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Reconstruction of Ionization Density Distribution in Hall Thruster Channel from Ion Energy Spectrum of Plasma Jet
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作者 李玉全 于达仁 《Plasma Science and Technology》 SCIE EI CAS CSCD 2006年第6期666-669,共4页
Propellant ionization in the Hall thruster discharge channel is a significant process and has strong influence on the thruster's efficiency. In this work, the functional relation has been established between the ioni... Propellant ionization in the Hall thruster discharge channel is a significant process and has strong influence on the thruster's efficiency. In this work, the functional relation has been established between the ionization density distribution and the function of the ion energy distribution through the basic equations governing the ion flow in the Hall thruster channel and the method achieved for reconstructing the ionization density distribution inside the channel by ordinary plasma diagnosis of the potential distribution and ion energy spectrum of the plasma jet. The ionization density distributions of single and double charged ions in an ATON-thruster channel have been reconstructed according to the experimental data of the potential distribution along the axis of the channel and the ion energy spectrum of the plasma jet. The agreement between the calculation and experimental results of the percentage of double charged ions proves the validity of our method achieved in this work. 展开更多
关键词 ionization density distribution ion energy spectrum ion energy distribution function atom densitv acceleration voltage
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Effects of power on ion behaviors in radio-frequency magnetron sputtering of indium tin oxide(ITO)
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作者 李茂洋 莫超超 +7 位作者 陈佳丽 季佩宇 谭海云 张潇漫 崔美丽 诸葛兰剑 吴雪梅 黄天源 《Plasma Science and Technology》 SCIE EI CAS CSCD 2024年第7期116-122,共7页
This study delves into ion behavior at the substrate position within RF magnetron discharges utilizing an indium tin oxide(ITO)target.The positive ion energies exhibit an upward trajectory with increasing RF power,att... This study delves into ion behavior at the substrate position within RF magnetron discharges utilizing an indium tin oxide(ITO)target.The positive ion energies exhibit an upward trajectory with increasing RF power,attributed to heightened plasma potential and initial emergent energy.Simultaneously,the positive ion flux escalates owing to amplified sputtering rates and electron density.Conversely,negative ions exhibit broad ion energy distribution functions(IEDFs)characterized by multiple peaks.These patterns are clarified by a combination of radiofrequency oscillation of cathode voltage and plasma potential,alongside ion transport time.This elucidation finds validation in a one-dimensional model encompassing the initial ion energy.At higher RF power,negative ions surpassing 100 e V escalate in both flux and energy,posing a potential risk of sputtering damages to ITO layers. 展开更多
关键词 RF magnetron sputtering ITO film ion energy distribution functions plasma diagnosis
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