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Simultaneous upconversion luminescence and color centers generated by femtosecond laser irradiation of LiF crystals
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作者 张扬 赵全忠 +3 位作者 泮怀海 王承伟 钱静 王占山 《Chinese Optics Letters》 SCIE EI CAS CSCD 2016年第8期93-97,共5页
We report the upconversion luminescence of lithium fluoride single crystals excited by an infrared femtosecond laser at room temperature. The luminescence spectra demonstrate that upconversion luminescence originates ... We report the upconversion luminescence of lithium fluoride single crystals excited by an infrared femtosecond laser at room temperature. The luminescence spectra demonstrate that upconversion luminescence originates from the color center of F3^+. The dependence of fluorescence intensity on pump power reveals that a two-photon excitation process dominates the conversion of infrared radiation into visible emission. Simultaneous absorption of two infrared photons is suggested to produce the F3^+ center population, which leads to the characteristic visible emission. The results are on the reveal and evaluation of the simultaneous two-photon absorption on the green upconversion process. 展开更多
关键词 luminescence irradiation simultaneous excited visible excitation fluoride relaxation luminescent lithium
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Micro-channel etching characteristics enhancement by femtosecond laser processing high-temperature lattice in fused silica glass 被引量:2
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作者 褚东凯 孙小燕 +6 位作者 胡友旺 董欣然 银恺 罗志 周剑英 王聪 段吉安 《Chinese Optics Letters》 SCIE EI CAS CSCD 2017年第7期56-59,共4页
A fused silica glass micro-channel can be formed by chemical etching after femtosecond laser irradiation, and the successful etching probability is only 48%. In order to improve the micro-channel fabrication success p... A fused silica glass micro-channel can be formed by chemical etching after femtosecond laser irradiation, and the successful etching probability is only 48%. In order to improve the micro-channel fabrication success probability,the method of processing a high-temperature lattice by a femtosecond laser pulse train is provided. With the same pulse energy and scanning speed, the success probability can be increased to 98% by optimizing pulse delay.The enhancement is mainly caused by the nanostructure, which changes from a periodic slabs structure to some intensive and loose pore structures. In this Letter, the optimum pulse energy distribution ratio to the etching is also investigated. 展开更多
关键词 etching fused silica fabrication irradiation optimizing loose relaxation train irradiated
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