This paper describes the successful fabrication of 4H-SiC junction barrier Schottky (JBS) rectifiers with a linearly graded field limiting ring (LG-FLR). Linearly variable ring spacings for the FLR termination are...This paper describes the successful fabrication of 4H-SiC junction barrier Schottky (JBS) rectifiers with a linearly graded field limiting ring (LG-FLR). Linearly variable ring spacings for the FLR termination are applied to improve the blocking voltage by reducing the peak surface electric field at the edge termination region, which acts like a variable lateral doping profile resulting in a gradual field distribution. The experimental results demonstrate a breakdown voltage of 5 kV at the reverse leakage current density of 2 mA/cm2 (about 80% of the theoretical value). Detailed numerical simulations show that the proposed termination structure provides a uniform electric field profile compared to the conventional FLR termi- nation, which is responsible for 45% improvement in the reverse blocking voltage despite a 3.7% longer total termination length.展开更多
A novel thin drift region device with heavily doped N+ rings embedded in the substrate is reported, which is called the field limiting rings in substrate lateral double-diffused MOS transistor (SFLR LDMOS). In the ...A novel thin drift region device with heavily doped N+ rings embedded in the substrate is reported, which is called the field limiting rings in substrate lateral double-diffused MOS transistor (SFLR LDMOS). In the SFLR LDMOS, the peak of the electric field at the main junction is reduced due to the transfer of the voltage from the main junction to other field limiting ring junctions, so the vertical electric field is improved significantly. A model of the breakdown voltage is developed, from which optimal spacing is obtained. The numerical results indicate that the breakdown voltage of the device proposed is increased by 76% in comparison to that of the conventional LDMOS.展开更多
Doping concentration and thickness of an epitaxy layer are the most essential parameters for power devices.The conventional algorithm extracts these two parameters by calculating the doping profile from its capacitanc...Doping concentration and thickness of an epitaxy layer are the most essential parameters for power devices.The conventional algorithm extracts these two parameters by calculating the doping profile from its capacitance-voltage(C-V)characteristics.Such an algorithm treats the device as a parallel-plane junction and ignores the influence of the terminations.The epitaxy layer doping concentration tends to be overestimated and the thickness underestimated.In order to obtain the epitaxy layer parameters with higher accuracy,a new algorithm applicable for devices with field limited ring(FLR)terminations is proposed in this paper.This new algorithm is also based on the C-V characteristics and considers the extension manner of the depletion region under the FLR termination.Such an extension manner depends on the design parameters of the FLR termination and is studied in detail by simulation and modeling.The analytical expressions of the device C-V characteristics and the effective doping profile are derived.More accurate epitaxy layer parameters can be extracted by fitting the effective doping profile expression to the C-V doping profile calculated from the C-V characteristics.The relationship between the horizontal extension width and the vertical depth of the depletion region is also acquired.The credibility of the new algorithm is verified by experiments.The applicability of our new algorithm to FLR/field plate combining terminations is also discussed.Our new algorithm acts as a powerful tool for analyses and improvements of power devices.展开更多
In order to control the large deformation of tunnel surrounding rock,a new energy-absorbing bolt is developed.This bolt can be transformed into a rigid support when the deformation of the surrounding rock reaches the ...In order to control the large deformation of tunnel surrounding rock,a new energy-absorbing bolt is developed.This bolt can be transformed into a rigid support when the deformation of the surrounding rock reaches the length of the sleeve tube,thus preventing the surrounding rock from continuing to deform.Moreover,this bolt has a simple structure and is easy to manufacture and assemble.Then the static tensile test is conducted on the bolt specimen to test its working performance.The test results show that when the cone angle of the cone block is small,the load–displacement curve of the bolt contains three stages;when the cone angle is large,the load–displacement curve contains only two stages.Meanwhile,both the average constant resistance and the maximum absorbed energy increase linearly with the increase of cone angle.On this basis,ignoring the influence of shear stress,and it is supposed that the thickness of the sleeve tube is constant,then the theoretical calculation formula of constant resistance for the new bolt is derived,and the rationality of the formula is verified using the static tensile test results.It is found that the error of the calculated result is less than 15%when the cone angle does not exceed 15.At last,the numerical simulation method is used to analyze the performance of the new bolt.The simulation results indicate that the generation of shear stress and the change of tube thickness during the movement of the cone block are two important factors that cause theoretical errors.展开更多
Using positive surface charge instead of traditional γ-ray total dose irradiation, the electric field distribution of a P-channel VDMOS terminal has been analyzed. A novel terminal structure for improving the total d...Using positive surface charge instead of traditional γ-ray total dose irradiation, the electric field distribution of a P-channel VDMOS terminal has been analyzed. A novel terminal structure for improving the total dose irradiation hardened of P-channel VDMOS has been proposed, and the structure is simulated and demonstrated with a -150 V P-channel VDMOS. The results show that the peak current density is reduced from 5.51 × 10^3 A/cm^2 to 2.01 × 10^3 A/cm^2, and the changed value of the breakdown voltage is 2.5 V at 500 krad(Si). Especially, using 60Co and X-ray to validate the results, which strictly match with the simulated values, there is not any added mask or process to fabricate the novel structure, of which the process is compatible with common P-channel VDMOS processes. The novel terminal structure can be widely used in total irradiation hardened P-channel VDMOS design and fabrication, which holds a great potential application in the space irradiation environment.展开更多
基金Project supported by the State Key Program of the National Natural Science Foundation of China(Grant No.61234006)
文摘This paper describes the successful fabrication of 4H-SiC junction barrier Schottky (JBS) rectifiers with a linearly graded field limiting ring (LG-FLR). Linearly variable ring spacings for the FLR termination are applied to improve the blocking voltage by reducing the peak surface electric field at the edge termination region, which acts like a variable lateral doping profile resulting in a gradual field distribution. The experimental results demonstrate a breakdown voltage of 5 kV at the reverse leakage current density of 2 mA/cm2 (about 80% of the theoretical value). Detailed numerical simulations show that the proposed termination structure provides a uniform electric field profile compared to the conventional FLR termi- nation, which is responsible for 45% improvement in the reverse blocking voltage despite a 3.7% longer total termination length.
