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KPFM在电介质电荷行为研究中的应用
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作者 郭皓敏 张梓轩 +3 位作者 贾贝贝 陈承相 吴锴 周峻 《绝缘材料》 CAS 北大核心 2023年第10期1-11,共11页
开尔文探针力显微镜(KPFM)是一种以纳米级分辨率对材料表面进行电势测量的重要工具,由于其对材料表面电荷的敏感性,近年来在电介质电荷行为研究中获得了广泛应用。本文介绍了KPFM的原理,归纳了KPFM应用于电介质中电荷行为的最新研究进展... 开尔文探针力显微镜(KPFM)是一种以纳米级分辨率对材料表面进行电势测量的重要工具,由于其对材料表面电荷的敏感性,近年来在电介质电荷行为研究中获得了广泛应用。本文介绍了KPFM的原理,归纳了KPFM应用于电介质中电荷行为的最新研究进展,重点分析了电介质中表面、界面电荷的扩散、迁移机制,还对KPFM在无机材料、纳米复合材料、铁电材料等典型电介质中的应用研究进行了综述。 展开更多
关键词 开尔文探针力显微镜(kpfm) 表面电势 电介质 电荷行为
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KPFM测试参数对表面电势测量的影响
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作者 冯凯 白刚 +1 位作者 王美玲 菅傲群 《微纳电子技术》 北大核心 2018年第12期922-926,共5页
开尔文探针力显微镜(KPFM)是一种可以对材料表面电势进行纳米级成像的工具,是研究纳米材料表面特性的一种重要手段。高定向热解石墨(HOPG)具有表面光滑、导电性好的特点,在原子力显微镜(AFM)的KPFM模式下,向HOPG表面施加不同电压... 开尔文探针力显微镜(KPFM)是一种可以对材料表面电势进行纳米级成像的工具,是研究纳米材料表面特性的一种重要手段。高定向热解石墨(HOPG)具有表面光滑、导电性好的特点,在原子力显微镜(AFM)的KPFM模式下,向HOPG表面施加不同电压,测量HOPG的表面电势,以结果作为参照,采用控制变量法分别对比了滤波器阶数、灵敏度和驱动值三种参数对表面电势测量的影响。实验结果表明:滤波器阶数、灵敏度和驱动值均对表面电势的测量有不同程度的影响,不同程度增加滤波器阶数、灵敏度和驱动值都可以起到提升信噪比的作用,其中灵敏度的提升对信号的影响最为显著。 展开更多
关键词 开尔文探针力显微镜(kpfm) 高定向热解石墨(HOPG) 滤波器阶数 灵敏度 驱动值
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904L超级奥氏体不锈钢焊接接头的耐腐蚀性能研究
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作者 廖雪波 张度宝 +1 位作者 蒲晶菁 高超 《材料保护》 CAS CSCD 2023年第12期167-172,178,共7页
为了研究904L超级奥氏体不锈钢焊接接头在模拟核电厂三回路水环境中的耐腐蚀性能,采用开尔文探针力显微镜(KPFM)和电子背散射衍射(EBSD)技术,结合电化学试验、浸泡腐蚀试验研究了904L焊缝和母材晶界特征分布、表面接触电势差及介质温度... 为了研究904L超级奥氏体不锈钢焊接接头在模拟核电厂三回路水环境中的耐腐蚀性能,采用开尔文探针力显微镜(KPFM)和电子背散射衍射(EBSD)技术,结合电化学试验、浸泡腐蚀试验研究了904L焊缝和母材晶界特征分布、表面接触电势差及介质温度对其耐腐蚀行为的影响。结果表明:904L母材具有更高的Σ3特殊晶界,较焊缝具有更好的耐腐蚀性能。焊缝和熔合线表面平均电位差分别为318 mV和295 mV,且局部区域存在电位差低谷,具有更高的电化学活性。母材和焊缝临界点蚀温度(CPT)分别为50℃和43℃,CPT焊缝<CPT母材。温度的变化对焊缝的点蚀电位(Eb)具有更大的影响,随着温度升高,焊缝点蚀电位Eb急剧降低,腐蚀速率大幅度提高。 展开更多
关键词 开尔文探针力显微镜(kpfm) 电子背散射衍射(EBSD) 接触电势差 临界点蚀温度 点蚀电位
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二氧化钛表面接触电位差测试设计与分析
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作者 穆磊磊 王康谊 《传感器与微系统》 CSCD 北大核心 2023年第1期34-37,42,共5页
作为光催化剂模型材料的金红石型二氧化钛(110)结构,同时针对金红石型二氧化钛(110)提出了接触电位差(CPD)的2种测试方法,包括二次扫描法与原子追踪2D测试法。基于超高真空超低温调频原子力显微镜与开尔文探针力显微镜(UHV-ULT-NC-AFM/K... 作为光催化剂模型材料的金红石型二氧化钛(110)结构,同时针对金红石型二氧化钛(110)提出了接触电位差(CPD)的2种测试方法,包括二次扫描法与原子追踪2D测试法。基于超高真空超低温调频原子力显微镜与开尔文探针力显微镜(UHV-ULT-NC-AFM/KPFM)测试技术,通过对探针的修饰,完成了金红石型二氧化钛(110)表面CPD的表征。实验发现由于Smoluchowski效应,二氧化钛(110)表面台阶上CPD可减少0.2 V,同时研究了CPD减少与光催化活性的关系。为后期相关研究实验奠定了基础。 展开更多
关键词 光催化剂 接触电位差 超高真空 调频原子力显微镜 开尔文探针力显微镜
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高灵敏度开尔文探针力显微镜测量方法及其研究现状 被引量:3
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作者 金晨 许军 +3 位作者 王慧云 董诚 王旭东 马宗敏 《微纳电子技术》 CAS 北大核心 2021年第6期545-557,共13页
开尔文探针力显微镜(KPFM)不仅能够表征多种平整材料的表面形貌,还能对材料表面电势进行纳米级的成像。简单介绍了KPFM的基本工作原理与接触电势差(CPD)的概念,并介绍了幅度调制模式KPFM(AM-KPFM)、频率调制模式KPFM(FM-KPFM)与外差幅... 开尔文探针力显微镜(KPFM)不仅能够表征多种平整材料的表面形貌,还能对材料表面电势进行纳米级的成像。简单介绍了KPFM的基本工作原理与接触电势差(CPD)的概念,并介绍了幅度调制模式KPFM(AM-KPFM)、频率调制模式KPFM(FM-KPFM)与外差幅度调制模式(HAM-KPFM)这三种重要测量方法及其应用。系统综述了KPFM的国内外应用研究现状,详细介绍了其在金属纳米结构、半导体纳米结构表征方面的超高灵敏度与分辨率,总结了其在多种领域电特性表征中的广泛应用。最后对不同工作模式的KPFM进行了对比总结,展望了KPFM的未来发展。 展开更多
关键词 开尔文探针力显微镜(kpfm) 接触电势差(CPD) 超高分辨率 纳米级成像 动态原子力显微镜(AFM)
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开尔文探针力显微镜的应用研究现状 被引量:2
