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Effects of the ion-beam voltage on the properties of the diamond-like carbon thin film prepared by ion-beam sputtering deposition 被引量:1
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作者 孙鹏 胡明 +4 位作者 张锋 季一勤 刘华松 刘丹丹 冷健 《Chinese Physics B》 SCIE EI CAS CSCD 2015年第6期581-585,共5页
Diamond-like carbon (DLC) thin film is one of the most widely used optical thin films. The fraction of chemical bondings has a great influence on the properties of the DLC film. In this work, DLC thin films are prep... Diamond-like carbon (DLC) thin film is one of the most widely used optical thin films. The fraction of chemical bondings has a great influence on the properties of the DLC film. In this work, DLC thin films are prepared by ion-beam sputtering deposition in Ar and CH4 mixtures with graphite as the target. The influences of the ion-beam voltage on the surface morphology, chemical structure, mechanical and infrared optical properties of the DLC films are investigated by atomic force microscopy (AFM), Raman spectroscopy, nanoindentation, and Fourier transform infrared (FTIR) spec- troscopy, respectively. The results show that the surface of the film is uniform and smooth. The film contains sp2 and sp3 hybridized carbon bondings. The film prepared by lower ion beam voltage has a higher sp3 bonding content. It is found that the hardness of DLC films increases with reducing ion-beam voltage, which can be attributed to an increase in the fraction of sp3 carbon bondings in the DLC film. The optical constants can be obtained by the whole infrared optical spectrum fitting with the transmittance spectrum. The refractive index increases with the decrease of the ion-beam voltage, while the extinction coefficient decreases. 展开更多
关键词 DLC thin film ion-beam sputtering deposition chemical bondings infrared optical and mechani-cal properties
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Density behaviors of Ge nanodots self-assembled by ion beam sputtering deposition
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作者 熊飞 杨涛 +1 位作者 宋肇宁 杨培志 《Chinese Physics B》 SCIE EI CAS CSCD 2013年第5期557-563,共7页
Self-assembled Ge nanodots with areal number density up to 2.33× 1010 cm-2 and aspect ratio larger than 0.12 are prepared by ion beam sputtering deposition. The dot density, a function of deposition rate and Ge c... Self-assembled Ge nanodots with areal number density up to 2.33× 1010 cm-2 and aspect ratio larger than 0.12 are prepared by ion beam sputtering deposition. The dot density, a function of deposition rate and Ge coverage, is observed to be limited mainly by the transformation from two-dimensional precursors to three-dimensional islands, and to be associated with the adatom behaviors of attachment and detachment from the islands. An unusual increasing temperature dependence of nanodot density is also revealed when a high ion energy is employed in sputtering deposition, and is shown to be related to the breaking down of the superstrained wetting layer. This result is attributed to the interaction between energetic atoms and the growth surface, which mediates the island nucleation. 展开更多
关键词 Ge nanodot SELF-ORGANIZATion ion beam sputtering deposition adatom behavior
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Nano-sized Thin Films Fabricated by Ion Beam Sputtering and Its Properties
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作者 周继承 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2007年第4期600-602,共3页
