Triggering scheme is a significant factor that may influence the process of vacuum arc initiation. In this work, the characteristics of resistance triggering of a pulsed vacuum arc ion source are investigated and comp...Triggering scheme is a significant factor that may influence the process of vacuum arc initiation. In this work, the characteristics of resistance triggering of a pulsed vacuum arc ion source are investigated and compared with the independent pulse generator triggering. The results show that although the resistance triggering method is capable of triggering a vacuum arc ion source by properly choosing the resistance and electric parameters, it inevitably increases the rise time of the arc current. A high speed multiframe camera is used to reveal the transition process o~ arc initiation during one shot. From the images it is conjectured that the lower voltage between the cathode and the anode may be the reason that leads to the lower transition speed of discharge at the moment of arc initiation.展开更多
A new method for the generation of high charged state metal ion beams is developed. This method is based on microwave heating of vacuum arc plasma in a magnetic trap under electron cyclotron resonance （ECR） conditio...A new method for the generation of high charged state metal ion beams is developed. This method is based on microwave heating of vacuum arc plasma in a magnetic trap under electron cyclotron resonance （ECR） conditions. Two gyrotrons for plasma heating were used, which were with the following parameters. The first is with a wave frequency of 37.5 GHz, a pulse duration of 1 ms and power of 100 kW, another is with 75 GHz, 0.15 ms and 400 kW. Two different magnetic traps were considered for vacuum arc plasma confinement. The first one is a simple mirror trap. Such system was already investigated and could provide high charge state ions. The second trap was with a cusp magnetic field configuration with native ＂minimum-B＂ field structure. Two different ways of metal plasma injection into the magnetic trap were used. The first one is an axial injection from an arc source located out of the trap, and the second is a radial injection from four arc sources mounted at the center of the trap. Both traps provide up to 200 eMA of ion beam current for platinum ions with highest charge state 10＋. Ion beams were successfully extracted from the plasma and accelerated by a voltage of up to 20 kV.展开更多
Plasma immersion ion implantation （PI） overcomes the direct exposure limit of traditional beam- line ion implantation, and is suitable for the treatment of complex work-piece with large size. Pm technology is often ...Plasma immersion ion implantation （PI） overcomes the direct exposure limit of traditional beam- line ion implantation, and is suitable for the treatment of complex work-piece with large size. Pm technology is often used for surface modification of metal, plastics and ceramics. Based on the requirement of surface modification of large size insulating material, a composite full-directional PHI device based on RF plasma source and metal plasma source is developed in this paper. This device can not only realize gas ion implantation, but also can realize metal ion implantation, and can also realize gas ion mixing with metal ions injection. This device has two metal plasma sources and each metal source contains three cathodes. Under the condition of keeping the vacuum unchanged, the cathode can be switched freely. The volume of the vacuum chamber is about 0.94 m3, and maximum vacuum degree is about 5 x10-4 Pa. The density of RF plasma in homogeneous region is about 109 cm-3, and plasma density in the ion implantation region is about 101x cm-3. This device can be used for large-size sample material PHI treatment, the maximum size of the sample diameter up to 400 mm. The experimental results show that the plasma discharge in the device is stable and can run for a long time. It is suitable for surface treatment of insulating materials.展开更多
This study reports a hybrid method which allows the formation of biocomposites on stainless steel implants. The main idea of the method is to create multilayer coatings consisting of titanium primer layer and a microa...This study reports a hybrid method which allows the formation of biocomposites on stainless steel implants. The main idea of the method is to create multilayer coatings consisting of titanium primer layer and a microarc calcium-phosphate coating. The titanium layer is deposited from plasma of continuous vacuum-arc discharge, and calcium-phosphate coating is formed by the microarc oxidation technique. The purpose of the hybrid method is to combine the properties of good strength stainless steel with high bioactivity of calcium-phosphate coating. This paper describes the chemical composition, morphology characteristics, adhesion and the ability of the formed biocomposites to stimulate the processes of osteoinduction. It is expedient to use such biocomposites for implants which carry heavy loads and are intended for long-term use, e.g. total knee endoprosthesis.展开更多
因脉冲熔化极气体保护焊(Pulse gas metal arc welding,GMAW-P)焊接电弧负载非线性与时变性的特点,GMAW-P焊接电源-电弧系统的研究、设计及其控制参数的选定有其固有的难点。采用基于Matlab/Simulink扩展工具S函数模块设计技术,建立GMA...因脉冲熔化极气体保护焊(Pulse gas metal arc welding,GMAW-P)焊接电弧负载非线性与时变性的特点,GMAW-P焊接电源-电弧系统的研究、设计及其控制参数的选定有其固有的难点。采用基于Matlab/Simulink扩展工具S函数模块设计技术,建立GMAW-P焊接电源-电弧系统动态仿真模型。基于所建立的仿真模型,在完成对控制器参数优化设计的同时,实现对GMAW-P电源-电弧系统的抗弧长干扰仿真研究。试验证明,仿真计算结果和试验结果具有较好的一致性,验证了所建仿真模型的正确性、控制系统调节器优化参数的适应性及电源控制系统的动态性能,为GMAW-P焊接电源-电弧系统仿真建模研究及控制器参数的优化设计提供了新的途径。展开更多
采用高速摄影和光谱诊断的方法研究了真空弧离子源脉冲工作瞬间的放电行为。拍摄了离子源放电瞬间吸氢电极上阴极斑的形成过程,分析了不同放电电流时阴极斑的发射光谱。实验结果表明,当脉冲工作电流为 101—102 A 时,真空弧离子源放电...采用高速摄影和光谱诊断的方法研究了真空弧离子源脉冲工作瞬间的放电行为。拍摄了离子源放电瞬间吸氢电极上阴极斑的形成过程,分析了不同放电电流时阴极斑的发射光谱。实验结果表明,当脉冲工作电流为 101—102 A 时,真空弧离子源放电区一般只有单个阴极斑,阴极斑的位置在同一次放电中的变化很小;较大的脉冲工作电流有利于提高阴极斑的温度,并最终导致氢离子浓度的增加,但也会使阴极材料的溅射更加严重,造成离子源等离子体品质下降。展开更多
基金Supported by the National Natural Science Foundation of China under Grant Nos 11105130 and 11475156
文摘Triggering scheme is a significant factor that may influence the process of vacuum arc initiation. In this work, the characteristics of resistance triggering of a pulsed vacuum arc ion source are investigated and compared with the independent pulse generator triggering. The results show that although the resistance triggering method is capable of triggering a vacuum arc ion source by properly choosing the resistance and electric parameters, it inevitably increases the rise time of the arc current. A high speed multiframe camera is used to reveal the transition process o~ arc initiation during one shot. From the images it is conjectured that the lower voltage between the cathode and the anode may be the reason that leads to the lower transition speed of discharge at the moment of arc initiation.