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作者 武兴盛 魏久焱 +1 位作者 常诞 马宗敏 《微纳电子技术》 北大核心 2018年第10期751-756,共6页
开尔文探针力显微镜(KPFM)是一种能够对众多材料表面电势纳米级成像的独特工具。首先介绍了开尔文探针力显微镜的基本工作原理和系统的建立。系统综述了开尔文探针力显微镜的国内外应用研究现状,包括开尔文探针力显微镜在物理、材料... 开尔文探针力显微镜(KPFM)是一种能够对众多材料表面电势纳米级成像的独特工具。首先介绍了开尔文探针力显微镜的基本工作原理和系统的建立。系统综述了开尔文探针力显微镜的国内外应用研究现状,包括开尔文探针力显微镜在物理、材料和生物等领域的重要应用。详细介绍了其在表征金属纳米结构和半导体纳米结构电学性质的超高分辨优势,表征器件纳米结构电学性质的兼容性优势及其他方面的独特的应用前景。指出了开尔文探针力显微镜的可扩展性需提高和物理机制需进一步深入研究,并且展望了开尔文探针力显微镜未来的发展趋势。 展开更多
关键词 开尔文探针力显微镜(kpfm) 接触电势差 纳米结构 超高分辨率 纳米级成像
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Crucial role of charge transporting layers on ion migration in perovskite solar cells
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作者 Abasi Abudulimu Lang Liu +3 位作者 Guilin Liu Nijiati Aimaiti Bohuslav Rezek Qi Chen 《Journal of Energy Chemistry》 SCIE EI CAS CSCD 2020年第8期132-137,I0005,共7页
The device preconditioning dependent hysteresis and the consequential performance degradation hinder the actual performance and stability of the perovskite solar cells. Ion migration and charge trapping in the perovsk... The device preconditioning dependent hysteresis and the consequential performance degradation hinder the actual performance and stability of the perovskite solar cells. Ion migration and charge trapping in the perovskite with large contribution from grain boundaries are the most common interpretations for the hysteresis. Yet, the high performing devices often include intermediate hole and electron transporting layers, which can further complicate the dynamical process in the device. Here, by using Kelvin Probe Force Microscopy and Confocal Photoluminescence Microscopy, we elucidate the impact of chargetransporting layers and excess MAI on the spatial and temporal variations of the photovoltage on the MAPbI3-based solar cells. By studying the devices layer by layer, we found that the light-induced ion migration occurs predominantly in the presence of an imbalanced charge extraction in the solar cells, and the charge transporting layers play crucial role in suppressing it. Careful selection and processing of the electron and hole-transporting materials are thus essential for making perovskite solar cells free from the ion migration effect. 展开更多
关键词 Perovskite solar cells Ion migration kpfm Charge transporting material
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Surface Characterisation of a Ferroelectric Single Crystal by Kelvin Probe Force Microscopy
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作者 Kenny Lau Yun Liu +3 位作者 Qian Li Zhenrong Li Ray L. Withers Zhuo Xu 《Journal of Surface Engineered Materials and Advanced Technology》 2013年第3期190-194,共5页
We investigated the surface potential dynamics of a ferroelectric Pb(In1/2Nb1/2)O3-Pb(Mg1/3Nb2/3)O3-PbTiO3 (PIMNT) single crystal using Kelvin probe force microscopy (KPFM). The initial surface potential is a function... We investigated the surface potential dynamics of a ferroelectric Pb(In1/2Nb1/2)O3-Pb(Mg1/3Nb2/3)O3-PbTiO3 (PIMNT) single crystal using Kelvin probe force microscopy (KPFM). The initial surface potential is a function of the applied bias since it reflects the interplay between the polarisation and screen charges. It is suggested that the different rates of tip injected charges are responsible for the asymmetric behaviour of the initial surface potential dependent on the sign of the applied bias. The polarisation, screen and tip injected charges are considered to explain the difference in surface potential dynamics. 展开更多
