We fabricate a GaAs-based InGaAs/InGaAsP multiple quantum wells （MQWs） laser at 1.55 pm. Using two-step growth method and thermal cyclic annealing, a thin low-temperature InP layer and a thick InP buffer layer are g...We fabricate a GaAs-based InGaAs/InGaAsP multiple quantum wells （MQWs） laser at 1.55 pm. Using two-step growth method and thermal cyclic annealing, a thin low-temperature InP layer and a thick InP buffer layer are grown on GaAs substrates by low-pressure metal organic chemical vapor deposition technology. Then, high- quality MQWs laser structures are grown on the InP buffer layer. Under quasi-continuous wave （QCW） condition, a threshold current of 476 mA and slope efficiency of 0.15 mW/mA are achieved for a broad area device with 50 μm wide strip and 500 μm long cavity at room-temperature. The peak wavelength of emission spectrum is 1549.5 nm at 700 mA. The device is operating for more than 2000 h at room-temperature and 600 mA.展开更多
基金supported by the National Natural Science Foundation of China(Nos.61274044 and61020106007)the National Basic Research Program of China(No.2010CB327600)+3 种基金the Natural Science Foundational Science and Technology Cooperation Projects(No.2011RR000100)the 111 Project of China(No.B07005)the Fundamental Research Funds for the Central University(No.2013RC1205)the Specialized Research Fund for the Doctoral Program of Higher Education(No.20130005130001)
文摘We fabricate a GaAs-based InGaAs/InGaAsP multiple quantum wells （MQWs） laser at 1.55 pm. Using two-step growth method and thermal cyclic annealing, a thin low-temperature InP layer and a thick InP buffer layer are grown on GaAs substrates by low-pressure metal organic chemical vapor deposition technology. Then, high- quality MQWs laser structures are grown on the InP buffer layer. Under quasi-continuous wave （QCW） condition, a threshold current of 476 mA and slope efficiency of 0.15 mW/mA are achieved for a broad area device with 50 μm wide strip and 500 μm long cavity at room-temperature. The peak wavelength of emission spectrum is 1549.5 nm at 700 mA. The device is operating for more than 2000 h at room-temperature and 600 mA.
