Low Crosstalk Three-Color Infrared Detector by Controlling the Minority Carriers Type of InAs/GaSb Superlattices for Middle-Long and Very-Long Wavelength

We report a type-Ⅱ InAs/GaSb superlattice three-color infrared detector for mid-wave （MW）, long-wave （LW）, and very long-wave （VLW） detections. The detector structure consists of three contacts of NIPIN architecture for MW and LW detections, and hetero-junction NIP architecture for VLW detection. It is found that the spectral crosstalks can be significantly reduced by controlling the minority carriers transport via doping beryllium in the two active regions of NIPIN section. The crosstalk detection at MW, LW, and VLW signals are achieved by selecting the bias voltages on the device. At 77K, the cutoff wavelengths of the three-color detection are 5.3μm （at OmV）, 141μm （at 300mV） and 19μm （at -20mV） with the detectivities of 4.6xlO11 cm.Hzl/ZW-1, 2.3×10^10 cm.Hzl/2W-1, and 1.0×10^10cm.Hzl/2W-1 for MW, LW and VLW. The crosstalks of the MW channel, LW channel, and VLW channel are almost 0, 0.25, and 0.6, respectively.

Effect of Interface Bond Type on the Structure of InAs/GaSb Superlattices Grown by Metalorganic Chemical Vapor Deposition

InAs/GaSb type-II superlattices were grown on(100)GaSb substrates by metalorganic chemical vapor deposition.Raman scattering spectroscopy reveals that it is possible to grow superlattices with almost pure GaAs-like and mixed-like(plane of mixed As and Sb atoms that connect the GaSb and InAs layers)interfaces.Introducing the InSb-like interface results in nanopipes and As contamination of the GaSb layers.X-ray diffraction and atomic force microscopy demonstrate that the superlattices with a mixed-like interface have better morphology and crystalline quality.

Metalorganic Chemical Vapor Deposition Growth of InAs/GaSb Superlattices on GaAs Substrates and Doping Studies of P-GaSb and N-InAs

InAs/GaSb type-Ⅱ superlattices (SLs),Zn-doped GaSh and Si-doped InAs were grown on semi-insulating (001) GaAs substrates by metalorganic chemical vapor deposition.X-ray diffraction reveals that complete strain compensation between the SLs and the GaSb buffer layer is achieved in our SL samples.The relationship between the hole concentration p in GaSb and the diethylzinc (DEZn) flow rate is poc[DEZn]0.57.The electron concentration in InAs does not show good linearity with the SiH4 flow rate.The growth rate of the p-GaSb epilayer is decreased as the DEZn mole fraction increases,while the growth rate of the n-InAs epilayer is weakly dependent on the SiH4 flow rate.

Performance of dual-band short-or mid-wavelength infrared photodetectors based on InGaAsSb bulk materials and InAs/GaSb superlattices

In this paper,we demonstrate bias-selectable dual-band short-or mid-wavelength infrared photodetectors based on In0.24Ga0.76As0.21Sb0.79 bulk materials and InAs/GaSb type-II superlattices with cutoff wavelengths of 2.2μm and 3.6μm,respectively.At 200 K,the short-wave channel exhibits a peak quantum efficiency of 42%and a dark current density of5.93×10^-5）/cm^2at 500 mV,thereby providing a detectivity of 1.55×10^11cm·Hz^1/2/W.The mid-wave channel exhibits a peak quantum efficiency of 31%and a dark current density of 1.22×10^-3A/cm^2at-300 mV,thereby resulting in a detectivity of 2.71×10^10cm·Hz^1/2/W.Moreover,we discuss the band alignment and spectral cross-talk of the dual-band n-i-p-p-i-n structure.

