Efficiency Droop Effect Mechanism in an InGaN/GaN Blue MQW LED

In order to clarify the origin of the efficiency droop effect in InGaN based blue multiple-quantum-well(MQW)light emitting diodes(LEDs),a reasonable model is set up,taking all the possible factor(carrier delocalization,carrier leakage and Auger recombination)into account.By fitting the external quantum efficiency-injection current(η–Ⅰ)measurements of two LED samples,the validity of the model is demonstrated.The fit results show that the main origin of efficiency droop at a high injection current is carrier leakage.Furthermore it is also indicated that carrier delocalization plays an important role in the efficiency droop effect in those LEDs of large localization degree.

Influences of stress on the properties of GaN/InGaN multiple quantum well LEDs grown on Si(111) substrates

The influences of stress on the properties of InGaN/GaN multiple quantum wells （MQWs） grown on silicon substrate were investigated. The different stresses were induced by growing InGaN and A1GaN insertion layers （IL） respectively before the growth of MQWs in metal-organic chemical vapor deposition （MOCVD） system. High resolution x-ray diffrac- tion （HRXRD） and photoluminescence （PL） measurements demonstrated that the InGaN IL introduced an additional ten- sile stress in n-GaN, which released the strain in MQWs. It is helpful to increase the indium incorporation in MQWs. In comparison with MQWs without the IL, the wavelength shows a red-shift. A1GaN IL introduced a compressive stress to compensate the tensile stress, which reduces the indium composition in MQWs. PL measurement shows a blue-shift of wavelength. The two kinds of ILs were adopted to InGaN/GaN MQWs LED structures. The same wavelength shifts were also observed in the electroluminescence （EL） measurements of the LEDs. Improved indium homogeneity with InGaN IL, and phase separation with A1GaN IL were observed in the light images of the LEDs.

The Influence of InGaN Interlayer on the Performance of InGaN/GaN Quantum-Well-Based LEDs at High Injections

Introducing a thin InGaN interlayer with a relatively lower indium content between the quantum well （QW） and barrier results in a step-like InxGa1-xN/GaN potential barrier on one side of the QW. This change in the active region leads to a significant shift in photolumineseence （PL） and electroluminescence （EL） emissions to a longer wavelength compared with the conventional QW based light-emitting diodes. More importantly, an improvement against efficiency droop and an enhancement in light output power at the high-current injection are observed in the modified light-emitting diode structures. The role of the inserted layer in these improvements is investigated by simulation in detail, which shows that the creation of more sublevels in the valence band and the increase of hole concentration inside QWs are the main reasons for these improvements.

MOCVD生长InGaN/GaN MQW紫光LED

利用LP MOCVD系统生长了InGaN/GaNMQW紫光LED外延片 ,双晶X射线衍射测试获得了 2级卫星峰 ,室温光致发光谱的峰值波长为 399 5nm ,FWHM为 15 5nm ,波长均匀性良好。制成的LED管芯 ,正向电流2 0mA时 ,工作电压在 4V以下。

生长温度对InGaN/GaN多量子阱LED光学特性的影响

利用低压MOCVD系统,在蓝宝石衬底上外延生长了InGaN/GaN多量子阱蓝紫光LED结构材料。研究了生长温度对有源层InGaN/GaN多量子阱的合金组分、结晶品质及其发光特性的影响。结果表明当生长温度从730℃升到800℃时,LED的光致发光波长从490 nm移到380 nm,室温下PL谱发光峰的半高全宽从133 meV降到73 meV,表明了量子阱结晶性的提高。高温生长时,PL谱中还观察到了GaN的蓝带发光峰,说明量子阱对载流子的限制作用有所减弱。研究表明,通过改变生长温度可以对LED发光波长及有源层InGaN的晶体质量实现良好的控制。