关键词 SURFACE POTENTIAL kpfm FERROELECTRIC
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金属性MoO_(2)纳米材料的制备及电阻的微区测量
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作者 黄晓丽 赖浩杰 谢伟广 《材料研究与应用》 CAS 2021年第5期441-447,I0002,共8页
为了研究MoO_(2)的本征电阻率,采用化学气相沉积法(CVD)在蓝宝石衬底上制备金属性MoO_(2)纳米材料,随后将材料转移到SiO_(2)衬底制备成双端电阻器件,在进行电压-电流曲线测量的同时,采用开尔文探针力显微镜(KPFM)研究不同偏压下MoO_(2)... 为了研究MoO_(2)的本征电阻率,采用化学气相沉积法(CVD)在蓝宝石衬底上制备金属性MoO_(2)纳米材料,随后将材料转移到SiO_(2)衬底制备成双端电阻器件,在进行电压-电流曲线测量的同时,采用开尔文探针力显微镜(KPFM)研究不同偏压下MoO_(2)纳米材料表面电势的空间分布。结果表明:传统测量时忽略了接触电阻和热效应的影响,导致测量结果偏高;测量的MoO_(2)的本征电阻率为6×10^(-5)Ω·cm,可以媲美高质量ITO薄膜电极。所以,MoO_(2)作为一种廉价电极材料在电子器件中具有潜在的应用前景。 展开更多
关键词 二氧化钼 电极材料 kpfm 电阻测量
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绝缘体表面电荷的开尔文探针力显微镜测量方法 被引量:3
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作者 何月 何鹏 +2 位作者 幸代鹏 曾慧中 张万里 《电子测量技术》 2018年第12期91-95,共5页
研究了一种基于开环模式开尔文探针力显微镜的表面电荷测量方法。该方法能够避免闭环模式开尔文探针力显微镜中外加直流偏压对电荷测量的影响。研究了针尖-样品间距、交流电压、比例系数等参数对电势测量的影响,优化了开环模式开尔文探... 研究了一种基于开环模式开尔文探针力显微镜的表面电荷测量方法。该方法能够避免闭环模式开尔文探针力显微镜中外加直流偏压对电荷测量的影响。研究了针尖-样品间距、交流电压、比例系数等参数对电势测量的影响,优化了开环模式开尔文探针力显微镜电荷测量方法,并将该方法运用于反射镜薄膜表面电荷积累特性的研究。实验结果表明针尖-样品间距直接影响开环模式开尔文探针力显微镜电荷测量的准确性,当针尖-样品间距控制在100nm时,实验成功检测到反射镜在等离子环境中的表面电荷积累效应,并且实现高于100nC/cm2的电荷分辨率,这对反射镜薄膜在等离子环境下损耗增加机制的研究具有重要意义。 展开更多
关键词 开尔文探针力显微镜 绝缘体材料 表面电荷测量 反射镜薄膜
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开尔文探针力显微镜非线性电学反馈系统设计
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作者 李新宇 胡晓东 +1 位作者 徐临燕 张锐 《自动化与仪表》 2022年第10期72-76,共5页
近年来,伴随着二维材料在半导体器件等方面的应用,人们使用开尔文探针力显微镜(KPFM)对二维材料进行了深入研究。尽管KPFM使用越来越广泛,但在KPFM测量二维材料功函数的准确性方面关注较少。该文提出使用一种非线性PI控制器提高KPFM的... 近年来,伴随着二维材料在半导体器件等方面的应用,人们使用开尔文探针力显微镜(KPFM)对二维材料进行了深入研究。尽管KPFM使用越来越广泛,但在KPFM测量二维材料功函数的准确性方面关注较少。该文提出使用一种非线性PI控制器提高KPFM的测量准确性。使用高定向热解石墨(HOPG)作为标准样进行非线性PI控制器系统性能评价,得到系统测量列的单次测量实验标准差为0.38 mV,平均值的实验标准差为0.12 mV,非线性误差为0.26%。衬底为金膜的二维材料MoSe2作为该文的实验测量对象,对比商用KPFM测量系统,基于非线性PI控制器调控的KPFM电学反馈误差电压绝对值的平均值减少了75.5%,误差电压绝对值的最大值减少了80.0%,表现出更高的测量准确性。 展开更多
关键词 开尔文探针力显微镜 高准确性PI控制器 有限元仿真
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Nanotribological properties and scratch resistance of MoS_(2)bilayerona SiO_(2)/Si substrate 被引量:1
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作者 Si-hwan KIM Hyo-sok AHN 《Friction》 SCIE EI CAS CSCD 2023年第1期154-164,共11页
The tribological properties and scratch resistance of MoS_(2)bilayer deposited on SiO_(2)/Si substrates prepared via chemical vapor deposition are investigated.Friction force microscopy(FFM)is employed to investigate ... The tribological properties and scratch resistance of MoS_(2)bilayer deposited on SiO_(2)/Si substrates prepared via chemical vapor deposition are investigated.Friction force microscopy(FFM)is employed to investigate the friction and wear properties of the MoS_(2)bilayer at the nanoscale by applying a normal load ranging from 200 to 1,000 nN.Scratch resistance is measured using the scratch mode in FFM based on a linearly increasing load from 100 to 1,000 nN.Kelvin probe force microscopy(KPFM)is performed to locally measure the surface potential in the