1280×1024元InAs/GaSb II类超晶格中/中波双色红外焦平面探测器

本文报道了1280×1024元InAs/GaSb II类超晶格中/中波双色红外焦平面阵列探测器的研究结果。探测器采用PN-NP叠层双色外延结构,信号提取采用叠层双色结构和顺序读出方式。运用分子束外延技术在GaSb衬底上生长超晶格材料,双波段红外吸收区的超晶格周期结构分别为中波1:6 ML InAs/7 ML GaSb和中波2:9 ML InAs/7 ML GaSb。焦平面阵列像元中心距为12μm。在80 K时测试,器件双波段的工作谱段为中波1:3~4μm,中波2:3.8~5.2μm。中波1器件平均峰值探测率达到6.32×10^(11) cm·Hz^(1/2)W^(-1),中波2器件平均峰值探测率达到2.84×10^(11) cm·Hz^(1/2)W^(-1)。红外焦平面偏压调节成像测试得到清晰的双波段成像。本文是国内首次报道1280×1024规模InAs/GaSb II类超晶格中/中波双色红外焦平面探测器。

InAs/GaSb Ⅱ类超晶格材料的Si离子注入研究

Ⅱ类超晶格红外探测器一般通过台面结实现对红外辐射的探测,而通过离子注入实现横向PN结,一方面材料外延工艺简单,同时可以利用超晶格材料横向扩散长度远高于纵向的优势改善光生载流子的输运,且易于制作高密度平面型阵列。本文利用多种材料表征技术,研究了不同能量的Si离子注入以及退火前后对InAs/GaSb Ⅱ类超晶格材料性能的影响。研究通过Si离子注入,外延材料由P型变为N型,超晶格材料中产生了垂直方向的拉伸应变,晶格常数变大,且失配度随着注入能量的增大而增大,注入前失配度为-0.012%,当注入能量到200 keV时,失配度达到0.072%,超晶格部分弛豫,弛豫程度为14%,而在300℃ 60 s退火后,超晶格恢复完全应变状态,且晶格常数变小,这种张应变是退火引起的Ga-In相互扩散以及Si替位导致的晶格收缩而造成的。

Structural design of mid-infrared waveguide detectors based on InAs/GaAsSb superlattice

In the realm of near-infrared spectroscopy,the detection of molecules has been achieved using on-chip waveguides and resonators.In the mid-infrared band,the integration and sensitivity of chemical sensing chips are often constrained by the reliance on off-chip light sources and detectors.In this study,we demonstrate an InAs/GaAsSb superlattice mid-infrared waveguide integrated detector.The GaAsSb waveguide layer and the InAs/GaAsSb superlattice absorbing layer are connected through evanescent coupling,facilitating efficient and highquality detection of mid-infrared light with minimal loss.We conducted a simulation to analyze the photoelectric characteristics of the device.Additionally,we investigated the factors that affect the integration of the InAs/GaAs⁃Sb superlattice photodetector and the GaAsSb waveguide.Optimal thicknesses and lengths for the absorption lay⁃er are determined.When the absorption layer has a thickness of 0.3μm and a length of 50μm,the noise equiva⁃lent power reaches its minimum value,and the quantum efficiency can achieve a value of 68.9%.The utilization of waveguide detectors constructed with Ⅲ-Ⅴ materials offers a more convenient means of integrating mid-infra⁃red light sources and achieving photoelectric detection chips.

Interface effect on superlattice quality and optical properties of InAs/GaSb type-Ⅱ superlattices grown by molecular beam epitaxy

We systematically investigate the influence of InSb interface(IF)engineering on the crystal quality and optical properties of strain-balanced InAs/GaSb type-Ⅱsuperlattices(T2SLs).The type-Ⅱsuperlattice structure is 120 periods InAs(8 ML)/GaSb(6 ML)with different thicknesses of InSb interface grown by molecular beam epitaxy(MBE).The highresolution x-ray diffraction(XRD)curves display sharp satellite peaks,and the narrow full width at half maximum(FWHM)of the 0th is only 30-39 arcsec.From high-resolution cross-sectional transmission electron microscopy(HRTEM)characterization,the InSb heterointerfaces and the clear spatial separation between the InAs and GaSb layers can be more intuitively distinguished.As the InSb interface thickness increases,the compressive strain increases,and the surface“bright spots”appear to be more apparent from the atomic force microscopy(AFM)results.Also,photoluminescence(PL)measurements verify that,with the increase in the strain,the bandgap of the superlattice narrows.By optimizing the InSb interface,a high-quality crystal with a well-defined surface and interface is obtained with a PL wavelength of 4.78μm,which can be used for mid-wave infrared(MWIR)detection.