基金supported by the Russian Foundation for Basic Research (grant #11-08-00259)by the Ministry of Education and Science of theRussian Federation (state contract No. 14.740.11.1333)
文摘A new method for the generation of high charged state metal ion beams is developed. This method is based on microwave heating of vacuum arc plasma in a magnetic trap under electron cyclotron resonance （ECR） conditions. Two gyrotrons for plasma heating were used, which were with the following parameters. The first is with a wave frequency of 37.5 GHz, a pulse duration of 1 ms and power of 100 kW, another is with 75 GHz, 0.15 ms and 400 kW. Two different magnetic traps were considered for vacuum arc plasma confinement. The first one is a simple mirror trap. Such system was already investigated and could provide high charge state ions. The second trap was with a cusp magnetic field configuration with native ＂minimum-B＂ field structure. Two different ways of metal plasma injection into the magnetic trap were used. The first one is an axial injection from an arc source located out of the trap, and the second is a radial injection from four arc sources mounted at the center of the trap. Both traps provide up to 200 eMA of ion beam current for platinum ions with highest charge state 10＋. Ion beams were successfully extracted from the plasma and accelerated by a voltage of up to 20 kV.
文摘Plasma immersion ion implantation （PI） overcomes the direct exposure limit of traditional beam- line ion implantation, and is suitable for the treatment of complex work-piece with large size. Pm technology is often used for surface modification of metal, plastics and ceramics. Based on the requirement of surface modification of large size insulating material, a composite full-directional PHI device based on RF plasma source and metal plasma source is developed in this paper. This device can not only realize gas ion implantation, but also can realize metal ion implantation, and can also realize gas ion mixing with metal ions injection. This device has two metal plasma sources and each metal source contains three cathodes. Under the condition of keeping the vacuum unchanged, the cathode can be switched freely. The volume of the vacuum chamber is about 0.94 m3, and maximum vacuum degree is about 5 x10-4 Pa. The density of RF plasma in homogeneous region is about 109 cm-3, and plasma density in the ion implantation region is about 101x cm-3. This device can be used for large-size sample material PHI treatment, the maximum size of the sample diameter up to 400 mm. The experimental results show that the plasma discharge in the device is stable and can run for a long time. It is suitable for surface treatment of insulating materials.
文摘This study reports a hybrid method which allows the formation of biocomposites on stainless steel implants. The main idea of the method is to create multilayer coatings consisting of titanium primer layer and a microarc calcium-phosphate coating. The titanium layer is deposited from plasma of continuous vacuum-arc discharge, and calcium-phosphate coating is formed by the microarc oxidation technique. The purpose of the hybrid method is to combine the properties of good strength stainless steel with high bioactivity of calcium-phosphate coating. This paper describes the chemical composition, morphology characteristics, adhesion and the ability of the formed biocomposites to stimulate the processes of osteoinduction. It is expedient to use such biocomposites for implants which carry heavy loads and are intended for long-term use, e.g. total knee endoprosthesis.
文摘因脉冲熔化极气体保护焊(Pulse gas metal arc welding,GMAW-P)焊接电弧负载非线性与时变性的特点,GMAW-P焊接电源-电弧系统的研究、设计及其控制参数的选定有其固有的难点。采用基于Matlab/Simulink扩展工具S函数模块设计技术,建立GMAW-P焊接电源-电弧系统动态仿真模型。基于所建立的仿真模型,在完成对控制器参数优化设计的同时,实现对GMAW-P电源-电弧系统的抗弧长干扰仿真研究。试验证明,仿真计算结果和试验结果具有较好的一致性,验证了所建仿真模型的正确性、控制系统调节器优化参数的适应性及电源控制系统的动态性能,为GMAW-P焊接电源-电弧系统仿真建模研究及控制器参数的优化设计提供了新的途径。
文摘采用高速摄影和光谱诊断的方法研究了真空弧离子源脉冲工作瞬间的放电行为。拍摄了离子源放电瞬间吸氢电极上阴极斑的形成过程,分析了不同放电电流时阴极斑的发射光谱。实验结果表明,当脉冲工作电流为 101—102 A 时,真空弧离子源放电区一般只有单个阴极斑,阴极斑的位置在同一次放电中的变化很小;较大的脉冲工作电流有利于提高阴极斑的温度,并最终导致氢离子浓度的增加,但也会使阴极材料的溅射更加严重,造成离子源等离子体品质下降。