Nanoscale thick amorphous Ni-Cr alloy thin films were fabricated by low-energy ion beam sputtering technology; then the as-deposited samples experienced rapid thermal process to realize the transformation from amorpho... Nanoscale thick amorphous Ni-Cr alloy thin films were fabricated by low-energy ion beam sputtering technology; then the as-deposited samples experienced rapid thermal process to realize the transformation from amorphous to crystalline state. The film thickness was measured with a-stylus surface profiler, the structure and the compositions of the films were confirmed by low angle X-ray diffraction and scanning auger electron microprobe respectively, and the surface topography was characterized by scanning electron microscope and scanning probe microscope. Electrical property of the films was measured by fourpoint probe. The experimental results illustrate that the combined processes of ion beam sputtering and rajid thermal process are effective for fabrication nanoscale Ni-Cr alloy thin film with good properties. 展开更多
关键词 ion beam sputtering deposition film rapid thermal process nanoscale NiCr thin film
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Preparation of YBa_2Cu_3O_(7-x) Superconductor Film by Ion Beam Sputtering
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作者 胡倾宇 闻立时 +1 位作者 乔桂文 庄育智 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 1989年第5期366-368,共3页
Since the discovery of high T;super-conductor, much effort was made toits application. More and more evidencehas revealed that most promising fieldof high T;superconductor first to havesuccess must be the microelectro... Since the discovery of high T;super-conductor, much effort was made toits application. More and more evidencehas revealed that most promising fieldof high T;superconductor first to havesuccess must be the microelectronics andcomputer. Superconductor films for mi-croelectronic application are preparedby PVD method, such as electron beamevaporation, pulsed laser evaporation andmagnetron sputtering. In this paper, thepreliminary results of ion beam sputteringdeposition of YBaCuO film are reported 展开更多
关键词 superconductor film ion beam sputtering
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Structure and Magnetic Properties of Fe-N Films Prepared by Dual Ion Beam Sputtering
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作者 诸葛兰剑 吴雪梅 +2 位作者 汤乃云 叶春兰 姚伟国 《Plasma Science and Technology》 SCIE EI CAS CSCD 2001年第6期1049-1054,共6页
Fe-N films were prepared on Si substrate by dual ion beam sputtering (DIBS). It is found that the crystal structure of the films varies from α-Fe, to ε-Fe2-3N, ε-Fe2-3N +γ-Fe4N, and finally γ'-Fe4N with the i... Fe-N films were prepared on Si substrate by dual ion beam sputtering (DIBS). It is found that the crystal structure of the films varies from α-Fe, to ε-Fe2-3N, ε-Fe2-3N +γ-Fe4N, and finally γ'-Fe4N with the increase in substrate temperature (TS). The magnetic properties of the films were investigated by a vibrating sample magnetometer (VSM). The structure of the films is insensitive to the ratios of N2/Ar in main ion source(MIS), and is mainly influenced by the substrate temperature (Ts). 展开更多
关键词 FE Structure and Magnetic Properties of Fe-N Films Prepared by Dual ion beam sputtering
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Cu_2ZnSnS_4 thin films prepared by sulfurization of ion beam sputtered precursor and their electrical and optical properties 被引量:11
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作者 ZHANG Jun SHAO Lexi FU Yujun XIE Erqing 《Rare Metals》 SCIE EI CAS CSCD 2006年第z1期315-319,共5页