Growth and fabrication of a mid-wavelength infrared focal plane array based on type-II InAs/GaSb superlattices

We present the fabrication of a mid-wavelength infrared focal plane array （FPA） based on type-II InAs/GaSb strain layer superlattices （SLs）. The detectors contain a 400-period 8 ML InAs/8 ML GaSb SL active layer, which is grown by solid source molecular beam epitaxy on GaSb （100） N type substrates. Lattice mismatch between the superlattices and GaSb substrate achieves 148.9 ppm. The full width at half maximum of the first or- der satellite peak from X-ray diffraction was 28 arcsec. Single element detectors and FPA with a 128 x 128 pixels were fabricated using citric acid based solution wet chemical etching. Chemical and physical passivation effectively reduces the surface leakage and this process was characterized by I-V measurement. The devices showed a 50% cut-off wavelength of 4.73 μm at 77 K. The photodiode exhibited an RoA of 103 f2. cm2. The FPA was characterized with an integration time of 0.5 ms and F/2.0 optics at 77 K and the average blackbody detectivity of the detectors is 2.01 × 10^9 cm.Hz^1/2/W.

InAs/GaSbⅡ类超晶格长波红外探测器研究进展

本文系统报道了基于InAs/GaSbⅡ类超晶格(T2SLs)的长波红外探测器的研究进展。从衬底、材料生长以及器件性能角度对比分析了基于GaSb、InAs衬底的各种器件结构的优缺点。分析结果表明,以InAs为衬底、吸收区材料为InAs/InAs1-xSbx、PB1IB2N型的结构为相对优化的器件结构设计,结合ZnS和Ge的多层膜结构设计或者重掺杂缓冲层,同时采用电感耦合等离子体(inductively coupled plasma)干法刻蚀工艺,该器件的50%截止波长可达12μm,量子效率(quantum efficiency)可提升到65%以上,暗电流密度降低至1×10^(-5) A/cm^(2)。并归纳总结了InAs/GaSb T2SLs长波红外探测器未来的发展趋势。

Comparison of short period InAs/GaSb superlattices on GaSb and GaAs substrates

Type II superlattices (SLs) short period InAs(4ML)/GaSb(8ML) were grown by molecular-beam epitaxy on lattice-mismatched GaAs substrates and on GaSb substrates. A smooth GaSb epilayer was formed on GaAs substrates by inserting mulit-buffer layers including an interfacial misfit mode AlSb quantum dot layer and AlSb/GaSb superlattices smooth layer. SLs grown on GaAs substrates (GaAs-based SLs) showed well-resolved satellite peaks in XRD. GaSb-based SLs with better structural quality and smoother surface showed strong photoluminescence at 2.55 μm with a full width at half maximum (FWHM) of 20 meV, narrower than 31 meV of GaAs-based SLs. Inferior optical absorption of GaAs-based SL was observed in the range of 2―3 μm. Photoresponse of GaSb-based SLs showed the cut-off wavelength at 2.6 μm.

InAs/GaSbⅡ类超晶格双色红外焦平面器件的干法刻蚀与湿法腐蚀制备对比研究

分别采用干法刻蚀工艺路线和湿法腐蚀工艺路线制备了面阵规模为320×256、像元中心距为30μm的InAs/GaSbⅡ类超晶格长/长波双色红外焦平面器件,并对其台面形貌、接触孔形貌、伏安特性以及互连读出电路并封入杜瓦后的中测性能进行了对比研究。总结了采用干法工艺和湿法工艺制备双色InAs/GaSbⅡ类超晶格焦平面器件的特点。该研究对InAs/GaSbⅡ类超晶格焦平面器件的研制具有参考意义。

Growth Optimization, Strain Compensation and Structure Design of InAs/GaSb Type-II Superlattices for Mid-Infrared Imaging

InAs/GaSb type-II superlattce (T2SL) photodetector structures at the MWIR regime were grown by molecular beam epitaxy. The growth temperature and group-V soaking times were optimized with respect to interface and transport quality. Novel strain compensation schemes with insertion of InSb layers were proposed and tested to be efficient to tune the overall strain between tensile and compressive without degradation of interface and optical quality. The effect of the proposed methods is modeled by analytic functions.? Band structure calculations were also carried out for the proposed T2SL structures to assist optimizing sample designs. Single pixel photodiodes with a low dark current were demonstrated.

