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Growth of High-Quality Superconducting FeSe0.5Te0.5 Thin Films Suitable for Angle-Resolved Photoemission Spectroscopy Measurements via Pulsed Laser Deposition
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作者 孔万东 刘治国 +6 位作者 吴尚飞 王刚 钱天 殷嘉鑫 夏芮岩 颜雷 丁洪 《Chinese Physics Letters》 SCIE CAS CSCD 2015年第8期144-147,共4页
High-quality superconducting FeSe0.5 Te0.5 films are epitaxiMly grown on different substrates by using the pulsed laser deposition method. By measuring the transport properties and surface morphology of films grown on... High-quality superconducting FeSe0.5 Te0.5 films are epitaxiMly grown on different substrates by using the pulsed laser deposition method. By measuring the transport properties and surface morphology of films grown on single- crystal substrates of Al2O3 (0001), SrTiO3 (001), and MgO (001), as well as monitoring the real-time growth process on MgO substrates with reflection high energy electron diffraction, we find the appropriate parameters for epitaxial growth of high-quality FeSe0.5 Te0.5 thin films suitable for angle-resolved photoemission spectroscopy measurements. We further report the angle-resolved photoemission spectroscopy characterization of the super- conducting films. The clearly resolved Fermi surfaces and the band structure suggest a sample quality that is as good as that of high-quality single-crystals, demonstrating that the pulsed laser deposition method can serve as a promising technique for in situ preparation and manipulation of iron-based superconducting thin films, which may bring new prosperity to angle-resolved photoemission spectroscopy research on iron-based superconductors. 展开更多
关键词 Thin films Suitable for Angle-Resolved Photoemission Spectroscopy Measurements via Pulsed laser Deposition Te growth of High-Quality Superconducting FeSe ARPES MgO
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Effect of Oxygen Partial Pressure on Epitaxial Growth and Properties of Laser-Ablated AZO Thin Films
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作者 王传彬 LUO Sijun +1 位作者 SHEN Qiang 张联盟 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2016年第1期27-30,共4页
Al-doped ZnO(AZO) thin films were grown on c-sapphire substrates by laser ablation under different oxygen partial pressures(P_(O2)).The effect of P_(O2) on the crystal structure,preferred orientation as well a... Al-doped ZnO(AZO) thin films were grown on c-sapphire substrates by laser ablation under different oxygen partial pressures(P_(O2)).The effect of P_(O2) on the crystal structure,preferred orientation as well as the electrical and optical properties of the films was investigated.The structure characterizations indicated that the as-grown films were single-phased with a wurtzite ZnO structure,showing a significant c-axis orientation.The films were well crystallized and exhibited better crystallinity and denser texture when deposited at higher P_(O2).At the optimum oxygen partial pressures of 10- 15 Pa,the AZO thin films were epitaxially grown on c-sapphire substrates with the(0001) plane parallel to the substrate surface,i e,the epitaxial relationship was AZO(000 1) // A1_2O_3(000 1).With increasing P_(O2),the value of Hall carrier mobility was increased remarkably while that of carrier concentration was decreased slightly,which led to an enhancement in electrical conductivity of the AZO thin films.All the films were highly transparent with an optical transmittance higher than 85%. 展开更多
关键词 AZO thin films epitaxial growth laser ablation oxygen partial pressure electrical and optical properties
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Growth and Characterization of InSb Thin Films on GaAs(001) without Any Buffer Layers by MBE
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作者 赵晓蒙 张杨 +4 位作者 崔利杰 关敏 王保强 朱战平 曾一平 《Chinese Physics Letters》 SCIE CAS CSCD 2017年第7期177-181,共5页
