The suitability of indium gallium zinc oxide(IGZO) thin-film transistors(TFT) for implementation of active matrix display of organic light emitting diodes(AMOLED) compensation pixel circuits is addressed in this paper...The suitability of indium gallium zinc oxide(IGZO) thin-film transistors(TFT) for implementation of active matrix display of organic light emitting diodes(AMOLED) compensation pixel circuits is addressed in this paper. In particular, the impact of mobility on compensating performance for the implementation in AMOLED pixel circuits is investigated. Details of the effective mobility modeling using the power law of gate-to-source voltage are provided, and parameters are extracted according to the measured current-to-voltage data of IGZO TFT samples. The investigated AMOLED pixel circuit consists of 4 switching TFTs, 1 driving TFT, and 1 capacitor. A "source-follower" structure is used for the threshold voltage extraction of the driving transistor. A new timing diagram is proposed; thus the current error of the pixel circuit is almost independent of the effective mobility. But, to improve the precision of the threshold voltage extraction of the driving transistor, the mobility is required to be greater than5 cm^2 V^(-1) s^(-1). On the other hand, the optimized storage capacitance is reversely proportional to the effective mobility. Thus, the layout area of the pixel circuit can be decreased from 100 × 100 to 100 × 68 μm2, with the effective mobility increased from 10 to50 cm^2 V^(-1) s^(-1). Therefore, IGZO TFT is a good alternative backplane technology for AMOLED displays, and a higher effective mobility is preferred for high compensation performance and compact layout.展开更多
随着人们进入信息时代,半导体技术快速发展,对薄膜晶体管(Thin film transistor,简称TFT)的性能要求逐渐提高.IGZO由于具有较高的载流子迁移率、相对良好的均匀性等优势而受到广泛关注;而传统的真空技术制备薄膜晶体管,因制备工艺复杂...随着人们进入信息时代,半导体技术快速发展,对薄膜晶体管(Thin film transistor,简称TFT)的性能要求逐渐提高.IGZO由于具有较高的载流子迁移率、相对良好的均匀性等优势而受到广泛关注;而传统的真空技术制备薄膜晶体管,因制备工艺复杂、制备成本高等问题,在快速发展的信息时代逐渐显露出局限性,本文采用制备工艺更为简单的溶液法在Si/SiO_(2)基底上制备IGZO有源层薄膜,并测试不同退火温度(450℃,550℃,650℃)条件下对薄膜性能的影响.结果表明,适当提高退火温度可以有效改善IGZO-TFT器件的电学性能,本实验测试得出:当溶液法制备薄膜在550℃退火温度下退火器件性能最优,溶液法制备的器件电流开关闭达到105,器件性能相对比较稳定.展开更多
基金supported by National Natural Science Foundation of China (No. 61404002)the Shenzhen Municipal Scientific Program (No. JCYJ20150626111117384)
文摘The suitability of indium gallium zinc oxide(IGZO) thin-film transistors(TFT) for implementation of active matrix display of organic light emitting diodes(AMOLED) compensation pixel circuits is addressed in this paper. In particular, the impact of mobility on compensating performance for the implementation in AMOLED pixel circuits is investigated. Details of the effective mobility modeling using the power law of gate-to-source voltage are provided, and parameters are extracted according to the measured current-to-voltage data of IGZO TFT samples. The investigated AMOLED pixel circuit consists of 4 switching TFTs, 1 driving TFT, and 1 capacitor. A "source-follower" structure is used for the threshold voltage extraction of the driving transistor. A new timing diagram is proposed; thus the current error of the pixel circuit is almost independent of the effective mobility. But, to improve the precision of the threshold voltage extraction of the driving transistor, the mobility is required to be greater than5 cm^2 V^(-1) s^(-1). On the other hand, the optimized storage capacitance is reversely proportional to the effective mobility. Thus, the layout area of the pixel circuit can be decreased from 100 × 100 to 100 × 68 μm2, with the effective mobility increased from 10 to50 cm^2 V^(-1) s^(-1). Therefore, IGZO TFT is a good alternative backplane technology for AMOLED displays, and a higher effective mobility is preferred for high compensation performance and compact layout.
文摘随着人们进入信息时代,半导体技术快速发展,对薄膜晶体管(Thin film transistor,简称TFT)的性能要求逐渐提高.IGZO由于具有较高的载流子迁移率、相对良好的均匀性等优势而受到广泛关注;而传统的真空技术制备薄膜晶体管,因制备工艺复杂、制备成本高等问题,在快速发展的信息时代逐渐显露出局限性,本文采用制备工艺更为简单的溶液法在Si/SiO_(2)基底上制备IGZO有源层薄膜,并测试不同退火温度(450℃,550℃,650℃)条件下对薄膜性能的影响.结果表明,适当提高退火温度可以有效改善IGZO-TFT器件的电学性能,本实验测试得出:当溶液法制备薄膜在550℃退火温度下退火器件性能最优,溶液法制备的器件电流开关闭达到105,器件性能相对比较稳定.
