Indium selenide(InSe),as a wide-bandgap semiconductor,has received extensive attention in the flexible electronics field in recent years due to its exceptional plasticity and promising thermoelectric performance.Howev...Indium selenide(InSe),as a wide-bandgap semiconductor,has received extensive attention in the flexible electronics field in recent years due to its exceptional plasticity and promising thermoelectric performance.However,the low carrier concentration severely limits its thermoelectric performance improvement.In this work,we conducted contrasting strategies that can be employed to increase the carrier concentration of InSe,including bandgap narrowing and heterovalent doping.Specifically,the carrier concentration initially increases as a result of the reduced bandgap upon Te alloying and then slightly decreases due to the weak electronegativity of Te.Whereas Br doping realizes high carrier concentration by pushing the Fermi level into the conduction bands and activating the multiple bands.On the other hand,both Te and Br obviously suppress the thermal conductivity due to the point defect scattering.By contrast,Br doping realizes a higher thermoelectric performance with a maximum ZT of~0.13 at 773 K benefiting from the better optimization of carrier concentration.This work elucidates the strategies for enhancing carrier concentration at anion sites and demonstrates the high efficiency of halogen doping in InSe.Moreover,the carrier concentration of InSe is promising to be further optimized,and future work should focus on employing approaches such as cation doping or secondphase compositing.展开更多
The Zintl compound Mg3Sb2 has been recently identified as promising thermoelectric material owing to its high thermoelectric performance and cost-effective,nontoxicity and environment friendly characteristics.However,...The Zintl compound Mg3Sb2 has been recently identified as promising thermoelectric material owing to its high thermoelectric performance and cost-effective,nontoxicity and environment friendly characteristics.However,the intrinsically p-type Mg3Sb2 shows low figure of merit（z T = 0.23 at 723 K） for its poor electrical conductivity.In this study,a series of Mg（3-x）LixSb2 bulk materials have been prepared by high-energy ball milling and spark plasma sintering（SPS） process.Electrical transport measurements on these materials revealed significant improvement on the power factor with respect to the undoped sample,which can be essentially attributed to the increased carrier concentration,leading to a maximum z T of0.59 at 723 K with the optimum doping level x = 0.01.Additionally,the engineering z T and energy conversion efficiency are calculated to be 0.235 and 4.89%,respectively.To our best knowledge,those are the highest values of all reported p-type Mg3Sb2-based compounds with single element doping.展开更多
Highly conductive boron-doped hydrogenated mieroerystalline silicon （μc-Si：H） films are prepared by very high frequency plasma enhanced chemical vapour deposition （VHF PECVD） at the substrate temperatures （Ts）...Highly conductive boron-doped hydrogenated mieroerystalline silicon （μc-Si：H） films are prepared by very high frequency plasma enhanced chemical vapour deposition （VHF PECVD） at the substrate temperatures （Ts） ranging from 90℃ to 270℃. The effects of Ts on the growth and properties of the films are investigated. Results indicate that the growth rate, the electrical （dark conductivity, carrier concentration and Hall mobility） and structural （crystallinity and grain size） properties are all strongly dependent on Ts. As Ts increases, it is observed that 1） the growth rate initially increases and then arrives at a maximum value of 13.3 nm/min at Ts=210℃, 2） the crystalline volume fraction （Xc） and the grain size increase initially, then reach their maximum values at TS=140℃, and finally decrease, 3） the dark conductivity （σd）, carrier concentration and Hall mobility have a similar dependence on Ts and arrive at their maximum values at Ts-190℃. In addition, it is also observed that at a lower substrate temperature Ts, a higher dopant concentration is required in order to obtain a maximum σd.展开更多
基金supported by the National Science Fund for Distinguished Young Scholars(No.51925101)the Tencent Xplorer Prize,the National Natural Science Foundation of China(Nos.52371208,52250090,52002042,51772012,51571007and 12374023)+1 种基金Beijing Municipal Natural Science Foundation(JQ18004)the 111 Project(B17002)。
文摘Indium selenide(InSe),as a wide-bandgap semiconductor,has received extensive attention in the flexible electronics field in recent years due to its exceptional plasticity and promising thermoelectric performance.However,the low carrier concentration severely limits its thermoelectric performance improvement.In this work,we conducted contrasting strategies that can be employed to increase the carrier concentration of InSe,including bandgap narrowing and heterovalent doping.Specifically,the carrier concentration initially increases as a result of the reduced bandgap upon Te alloying and then slightly decreases due to the weak electronegativity of Te.Whereas Br doping realizes high carrier concentration by pushing the Fermi level into the conduction bands and activating the multiple bands.On the other hand,both Te and Br obviously suppress the thermal conductivity due to the point defect scattering.By contrast,Br doping realizes a higher thermoelectric performance with a maximum ZT of~0.13 at 773 K benefiting from the better optimization of carrier concentration.This work elucidates the strategies for enhancing carrier concentration at anion sites and demonstrates the high efficiency of halogen doping in InSe.Moreover,the carrier concentration of InSe is promising to be further optimized,and future work should focus on employing approaches such as cation doping or secondphase compositing.