Cu2ZnSnS4 (CZTS) thin films were successfully prepared by sulfurization of ion bean sputtered precursors on soda-lime glass substrate. The single phase of stannite-type structure CZTS films were obtained as revealed i... Cu2ZnSnS4 (CZTS) thin films were successfully prepared by sulfurization of ion bean sputtered precursors on soda-lime glass substrate. The single phase of stannite-type structure CZTS films were obtained as revealed in EDS and XRD analysis when the ratios of the constituents of CZTS thin films are close to stoichiometric by optimizing the conditions of precursor preparation and sulfurization. A low sheet resistivity as about 0.156 Ω·cm and a high absorption coefficient as 1×104 cm-1 were achieved in this method by Hall effect measurements and UV-VIS spectrophotometer. The optical band-gap energy of the CZTS sample is about 1.51 eV, which is very close to the optimum value for a solar-cell absorber. 展开更多
关键词 Cu2ZnSnS4 thin film SOLAR-CELL ion beam sputtering
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Influence of Oxygen to Argon Ratio on the Structural and Morphological Properties of Nb-Doped SrTiO<sub>3</sub>Epitaxial Films Grown by Reactive Ion Beam Sputter Deposition
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作者 Gasidit Panomsuwan Nagahiro Saito 《Crystal Structure Theory and Applications》 2013年第1期34-38,共5页
Nb-doped SrTiO3 (STNO) films were grown on (001)-oriented LaAlO3 substrates by a reactive ion beam sputter deposition at various mixing ratios (OMRs) with a substrate temperature of 800oC. The STNO films exhibited goo... Nb-doped SrTiO3 (STNO) films were grown on (001)-oriented LaAlO3 substrates by a reactive ion beam sputter deposition at various mixing ratios (OMRs) with a substrate temperature of 800oC. The STNO films exhibited good crystallinity with an epitaxial orientation as characterized by high-resolution X-ray diffraction, grazing-incidence X-ray diffraction, and in-plane pole figure analysis. A decrease of out-of-plane and in-plane lattice constants was observed with an increase of OMR. The surface morphology of the STNO films showed a very dense fine-grain structure. The root-mean-square roughness was found to be increased as the OMR increased. Moreover, the elemental compositions of the STNO films were examined by X-ray photoelectron spectroscopy. 展开更多
关键词 Nb-Doped SRTIO3 Epitaxial Films Crystal Structure ion beam sputter Deposition
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溅射方位对IBS沉积TbDy-Fe薄膜性质的影响 被引量:4
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作者 周白杨 卢志红 +2 位作者 林梅 姜华 邓光华 《真空科学与技术学报》 EI CAS CSCD 北大核心 2004年第5期367-371,共5页
本文采用铸造合金靶材和离子束溅射 (IBS)技术制备TbDy Fe超磁致伸缩薄膜 (GMFs) ,研究了不同溅射方位 (α角 )对冷基片成膜过程和薄膜性质的影响。结果表明 ,在给定的溅射角范围内 ,薄膜表面平整光滑 ,组织致密 ,膜厚均匀且与基片结合... 本文采用铸造合金靶材和离子束溅射 (IBS)技术制备TbDy Fe超磁致伸缩薄膜 (GMFs) ,研究了不同溅射方位 (α角 )对冷基片成膜过程和薄膜性质的影响。结果表明 ,在给定的溅射角范围内 ,薄膜表面平整光滑 ,组织致密 ,膜厚均匀且与基片结合良好 ,膜的结构均为非晶态 ;成膜生长速率、膜层成份以及λ值随α角的改变均呈现规律性的变化 ,当α角为α6左右时 ,沉积速率最大 ;在α角为α5左右范围内 ,膜层的成份最接近于靶材成份 ;α角在α4附近时用Tam法试验测定在Hmax=0 5 7T下的磁伸值λ∥ 可达 970× 10 -6,在中低场强H =0 2 5T下 ,λ∥ 值达到 710× 10 -6。 展开更多
关键词 膜层 平整 离子束溅射 铸造合金 靶材 组织 非晶态 薄膜 基片 性质
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试片取向与IBS沉积TbDy-Fe膜应力及磁伸性能 被引量:2
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作者 周白杨 邓光华 林庆彬 《真空科学与技术学报》 EI CAS CSCD 北大核心 2005年第4期268-270,274,共4页
本文研究了轧制青铜试片的取向对离子束溅射(IBS)制备的TbDy-Fe超磁致伸缩膜(GMF)应力及磁致伸缩性能的影响。结果表明,溅射沉积在沿垂直轧制方向截取的试片上沉积膜的应力小于沿平行轧向截取的试片上沉积膜的应力,从而对薄膜的磁致伸... 本文研究了轧制青铜试片的取向对离子束溅射(IBS)制备的TbDy-Fe超磁致伸缩膜(GMF)应力及磁致伸缩性能的影响。结果表明,溅射沉积在沿垂直轧制方向截取的试片上沉积膜的应力小于沿平行轧向截取的试片上沉积膜的应力,从而对薄膜的磁致伸缩性能产生相应的影响。 展开更多
关键词 金属材料 TbDy—Fe薄膜 离子束溅射 应力 磁伸性能
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退火对EBE,IBS和ALD沉积HfO2薄膜的抗激光损伤性能影响 被引量:1
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作者 刘浩 马平 +1 位作者 蒲云体 赵祖珍 《强激光与粒子束》 EI CAS CSCD 北大核心 2020年第7期7-14,共8页
结合自身实验条件采用电子束蒸发(EBE)、离子束溅射(IBS)和原子层沉积(ALD)三种工艺制备了HfO2薄膜,对其进行退火实验,采用1064 nm Nd:YAG激光测定了即时沉积和退火后各HfO2薄膜的抗激光损伤能力。研究发现,ALD HfO2薄膜的激光损伤阈值... 结合自身实验条件采用电子束蒸发(EBE)、离子束溅射(IBS)和原子层沉积(ALD)三种工艺制备了HfO2薄膜,对其进行退火实验,采用1064 nm Nd:YAG激光测定了即时沉积和退火后各HfO2薄膜的抗激光损伤能力。研究发现,ALD HfO2薄膜的激光损伤阈值最高,EBE HfO2薄膜次之,IBS HfO2薄膜的损伤阈值最低;300℃退火对各工艺薄膜抗激光损伤能力的影响均为负面,500℃退火则会显著降低ALD HfO2薄膜的抗激光损伤能力。 展开更多
