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Transition from a filamentary mode to a diffuse one with varying distance from needle to stream of an argon plasma jet
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作者 许慧敏 高敬格 +3 位作者 贾鹏英 冉俊霞 陈俊宇 李金懋 《Chinese Physics B》 SCIE EI CAS CSCD 2024年第1期539-544,共6页
Plasma jet has extensive application potentials in various fields, which normally operates in a diffuse mode when helium is used as the working gas. However, when less expensive argon is used, the plasma jet often ope... Plasma jet has extensive application potentials in various fields, which normally operates in a diffuse mode when helium is used as the working gas. However, when less expensive argon is used, the plasma jet often operates in a filamentary mode. Compared to the filamentary mode, the diffuse mode is more desirable for applications. Hence, many efforts have been exerted to accomplish the diffuse mode of the argon plasma jet. In this paper, a novel single-needle argon plasma jet is developed to obtain the diffuse mode. It is found that the plasma jet operates in the filamentary mode when the distance from the needle tip to the central line of the argon stream(d) is short. It transits to the diffuse mode with increasing d. For the diffuse mode, there is always one discharge pulse per voltage cycle, which initiates at the rising edge of the positive voltage. For comparison, the number of discharge pulse increases with an increase in the peak voltage for the filamentary mode. Fast photography reveals that the plasma plume in the filamentary mode results from a guided positive streamer,which propagates in the argon stream. However, the plume in the diffuse mode originates from a branched streamer, which propagates in the interfacial layer between the argon stream and the surrounding air. By optical emission spectroscopy,plasma parameters are investigated for the two discharge modes, which show a similar trend with increasing d. The diffuse mode has lower electron temperature, electron density, vibrational temperature, and gas temperature compared to the filamentary mode. 展开更多
关键词 plasma jet diffuse mode filamentary mode optical emission spectroscopy
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Diagnostics of laser-induced plasma on carbon-based polymer material using atomic and molecular emission spectra
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作者 Jelena PETROVIC Dragan RANKOVIC +5 位作者 Miroslav KUZMANOVIC Jelena SAVOVIC Vasili KIRIS Alena NEVAR Mikhail NEDELKO Nikolai TARASENKO 《Plasma Science and Technology》 SCIE EI CAS CSCD 2023年第4期175-183,共9页
Time-integrated optical emission analysis of laser-induced plasma on Teflon is presented.Plasma was induced under atmospheric pressure air using transversely excited atmospheric CO_(2) laser pulses.Teflon is a C-based... Time-integrated optical emission analysis of laser-induced plasma on Teflon is presented.Plasma was induced under atmospheric pressure air using transversely excited atmospheric CO_(2) laser pulses.Teflon is a C-based polymer that is,among other things,interesting as a substrate for laser-induced breakdown spectroscopy analysis of liquid samples.This study aimed to determine the optimal experimental conditions for obtaining neutral and ionized C spectral lines and C2 and CN molecular band emission suitable for spectrochemical purposes.Evaluation of plasma parameters was done using several spectroscopic techniques.Stark profiles of appropriate C ionic lines were used to determine electron number density.The ratio of the integral intensity of ionic-to-atomic C spectral lines was used to determine the ionization temperature.A spectral emission of C2 Swan and CN violet bands system was used to determine the temperature of the colder,peripheral parts of plasma.We critically analyzed the use of molecular emission bands as a tool for plasma diagnostics and suggested methods for possible improvements. 展开更多
关键词 spectroscopy of laser-induced plasma laser-induced breakdown spectroscopy transversely excited atmospheric CO_(2)laser plasma diagnostics atomic and molecular emission spectra TEFLON
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Plasma diagnostics by optical emission spectroscopy on manganese ore in conjunction with XRD, XRF and SEM-EDS 被引量:4
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作者 Muhammad FAHAD Sajad ALI Yaseen IQBAL 《Plasma Science and Technology》 SCIE EI CAS CSCD 2019年第8期103-110,共8页
Manganese(Mn) is an important industrial mineral.Information about the chemical and phase constitution along with the concentration of impurities presented in Mn ore is compulsory in assessing its suitability for diff... Manganese(Mn) is an important industrial mineral.Information about the chemical and phase constitution along with the concentration of impurities presented in Mn ore is compulsory in assessing its suitability for different applications.We performed the qualitative and quantitative analysis of low-grade Mn ore(LGMO) using laser-induced breakdown spectroscopy(LIBS) in conjunction with x-ray diffraction(XRD), x-ray fluorescence(XRF) and scanning electron microscopy(SEM) coupled with energy dispersive x-ray electron spectroscopy(EDS).The optical emission spectra of the LGMO sample displayed the presence of Mn, Si, Ca, Fe, Al, Mg,V, Ti, Sr, Ni, Na, Ba and Li.The plasma parameters, electron temperature and number density were estimated using the Boltzmann plot and Stark broadening line profile methods and were found to be 7500 K±750 K and 8.18±0.8×1017 cm-3, respectively.Quantitative analysis was performed using the calibration-free LIBS(CF-LIBS) method and its outcome along with XRD, XRF and SEM-EDS data showed almost analogous elemental composition, while the LIBS method gave acceptably precise elemental analysis by detecting the low atomic number element Li besides V and Sr.The results obtained using LIBS for the LGMO exhibited its ability as a powerful analytical tool and XRF, XRD and SEM-EDS as complementary methods for the compositional analysis of complex low-grade mineral ore. 展开更多
