂,采用三阶程序升温,消解最高温度至180℃,保温180 min。结果表明,稀土元素的检出限为0.0002~0.001 mg/kg,方法加标回收率在71.1%~90.9%,相对标准偏差RSD在3.8%~9.2%,各元素的标准曲线线性关系良好。与传统方法相比,微敞开石墨消解技术操作简便,可按照设定程序自动完成消解全过程,无需单独赶酸,工作效率较高,且具有成本低、检测范围宽、检出限低、处理效率高等优点,适用于橡胶制品中稀土元素的高通量检测。展开更多
基金Funded by Shenzhen-Hong Kong Innovative Collaborative Research and Development Program (Nos.SGLH20181109 110802117, CityU 9240014)Innovation Project of Southwestern Institute of Physics (Nos.202001XWCXYD002, 202301XWCX003)CNNC Young Talent Program (No.2023JZYF-01)。
文摘Surface metallization of glass fiber(GF)/polyetheretherketone(PEEK)[GF/PEEK] is conducted by coating copper using electroplating and magnetron sputtering and the properties are determined by X-ray diffraction(XRD), scanning electron microscopy(SEM), and electron backscatter diffraction(EBSD).The coating bonding strength is assessed by pull-out tests and scribing in accordance with GB/T 9286-1998.The results show that the Cu coating with a thickness of 30 μm deposited on GF/PEEK by magnetron sputtering has lower roughness, finer grain size, higher crystallinity, as well as better macroscopic compressive stress,bonding strength, and electrical conductivity than the Cu coating deposited by electroplating.
基金supported by the National Key Research and Development Program of China (No. 2020YFC2201101)the Shenzhen Key Laboratory of Intelligent Microsatellite Constellation (No. ZDSYS20210623091808026)Guangdong Basic and Applied Basic Research Foundation (No. 2021A1515110500)。
文摘Sputtering is a crucial technology in fields such as electric propulsion, materials processing and semiconductors. Modeling of sputtering is significant for improving thruster design and designing material processing control algorithms. In this study we use the hierarchical clustering analysis algorithm to perform cluster analysis on 17 descriptors related to sputtering. These descriptors are divided into four fundamental groups, with representative descriptors being the mass of the incident ion, the formation energy of the incident ion, the mass of the target and the formation energy of the target. We further discuss the possible physical processes and significance involved in the classification process, including cascade collisions, energy transfer and other processes. Finally, based on the analysis of the above descriptors, several neural network models are constructed for the regression of sputtering threshold E_(th), maximum sputtering energy E_(max) and maximum sputtering yield SY_(max). In the regression model based on 267 samples, the four descriptor attributes showed higher accuracy than the 17 descriptors(R^(2) evaluation) in the same neural network structure, with the 5×5 neural network structure achieving the highest accuracy, having an R^(2) of 0.92. Additionally, simple sputtering test data also demonstrated the generalization ability of the 5×5 neural network model, the error in maximum sputtering yield being less than 5%.
基金the financial support from the National Key Research and Development Program of China(No.2017YFB0305500)the State Key Laboratory of Powder Metallurgy,Central South University,Changsha,China.
文摘Pure cobalt(Co)thin films were fabricated by direct current magnetron sputtering,and the effects of sputtering power and pres-sure on the microstructure and electromagnetic properties of the films were investigated.As the sputtering power increases from 15 to 60 W,the Co thin films transition from an amorphous to a polycrystalline state,accompanied by an increase in the intercrystal pore width.Simultaneously,the resistivity decreases from 276 to 99μΩ·cm,coercivity increases from 162 to 293 Oe,and in-plane magnetic aniso-tropy disappears.As the sputtering pressure decreases from 1.6 to 0.2 Pa,grain size significantly increases,resistivity significantly de-creases,and the coercivity significantly increases(from 67 to 280 Oe),which can be attributed to the increase in defect width.Corres-pondingly,a quantitative model for the coercivity of Co thin films was formulated.The polycrystalline films sputtered under pressures of 0.2 and 0.4 Pa exhibit significant in-plane magnetic anisotropy,which is primarily attributable to increased microstress.
基金Funded by the National Natural Science Foundation of China(No.52071252)the Key Research and Development Plan of Shaanxi Province Industrial Project(Nos.2021GY-208,2022GY-407,and 2021ZDLSF03-11)the China Postdoctoral Science Foundation(No.2020M683670XB)。
文摘Magnetron sputtering deposition with regulated Cu target power was used for depositing Cu-containing high-entropy alloy nitride(Cu-(HEA)N)films on TC4 titanium alloy substrates.The microscopic morphologies,surface compositions,and thicknesses of the films were characterized using SEM+EDS;the anti-corrosion,wear resistance and antibacterial properties of the films in simulated seawater were investigated.The experimental results show that all four Cu-(HEA)N films are uniformly dense and contained nanoparticles.The film with Cu doping come into contact with oxygen in the air to form cuprous oxide.The corrosion resistance of the(HEA)N film without Cu doping on titanium alloy is better than the films with Cu doping.The Cu-(HEA)N film with Cu target power of 16 W shows the best wear resistance and antibacterial performance,which is attributed to the fact that Cu can reduce the coefficient of friction and exacerbate corrosion,and the formation of cuprous oxide has antibacterial properties.The findings of this study provide insights for engineering applications of TC4 in the marine field.
