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The Effect of Ion Current Density on Target Etching in Radio Frequency-Magnetron Sputtering Process
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作者 王庆 王永富 +1 位作者 巴德纯 岳向吉 《Plasma Science and Technology》 SCIE EI CAS CSCD 2012年第3期235-239,共5页
The effect of ion current density of argon plasma on target sputtering in magnetron sputtering process was investigated. Using home-made ion probe with computer-based data acquisition system, the ion current density a... The effect of ion current density of argon plasma on target sputtering in magnetron sputtering process was investigated. Using home-made ion probe with computer-based data acquisition system, the ion current density as functions of discharge power, gas pressure and positions was measured. A double-hump shape was found in ion current density curve after the analysis of the effects of power and pressure. The data demonstrate that ion current density increases with the increase in gas pressure in spite of slightly at the double-hump site, sharply at wave-trough and side positions. Simultaneously, the ion current density increases upon increase in power. Es- pecially, the ion current density steeply increases at the double-hump site. The highest energy of the secondary electrons arising from Larmor precession was found at the double-hump position, which results in high ion density. The target was etched seriously at the double-hump position due to the high ion density there. The data indicates that the increase in power can lead to a high sputtering speed rate. 展开更多
关键词 magnetron sputtering TARGET ion current probe ion current density ETCHING
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Research on corona discharge suppression of high-voltage direct-current transmission lines based on dielectric-film-covered conductor
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作者 Yuze JIANG Qiying LI +4 位作者 Xuekai ZHANG Diwen JIANG Shiqiang LIU Bangfa PENG Jie LI 《Plasma Science and Technology》 SCIE EI CAS CSCD 2021年第2期64-75,共12页
Corona discharge suppression for high-voltage direct-current(HVDC)transmission lines at line terminals such as converter stations is a subject that requires attention.In this paper,a method based on a conductor covere... Corona discharge suppression for high-voltage direct-current(HVDC)transmission lines at line terminals such as converter stations is a subject that requires attention.In this paper,a method based on a conductor covered with dielectric film is proposed and implemented through a bench-scale setup.Compared with the bare conductor,the corona discharge suppression effect of the dielectric-film-covered conductor under positive polarity is studied from the composite field strength and ion current density using a line-plate experimental device.The influences of film thickness and film material on the corona discharge suppression effect are investigated.The charge accumulation and dissipation characteristics of different film materials are also studied.The results show that the conductor covered with dielectric film has excellent ability to inhibit corona discharge.The ground-level composite field strength of the conductor covered with dielectric film is lower than its nominal field strength,and its ion current density is at the nA m^(−2) level.The corona threshold voltage can be promoted by increasing the film thickness,but the ability to inhibit corona discharge becomes weak.The larger the surface electric field strength,the more charge accumulated,but the faster the charge dissipation rate.Compared with polyvinyl chloride film,cross-linked polyethylene film has stronger charge accumulation ability and slower charge dissipation rate,which can better restrain the corona discharge of HVDC transmission lines. 展开更多
关键词 high-voltage direct-current(HVDC)transmission lines corona discharge suppression dielectric-film-covered conductor composite field strength ion current density
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Saturation Ion Current Densities in Inductively Coupled Hydrogen Plasma Produced by Large-Power Radio Frequency Generator
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作者 WANG Songbai LEI Guangjiu +3 位作者 BI Zhenhua H. GHOMI YANG Size LIU Dongping 《Plasma Science and Technology》 SCIE EI CAS CSCD 2016年第9期907-911,共5页
An experimental investigation of the saturation ion current densities (Jions) in hydrogen inductively coupled plasma (ICP) produced by a large-power (2-32 kW) radio frequency (RF) generator is reported, then s... An experimental investigation of the saturation ion current densities (Jions) in hydrogen inductively coupled plasma (ICP) produced by a large-power (2-32 kW) radio frequency (RF) generator is reported, then some reasonable explanations are given out. With the increase of RF power, the experimental results show three stages: in the first stage (2-14 kW), the electron temperature will rise with the increase of RF power in the ICP, thus, the Jions increases continually as the electron temperature rises in the ICP. In the second stage (14 20 kW), as some H- ions lead to the mutual neutralization (MN), the slope of Jio^s variation firstly decreases then increases. In the third stage (20-32 kW), both the electronic detachment (ED) and the associative detachment (AD) in the ICP result in the destruction of H- ions, therefore, the increased amplitude of the Jions in the third stage is weaker than the one in the first stage. In addition, with the equivalent transformer model, we successfully Explain that the Jions at different radial locations in ICP has the same rule. Finally, it is found that the Jions has nothing to do with the outer/inner puffing gas pressure ratio, which is attributed to the high-speed movement of hydrogen molecules. 展开更多
关键词 saturation ion current densities large-power RF generator outer/innerpuffing gas pressure ratio H- ion transformer model
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Charge Exchange Effect on Space-Charge-Limited Current Densities in Ion Diode
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作者 石磊 《Plasma Science and Technology》 SCIE EI CAS CSCD 2002年第2期1239-1242,共4页
The article theoretically studied the charge-exchange effects on space charge limitedelectron and ion current densities of non-relativistic one-dimensional slab ion diode, and comparedwith those of without charge exch... The article theoretically studied the charge-exchange effects on space charge limitedelectron and ion current densities of non-relativistic one-dimensional slab ion diode, and comparedwith those of without charge exchange. 展开更多
关键词 Charge Exchange Effect on Space-Charge-Limited current Densities in ion Diode THAN
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