We report the growth of InSb layers directly on GaAs (001) substrates without any buffer layers by molecular beam epitaxy (MBE). Influences of growth temperature and V/Ⅲ flux ratios on the crystal quality, the su... We report the growth of InSb layers directly on GaAs (001) substrates without any buffer layers by molecular beam epitaxy (MBE). Influences of growth temperature and V/Ⅲ flux ratios on the crystal quality, the surface morphology and the electrical properties of InSb thin films are investigated. The InSb samples with room- temperature mobility of 44600cm2/Vs are grown under optimized growth conditions. The effect of defects in InSb epitaxial on the electrical properties is researched, and we infer that the formation of In vacancy (VIn) and Sb anti-site (SbIn) defects is the main reason for concentrations changing with growth temperature and Sb2/In flux ratios. The mobility of the InSb sample as a function of temperature ranging from 90 K to 360K is demonstrated and the dislocation scattering mechanism and phonon scattering mechanism are discussed. 展开更多
关键词 growth and Characterization of InSb Thin films on GaAs mbe
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Centimeter-scale growth of two-dimensional layered high-mobility bismuth films by pulsed laser deposition 被引量:11
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作者 Zhibin Yang Zehan Wu +1 位作者 Yongxin Lyu Jianhua Hao 《InfoMat》 SCIE CAS 2019年第1期98-107,共10页
Ever since discovery of graphene,two-dimensional(2D)materials become a new tool box for information technology.Among the 2D family,ultrathin bismuth(Bi)has attracted a great deal of attention in recent years due to it... Ever since discovery of graphene,two-dimensional(2D)materials become a new tool box for information technology.Among the 2D family,ultrathin bismuth(Bi)has attracted a great deal of attention in recent years due to its unique topological insulating properties and large magnetoresistance.However,the scalable synthesis of layered Bi ultrathin films is rarely been reported,which would greatly restrict further fundamental investigation and practical device development.Here,we demonstrate the direct growth of homogeneous and centimeter-scale layered Bi films by pulsed laser deposition(PLD)technique.The as-grown Bi film exhibits high-purity phase and good crystallinity.In addition,both(111)and(110)-oriented Bi films can be synthesized by precisely controlling the processing temperature.The characterization of optical properties shows a thickness dependent band gaps(0.075-0.2 eV).Moreover,Bi thin-film-based field-effect transistors have been demonstrated,exhibiting a large carrier mobility of 220 cm2 V−1 s−1.Our work suggests that the PLD-grown Bi films would hold the potential to develop spintronic applications,electronic and optoelectronic devices used for information science and technology. 展开更多
关键词 2D materials bismuth film nanoscale information devices pulsed laser deposition wafer scale growth
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Epitaxial growth and electrical transport properties of La_(0.5)Sr_(0.5)CoO_3 thin films prepared by pulsed laser deposition 被引量:1
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作者 李美亚 熊光成 +3 位作者 王忠烈 范守善 赵清太 林揆训 《Science China Mathematics》 SCIE 1999年第8期865-872,共8页
Epitaxial growth of the Lag0.5Sr0.5CoO3(LSCO) thin films has been realized on LaAl03, SrTiO3 and MgO substrates by pulsed laser deposition. The epitaxial growth behavior and the electrical transport properties of thes... Epitaxial growth of the Lag0.5Sr0.5CoO3(LSCO) thin films has been realized on LaAl03, SrTiO3 and MgO substrates by pulsed laser deposition. The epitaxial growth behavior and the electrical transport properties of these films were studied systematically. The temperature dependencies of the resistivity of the film have been determined. Studies indicate that close dependencies exist between the crystal structures and the electrical transport properties of the epitaxial LSCO films, and that the epitaxial thin films are of low resistivity and metallic conductive features. The epitaxial films deposited on the LaAlO3 substrates at about 700℃ possess the optimal properties compared with the others. Discussions of the dependencies and the mechanisms of the epitaxial structures on the electrical transport properties of the LSCO films have been made. 展开更多
关键词 EPITAXIAL growth PULSED laser DEPOSITION La0.5Sr0.5CoO3 THIN film electrical transport properties.
