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Sodium Nitrate Passivation as a Novel Insulation Technology for Soft Magnetic Composites
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作者 Mi Yan Qiming Chen +2 位作者 Dong Liu Chen Wu Jian Wang 《Engineering》 SCIE EI CAS CSCD 2023年第1期134-142,共9页
Sodium nitrate passivation has been developed as a new insulation technology for the production of FeSiAl soft magnetic composites (SMCs). In this work, the evolution of coating layers grown at different pH values is ... Sodium nitrate passivation has been developed as a new insulation technology for the production of FeSiAl soft magnetic composites (SMCs). In this work, the evolution of coating layers grown at different pH values is investigated involving analyses on their composition and microstructure. An insulation coating obtained using an acidic NaNO_(3) solution is found to contain Fe2O_(3), SiO_(2), Al2O_(3), and AlO(OH). The Fe2O_(3) transforms into Fe3O4 with weakened oxidizability of the NO_(3)– at an elevated pH, whereas an alkaline NaNO_(3) solution leads to the production of Al2O_(3), AlO(OH), and SiO_(2). Such growth is explained from both thermodynamic and kinetic perspectives and is correlated to the soft magnetic properties of the FeSiAl SMCs. Under tuned passivation conditions, optimal performance with an effective permeability of 97.2 and a core loss of 296.4 mW∙cm−3 is achieved at 50 kHz and 100 mT. 展开更多
关键词 Soft magnetic composites Surface passivation insulation technology Growth mechanism Magnetic performance
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Relation between EL2 Groupand EL6 Group in SI-GaAs
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作者 吴凤美 赵周英 《Rare Metals》 SCIE EI CAS CSCD 1996年第3期191-195,共5页
The annealing behavior for EL2 and EL6 groups as dominant deep levels in semi-insulating GaAs was presented using Photo Induced Transient Spectroscopy measurement (PITS). During rapid thermal annealing, a relation was... The annealing behavior for EL2 and EL6 groups as dominant deep levels in semi-insulating GaAs was presented using Photo Induced Transient Spectroscopy measurement (PITS). During rapid thermal annealing, a relation was identified between EL2 group at 0.79 and 0.82 eV and EL6 group at 0.24, 0.27 and 0.82 eV below the conduction band. It is found that they may be close in structure, and belong to the EL2 and EL6 groups, respectively. In rapidly annealed samples, the quantity of all defects in the EL2 group increases, while that in the EL6 group decreases. However, by furnace annealing at 950°C for 5 h, some of the defects in the EL2 group break up, and the quantity of all defects in the EL6 group increases. It is suggested that the EL2 group and EL6 group are related in their microscopy structures. The relation between the two groups and origins was also discussed. 展开更多
关键词 ANNEALING Crystal defects Electron energy levels Silicon on insulator technology SPECTROMETRY
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Yb-doped passively mode-locked fiber laser with Bi_2Te_3-deposited
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作者 李璐 闫培光 +3 位作者 王勇刚 段利娜 孙航 司金海 《Chinese Physics B》 SCIE EI CAS CSCD 2015年第12期329-333,共5页
In this study we present an all-normal-dispersion Yb-doped fiber laser passively mode-locked with topological insulator(Bi2Te3) saturable absorber. The saturable absorber device is fabricated by depositing Bi2Te3 on... In this study we present an all-normal-dispersion Yb-doped fiber laser passively mode-locked with topological insulator(Bi2Te3) saturable absorber. The saturable absorber device is fabricated by depositing Bi2Te3 on a tapered fiber through using pulsed laser deposition(PLD) technology, which can give rise to less non-saturable losses than most of the solution processing methods. Owing to the long interaction length, Bi2Te3 is not exposed to high optical power, which allows the saturable absorber device to work in a high power regime. The modulation depth of this kind of saturable absorber is measured to be 10%. By combining the saturable absorber device with Yb-doped fiber laser, a mode-locked pulse operating at a repetition rate of 19.8 MHz is achieved. The 3-d B spectral width and pulse duration are measured to be 1.245 nm and317 ps, respectively. 展开更多