基于AlAsSb/InAsSb超晶格势垒的InAs/InAsSbⅡ类超晶格nBn中波红外探测器

InAs/InAsSbⅡ类超晶格避免了InAs/GaSbⅡ类超晶格中与Ga原子相关的缺陷复合中心,具有更高的少数载流子寿命,在高工作温度中波红外探测器制备方面有着良好的应用前景。少数载流子单极势垒结构通常被用来抑制探测器暗电流,如nBn结构探测器。在InAs/InAsSbⅡ类超晶格nBn中波红外光电探测器中,势垒层常采用AlAsSb等多元合金材料,阻挡多数载流子的输运。然而,势垒层与吸收层存在的价带偏移(VBO)使得光电流往往需要在大偏压下饱和,从而增大了探测器暗电流。本文设计了一种AlAsSb/InAsSb超晶格势垒,旨在消除VBO并降低量子效率对偏压的依赖性。研究结果显示,150 K下,设计制备的nBn光电探测器的50%截止波长为4.5μm,探测器光响应在-50 mV的小反向偏压下达到了饱和,3.82μm处的峰值响应度为1.82 A/W,对应量子效率为58.8%。在150 K和-50 mV偏压下,探测器的暗电流密度为2.01×10^(-5)A/cm^(2),计算得到在3.82μm的峰值探测率为6.47×10^(11)cm·Hz^(1/2)/W。

MBE growth of high absorption mid-IR type-II InAs/GaSb superlattices

Two kinds of short-period type II superlattices(SLs)InAs(6 monolayers(MLs))/GaSb(3 MLs)and InAs(8 MLs)/GaSb(8 MLs)which can serve for mid-infrared(MIR)detection have been grown by molecular beam epitaxy(MBE)on p-type GaSb(100)substrates.The cutoff wavelength for the two superlattices(SLs)was found to be around 4.8 lm at 300 K.The high resolution X-ray diffraction(HRXRD)measurements indicated that the InAs(8 MLs)/GaSb(8 MLs)SLs have better crystalline quality than that of the InAs(6 MLs)/GaSb(3 MLs)SLs.However,compared with infrared absorption in the 2.5–4.3 lm range,the optical absorption of InAs(6 MLs)/GaSb(3MLs)SLs was more excellent.This can be attributed to increase probability of the electron and hole wave function overlap in the thinner period thickness.

Long-Period InAs/GaSb Type-II Superlattices for Terahertz Application

We present a theoretical study on the terahertz (THz) optoelectronic properties of long-period InAs/GaSb type-II super lattices (SLs). The eight-band k·p model is used to calculate the electronic structures of such SLs and on the basis of band structures, the Boltzmann equation approach is employed to calculate the optical absorption coefficients for the corresponding SL systems. It is found that long-period InAs/GaSb type-II SLs have a considerable absorption in the THz bandwidth. By examining the dependence of THz absorption coefficient on the InAs/GaSb layer widths, we demonstrate that with a proper choice of InAs/GaSb layer widths, an optimized THz absorption can be achieved. This study is pertinent to the potential application of InAs/GaSb type-II SLs as THz photo detectors.