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Growth of HT-LiCoO2 thin films on Pt-metalized silicon substrates
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作者 ZHANG Yao CHUNG Chiyuen ZHU Min 《Rare Metals》 SCIE EI CAS CSCD 2008年第3期266-272,共7页
Layered LiCoO2 (HT-LiCoO2) films were grown on Pt-metalized silicon (PMS) substrates and polished bulk nickel (PBN) substrates by pulsed laser deposition. The effects of substrate temperature, oxygen pressure, a... Layered LiCoO2 (HT-LiCoO2) films were grown on Pt-metalized silicon (PMS) substrates and polished bulk nickel (PBN) substrates by pulsed laser deposition. The effects of substrate temperature, oxygen pressure, and substrate surface roughness on the microstructure of LiCoO2 films were investigated. It has been found that a higher substrate temperature and a higher oxygen pressure favor the formation of better crystallized and less lithium-deficient HT-LiCoO2 films. The HT-LiCoO2 film deposited on PBN substrates consists of large randomly orientated equiaxial grains, whereas on PMS substrate, it is made up of loosely packed highly [001] preferential orientated triangular shaped grains with the average grain size less than 100 nm. Electrochemical measurements show that the highly [001] preferentially orientated nanostructured HT-LiCoO2 thin film grown on PMS substrate has good structural stability upon lithium insertion/extraction and can deliver an initial discharge capacity of approximately 45μA·h·cm^-2·μm^-1 with a cycling efficiency of above 99% at the charge/discharge rate of 0.5 C. 展开更多
关键词 thin film LICOO2 pulsed laser deposition electrochemical properties thin film growth
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In situ LASER PROCESSING OF HIGH T_c SUPERCONDUCTING THIN FILMS AT 450—550℃
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作者 安承武 范永昌 +1 位作者 陆冬生 李再光 《Chinese Science Bulletin》 SCIE EI CAS 1992年第17期1483-1486,共4页
To achieve wide applications of high T_c superconductivity in the field of novel microelectronics, the high quality superconducting thin films have to be prepared first. Great progress on preparation of high T_c super... To achieve wide applications of high T_c superconductivity in the field of novel microelectronics, the high quality superconducting thin films have to be prepared first. Great progress on preparation of high T_c supercoducting thin films by various techniques, 展开更多
关键词 laser processing SUPERCONDUCTING THIN filmS in SITU growth low temperature preparing.
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The Growth and Microstructure of GaAs Embedded with Al Nanocrystals