关键词 topological insulator mode-locked lasers pulsed laser deposition technology fiber lasers
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Paired interference 3-dB coupler based on SOI rib waveguides with anisotropic chemical wet etching 被引量:3
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作者 李智勇 余金中 +2 位作者 陈少武 刘敬伟 夏金松 《Chinese Optics Letters》 SCIE EI CAS CSCD 2007年第4期215-217,共3页
A 3-dB paired interference (PI) optical coupler in silicon-on-insulator (SOI) based on rib waveguides with trapezoidal cross section was designed with simulation by a modified finite-difference beam propagation me... A 3-dB paired interference (PI) optical coupler in silicon-on-insulator (SOI) based on rib waveguides with trapezoidal cross section was designed with simulation by a modified finite-difference beam propagation method (FD-BPM) and fabricated by potassium hydroxide (KOH) anisotropic chemical wet etching. Theoretically, tolerances of width, length, and port distance are more than 1, 100, and 1 μm, respectively. Smooth interface was obtained with the propagation loss of 1.1 dB/cm at the wavelength of 1.55 μm. The coupler has a good uniformity of 0.2 dB and low excess loss of less than 2 dB. 展开更多
关键词 Beam propagation method? ?Potassium hydroxide? ?Silicon on insulator technology? ?Waveguide couplers? ?Wet etching
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Performance testing of log pile photonic crystal fast-fabricated by direct femtosecond laser writing 被引量:2
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作者 杨海峰 周明 +2 位作者 戴娟 狄建科 赵恩兰 《Chinese Optics Letters》 SCIE EI CAS CSCD 2008年第11期864-867,共4页
Great efforts has been made on fabricating photonic crystals (PCs) with photonic band gaps (PBGs) during the past decade. Three-dimensional (3D) log pile PC was fabricated fast by direct femtosecond laser writin... Great efforts has been made on fabricating photonic crystals (PCs) with photonic band gaps (PBGs) during the past decade. Three-dimensional (3D) log pile PC was fabricated fast by direct femtosecond laser writing in ORMOCER. Qualitative analysis of the errors of PC was investigated using the Image Pro Plus. Surface qualities such as bending, distortion, and surface roughness were shown, and the band gap in the infrared wavelength region was observed. Meanwhile, the theory was experimentally verified that the center of PBG diminishes as the crystal lattice period reduces. Therefore, it is possible to fabricate PCs whose band gap range is from the near-infrared to visible wave band. 展开更多
关键词 Crystal atomic structure CRYSTALLOGRAPHY Energy gap Gallium alloys Microcomputers Photonic band gap PHOTONICS PILES Pulsed laser applications Silicon on insulator technology Surface roughness Three dimensional Ultrashort pulses
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Three-step lithography to the fabrication of vertically coupled micro-ring resonators in amorphous silicon-on-insulator 被引量:2
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作者 程俊 严楠 《Chinese Optics Letters》 SCIE EI CAS CSCD 2015年第8期100-104,共5页
A simple method to fabricate vertically coupled micro-ring resonators in amorphous silicon-on-insulator is created by a three-step lithography process. First, the linear loss at 1.55 μm of the a-Si:H film is calcula... A simple method to fabricate vertically coupled micro-ring resonators in amorphous silicon-on-insulator is created by a three-step lithography process. First, the linear loss at 1.55 μm of the a-Si:H film is calculated to be 0.2 =k 0.05 dB/cm. Then, the bottom line waveguide of Su-8 with a flat top surface of 300 nm is created by etching. The thickness of Su-8 can easily be controlled by the etching time. Finally, by opening the window pattern and etching several layers, the first layer marks made by electron beam lithography are found with a 50 nm resolution, and the high quality of the micro-ring resonator is demonstrated. 展开更多
关键词 Electron beam lithography ETCHING LITHOGRAPHY Optical resonators Resonators Silicon on insulator technology
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Reverse current reduction of Ge photodiodes on Si without post-growth annealing 被引量:1
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作者 Sungbong Park Shinya Takita +2 位作者 Yasuhiko Ishikawa Jiro Osaka Kazumi Wada 《Chinese Optics Letters》 SCIE EI CAS CSCD 2009年第4期286-290,共5页