基金financial supports by National Natural Science Foundation of China(Nos.11975163 and 12175160)Nantong Basic Science Research-General Program(No.JC22022034)Natural Science Research Fund of Jiangsu College of Engineering and Technology(No.GYKY/2023/2)。
文摘This study delves into ion behavior at the substrate position within RF magnetron discharges utilizing an indium tin oxide(ITO)target.The positive ion energies exhibit an upward trajectory with increasing RF power,attributed to heightened plasma potential and initial emergent energy.Simultaneously,the positive ion flux escalates owing to amplified sputtering rates and electron density.Conversely,negative ions exhibit broad ion energy distribution functions(IEDFs)characterized by multiple peaks.These patterns are clarified by a combination of radiofrequency oscillation of cathode voltage and plasma potential,alongside ion transport time.This elucidation finds validation in a one-dimensional model encompassing the initial ion energy.At higher RF power,negative ions surpassing 100 e V escalate in both flux and energy,posing a potential risk of sputtering damages to ITO layers.
基金supported by the National Key R&D Program of China(No.2019YFE0123900)the National Natural Sci-ence Foundation of China(Grant No.51974069)the Special Fund for Basic Scientific Research of Central Colleges(N2125035).
文摘The mechanical and frictional properties of ta-C coatings deposited on the substrate surface affect applications in the field of cutting tools and wear-resistant components.In this paper,the effect of bias parameters on the performance of ta-C coatings was investigated based on high power impulse magnetron sputtering(HiPIMS)technology.The results show that bias voltage has a significant effect on the deposition rate,structure,and wear resistance of the coating.In the range of bias voltage−50 V to−200 V,the ta-C coating performance was the best under bias voltage−150 V.The thickness reached 530.4 nm,the hardness value reached 35.996 GPa,and the bonding force in-creased to 14.2 N.The maximum sp3 bond content was 59.53% at this condition.
文摘为探究陕西眉县所产猕猴桃中矿物质含量及评价其相关营养价值。利用电感耦合等离子体发射光谱(ICP-OES)法对陕西眉县主产的徐香、翠香、红心、黄心四个品种猕猴桃中9种矿物质含量进行测定,并采用营养质量指数法(Index of nutritional quality,INQ)对矿物质元素进行营养评价,同时应用SPSS软件对9种矿物质和能量进行相关性分析。陕西眉县四个品种猕猴桃矿物质均以钾、磷、钙、镁四种元素为主,约占总矿物质的99.8%,四个品种中INQ均大于1的矿物质有钙、钾、镁、铜,其中钾的INQ最高在3.89~5.19。矿物总量最高的品种为翠香328 mg/100g,但营养质量指数最高的为徐香16.78(INQ_(总))。通过相关性分析表明各元素间存在着不同程度的相关性,其中钾与能量的相关系数最高为0.982。猕猴桃是一种高钾低钠的优质食品,不同品种猕猴桃矿物质元素的营养价值差异明显,矿物质营养密度最高的为翠香,其次为红心、黄心、徐香,但从营养价值指数方面来看,徐香最高,翠香次之,红心和黄心猕猴桃矿物营养水平稍逊。
文摘增益(Gain)校正有助于消除MC-ICP-MS不同高阻放大器之间的阻值差异,进而提高同位素分析的精度和准确度,但有关Gain的偏移和校正频率对同位素测试的影响和作用原理还缺乏系统认识。本研究结合本实验室Neptune Plus MC-ICP-MS的Gain校正数据,以实际测试的汞同位素数据为例,评估了放大器Gain校正系数偏移对同位素测试的影响。结果显示,当测试标样和样品的校正系数偏移幅度一致时,汞同位素测试结果基本无变化;当偏移幅度存在明显差异且单一放大器校正系数的相对偏移幅度超过–0.070‰~0.058‰时,汞同位素的测试结果大于分析误差。Gain校正系数单日的相对变化幅度(–0.028‰~0.028‰)可保证汞同位素测试结果小于分析误差,但长期的偏移却会导致汞同位素变化远超分析误差。此外,仪器的硬件、温度和真空度等也是Gain校正系数变化的重要影响因素,因此建议定期维护仪器,并每日进行Gain校正,以保证测试结果的稳定和准确。
文摘稀土元素会对橡胶的性能造成影响,需加强监控。通过系统分析消解试剂、消解温度以及消解时间等因素对检测分析的影响,对设备工作功率、步距深度、冷却气流速、辅助气流速、雾化气流速等质谱参数进行优化筛选,利用在线内标手段校正基体效应和信号漂移等问题,利用微敞开石墨消解技术结合电感耦合等离子体质谱仪,构建了测定天然橡胶制品中16种稀土元素含量的方法。微敞开石墨消解橡胶制品的较优处理条件以6 mL HNO_(3)、1 mL HClO_(4)和4 mL HF为消解试剂,采用三阶程序升温,消解最高温度至180℃,保温180 min。结果表明,稀土元素的检出限为0.0002~0.001 mg/kg,方法加标回收率在71.1%~90.9%,相对标准偏差RSD在3.8%~9.2%,各元素的标准曲线线性关系良好。与传统方法相比,微敞开石墨消解技术操作简便,可按照设定程序自动完成消解全过程,无需单独赶酸,工作效率较高,且具有成本低、检测范围宽、检出限低、处理效率高等优点,适用于橡胶制品中稀土元素的高通量检测。