瓦级大功率InGaN蓝光LED的光色电特性

封装并测量了瓦级大功率InGaN蓝色发光二极管(LED)在不同正向电流IF驱动下的光通量、电功率、发光效率、发射光谱和色品坐标等参数的变化。研究表明,光通量与电功率随IF的增大呈亚线性增加,而发光效率η则下降。当IF从50mA一直增大到450mA左右时,发射光谱的峰值波长λp随IF的增加发生蓝移,蓝移现象可能与InGaN蓝光LED芯片在较大电流时能带被拉平以及In成分的作用有关。当IF大于500mA或800mA后,λp又发生红移,红移现象可能与大电流注入下InGaN蓝光LED芯片产生的热效应以及电子-空穴对辐射复合有关。此外,光谱的半峰全宽(FWHM)产生宽化现象,色坐标x和y值也发生变化。

In含量对InGaN/GaN LED光电性能的影响

运用软件模拟和理论计算的方法分析了In含量对发光二极管光电性能的影响,研究了In含量与光谱功率密度、量子阱中载流子的浓度、辐射速率、发光功率等之间的关系。分析结果表明:电子泄漏与能带填充是影响光电性能的主要原因。当In含量较低时,随着电流密度增大(<8 kA/cm2),光谱发生蓝移程度相对较小,但电流密度太大(>8 kA/cm2)会造成电子泄漏,发光功率降低;而当In含量较高时,随着电流密度增大,光谱发生蓝移程度相对较大,但在电流密度较大时,会获得较高的发光功率。因此,为了使InGaN/GaN发光二极管获得最大量子效率与发光效率,应该根据电流密度的大小(8 kA/cm2)来选择In含量的高低。

RIE技术制备p-n结型GaN蓝光LEDs

自从Ｓ．Ｎａｋａｍｕｒａ等人成功地制备了ＧａＮ／ＧａＩｎＮ／ＡｌＧａＮ蓝、绿光ＬＥＤｓ以来，ＧａＮ及其相关化合物的材料生长和器件工艺得到了广泛地研究．由于ＧａＮ材料不同于传统的Ⅲ－Ⅴ族化合物半导体材料，因此其器件的加工工艺，如欧姆或肖特基接触的形成、...

组份渐变电子阻挡层对InGaN/GaN LED光电特性的影响

利用数值模拟方法,研究组份渐变电子阻挡层(EBL)对InGaN/GaN发光二极管电学和光学特性的影响。结果表明,三角形组份渐变EBL结构能有效减小器件的开启电压,提高光输出功率,改善高注入电流水平下发光效率的下降情况。能带模拟结果进一步表明,三角形组份渐变EBL结构显著提高了导带底的电子势垒,可有效限制电子向P型GaN层的泄露,同时减小了价带顶的空穴势垒,可增强P型GaN层的空穴向有源区的注入效率,改善其在量子阱内的浓度分布。

InGaN蓝光LED的发射光谱、色品质与正向电流的关系

测量了InGaN蓝色发光二极管 (LED)在不同正向电流IF 驱动下的发射光谱、色品坐标、光通量、光效等性质的变化。探讨了它们与IF 的依赖关系。结果表明 ,发射光谱和峰值波长λp 随电流IF 从 5mA～ 2 0mA增加 ,发生蓝移 ,当IF 大于 2 5mA直到 5 0mA后 ,λp 又逐渐红移 ,光谱的半高宽 (FWHM)和色坐标x和y值也发生变化 ,光通量呈亚线性增加 ,而光效下降。解析随IF 增加 ,影响蓝光LED性能的因素是多方面的。此外 ,还发现EL光谱中有弱的紫外光辐射。

p型InGaN/GaN超晶格N面GaN基LED的光电特性

随着氮(N)面Ga N材料生长技术的发展,基于N面Ga N衬底的高亮度发光二极管(LED)的研究具有重要的科学意义。研究了具有高发光功率的N面Ga N基蓝光LED的新型结构设计,通过在N面LED的电子阻挡层和多量子阱有源层之间插入p型In Ga N/Ga N超晶格来提高有源层中的载流子注入效率。为了对比N面Ga N基LED优异的器件性能,同时设计了具有相同结构的Ga面LED。通过对两种LED结构的电致发光特性、有源层中能带图、电场和载流子浓度分布进行比较可以发现,N面LED在输出功率和载流子注入效率上比Ga面LED有明显的提升,从而表明N面Ga N基LED具有潜在的应用前景。