关键词 HFO2薄膜 激光损伤阈值 电子束蒸发 离子束溅射 原子层沉积
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Enhanced adhesion of Cu-W thin films by ion beam assisting bombardment implanting 被引量:2
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作者 周灵平 汪明朴 +5 位作者 王瑞 李周 朱家俊 彭坤 李德意 李绍禄 《中国有色金属学会会刊:英文版》 EI CSCD 2008年第2期372-377,共6页
Cu-W thin film with high W content was deposited by dual-target DC-magnetron co-sputtering technology.Effects of the substrates surface treating technique on the adhesive strength of Cu-W thin films were studied.It is... Cu-W thin film with high W content was deposited by dual-target DC-magnetron co-sputtering technology.Effects of the substrates surface treating technique on the adhesive strength of Cu-W thin films were studied.It is found that the technique of ion beam assisting bombardment implanting of W particles can remarkably improve the adhesive property of Cu-W thin films. Indentation and scratching test show that,the critical load is doubled over than the sample only sputter-cleaned by ion beam.The enhancing mechanism of ion beam assisting bombardment implanting of Cu-W thin films was analyzed.With the help of mid-energy Ar+ion beam,W atoms can diffuse into the Fe-substrate surface layer;Fe atoms in the substrate surface layer and W atoms interlace with one another;and microcosmic mechanical meshing and diffusing combination on atom-scale among the Fe and W atoms through the film/substrate interface can be formed.The wettability and thermal expansion properties of the W atoms diffusion zone containing plentiful W atoms are close to those of pure W or W-based Cu-W film. 展开更多
关键词 薄膜 离子 磁电管
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Studies on Ion-Beam Modified Hydrogen Evolution Electrodes
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作者 Zhang Ji-shuang Li Qin-lian Lu Yao-jiao and Yan Xi-yun (Department of Chemistry and Chemical Engineering, Hunan Univesity, Changsha, 410082) Hou Rang-kun (Deaprtment of Chemistiy , Henan Educational College, Zhengzhou, 450003 ) 《Chemical Research in Chinese Universities》 SCIE CAS CSCD 1994年第2期68-71,共4页
he present paper focuses on the modifying effects of ion beam mixing, ion im-planting and ion sputtering on hydrogen evolution electrodes. It was discovered thatthe four types of electrodes possessed excellent catalyt... he present paper focuses on the modifying effects of ion beam mixing, ion im-planting and ion sputtering on hydrogen evolution electrodes. It was discovered thatthe four types of electrodes possessed excellent catalytic activity in acid or alkalinemedia and potential stability in long term electrolysis of water under high currentdensity. Their stability and applying life-span greatly surpass those of other elec-trodes activated by electrodepositing and other method. The effects of temperatureand roughness on function of electrodes were also examined. XPS and AES wereapplied to analyse the surface composition and bond states of the electrodes, andthe distribution of concentration varying with depth, and to explain the law of theexperiments . 展开更多
关键词 Implantating ion-beam Mixing ion sputtering XPS Hydrogen Evo-lution Reaction
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PHASE ANALYSES FOR DUAL ION BEAM DEPOSITED ZrO_2 FILMS ON NaCl SUBSTRATE
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作者 黄宁康 汪德志 《Nuclear Science and Techniques》 SCIE CAS CSCD 1994年第4期202-205,共4页
PHASEANALYSESFORDUALIONBEAMDEPOSITEDZrO_2FILMSONNaClSUBSTRATEHuangNingkang(黄宁康)andWangDezhi(汪德志)(Instituteof... PHASEANALYSESFORDUALIONBEAMDEPOSITEDZrO_2FILMSONNaClSUBSTRATEHuangNingkang(黄宁康)andWangDezhi(汪德志)(InstituteofNuclearScienceand?.. 展开更多
关键词 ZRO2薄膜 氯化钠衬底 离子束沉积
