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Nanoscale Ⅲ-Ⅴ on Si-based junctionless tunnel transistor for EHF band applications
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作者 Yogesh Goswami Pranav Asthana Bahniman Ghosh 《Journal of Semiconductors》 EI CAS CSCD 2017年第5期42-48,共7页
A single gate Ⅲ-Ⅴ junctionless tunnel field effect transistor(SG-JLTFET) has been reported which shows excellent dc characteristics at low power supply operation.This device has a thin uniformly n-type doped chann... A single gate Ⅲ-Ⅴ junctionless tunnel field effect transistor(SG-JLTFET) has been reported which shows excellent dc characteristics at low power supply operation.This device has a thin uniformly n-type doped channel of GaSb i.e.gallium antimonide which is grown epitaxially over silicon substrate.The DC performance parameters such as I(on),I(on)/I(off),average and point subthreshold slope as well as device parameters for analog applications viz.transconductance gm,transconductance generation efficiency gm/ID,various capacitances and the unity gain frequency fT are studied using a device simulator.Along with examining its endurance to short channel effects,the performances are also compared with a Silicon Dual Gate Junctionless Tunnel FET(DG-JLTFET).The DC and small signal analog performance reflects that GaSb SG-JLTFET has immense purview for extreme high-frequency and low-power applications. 展开更多
关键词 single gate junctionless tunnel field effect transistor (SG jl-tfet) gallium antimonide band-to-band tunnelling sub-threshold slope (SS)
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