CuInS2 thin films have been prepared by ion layer gas reaction (ILGAR) using C2H5OH as solvent, CuC1and InCl3 as reagents and H2S gas as sulfuration source. The effects of cationic concentrations and numbers of cycle ...CuInS2 thin films have been prepared by ion layer gas reaction (ILGAR) using C2H5OH as solvent, CuC1and InCl3 as reagents and H2S gas as sulfuration source. The effects of cationic concentrations and numbers of cycle on the properties of CuInS2 film were investigated. The chemical composition, crystalline structure, surface topography, deposited rate, optical and electronic properties of the films were characterized by X-ray diffractrometry (XRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), ultraviolet-visible spectrometry (UV-Vis) and Hall System. The results show that the crystalline of CuInS2 thin films and the deposition rate have been improved with the increase of cationic concentration, while CuxS segregation phases appear with further increasing cationic concentration. The deposition rate is close to constant as cationic concentration is fixed.CuInS2 thin film derived form lower cationic concentration is uniform, compact and good in adhesion to the substrates. The absorption coefficient of CuInS2 thin films is larger than 104 cm^-1, and the band gap Eg is in the range of 1.30-1.40 eV. The dark resisitivity of the thin film decreases from 50 to 10 Ω·cm and the carrier concentration ranges are over 10^16 cm^-3.展开更多
CdS thin films were deposited by the ion layer gas reaction (TLGAR) method.Structural, chemical, topographical development as well as optical and electrical properties ofas-deposited and annealed thin films were inves...CdS thin films were deposited by the ion layer gas reaction (TLGAR) method.Structural, chemical, topographical development as well as optical and electrical properties ofas-deposited and annealed thin films were investigated by XRD, SEM, XPS, AFM and UV-VIS. The resultsshowed that the thin films are uniform, compact and good in adhesion to the substrates, and thegrowth of the films is 2.8 nm/cycle. The evolution of structure undergoes from the cubic structureto the hexagonal one with a preferred orientation along the (002) plane after annealing at 673 K. Anamount of C, O and Cl impurities can be reduced by increasing the drying temperature or byannealing in N2 atmosphere. It was found that the band gap of the CdS films shifts to higherwavelength after annealing or increasing film thickness. The electrical resistivity decreases withincreasing annealing temperature and film thickness.展开更多
CdS thin films were deposited by ILGAR （ ion lay gas reaction） method. The effect of annealing temperature under N2 atmosphere on the structural, chemical, topographical development and optical and electrical prope...CdS thin films were deposited by ILGAR （ ion lay gas reaction） method. The effect of annealing temperature under N2 atmosphere on the structural, chemical, topographical development and optical and electrical properties of CdS thin films was investigated by XRD, SEM, XPS, UV- VIS and two-probe technique. It is found that the cubic-phase of as-deposited CdS film transforms to hexagonal phase with a perfected orientation along （002） plane at 300 ℃ . The band gap decreases with increasing annealing temperature until 300 ℃ , which is consistent with the grain growth. The fall of dark and light resistivitiy is obvious with increasing annealing temperature, corresponding to the continuous grain growth and deviation of stoichiometry at higher temperature. The smooth and uniform surface of as-deposited films becomes rougher through thermal treatment, which is related to grain growth and sublimation of CdS at a higher annealing temperature.展开更多
文摘CuInS2 thin films have been prepared by ion layer gas reaction (ILGAR) using C2H5OH as solvent, CuC1and InCl3 as reagents and H2S gas as sulfuration source. The effects of cationic concentrations and numbers of cycle on the properties of CuInS2 film were investigated. The chemical composition, crystalline structure, surface topography, deposited rate, optical and electronic properties of the films were characterized by X-ray diffractrometry (XRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), ultraviolet-visible spectrometry (UV-Vis) and Hall System. The results show that the crystalline of CuInS2 thin films and the deposition rate have been improved with the increase of cationic concentration, while CuxS segregation phases appear with further increasing cationic concentration. The deposition rate is close to constant as cationic concentration is fixed.CuInS2 thin film derived form lower cationic concentration is uniform, compact and good in adhesion to the substrates. The absorption coefficient of CuInS2 thin films is larger than 104 cm^-1, and the band gap Eg is in the range of 1.30-1.40 eV. The dark resisitivity of the thin film decreases from 50 to 10 Ω·cm and the carrier concentration ranges are over 10^16 cm^-3.
文摘CdS thin films were deposited by the ion layer gas reaction (TLGAR) method.Structural, chemical, topographical development as well as optical and electrical properties ofas-deposited and annealed thin films were investigated by XRD, SEM, XPS, AFM and UV-VIS. The resultsshowed that the thin films are uniform, compact and good in adhesion to the substrates, and thegrowth of the films is 2.8 nm/cycle. The evolution of structure undergoes from the cubic structureto the hexagonal one with a preferred orientation along the (002) plane after annealing at 673 K. Anamount of C, O and Cl impurities can be reduced by increasing the drying temperature or byannealing in N2 atmosphere. It was found that the band gap of the CdS films shifts to higherwavelength after annealing or increasing film thickness. The electrical resistivity decreases withincreasing annealing temperature and film thickness.
基金Funded by the Tianjin Key Research Foundarion( Grant No.033802311)
文摘CdS thin films were deposited by ILGAR （ ion lay gas reaction） method. The effect of annealing temperature under N2 atmosphere on the structural, chemical, topographical development and optical and electrical properties of CdS thin films was investigated by XRD, SEM, XPS, UV- VIS and two-probe technique. It is found that the cubic-phase of as-deposited CdS film transforms to hexagonal phase with a perfected orientation along （002） plane at 300 ℃ . The band gap decreases with increasing annealing temperature until 300 ℃ , which is consistent with the grain growth. The fall of dark and light resistivitiy is obvious with increasing annealing temperature, corresponding to the continuous grain growth and deviation of stoichiometry at higher temperature. The smooth and uniform surface of as-deposited films becomes rougher through thermal treatment, which is related to grain growth and sublimation of CdS at a higher annealing temperature.