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作者 WANG Xinming CHEN Jie +4 位作者 ZENG Yong LI Jia ZHOU Minjie WU Weidong YAN Dawei 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2022年第6期1051-1055,共5页
The preparation and the microstructure of GaAs embedded with Al nanocrystals prepared by Laser molecular beam epitaxy were investigated.The microstructure of the sample was observed by transmission electron microscope... The preparation and the microstructure of GaAs embedded with Al nanocrystals prepared by Laser molecular beam epitaxy were investigated.The microstructure of the sample was observed by transmission electron microscope.The reflection high-energy electron diffraction(RHEED)pattern varied from the stripe pattern to the spot pattern at the beginning of the Al nanocrystals growth,and then the spot pattern tended to change to the stripe pattern.There was a large lattice mismatch between Al and GaAs substrate,and Al formed three-dimensional islands on the GaAs substrate,which led to the RHEED transformation into the spot pattern.Otherwise,the dislocations would be formed between the GaAs layer and Al islands due to the large lattice mismatch.Meanwhile,there was some polycrystal of GaAs around the Al islands. 展开更多
关键词 GaAs thin films epitaxial growth laser molecular beam epitaxy film growth mechanism
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Molecular Beam Epitaxy Growth and Scanning Tunneling Microscopy Study of Pyrite CuSe2 Films on SrTiO3
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作者 彭俊平 张慧敏 +5 位作者 宋灿立 蒋烨平 王立莉 何珂 薛其坤 马旭村 《Chinese Physics Letters》 SCIE CAS CSCD 2015年第6期180-183,共4页
We perform molecular beam epitaxy growth and scanning tunneling microscopy study of copper diselenide (CuSe2 ) films on SrTiO3 (001). Using a Se-rich condition, the single-phase pyrite CuSe2 grows in the Stranski-... We perform molecular beam epitaxy growth and scanning tunneling microscopy study of copper diselenide (CuSe2 ) films on SrTiO3 (001). Using a Se-rich condition, the single-phase pyrite CuSe2 grows in the Stranski-Krastanov (layer-plus-island) mode with a preferential orientation of (111). Our careful inspection of both the as-grown and post-annealed CuSe2 films at various temperatures invariably shows a Cu-terminated surface, which, depending on the annealing temperature, reconstructs into two distinct structures 2 ×√3 and √x ×√3-R30°. The Cu termi- nation is supported by the depressed density of states near the Fermi level, measured by in-situ low temperature scanning tunneling spectroscopy. Our study helps understand the preparation and surface chemistry of transition metal pyrite dichalcogenides thin films. 展开更多