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PHASE ANALYSES FOR DUAL ION BEAM DEPOSITED ZrO2 FILMS ON NaCl SUBSTRATE
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作者 黄宁康 汪德志 《Nuclear Science and Techniques》 SCIE CAS CSCD 1994年第4期202-205,共页
PHASEANALYSESFORDUALIONBEAMDEPOSITEDZrO<sub>2</sub>FILMSONNaClSUBSTRATEHuangNingkang(黄宁康)andWangDezhi(汪德志)(I... PHASEANALYSESFORDUALIONBEAMDEPOSITEDZrO<sub>2</sub>FILMSONNaClSUBSTRATEHuangNingkang(黄宁康)andWangDezhi(汪德志)(InstituteofNuclearScienceand?.. 展开更多
关键词 ZrO2 film DUAL ion beam deposition ion sputtering TEM XRD XPS
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Study on Surface Optimization by Ion Beams
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作者 王明红 《Journal of China Textile University(English Edition)》 EI CAS 1998年第2期46-50,共5页
Preliminary tribo-mechanical properties of IBED filmsof GCr15 bearing steels have been studied in this paperalong with the comparison between IBED films and PVDfilms as well as non-implanted surface in wear resis-tanc... Preliminary tribo-mechanical properties of IBED filmsof GCr15 bearing steels have been studied in this paperalong with the comparison between IBED films and PVDfilms as well as non-implanted surface in wear resis-tance,micro-hardness,friction and surface morpholo-gy.Experiments gave a consistent picture and statedclearly that TIN films can really improve the tribo-me-chanical properties of materials and have practical usesin a certain sense.However,further theoretical and ex-perimental studies must be performed in respect thatthere are some defects on IBED films. 展开更多
关键词 ion beams ibED PVD WEAR resistance WEAR AMOUNT SURFACE ROUGHNESS micro - hardness friction SURFACE morphology.
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Si基SiC薄膜物理制备工艺研究进展
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作者 苏江滨 朱秀梅 +3 位作者 季雪梅 祁昊 潘鹏 何祖明 《常州大学学报(自然科学版)》 CAS 2024年第1期9-17,共9页
随着微纳电子器件集成化程度不断提高,用Si基SiC薄膜取代SiC体单晶引起了人们极大的兴趣,这种方法不仅有利于降低生产成本,还能与Si基大规模集成电路兼容。文章综述了磁控溅射、分子束外延、离子束溅射、离子注入4种物理制备Si基SiC薄... 随着微纳电子器件集成化程度不断提高,用Si基SiC薄膜取代SiC体单晶引起了人们极大的兴趣,这种方法不仅有利于降低生产成本,还能与Si基大规模集成电路兼容。文章综述了磁控溅射、分子束外延、离子束溅射、离子注入4种物理制备Si基SiC薄膜主要工艺的研究进展,简单阐述了各种工艺对薄膜性能的影响,对各种工艺的优缺点和存在的问题进行了评述,同时指明了Si基SiC薄膜领域未来的发展方向。 展开更多
关键词 SIC薄膜 磁控溅射 分子束外延 离子束溅射 离子注入
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Microstructure and Tribological Behavior of Cr-Cu-N Coatings Deposited by Ion Beam Assisted Magnetron Sputtering
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作者 Tian Linhai Zhang Yang +2 位作者 Yang Yaojun Zhu Xiaodong Tang Bin 《稀有金属材料与工程》 SCIE EI CAS CSCD 北大核心 2012年第S1期355-358,共4页
Cr-Cu-N coatings with copper content from 0 at%to 6.8 at%were deposited on silicon and M2 steel by ion beam assisted magnetron sputtering.The microstructure and composition of the coatings were characterized using SEM... Cr-Cu-N coatings with copper content from 0 at%to 6.8 at%were deposited on silicon and M2 steel by ion beam assisted magnetron sputtering.The microstructure and composition of the coatings were characterized using SEM,GDOES,XRD and XPS.The mechanical properties of the coatings were tested on a standard hardness tester.The tribological behavior of the coatings in dry wear condition was studied by means of ball-on-disc wear test.The experimental results show that addition of copper can restrict the columnar crystal growing to a certain degree.XRD and XPS analysis indicate that coatings are mainly composed of Cr and CrN phase.Cu is mainly existed in a free state in the coatings.Copper adding has no obvious effects on the hardness of the coatings.However,the coatings fracture toughness can be improved by doped copper.The coefficient of friction of the coatings against bearing steel is in the range of 0.25-0.6 changing with the copper content.The coating with 2.6 at%copper shows the lowest coefficient of friction about 0.25 and wear rate which is about one tenth of that of the coating with 6.8 at%copper.The higher coefficient of friction and wear rate of the coating with 6.8at%copper may be attributed to its lower bonding strength. 展开更多
