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Smaller Ge Quantum Dots Obtained by ArF Excimer Laser Annealing
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作者 曾玉刚 韩根全 余金中 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2008年第4期641-644,共4页
Ge self-assembled quantum dots (SAQDs) are grown with a self-assembled UHV/CVD epitaxy system. Then, the as-grown Ge quantum dots are annealed by ArF excimer laser. In the ultra-shot laser pulse duration, -20ns, bul... Ge self-assembled quantum dots (SAQDs) are grown with a self-assembled UHV/CVD epitaxy system. Then, the as-grown Ge quantum dots are annealed by ArF excimer laser. In the ultra-shot laser pulse duration, -20ns, bulk diffusion is forbidden,and only surface diffusion occurs, resulting in a laser induced quantum dot (LIQD). The diameter of the LIQD is 20-25nm which is much smaller than the as-grown dot and the LIQD has a higher density of about 6 ×10^10cm^-2. The surface morphology evolution is investigated by AFM. 展开更多
关键词 Ge quantum dot ArF excimer laser annealing liqd AFM
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