tested surface to qualitatively measure the wear/removal of Mos,layers and identify critical loads associated with the individual failures of the top and bottom layers.The analysis of the contact potential difference values as well as that of KPFM,friction,and height images show that the wear/removal of the top and bottom layers in the MoS_(2)bilayer system occurred consecutively.The FFM and KPFM results show that the top MoS_(2)layer begins to degrade at the end of the low friction stage,followed by the bottom layer,thereby resulting in a transitional friction stage owing to the direct contact between the diamond tip and SiO_(2)substrate.In the stable third stage,the transfer of lubricious MoS_(2)debris to the tip apex results in contact between the MoS_(2)-transferred tip and SiO_(2).Nanoscratch test results show two ranges of critical loads,which correspond to the sequential removal of the top and bottom layers. 展开更多
关键词 chemical vapor deposition(CVD)-grown MoS bilayer friction force microscopy(FFM) nanoscratch test Kelvin probe force microscopy(kpfm) scratch resistance
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Direct observation of localized surface plasmon field enhancement by Kelvin probe force microscopy 被引量:2
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作者 Da-Bing Li Xiao-Juan Sun +5 位作者 Yu-Ping Jia Mark I Stockman Hari P Paudel Hang Song Hong Jiang Zhi-Ming Li 《Light(Science & Applications)》 SCIE EI CAS CSCD 2017年第1期608-614,共7页
A surface plasmon(SP)is a fundamental excitation state that exists in metal nanostructures.Over the past several years,the performance of optoelectronic devices has been improved greatly via the SP enhancement effect.... A surface plasmon(SP)is a fundamental excitation state that exists in metal nanostructures.Over the past several years,the performance of optoelectronic devices has been improved greatly via the SP enhancement effect.In our previous work,the responsivity of GaN ultraviolet detectors was increased by over 30 times when using Ag nanoparticles.However,the physics of the SP enhancement effect has not been established definitely because of the lack of experimental evidence.To reveal the physical origin of this enhancement,Kelvin probe force microscopy(KPFM)was used to observe the SP-induced surface potential reduction in the vicinity of Ag nanoparticles on a GaN epilayer.Under ultraviolet illumination,the localized field enhancement induced by the SP forces the photogenerated electrons to drift close to the Ag nanoparticles,leading to a reduction of the surface potential around the Ag nanoparticles on the GaN epilayer.For an isolated Ag nanoparticle with a diameter of~200 nm,the distribution of the SP localized field is located within 60 nm of the boundary of the Ag nanoparticle.For a dimer of Ag nanoparticles,the localized field enhancement between the nanoparticles was the strongest.The results presented here provide direct experimental proof of the localized field enhancement.These results not only explain the high performance of GaN detectors observed with the use of Ag nanoparticles but also reveal the physical mechanism of SP enhancement in optoelectronic devices,which will help us further understand and improve the performance of SP-based optoelectronic devices in the future. 展开更多