关键词 Molecular Beam Epitaxy growth and Scanning Tunneling Microscopy Study of Pyrite CuSe2 films on SrTiO3 mbe Cu
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生长温度对L-MBE法制备的ZnO薄膜性能的影响 被引量:1
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作者 徐庆安 张景文 +3 位作者 杨晓东 巨楷如 贺永宁 侯洵 《人工晶体学报》 EI CAS CSCD 北大核心 2006年第2期248-252,共5页
在蓝宝石C面上利用激光分子束外延(L-MBE)的方法,分别在250℃、300℃、350℃、400℃和450℃生长了高度C轴取向的ZnO薄膜。并进行了X射线衍射(XRD)、光致发光(PL)谱的分析。测试结果表明,较低温度时,随着生长温度的升高,薄膜的结晶及发... 在蓝宝石C面上利用激光分子束外延(L-MBE)的方法,分别在250℃、300℃、350℃、400℃和450℃生长了高度C轴取向的ZnO薄膜。并进行了X射线衍射(XRD)、光致发光(PL)谱的分析。测试结果表明,较低温度时,随着生长温度的升高,薄膜的结晶及发光性能得到提高;但是当温度进一步升高,却有所变差。说明利用L-MBE系统制备ZnO薄膜存在一合适的温度范围,并对此机理进行了深入分析。 展开更多
关键词 ZNO薄膜 生长温度 激光分子束外延 X射线衍射 光致发光谱
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MBE法制备VO_2薄膜及其中红外调制深度测量 被引量:1
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作者 刘志伟 路远 +1 位作者 侯典心 邹崇文 《发光学报》 EI CAS CSCD 北大核心 2018年第7期942-947,共6页
为了给VO_2薄膜在定向红外对抗系统防护方面的应用提供理论依据,我们用透过率调制深度表征VO_2薄膜在中红外波段的相变特性。本实验利用分子束外延法(MBE)制备VO_2外延单晶薄膜,经XRD、AFM表征,发现其具有(020)择优取向、纯度较高,薄膜... 为了给VO_2薄膜在定向红外对抗系统防护方面的应用提供理论依据,我们用透过率调制深度表征VO_2薄膜在中红外波段的相变特性。本实验利用分子束外延法(MBE)制备VO_2外延单晶薄膜,经XRD、AFM表征,发现其具有(020)择优取向、纯度较高,薄膜表面平整、均匀且致密。经VU-Vis-IR测量发现其近红外透过率相变特性显著,但在紫外和可见光范围内透过率相变特性较不明显。然后我们对制备时间为30 min、40min的两组薄膜分别进行25~70℃的升温和降温实验,观察其对波长为3 459 nm、脉宽50 ns、重频50 k Hz、功率密度0.14 W/cm2的中红外激光的透过率变化,并比较两组薄膜的温滞曲线特性。实验发现它们对中红外透过率的调制深度均可达60%以上,前者比后者对中红外的调制深度高出约4%。这说明利用分子束外延法制备的VO_2单晶薄膜具有良好的中红外调制特性,且调制深度和膜厚有关。进一步表明了利用VO_2薄膜实现中红外激光防护具有一定的可行性。 展开更多
关键词 分子束外延 VO2薄膜 透过率调制深度 中红外激光防护
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Development of in situ characterization techniques in molecular beam epitaxy 被引量:1
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作者 Chao Shen Wenkang Zhan +7 位作者 Manyang Li Zhenyu Sun Jian Tang Zhaofeng Wu Chi Xu Bo Xu Chao Zhao Zhanguo Wang 《Journal of Semiconductors》 EI CAS CSCD 2024年第3期9-32,共24页
Ex situ characterization techniques in molecular beam epitaxy(MBE)have inherent limitations,such as being prone to sample contamination and unstable surfaces during sample transfer from the MBE chamber.In recent years... Ex situ characterization techniques in molecular beam epitaxy(MBE)have inherent limitations,such as being prone to sample contamination and unstable surfaces during sample transfer from the MBE chamber.In recent years,the need for improved accuracy and reliability in measurement has driven the increasing adoption of in situ characterization techniques.These techniques,such as reflection high-energy electron diffraction,scanning tunneling microscopy,and X-ray photoelectron spectroscopy,allow direct observation of film growth processes in real time without exposing the sample to air,hence offering insights into the growth