Etching mask optimization of InAs/GaSb superlattice mid-wavelength infared 640×512 focal plane array

In this paper we focused on the mask technology of inductively coupled plasma（ICP） etching for the mesa fabrication of infrared focal plane arrays（FPA）.By using the SiO_2 mask,the mesa has higher graphics transfer accuracy and creates less micro-ripples in sidewalls.Comparing the IV characterization of detectors by using two different masks,the detector using the SiO_2 hard mask has the R_0A of 9.7×10~6 Ω·cm^2,while the detector using the photoresist mask has the R_0A of3.2 × 10~2 Ω·cm^2 in 77 K.After that we focused on the method of removing the remaining SiO_2 after mesa etching.The dry ICP etching and chemical buffer oxide etcher（BOE） based on HF and NH4 F are used in this part.Detectors using BOE only have closer R_0A to that using the combining method,but it leads to gaps on mesas because of the corrosion on AlSb layer by BOE.We finally choose the combining method and fabricated the 640×512 FPA.The FPA with cutoff wavelength of 4.8 μm has the average R_0A of 6.13 × 10~9 Ω·cm^2 and the average detectivity of 4.51 × 10~9 cm·Hz^（1/2）.W^（-1）at 77 K.The FPA has good uniformity with the bad dots rate of 1.21%and the noise equivalent temperature difference（NEDT） of 22.9 mK operating at 77 K.

Effect of compensation doping on the electrical and optical properties of mid-infrared type-II InAs/GaSb superlattice photodetectors

This paper presents a theoretical study on the electrical and optical properties of mid-infrared type-II InAs/GaSb superlattices with different beryllium concentrations in the InAs layer of the active region. Dark current, resistancearea product, absorption coefficient and quantum efficiency characteristics are thoroughly examined. The superlattice is residually n-type and it becomes slightly p-type by varying beryllium-doping concentrations, which improves its electrical performances. The optical performances remain almost unaffected with relatively low p-doping levels and begin to deteriorate with increasing p-doping density. To make a compromise between the electrical and optical performances, the photodetector with a doping concentration of 3 ×10^15 cm-3 in the active region is believed to have the best overall performances.

nBn结构InAs/GaSb超晶格中/长双波段探测器优化设计

双波段红外探测可对复杂的红外背景进行抑制,在军用目标识别、医疗诊断和污染监测等方面有重要应用价值。基于二类超晶格的双波段红外探测器在成本和性能方面具有很大的优势,成为新型红外探测器领域的研究热点。然而其暗电流和串扰会极大地影响双波段红外探测器的性能。因此,设计了nBn结构的InAs/GaSb超晶格中/长波双波段红外探测器,通过仿真比较不同结构的器件在不同偏压下的中波/长波通道的响应率和暗电流大小,分析势垒层厚度、吸收层厚度、不同区域的掺杂对暗电流和串扰的影响,从而得到最佳的模型参数达到减小暗电流和降低串扰的效果。仿真结果显示:nBn结构的中/长波双波段红外探测器在77 K下,中波通道的暗电流密度为4.5×10^(-5)A·cm^(-2),在0.3 V偏压下,2μm处的峰值量子效率为64%,探测率可以达到3.9×10^(11)cm·Hz^(1/2)·W^(-1);长波通道的暗电流密度为1.3×10^(-4)A·cm^(-2),在-0.3 V的偏压下,5.6μm处的峰值量子效率为48%,探测率可以达到4.1×10^(11)cm·Hz^(1/2)·W^(-1)。相关结论可为器件设计和加工提供参考。

原子层沉积Al_(2)O_(3)钝化对InAs/InGaAsSbⅡ类超晶格发光特性的影响

提出一种基于干法刻蚀与原子层沉积相结合的钝化方法,采用干法刻蚀去除InAs/InGaAsSb超晶格表面及端面固有的氧化层,利用原子层沉积Al_(2)O_(3)薄膜钝化刻蚀表面,对钝化前后光致发光光谱的表征研究其发光性能与长期稳定性。处理后超晶格的As 3d谱中As-O键相关的峰消失表明其表面的氧化物被有效去除。样品的发光强度与激发光功率之间的拟合系数α从1.17减小为1.02,表明激子主导的发光占比增加。连续五天的红外光谱测试发现,处理后样品发光强度降低为原来的89%,而未处理样品的发光强度降低为原来的76%,表明处理后超晶格表现出更好发光稳定性。本研究为提升InAs/InGaAsSb超晶格性能、促进其光电探测领域的应用提供参考。