关键词 DETECTOR GAN kpfm PLASMON
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Effects of oxygen and moisture on the I-V characteristics of TiO_(2) thin films 被引量:2
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作者 Wanheng Lu Lai-Mun Wong +1 位作者 Shijie Wang Kaiyang Zeng 《Journal of Materiomics》 SCIE EI 2018年第3期228-237,共10页
Current-voltage(I-V)characteristics well reveal the resistive switching performance of materials promising for the next-generation memory-resistance random access memory(ReRAM).It has been observed that the atmospheri... Current-voltage(I-V)characteristics well reveal the resistive switching performance of materials promising for the next-generation memory-resistance random access memory(ReRAM).It has been observed that the atmospheric environment can affect the resistive switching performance,but the origin of this effect is still under debate.Conductive Atomic Force Microscopy(c-AFM)is widely used to study the resistive switching performance because of its capability to realize the resistive switching at the nanoscale that is becoming attractive as the miniaturization of memory devices.This study therefore aims to understand the effects of oxygen and moisture on the I-V characteristics of the TiO_(2)thin film by performing c-AFM measurements in ambient air,synthetic air,and argon gas.It is found that the oxygen in the environment can reduce the set and the reset voltages for the resistive switching,and it can also reduce the resistance at the low resistance state(LRS).Where the moisture in the environment can increase the set and reset voltages,and increase the resistance at LRS.These effects of oxygen and moisture in the environment can be attributed to the modification of the effective electric field during the resistive switching processes,which have been further confirmed by Kelvin Probe Force Microscopy(KPFM)measurements.In addition,it is found that the local ionic dynamics of TiO_(2)during the resistive switching are strongly dependent of the environments by performing the FORC-IV(First Order Reversal Curve-Current-Voltage)measurements in the three gas environments.Results in this work can provide a new perspective on the effect of environments on the resistive switching of materials,that is,the modulation of the effective electric field due to the adsorption of oxygen and moisture under the c-AFM tip. 展开更多
关键词 Resistive switching Environmental control c-AFM kpfm FORC-IV
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Local phenomena at grain boundaries:An alternative approach to grasp the role of oxygen vacancies in metallization of VO_(2) 被引量:2
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作者 Wanheng Lu Lai-Mun Wong +1 位作者 Shijie Wang Kaiyang Zeng 《Journal of Materiomics》 SCIE EI 2018年第4期360-367,共8页