mechanisms of epitaxial films with controlled properties.By combining multiple in situ characterization techniques with MBE,researchers can better understand film growth processes,realizing novel materials with customized properties and extensive applications.This review aims to overview the benefits and achievements of in situ characterization techniques in MBE and their applications for material science research.In addition,through further analysis of these techniques regarding their challenges and potential solutions,particularly highlighting the assistance of machine learning to correlate in situ characterization with other material information,we hope to provide a guideline for future efforts in the development of novel monitoring and control schemes for MBE growth processes with improved material properties. 展开更多
关键词 epitaxial growth thin film in situ characterization molecular beam epitaxy(mbe)
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ZnO薄膜的制备和结构性能分析 被引量:5
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作者 贺永宁 朱长纯 +4 位作者 侯洵 张景文 杨晓东 徐庆安 曾凡光 《真空科学与技术学报》 EI CAS CSCD 北大核心 2004年第6期420-423,共4页
ZnO作为一种宽带隙半导体材料 ,近几年来已经成为国际上紫外半导体光电子材料和器件领域的研究热点。激光分子束外延 (L MBE)系统是获得器件级ZnO外延薄膜的先进技术之一。高质量精密ZnO陶瓷靶材对于该工艺的实施是十分关键的 ,本文中... ZnO作为一种宽带隙半导体材料 ,近几年来已经成为国际上紫外半导体光电子材料和器件领域的研究热点。激光分子束外延 (L MBE)系统是获得器件级ZnO外延薄膜的先进技术之一。高质量精密ZnO陶瓷靶材对于该工艺的实施是十分关键的 ,本文中采用高纯原料 ,在洁净条件下制备了大面积、薄片型、尺寸可控的符合理想化学配比的高纯ZnO陶瓷靶材。采用所制备的靶材 ,利用L MBE技术在 (0 0 0 1)蓝宝石基片上进行了ZnO薄膜的外延生长 ,在 2 80℃~ 30 0℃低温条件下所生长的薄膜样品具有 (0 0 0 1)取向的纤锌矿晶体结构 ,薄膜光学性能良好 ,论文中对ZnO薄膜的低温L MBE生长机理进行了探讨。 展开更多
关键词 mbe ZnO陶瓷 ZNO薄膜 宽带隙半导体材料 光电子材料 器件 蓝宝石基片 可控 薄膜光学 外延薄膜
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脉冲激光制膜新技术及其在功能薄膜研究中的应用 被引量:15
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作者 李美亚 王忠烈 +2 位作者 林揆训 熊光成 范守善 《功能材料》 EI CAS CSCD 北大核心 1998年第2期132-135,共4页
脉冲激光制膜是近年来发展的富有希望的制膜新技术。本文简要介绍了脉冲激光制膜技术的原理、特点和优势以及在功能薄膜研究中的应用。
关键词 脉冲激光制膜 功能薄膜 外延生长 PLD 薄膜技术
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脉冲激光沉积技术在磁性薄膜制备中的应用 被引量:9
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作者 邓联文 江建军 何华辉 《材料导报》 EI CAS CSCD 2003年第2期66-68,共3页
脉冲激光沉积制膜(PLD)是近年来迅速发展起来的制膜新技术,首先简要介绍了脉冲激光沉积技术的原理、特点和优势以及在磁性功能薄膜研究中的应用,最后说明了该技术的最新发展趋势。
关键词 脉冲激光沉积技术 制备 磁性薄膜 外延生长 超晶格 成膜机理
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PLD制备钛酸铅薄膜过程的RHEED分析 被引量:5
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作者 葛芳芳 白黎 +2 位作者 吴卫东 曹林洪 沈军 《真空科学与技术学报》 EI CAS CSCD 北大核心 2009年第4期341-345,共5页
本文采用反射式高能电子衍射(RHEED)监测脉冲激光沉积法制备钛酸铅薄膜过程。根据PbTiO3/MgO(001)薄膜、PbTiO3/Si(100)薄膜生长过程中RHEED强度的时间演变,分析基片对薄膜生长模式的影响。并且观测不同生长时刻的RHEED强度的空间分布,... 本文采用反射式高能电子衍射(RHEED)监测脉冲激光沉积法制备钛酸铅薄膜过程。根据PbTiO3/MgO(001)薄膜、PbTiO3/Si(100)薄膜生长过程中RHEED强度的时间演变,分析基片对薄膜生长模式的影响。并且观测不同生长时刻的RHEED强度的空间分布,讨论生长过程中薄膜表面的台阶尺寸变化。另外,比较在不同氧分压下沉积的钛酸铅薄膜表面的RHEED图案,发现氧气将改变薄膜的微结构,提高薄膜的结晶性。 展开更多