关键词 Cr-Cu-N COATINGS ion beam assisted MAGNETRON sputtering MICROSTRUCTURE tribological behavior
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退火对IBED氧化钒薄膜结构和性能的影响 被引量:2
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作者 谢建生 李金华 袁宁一 《微细加工技术》 2004年第4期36-40,63,共6页
对离子束增强沉积(IBED)氧化钒薄膜作不同条件的退火,用X射线衍射分析薄膜的晶体结构;用电阻 温度测试分析了薄膜的热电阻温度系数。实验发现,沉积薄膜存在一个形成二氧化钒结构的临界结晶温度,该温度随薄膜制备时离子束增强沉积条件的... 对离子束增强沉积(IBED)氧化钒薄膜作不同条件的退火,用X射线衍射分析薄膜的晶体结构;用电阻 温度测试分析了薄膜的热电阻温度系数。实验发现,沉积薄膜存在一个形成二氧化钒结构的临界结晶温度,该温度随薄膜制备时离子束增强沉积条件的不同而改变。退火温度低于临界结晶温度时,很难使薄膜结晶成二氧化钒结构;高于临界温度较多的退火或形成VO2结构后再长时间退火,都会使VO2多晶薄膜中的钒分解降价,使薄膜的结构退化、性能变差。IBED多晶VO2薄膜在室温附近的电阻温度系数可达到4%/K以上。 展开更多
关键词 氧化钒薄膜 退火 离子束增强沉积
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Infrared transition properties of vanadium dioxide thin films across semiconductor-metal transition 被引量:4
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作者 LIANG Jiran HU Ming +4 位作者 KAN Qiang LIANG Xiuqin WANG Xiaodong LI Guike CHEN Hongda 《Rare Metals》 SCIE EI CAS CSCD 2011年第3期247-251,共5页
Vanadium dioxide thin films were fabricated through annealing vanadium oxide thin films deposited by dual ion beam sputtering. X-ray diffraction (XRD), atom force microscopy (AFM), and Fourier transform infrared s... Vanadium dioxide thin films were fabricated through annealing vanadium oxide thin films deposited by dual ion beam sputtering. X-ray diffraction (XRD), atom force microscopy (AFM), and Fourier transform infrared spectrum (FTIR) were employed to measure the crystalline structure, surface morphology, and infrared optical transmittance. The phase transition properties were characterized by transmittance. The results show that the annealed vanadium oxide thin film is composed of monoclinic VO2, with preferred orientation of (011). The maximum of transmittance change is beyond 65% as the temperature increases from 20 to 80 C. The reversible changes in optical transmittance against temperature were observed. The change rate of transmittance at short wavelength is higher than that at long wavelength at the same temperature across semiconductor-metal phase transition. This phenomenon was discussed using diffraction effect. 展开更多
关键词 vanadium dioxide infrared transition diffraction effect dual ion beam sputtering ANNEALING
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Preparation of MgO Thin Films by Dual Ion Beam Sputtering
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作者 李贻杰 熊光成 +2 位作者 连贵君 李洁 甘子钊 《Chinese Science Bulletin》 SCIE EI CAS 1993年第20期1703-1707,共5页
1 Introduction Recently much attention has been devoted to the study on the deposition and properties of oxide films. Oxide thin films, such as MgO, SiO<sub>2</sub> and ZrO<sub>2</sub>, not onl... 1 Introduction Recently much attention has been devoted to the study on the deposition and properties of oxide films. Oxide thin films, such as MgO, SiO<sub>2</sub> and ZrO<sub>2</sub>, not only can be used as insulating layers in electronic devices but also act as buffer layers which can effectively obstruct the interface reaction between substrates and films or different layers. Moreover, in the technology of multilayer structures and Josephson junctions, it is also needed to grow insulating layers with perfect epitaxial structure. Up to now, it has been experimentally proved that a variety of oxide thin films can be used as buffer layers 展开更多
关键词 MGO THIN FILMS ion beam sputtering EPITAXIAL growth
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