Vanadium dioxide(VO_(2))undergoes an insulator to metal transition(MIT)and an accompanied phase transition from a monoclinic(M)structure to rutile(R)structure near room temperature,forming the basis for many VO_(2)-ba... Vanadium dioxide(VO_(2))undergoes an insulator to metal transition(MIT)and an accompanied phase transition from a monoclinic(M)structure to rutile(R)structure near room temperature,forming the basis for many VO_(2)-based functional devices.The MIT transition of VO_(2)and the functionality of VO_(2)-based devices can be controlled by a variety of chemical and physical stimuli.With these external stimuli,defects,such as oxygen vacancies,are often inevitably introduced.However,due to the VeO systeminduced challenge to synthesize stable VO_(2)with different oxygen vacancy concentrations,the impact of oxygen vacancies on the resistance and transition of the VO_(2)is not fully understood.Oxygen vacancy,as one of the typical defects in VO_(2),is expected to concentrate at grain boundaries,and hence a concentration gradient of oxygen vacancies may exist between the grains interior and the boundaries,and this suggests a possibility to study the effects of oxygen vacancies on the transition of VO_(2)by probing local phenomena at the grain boundaries.For investigating local phenomena at the grain boundaries,Scanning Probe Microscopy(SPM)techniques are effective,which allows probing the structure and various properties at the nanoscale.In this work,a series of SPM techniques,including Atomic Force Microscopy(AFM),conductive-AFM(c-AFM),Electrochemical Strain Microscopy(ESM),and Kelvin Probe Force Microscopy(KPFM),are employed to measure variations of the surface structure,the resistance,the oxygen vacancy concentration,and the work function between the grain interior and the grain boundary.It has been demonstrated that,for most cases,both the resistance and the work function are lower at the grain boundaries as a result of the accumulation of oxygen vacancies at those positions.In addition,the resistance change induced by the electric field has been observed in the deposited VO_(2)thin films,which may be associated with the generation/annihilation of the oxygen vacancies,rather than charge injection.This work has demonstrated the effects of oxygen vacancies in the transition of VO_(2)by probing the local phenomena at grain boundaries,also provided a new insight into the resistance change of VO_(2)under an electric field. 展开更多
关键词 Fermi level VO_(2)thin film c-AFM kpfm ESM
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Tunable diameter electrostatically formed nanowire for high sensitivity gas sensing 被引量:1
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作者 Alex Henning Nandhini Swaminathan +3 位作者 Andrey Godkin Gil Shalev Iddo Amit Yossi Rosenwaks 《Nano Research》 SCIE EI CAS CSCD 2015年第7期2206-2215,共10页
We report on an electrostatically formed nanowire (EFN)-based sensor with tunable diameters in the range of 16 nm to 46 nm and demonstrate an EFN- based field-effect transistor as a highly sensitive and robust room ... We report on an electrostatically formed nanowire (EFN)-based sensor with tunable diameters in the range of 16 nm to 46 nm and demonstrate an EFN- based field-effect transistor as a highly sensitive and robust room temperature gas sensor. The device was carefully designed and fabricated using standard integrated processing to achieve the 16 nm EFN that can be used for sensing without any need for surface modification. The effective diameter for the EFN was determined using Kelvin probe force microscopy accompanied by three- dimensional electrostatic simulations. We show that the EFN transistor is capable of detecting 100 parts per million of ethanol gas with bare SiO2. 展开更多