A new approach to reduce the reverse current of Ge pin photodiodes on Si is presented, in which an i-Si layer is inserted between Ge and top Si layers to reduce the electric field in the Ge layer. Without post- growth... A new approach to reduce the reverse current of Ge pin photodiodes on Si is presented, in which an i-Si layer is inserted between Ge and top Si layers to reduce the electric field in the Ge layer. Without post- growth annealing, the reverse current density is reduced to -10 mA/cm^2 at -1 V, i.e., over one order of magnitude lower than that of the reference photodiode without i-Si layer. However, the responsivity of the photodiodes is not severely compromised. This lowered-reverse-current is explained by band-pinning at the i-Si/i-Ge interface. Barrier lowering mechanism induced by E-field is also discussed. The presented "non-thermal" approach to reduce reverse current should accelerate electronics-photonics convergence by using Oe on the Si complementary metal oxide semiconductor (CMOS) platform. 展开更多
关键词 CMOS integrated circuits Electric fields GERMANIUM METALS MOS devices Oxide semiconductors Photodiodes Silicon Silicon on insulator technology
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A compact T-branch beam splitter based on anomalous reflection in two-dimensional photonic crystals 被引量:1
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作者 沈义峰 孙建 +4 位作者 沈晓鹏 王娟 孙露露 韩奎 王国中 《Chinese Optics Letters》 SCIE EI CAS CSCD 2008年第10期709-712,共4页
We project a compact T-branch beam splitter with a micron scale using a two-dimensional (2D) photonic crystal (PC). For TE polarization, one light beam can be split into two sub-beams along opposite directions. Th... We project a compact T-branch beam splitter with a micron scale using a two-dimensional (2D) photonic crystal (PC). For TE polarization, one light beam can be split into two sub-beams along opposite directions. The propagating directions of the two splitting beams remain unchanged when the incident angle varies in a certain range. Coupled-mode theory is used to analyze the truncating interface structure in order to investigate the energy loss of the splitter. Simulation results and theoretical analysis show that choosing an appropriate location of the truncating interface (PC-air interface) is very important for obtaining high efficiency due to the effect of defect modes. The most advantage of this kind of beam splitter is being fabricated and integrated easily. 展开更多
关键词 Crystal atomic structure? ?Crystallography? ?Electric network analysis? ?Energy dissipation? ?Optical instruments? ?Particle beams? ?Photonics? ?Powders? ?Prisms? ?Silicon on insulator technology ? ?Stereochemistry? ?Two dimensional
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High-speed electrooptical VOA integrated in silicon-on-insulator 被引量:1
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作者 严清峰 余金中 +1 位作者 夏金松 刘忠立 《Chinese Optics Letters》 SCIE EI CAS CSCD 2003年第4期217-219,共3页
In this paper, we present simulation results of an electrooptical variable optical attenuator (VOA) integrated in silicon-on-insulator waveguide. The device is functionally based on free carriers absorption to achieve... In this paper, we present simulation results of an electrooptical variable optical attenuator (VOA) integrated in silicon-on-insulator waveguide. The device is functionally based on free carriers absorption to achieve attenuation. Beam propagation method (BPM) and two-dimensional semiconductor device simulation tool PISCES-II were used to analyze the dc and transient characteristics of the device. The device has a response time (including rise time and fall time) less than 200 ns, much faster than the thermooptic and micro-electromechanical systems (MEMSs) based VOAs. 展开更多
关键词 ATTENUATION Electrooptical effects Silicon on insulator technology Waveguide attenuators
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SOI thermo-optic modulator with fast response 被引量:1
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作者 王小龙 刘敬伟 +2 位作者 严清峰 陈绍武 余金中 《Chinese Optics Letters》 SCIE EI CAS CSCD 2003年第9期527-528,共2页
