A simple method for measuring RF plasma parameters by means of a DC-biased Langmuir probe is developed. The object of this paper is to ensure the reliability of this method by using the other methods with different pr...A simple method for measuring RF plasma parameters by means of a DC-biased Langmuir probe is developed. The object of this paper is to ensure the reliability of this method by using the other methods with different principles. First, Langmuir probe current response on RF voltage superimposed to DC biased probe was examined in DC plasmas. Next, probe current response of DC biased probe in RF plasmas was studied and compared with the first experiment. The results were confirmed by using an emissive prove method, an ion acoustic wave method, and a square pulse response method. The method using a simple Langmuir probe is useful and convenient for measuring electron temperature , electron density , time-averaged space potential , and amplitude of space potential oscillation in RF plasmas with a frequency of the order of .展开更多
The inflexion point of electron density and effective electron temperature curves versus radio-frequency （RF） bias voltage is observed in the H mode of inductively coupled plasmas （ICPs）. The electron energy proba...The inflexion point of electron density and effective electron temperature curves versus radio-frequency （RF） bias voltage is observed in the H mode of inductively coupled plasmas （ICPs）. The electron energy probability function （EEPF） evolves first from a Maxwellian to a Druyvesteyn-like distribution, and then to a Maxwellian distribution again as the RF bias voltage increases. This can be explained by the interaction of two distinct bias-induced mechanisms, that is： bias- induced electron heating and bias-induced ion acceleration loss and the decrease of the effective discharge volume due to the sheath expansion. Furthermore, the trend of electron density is verified by a fluid model combined with a sheath module.展开更多
文摘A simple method for measuring RF plasma parameters by means of a DC-biased Langmuir probe is developed. The object of this paper is to ensure the reliability of this method by using the other methods with different principles. First, Langmuir probe current response on RF voltage superimposed to DC biased probe was examined in DC plasmas. Next, probe current response of DC biased probe in RF plasmas was studied and compared with the first experiment. The results were confirmed by using an emissive prove method, an ion acoustic wave method, and a square pulse response method. The method using a simple Langmuir probe is useful and convenient for measuring electron temperature , electron density , time-averaged space potential , and amplitude of space potential oscillation in RF plasmas with a frequency of the order of .
基金supported by the National Natural Science Foundation of China(Grant Nos.11075029,11175034,and 11205025)the Fundamental Research Funds for Central Universities,China(Grant No.DUT12RC(3)14)
文摘The inflexion point of electron density and effective electron temperature curves versus radio-frequency （RF） bias voltage is observed in the H mode of inductively coupled plasmas （ICPs）. The electron energy probability function （EEPF） evolves first from a Maxwellian to a Druyvesteyn-like distribution, and then to a Maxwellian distribution again as the RF bias voltage increases. This can be explained by the interaction of two distinct bias-induced mechanisms, that is： bias- induced electron heating and bias-induced ion acceleration loss and the decrease of the effective discharge volume due to the sheath expansion. Furthermore, the trend of electron density is verified by a fluid model combined with a sheath module.