关键词 gas sensing silicon nanowires KELVIN probe forcemicroscopy (kpfm) ELECTROSTATIC confinement multiple gate transistor
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Hole-doping of mechanically exfoliated graphene by confined hydration layers 被引量:1
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作者 Tjeerd R. J. Bollmann Liubov Yu. Antipina +2 位作者 Matthias Temmen Michael Reichling Pavel B. Sorokin 《Nano Research》 SCIE EI CAS CSCD 2015年第9期3020-3026,共7页
By the use of non-contact atomic force microscopy (NC-AFM) and Kelvin probe force microscopy (KPFM), we measure the local surface potential of mechanically exfoliated graphene on the prototypical insulating hydrop... By the use of non-contact atomic force microscopy (NC-AFM) and Kelvin probe force microscopy (KPFM), we measure the local surface potential of mechanically exfoliated graphene on the prototypical insulating hydrophilic substrate of CAF2(111). Hydration layers confined between the graphene and the CaF2 substrate, resulting from the graphene's preparation under ambient conditions on the hydrophilic substrate surface, are found to electronically modify the graphene as the material's electron density transfers from graphene to the hydration layer. Density functional theory (DFT) calculations predict that the first 2 to 3 water layers adjacent to the graphene hole-dope the graphene by several percent of a unit charge per unit cell. 展开更多
关键词 graphene non-contact ATOMIC forcemicroscopy (NC-AFM kpfm) liquid-solid interfacestructure electronic TRANSPORT innanoscale materials andstructuresgraphene non-contact ATOMIC forcemicroscopy (NC-AFM kpfm) liquid-solid interfacestructure electronic TRANSPORT innanoscale materials andstructures
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Interface Reconstruction Study by Functional Scanning Probe Microscope in Li-ion Battery Research
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作者 JIA Lang-Lang JI Yu-Chen +3 位作者 YANG Kai WANG Zi-Jian CHEN Hai-Biao PAN Feng 《Chinese Journal of Structural Chemistry》 SCIE CAS CSCD 2020年第2期200-205,183,共7页
Interfacial reaction is a critical factor of lithium ion battery, but is also complicated and difficult to characterize. Scanning probe microscope(SPM) is one of the most effective tools to reveal the interface recons... Interfacial reaction is a critical factor of lithium ion battery, but is also complicated and difficult to characterize. Scanning probe microscope(SPM) is one of the most effective tools to reveal the interface reconstruction and interfacial properties(including the morphologies, mechanical properties and electricity properties) of energy material at nanoscale and at real time. In this paper, we briefly summarized the principles of AFM, conductive AFM(C-AFM) and Kelvin probe force microscope(KPFM), as well as their application to investigate the interface reconstruction of lithium-ion battery electrode material. 展开更多
关键词 SPM AFM kpfm C-AFM BATTERY
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Patterning Functionalized Surfaces of 2D Materials by Nanoshaving
