In this paper, a new intelligent control method is introduced, which combines stipulations, optimal control method with knowledge based control. Using nonlinear programming method and expert experience for the compli...In this paper, a new intelligent control method is introduced, which combines stipulations, optimal control method with knowledge based control. Using nonlinear programming method and expert experience for the complicated nonlinear object, the good control result can be achieved. The effect of this method is shown by a simulation of three stage inverted pendulums.展开更多
This work presents an implementation of an innovative single phase multilevel inverter using capacitors with reduced switches. The proposed Capacitor pattern H-bridge Multilevel Inverter (CPHMLI) topology consists of ...This work presents an implementation of an innovative single phase multilevel inverter using capacitors with reduced switches. The proposed Capacitor pattern H-bridge Multilevel Inverter (CPHMLI) topology consists of a proper number of Capacitor connected with switches and power sources. The advanced switching control supplied by Pulse Width Modulation (PDPWM) to attain mixed staircase switching state. The charging and discharging mode are achieved by calculating the voltage error at the load. Furthermore, to accomplish the higher voltage levels at the output with less number of semiconductors switches and simple commutation designed using CPHMLI topology. To prove the performance and effectiveness of the proposed approach, a set of experiments performed under various load conditions using MATLAB tool.展开更多
In this paper,the anisotropic etching process of Si(100) wafers in tetramethyl ammonium hydroxide(TMAH) solution with isopropyl alcohol(IPA) is investigated in detail. An inverted trapezoidal pattern is developed. A s...In this paper,the anisotropic etching process of Si(100) wafers in tetramethyl ammonium hydroxide(TMAH) solution with isopropyl alcohol(IPA) is investigated in detail. An inverted trapezoidal pattern is developed. A series of experiments are performed by changing TMAH concentration,IPA concentration,etching temperature and etching time. The structure of inverted trapezoidal patterns and roughness of the bottom surface are characterized by scanning electron microscopy(SEM) and atomic force microscopy(AFM). The results show that with TMAH concentration increases,the roughness of bottom surface will decrease. The addition of IPA into TMAH solution improves the morphology of the bottom surface significantly. Low temperature is beneficial to get a smooth bottom surface. Furthermore,etching time can change the bottom surface roughness. A model is proposed to explain the etching processes. The hillock area ratio of the bottom surface has the same tendency as the etching area ratio. Finally,smooth silicon inverted trapezoidal patterns are obtained for epitaxial growth of Ga N-based light emitting diode(LED) devices.展开更多
文摘In this paper, a new intelligent control method is introduced, which combines stipulations, optimal control method with knowledge based control. Using nonlinear programming method and expert experience for the complicated nonlinear object, the good control result can be achieved. The effect of this method is shown by a simulation of three stage inverted pendulums.
文摘This work presents an implementation of an innovative single phase multilevel inverter using capacitors with reduced switches. The proposed Capacitor pattern H-bridge Multilevel Inverter (CPHMLI) topology consists of a proper number of Capacitor connected with switches and power sources. The advanced switching control supplied by Pulse Width Modulation (PDPWM) to attain mixed staircase switching state. The charging and discharging mode are achieved by calculating the voltage error at the load. Furthermore, to accomplish the higher voltage levels at the output with less number of semiconductors switches and simple commutation designed using CPHMLI topology. To prove the performance and effectiveness of the proposed approach, a set of experiments performed under various load conditions using MATLAB tool.
基金supported by the National Natural Science Foundation of China(Nos.51472229,61422405,51202238,61306051 and 61474109)the “100 Talent Program” of Chinese Academy of Sciencesthe Opening Funding of State Key Lab of Silicon Materials(No.SKL2014-4)
文摘In this paper,the anisotropic etching process of Si(100) wafers in tetramethyl ammonium hydroxide(TMAH) solution with isopropyl alcohol(IPA) is investigated in detail. An inverted trapezoidal pattern is developed. A series of experiments are performed by changing TMAH concentration,IPA concentration,etching temperature and etching time. The structure of inverted trapezoidal patterns and roughness of the bottom surface are characterized by scanning electron microscopy(SEM) and atomic force microscopy(AFM). The results show that with TMAH concentration increases,the roughness of bottom surface will decrease. The addition of IPA into TMAH solution improves the morphology of the bottom surface significantly. Low temperature is beneficial to get a smooth bottom surface. Furthermore,etching time can change the bottom surface roughness. A model is proposed to explain the etching processes. The hillock area ratio of the bottom surface has the same tendency as the etching area ratio. Finally,smooth silicon inverted trapezoidal patterns are obtained for epitaxial growth of Ga N-based light emitting diode(LED) devices.