基金supported by the Guangxi Provincial Natural Science Foundation,China(Grant No.2010GXNSFB013054)the Guangxi Provincial Key Science and Technology Program,China(Grant No.11107001-20)
文摘A novel thin drift region device with heavily doped N+ rings embedded in the substrate is reported, which is called the field limiting rings in substrate lateral double-diffused MOS transistor (SFLR LDMOS). In the SFLR LDMOS, the peak of the electric field at the main junction is reduced due to the transfer of the voltage from the main junction to other field limiting ring junctions, so the vertical electric field is improved significantly. A model of the breakdown voltage is developed, from which optimal spacing is obtained. The numerical results indicate that the breakdown voltage of the device proposed is increased by 76% in comparison to that of the conventional LDMOS.
基金Project supported by the National Key Research and Development Program of China(Grant No.2018YFB0104701)。
文摘Doping concentration and thickness of an epitaxy layer are the most essential parameters for power devices.The conventional algorithm extracts these two parameters by calculating the doping profile from its capacitance-voltage(C-V)characteristics.Such an algorithm treats the device as a parallel-plane junction and ignores the influence of the terminations.The epitaxy layer doping concentration tends to be overestimated and the thickness underestimated.In order to obtain the epitaxy layer parameters with higher accuracy,a new algorithm applicable for devices with field limited ring(FLR)terminations is proposed in this paper.This new algorithm is also based on the C-V characteristics and considers the extension manner of the depletion region under the FLR termination.Such an extension manner depends on the design parameters of the FLR termination and is studied in detail by simulation and modeling.The analytical expressions of the device C-V characteristics and the effective doping profile are derived.More accurate epitaxy layer parameters can be extracted by fitting the effective doping profile expression to the C-V doping profile calculated from the C-V characteristics.The relationship between the horizontal extension width and the vertical depth of the depletion region is also acquired.The credibility of the new algorithm is verified by experiments.The applicability of our new algorithm to FLR/field plate combining terminations is also discussed.Our new algorithm acts as a powerful tool for analyses and improvements of power devices.
基金The paper is supported by the National Natural Science Foundation of China(Nos.52178393 and 52178354)the Housing and Urban-Rural Construction Science and Technology Planning Project of Shaanxi Province(No.2019-K39)the Innovation Capability Support Plan of Shaanxi-Innovation Team(No.2020TD-005).
文摘In order to control the large deformation of tunnel surrounding rock,a new energy-absorbing bolt is developed.This bolt can be transformed into a rigid support when the deformation of the surrounding rock reaches the length of the sleeve tube,thus preventing the surrounding rock from continuing to deform.Moreover,this bolt has a simple structure and is easy to manufacture and assemble.Then the static tensile test is conducted on the bolt specimen to test its working performance.The test results show that when the cone angle of the cone block is small,the load–displacement curve of the bolt contains three stages;when the cone angle is large,the load–displacement curve contains only two stages.Meanwhile,both the average constant resistance and the maximum absorbed energy increase linearly with the increase of cone angle.On this basis,ignoring the influence of shear stress,and it is supposed that the thickness of the sleeve tube is constant,then the theoretical calculation formula of constant resistance for the new bolt is derived,and the rationality of the formula is verified using the static tensile test results.It is found that the error of the calculated result is less than 15%when the cone angle does not exceed 15.At last,the numerical simulation method is used to analyze the performance of the new bolt.The simulation results indicate that the generation of shear stress and the change of tube thickness during the movement of the cone block are two important factors that cause theoretical errors.
基金supported by the Pre-Research Foundation(No.51311050202)
文摘Using positive surface charge instead of traditional γ-ray total dose irradiation, the electric field distribution of a P-channel VDMOS terminal has been analyzed. A novel terminal structure for improving the total dose irradiation hardened of P-channel VDMOS has been proposed, and the structure is simulated and demonstrated with a -150 V P-channel VDMOS. The results show that the peak current density is reduced from 5.51 × 10^3 A/cm^2 to 2.01 × 10^3 A/cm^2, and the changed value of the breakdown voltage is 2.5 V at 500 krad(Si). Especially, using 60Co and X-ray to validate the results, which strictly match with the simulated values, there is not any added mask or process to fabricate the novel structure, of which the process is compatible with common P-channel VDMOS processes. The novel terminal structure can be widely used in total irradiation hardened P-channel VDMOS design and fabrication, which holds a great potential application in the space irradiation environment.