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作者 Katie O'Neill Rob Greig +7 位作者 Rita Tilmann Lisanne Peters Conor P.Cullen Graeme Cunningham Cian Bartlam Cormac O Coileain Niall McEvoy Georg S.Duesberg 《Nanomanufacturing and Metrology》 EI 2022年第1期23-31,共9页
Atomic force microscopy(AFM)and scanning probe lithography can be used for the mechanical treatment of various surfaces,including polymers,metals,and semiconductors.The technique of nanoshaving,in which materials are ... Atomic force microscopy(AFM)and scanning probe lithography can be used for the mechanical treatment of various surfaces,including polymers,metals,and semiconductors.The technique of nanoshaving,in which materials are removed using the AFM tip,is employed in this work to produce nanopatterns of self-assembled monolayers(SAMs)on two-dimensional(2D)materials.The materials used are monolayers of transition metal dichalcogenides(TMDs),namely,MoS_(2)and WS_(2),which are noncovalently functionalized with perylene diimide(PDI),a perylene derivative.The approach involves rastering an AFM probe across the surface at a controlled increased load in ambient conditions.As a result of the strong bond between PDI SAM and TMD,loads in excess of 1|1N are required to pattern the monolayer.Various predefined patterns,including a grating pattern with feature sizes below 250 nm,are demonstrated.Results indicate the high precision of nanoshaving as an accurate and nondestructive lithographic technique for 2D materials.The work functions of shaved heterostructures are also examined using Kelvin probe force microscopy. 展开更多
关键词 Nanoshaving AFM kpfm Perylene diimide 2D materials MoS_(2) WS_(2) Noncovalent functionalization
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Optoeletronic investigation of Cu2ZnSn(S,Se)4 thin-films & Cu2Zn Sn(S,Se)4/CdS interface with scanning probe microscopy
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作者 Jiangjun Li Yugang Zou +3 位作者 Ting Chen Jinsong Hu Dong Wang Li-Jun Wan 《Science China Chemistry》 SCIE EI CAS CSCD 2016年第2期231-236,共6页
The kesterite-structured semiconductor Cu_2 Zn Sn(S,Se)_4(CZTSSe) is prepared by spin coating a non-hydrazine precursor and annealing at Se atmosphere. Local electrical and optoelectronic properties of the CZTSSe thin... The kesterite-structured semiconductor Cu_2 Zn Sn(S,Se)_4(CZTSSe) is prepared by spin coating a non-hydrazine precursor and annealing at Se atmosphere. Local electrical and optoelectronic properties of the CZTSSe thin-film are explored by Kelvin probe force microscopy and conductive atomic force microscopy. Before and after irradiation, no marked potential bending and very low current flow are observed at GBs, suggesting that GBs behave as a charge recombination site and an obstacle for charge transport. Furthermore, Cd S nano-islands are synthesized via successive ionic layer adsorption and reaction(SILAR) method on the surface of CZTSSe. By comparing the work function and current flow change of CZTSSe and Cd S in dark and under illumination, we demonstrate photo-induced electrons and holes are separated at the interface of p-n junction and transferred in Cd S and CZTSSe, respectively. 展开更多
关键词 扫描探针显微镜 SE CD 薄膜 导电原子力显微镜 Kelvin探针 电调 SN
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