Silicon-on-insulator (SOI) technology offers tremendous potential for integration of optoelectronic functions on a silicon wafer. In this letter, a 1 x 1 multimode interference (MMI) Mach-Zender interferometer (MZI) t... Silicon-on-insulator (SOI) technology offers tremendous potential for integration of optoelectronic functions on a silicon wafer. In this letter, a 1 x 1 multimode interference (MMI) Mach-Zender interferometer (MZI) thermo-optic modulator fabricated by wet-etching method is demonstrated. The modulator has an extinction ratio of -11.0 dB, extra loss of -4.9 dB and power consumption of 420 mW. The response time is less than 30 us. 展开更多
关键词 INTERFEROMETERS Optoelectronic devices Silicon on insulator technology
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Compact and broadband waveguide taper based on partial bandgap photonic crystals
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作者 侯金 郜定山 +1 位作者 吴华明 周治平 《Chinese Optics Letters》 SCIE EI CAS CSCD 2009年第4期309-311,共3页
Partial bandgap characteristics of parallelogram lattice photonic crystals are proposed to suppress the radiation modes in a compact dielectric waveguide taper so as to obtain high transmittance in a large wavelength ... Partial bandgap characteristics of parallelogram lattice photonic crystals are proposed to suppress the radiation modes in a compact dielectric waveguide taper so as to obtain high transmittance in a large wavelength range. Band structure of the photonic crystals shows that there exists a partial bandgap, The photonie crystals with partial bandgap are then used as the cladding of a waveguide taper to reduce the radiation loss efficiently. In comparison with the conventional dielectric taper and the complete bandgap photonic crystal taper, the partial bandgap photonic crystal taper has a high transmittance of above 85% with a wide band of 170 nm. 展开更多
关键词 Crystal atomic structure Energy gap PHOTONICS Silicon on insulator technology WAVEGUIDES
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Polarization-independent grating coupler based on silicon-on-insulator
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作者 张晶晶 杨俊波 +3 位作者 路环宇 吴闻军 黄杰 常胜利 《Chinese Optics Letters》 SCIE EI CAS CSCD 2015年第9期34-38,共5页
A novel and simple polarization independent grating couplers is designed and analyzed here, in which the TE polarization and the TM polarization light can be simultaneously coupled into a silicon waveguide along the s... A novel and simple polarization independent grating couplers is designed and analyzed here, in which the TE polarization and the TM polarization light can be simultaneously coupled into a silicon waveguide along the same direction with high coupling efficiency. For the polarization-insensitive grating coupler, the coupling effi- ciencies of two orthogonal polarizations light are more than 60% at 1550 nm wavelength based on our optimized design parameters including grating period, etching height, filling factor, and so on. For TE mode the maximum efficiency is ~72% with more than 30 nm i dB bandwidth, simultaneously, for TM mode the maximum efficiency is 75.15% with 40 nm 1 dB bandwidth. Their corresponding wavelength difference between two polarizations' coupling peaks is demonstrated to be 35 nm. Polarization independent grating coupler designed here can be widelv used in optical communication and ontical information processing. 展开更多
关键词 BANDWIDTH EFFICIENCY Optical communication Optical data processing Silicon on insulator technology
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Design and fabrication of the star coupler based on SOI material
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作者 江晓清 李柏阳 +6 位作者 唐衍哲 杨建义 王明华 王文辉 杨艺榕 吴亚明 王跃林 《Chinese Optics Letters》 SCIE EI CAS CSCD 2003年第8期465-467,共3页
A 1 x 25 star coupler is designed through calculation and beam propagation method (BPM) simulation. Improvement methods are focused on the design of the tapered waveguides in the device, improving the uniformity of th... A 1 x 25 star coupler is designed through calculation and beam propagation method (BPM) simulation. Improvement methods are focused on the design of the tapered waveguides in the device, improving the uniformity of the output light power of the star coupler. Utilizing the conventional Si process technology, the device is fabricated based on silicon-on-insulator (SOI) material. The test result shows that the star coupler has a perfect function of power splitting. 展开更多
关键词 Optical fibers Silicon on insulator technology Wave propagation WAVEGUIDES
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