基金Project supported by the National Natural Science Foundation of China(Grant Nos.U1601213 and 51572287)the Key Research Program of Frontier Sciences of the Chinese Academy of Sciences(Grant No.QYZDB-SSW-SLH013)
文摘The Zintl compound Mg3Sb2 has been recently identified as promising thermoelectric material owing to its high thermoelectric performance and cost-effective,nontoxicity and environment friendly characteristics.However,the intrinsically p-type Mg3Sb2 shows low figure of merit（z T = 0.23 at 723 K） for its poor electrical conductivity.In this study,a series of Mg（3-x）LixSb2 bulk materials have been prepared by high-energy ball milling and spark plasma sintering（SPS） process.Electrical transport measurements on these materials revealed significant improvement on the power factor with respect to the undoped sample,which can be essentially attributed to the increased carrier concentration,leading to a maximum z T of0.59 at 723 K with the optimum doping level x = 0.01.Additionally,the engineering z T and energy conversion efficiency are calculated to be 0.235 and 4.89%,respectively.To our best knowledge,those are the highest values of all reported p-type Mg3Sb2-based compounds with single element doping.
文摘采用三电极体系在硫酸铜-乳酸体系中电化学沉积法制备Cl∶Cu_2O薄膜,通过光电流(I-t)测试、莫特-肖特基(M-s)曲线测试、光电压衰减测试(V-t),研究Cl离子掺杂对氧化亚铜薄膜性能产生的影响。结果表明当p H值为8.5时,可以获得n型氧化亚铜。随着CuCl_2的加入,氧化亚铜薄膜的光电流密度先上升后下降。莫特-肖特基曲线测试的载流子浓度与光电流密度的趋势一致,当Cu Cl2为40 mmol/L时达到最高值,光电流密度为0.11 m A/cm2(较纯氧化亚铜提高了247.6%),载流子浓度为3.58×10^(19)cm^(-3)(较纯氧化亚铜的载流子浓度提高了2457%)。将光电压衰减测试结果进行拟合后发现在40 mmol/L Cu Cl_2溶液中得到的薄膜,其载流子的半衰期提高到了8.92 s,说明较纯氧化亚铜薄膜的光稳定性大大提高了。
文摘Highly conductive boron-doped hydrogenated mieroerystalline silicon （μc-Si：H） films are prepared by very high frequency plasma enhanced chemical vapour deposition （VHF PECVD） at the substrate temperatures （Ts） ranging from 90℃ to 270℃. The effects of Ts on the growth and properties of the films are investigated. Results indicate that the growth rate, the electrical （dark conductivity, carrier concentration and Hall mobility） and structural （crystallinity and grain size） properties are all strongly dependent on Ts. As Ts increases, it is observed that 1） the growth rate initially increases and then arrives at a maximum value of 13.3 nm/min at Ts=210℃, 2） the crystalline volume fraction （Xc） and the grain size increase initially, then reach their maximum values at TS=140℃, and finally decrease, 3） the dark conductivity （σd）, carrier concentration and Hall mobility have a similar dependence on Ts and arrive at their maximum values at Ts-190℃. In addition, it is also observed that at a lower substrate temperature Ts, a higher dopant concentration is required in order to obtain a maximum σd.