基于离子注入制备的InGaN横向Micro-LED阵列

采用离子注入工艺在InGaN/GaN量子阱蓝光LED结构的p-GaN层形成高阻态隔离区域,实现了最小4μm超小尺寸高光效Micro-LED阵列的制备,并系统研究了氟离子注入隔离工艺制备的横向结构Micro-LED阵列的电学和光学性能。实验结果表明,在采用的离子注入能量范围内,氟离子在p-GaN层中的注入深度越深,对应器件的电学和光学隔离效果越好。当离子注入能量为60 keV时,Micro-LED阵列具有相对最佳的光电效果,同时基于该离子注入能量制备的4μm超小尺寸Micro-LED阵列的光功率密度高达200 W/cm2,展现了离子注入工艺在新一代Micro-LED微显示芯片中的应用潜力。

量子阱结构对含V形坑InGaN/GaN蓝光LED效率衰减的影响

使用MOCVD在图形化Si衬底上生长了含V形坑的InGaN/GaN蓝光LED。通过改变生长温度,生长了禁带宽度稍大的载流子限制阱和禁带宽度稍小的发光阱,研究了两类量子阱组合对含V形坑InG aN/GaN基蓝光LED效率衰减的影响。使用高分辨率X射线衍射仪和LED电致发光测试系统对LED外延结构和LED光电性能进行了表征。结果表明:限制阱靠近n层、发光阱靠近p层的新型量子阱结构,在室温75 A/cm^2时的外量子效率相对于其最高点仅衰减12.7%,明显优于其他量子阱结构的16.3%、16.0%、28.4%效率衰减,且只有这种结构在低温时(T≤150 K)未出现内量子效率随电流增大而剧烈衰减的现象。结果表明,合理的量子阱结构设计能够显著提高电子空穴在含V形坑量子阱中的有效交叠,促进载流子在阱间交互,提高载流子匹配度,抑制电子泄漏,从而减缓效率衰减、提升器件光电性能。

InGaN绿光LED中p型GaN层的优化设计

InGaN绿光LED的量子阱结构具有较高的In含量,InN与GaN之间较大的晶格失配度使得该结构的稳定性下降。由于量子阱结构生长完成之后的p型GaN的生长温度要远高于量子阱结构生长温度,因此,p型GaN的生长过程对多量子阱质量有重大影响。论文探讨了p型GaN的生长温度与厚度对绿光LED的材料结构及器件性能的影响。研究发现,p-GaN过高的生长温度和过大的厚度都能加剧多量子阱结构中In组分的波动,使得发光峰宽化,同时降低绿光量子阱的发光效率。论文据此提出了优化的p型GaN生长温度与厚度,探讨了量子阱保护层对InGaN绿光LED性能的影响,该结构有利于增强绿光LED发光波长的稳定性。

Efficiency droop alleviation in blue light emitting diodes using the InGaN/GaN triangular-shaped quantum well

The InGaN/GaN blue light emitting diode（LED） is numerically investigated using a triangular-shaped quantum well model,which involves analysis on its energy band,carrier concentration,overlap of electron and hole wave functions,radiative recombination rate,and internal quantum efficiency.The simulation results reveal that the InGaN/GaN blue light emitting diode with triangular quantum wells exhibits a higher radiative recombination rate than the conventional light emitting diode with rectangular quantum wells due to the enhanced overlap of electron and hole wave functions（above 90%） under the polarization field.Consequently,the efficiency droop is only 18% in the light emitting diode with triangular-shaped quantum wells,which is three times lower than that in a conventional LED.

Performance improvement of blue InGaN light-emitting diodes with a specially designed n-AlGaN hole blocking layer

Blue InGaN light-emitting diodes （LEDs） with a conventional electron blocking layer （EBL）, a common n-A1GaN hole blocking layer （HBL）, and an n-A1GaN HBL with gradual A1 composition are investigated numerically, which involves analyses of the carrier concentration in the active region, energy band diagram, electrostatic field, and internal quantum efficiency （IQE）. The results indicate that LEDs with an n-AIGaN HBL with gradual AI composition exhibit better hole injection efficiency, lower electron leakage, and a smaller electrostatic field in the active region than LEDs with a conven tional p-A1GaN EBL or a common n-A1GaN HBL. Meanwhile, the efficiency droop is alleviated when an n-A1GaN HBL with gradual A1 composition is used.