关键词 钛酸铅薄膜 脉冲激光沉积 RHEED 生长模式
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激光等离子体淀积硅薄膜过程动力学研究 被引量:3
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作者 董丽芳 傅广生 +3 位作者 李晓苇 韩理 张连水 吕福润 《Journal of Semiconductors》 EI CAS CSCD 北大核心 1989年第4期280-285,共6页
采用强TEA CO_2脉冲激光辐照SiH_4/H_2系统,对SiH_4激光等离子体淀积硅膜进行了研究,测量了膜淀积及膜性能随淀积条件的变化关系.同时采用光学发射光谱、光声激光偏转方法对其基本的微观和宏观动力学过程进行了研究,在此基础上初步建立... 采用强TEA CO_2脉冲激光辐照SiH_4/H_2系统,对SiH_4激光等离子体淀积硅膜进行了研究,测量了膜淀积及膜性能随淀积条件的变化关系.同时采用光学发射光谱、光声激光偏转方法对其基本的微观和宏观动力学过程进行了研究,在此基础上初步建立了膜淀积的物理模型,计算了膜淀积速率、膜面积等,结果与实验符合得较好. 展开更多
关键词 激光 等离子体 淀积 硅薄膜 动力学
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BaTiO_3铁电薄膜在硅基片上的取向生长 被引量:6
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作者 魏贤华 黄文 +1 位作者 接文静 朱俊 《硅酸盐学报》 EI CAS CSCD 北大核心 2007年第5期583-587,共5页
采用脉冲激光沉积方法,在硅基片上先沉积 MgO 或 CeO2缓冲层后再制备 BaTiO3 (BTO)铁电薄膜。通过原位反射高能电子衍射来监测 MgO,CeO2 缓冲层在硅基片上的生长行为。用 X 射线衍射测定 BTO 薄膜的结晶取向。并利用压电响应力显微镜观... 采用脉冲激光沉积方法,在硅基片上先沉积 MgO 或 CeO2缓冲层后再制备 BaTiO3 (BTO)铁电薄膜。通过原位反射高能电子衍射来监测 MgO,CeO2 缓冲层在硅基片上的生长行为。用 X 射线衍射测定 BTO 薄膜的结晶取向。并利用压电响应力显微镜观察了铁电薄膜的自发极化形成的铁电畴。结果表明:BTO 薄膜在不同的缓冲层硅基片上以不同的取向生长,在织构的 MgO/Si(001)基片上为(001)择优,择优程度与 MgO 织构品质有关,其中在双轴织构 MgO 缓冲层上为(001)单一取向;在 CeO2(111)缓冲层上为(011)单一取向。(001)取向的 BTO 薄膜具有更大的面外极化,而(011)取向的 BTO薄膜具有更大的面内极化。 展开更多
关键词 钛酸钡 铁电薄膜 缓冲层 取向生长 激光沉积
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PLD法在c面蓝宝石衬底上制备纤锌矿ZnS外延薄膜 被引量:5
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作者 张蕾 方龙 +3 位作者 刘攀克 刘越彦 黎明锴 何云斌 《功能材料》 EI CAS CSCD 北大核心 2016年第5期224-226,共3页
采用脉冲激光沉积方法以ZnS为靶材c面蓝宝石为衬底制备了一系列的ZnS薄膜,并采用四圆单晶衍射仪研究了薄膜的晶体结构及其与衬底的取向关系。首先研究了沉积温度对ZnS薄膜质量的影响,结果表明,所有制备的ZnS薄膜均为六方纤锌矿结构;在... 采用脉冲激光沉积方法以ZnS为靶材c面蓝宝石为衬底制备了一系列的ZnS薄膜,并采用四圆单晶衍射仪研究了薄膜的晶体结构及其与衬底的取向关系。首先研究了沉积温度对ZnS薄膜质量的影响,结果表明,所有制备的ZnS薄膜均为六方纤锌矿结构;在衬底温度为750℃时所制备的薄膜具有较好的晶体质量,并表现出与蓝宝石衬底明确的外延关系[ZnS(001)∥Al_2O_3(001)且ZnS(110)∥Al_2O_3(110)]。进一步研究了在750℃下加入不同厚度的ZnO缓冲层对于ZnS薄膜晶体质量的影响,结果表明在沉积ZnS薄膜前先沉积一层ZnO薄膜缓冲层可以进一步有效提高ZnS薄膜的晶体质量和面外取向性,其中在沉积时间为2min的ZnO缓冲层上制备的ZnS外延薄膜晶体质量最好,其(002)面摇摆曲线半高宽为1.35°。本文结论对于研究ZnS薄膜制备光电器件具有重要的意义。 展开更多
关键词 脉冲激光沉积 ZNS薄膜 缓冲层 外延生长 晶体结构
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激光化学气相反应生长Ti(C,N)薄膜的成分及微观结构 被引量:3
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作者 张炳春 李梅 +1 位作者 王亚庆 冯钟潮 《材料研究学报》 EI CAS CSCD 北大核心 1998年第6期663-664,共2页
运用XRD、EPMA、TEM等手段分析在Ti—6Al—4V基材上用激光化学气相反应生长的Ti(C,N)薄膜的成分、结构、显微组织可在基材表面形成大面积均匀的Ti(C,N)膜层,为无明显择优取向的等轴纳米晶,其中有少量的Ti2N相,且Al、V含量低于... 运用XRD、EPMA、TEM等手段分析在Ti—6Al—4V基材上用激光化学气相反应生长的Ti(C,N)薄膜的成分、结构、显微组织可在基材表面形成大面积均匀的Ti(C,N)膜层,为无明显择优取向的等轴纳米晶,其中有少量的Ti2N相,且Al、V含量低于基材。 展开更多
关键词 激光 化学气相反应 薄膜 TI(C N) 微观结构
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