量子阱生长气压对InGaN/GaN黄光LED光电性能的影响

采用MOCVD技术在图形化硅衬底上生长了InGaN/GaN多量子阱黄光LED外延材料,研究了不同的量子阱生长气压对黄光LED光电性能的影响。使用高分辨率X射线衍射仪(HRXRD)和荧光显微镜(FL)对晶体质量进行了表征,使用电致发光系统积分球测试对光电性能进行了表征。结果表明:随着气压升高,In的并入量略有降低且均匀性更好,量子阱中的点缺陷数目降低,但是阱垒间界面质量有所下降。在实验选取的4个气压4,6.65,10,13.3 k Pa下,外量子效率最大值随着量子阱生长气压的上升而显著升高,分别为16.60%、23.07%、26.40%、27.66%,但是13.3 k Pa下生长的样品在大电流下EQE随电流droop效应有所加剧,在20 A·cm-2的工作电流下,样品A、B、C、D的EQE分别为16.60%、19.77%、20.03%、19.45%,10 k Pa下生长的量子阱的整体光电性能最好。

Carrier Dynamics Determined by Carrier-Phonon Coupling in InGaN/GaN Multiple Quantum Well Blue Light Emitting Diodes

Phonon sidebands in the electrolumiescence(EL) spectra of InGaN/GaN multiple quantum well blue light emitting diodes are investigated. S-shaped injection current dependence of the energy spacing(ES) between the zero-phonon and first-order phonon-assisted luminescence lines is observed in a temperature range of 100–150 K.The S-shape is suppressed with increasing temperature from 100 to 150 K, and vanishes at temperature above200 K. The S-shaped injection dependence of ES at low temperatures could be explained by the three stages of carrier dynamics related to localization states:(i) carrier relaxation from shallow into deep localization states,(ii) band filling of shallow and deep localization states, and(iii) carrier overflow from deep to shallow localization states and to higher energy states. The three stages show strong temperature dependence. It is proposed that the fast change of the carrier lifetime with temperature is responsible for the suppression of S-shaped feature.The proposed mechanisms reveal carrier recombination dynamics in the EL of InGaN/GaN MQWs at various injection current densities and temperatures.

Analysis of stress-induced inhomogeneous electroluminescence in GaN-based green LEDs grown on mesh-patterned Si(111)substrates with n-type AlGaN layer

Inhomogeneous electroluminescence(EL)of InGaN green LEDs grown on mesh-patterned Si(111)substrate had been investigated.Sample with n-AlGaN inserted between the pre-strained layers and the first quantum well showed the inhomogeneous EL in the low current density range.Near-field EL emission intensity distribution images depicted that inhomogeneity in the form of premature turn-on at the periphery of the LED chip,results in stronger emission intensity at the edges.This premature turn-on effect significantly reduces the luminous efficacy and higher ideality factor value due to locally current crowding effect.Raman measurement and fluorescence microscopy results indicated that the partially relaxed in-plane stress at the edge of the window region acts as a parasitic diode with a smaller energy band gap,which is a source of edge emission.Numerical simulations showd that the tilted triangular n-AlGaN functions like a forward-biased Schottky diode,which not only impedes carrier transport,but also contributes a certain ideality factor.

Effect of Droop Phenomenon in InGaN/GaN Blue Laser Diodes on Threshold Current

Electroluminescence （EL） and temperature-dependent photolumineseenee measurements are performed to study the internal quantum efficiency droop phenomenon of blue laser diodes （LDs） before lasing. Based on the ABC mode, the EL result demonstrates that non-radiative recombination rates of LDs with threshold current densities of 4 and 6kA/cm2 are similar, while LD with threshold current density of 4kA/cm2 exhibits a smaller auger- like recombination rate compared with the one of 6kA/cm2. The internal quantum efficiency droop is more serious for LD with higher threshold current density. temperature-dependent photoluminescence is consistent The internal quantum efficiency value estimated from with EL measurements.