关键词 plasma diagnostic optical emission spectroscopy spectrochemical analysis LASER-INDUCED BREAKDOWN spectroscopy SEM-EDS
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Time-Resolved Optical Emission Spectroscopy Diagnosis of CO_2 Laser-Produced SnO_2 Plasma 被引量:1
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作者 兰慧 王新兵 左都罗 《Plasma Science and Technology》 SCIE EI CAS CSCD 2016年第9期902-906,共5页
The spectral emission and plasma parameters of SnO2 plasmas have been investigated. A planar ceramic SnO2 target was irradiated by a CO2 laser with a full width at half maximmn of 80 ns. The temporal behavior of the s... The spectral emission and plasma parameters of SnO2 plasmas have been investigated. A planar ceramic SnO2 target was irradiated by a CO2 laser with a full width at half maximmn of 80 ns. The temporal behavior of the specific emission lines from the SnO2 plasma was characterized. The intensities of Sn I and Sn Ⅱ lines first increased, and then decreased with the delay time. The results also showed a faster decay of Sn I atoms than that of Sn II ionic species. The temporal evolutions of the SnO2 plasma parameters (electron temperature and density) were deduced. The measured temperature and density of SnO2 plasma are 4.38 eV to 0.5 eV and 11.38×1017 cm 3 to 1.1×1017^ cm-3, for delay times between 0.1 μs and 2.2 #s. We also investigated the effect of the laser pulse energy on Sn02 plasma. 展开更多
关键词 optical emission spectroscopy laser produced plasma C02 laser electrontemperature electron density
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Investigation on plasma characteristics in a laser ablation pulsed plasma thruster by optical emission spectroscopy 被引量:1
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作者 张宇 吴建军 +2 位作者 欧阳 张代贤 李健 《Plasma Science and Technology》 SCIE EI CAS CSCD 2020年第4期83-89,共7页
In order to further improve the propulsion performance of pulsed plasma thrusters for space micro propulsion,a novel laser ablation pulsed plasma thruster is proposed,which separated the laser ablation and electromagn... In order to further improve the propulsion performance of pulsed plasma thrusters for space micro propulsion,a novel laser ablation pulsed plasma thruster is proposed,which separated the laser ablation and electromagnetic acceleration.Optical emission spectroscopy is utilized to investigate the plasma characteristics in the thruster.The spectral lines at different times,positions and discharge intensities are experimentally recorded,and the plasma characteristics in the discharge channel are concluded through analyzing the variation of spectral lines.With the discharge energy of 24 J,laser energy of 0.6 J and the use of aluminum propellant,the specific impulse and thrust efficiency reach 6808 s and 70.6%,respectively. 展开更多
关键词 laser ablation PULSED plasma THRUSTER optical emission spectroscopy plasma PROPULSION performance
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Quantitative Determination of Density of Ground State Atomic Oxygen from Both TALIF and Emission Spectroscopy in Hot Air Plasma Generated by Microwave Resonant Cavity 被引量:1
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作者 F.MARCHAL M.YOUSFI +2 位作者 N.MERBAHI G.WATTIEAUX A.PIQUEMAL 《Plasma Science and Technology》 SCIE EI CAS CSCD 2016年第3期259-265,共7页
Two experimental techniques have been used to quantify the atomic oxygen density in the case of hot air plasma generated by a microwave (MW) resonant cavity. The latter operates at a frequency of 2.45 GHz inside a c... Two experimental techniques have been used to quantify the atomic oxygen density in the case of hot air plasma generated by a microwave (MW) resonant cavity. The latter operates at a frequency of 2.45 GHz inside a cell of gas conditioning at a pressure of 600 mbar, an injected air flow of 12 L/min and an input MW power of 1 kW. The first technique is based on the standard two photon absorption laser induced fluorescence (TALIF) using xenon for calibration but applied for the first time in the present post discharge hot air plasma column having a temperature of about 4500 K near the axis of the nozzle. The second diagnostic technique is an actinometry method based on optical emission spectroscopy (OES). In this case, we compared the spectra intensities of a specific atomic oxygen line (844 nm) and the closest wavelength xenon line (823 nm). The two lines need to be collected under absolutely the same spectroscopic parameters. The xenon emission is due to the addition of a small proportion of xenon (1% Xe) of this chemically inert gas inside the air while a further small quantity of H2 (2~) is also added in the mixture in order to collect OH(A- X) and NH(A-X) spectra without noise. The latter molecular spectra are required to estimate gas and excitation temperatures. Optical emission spectroscopy measurements, at for instance the position z=12 mm on the axis plasma column that leads to a gas measured temperature equal to 3500 K, an excitation temperature of about 9500 K and an atomic oxygen density 2.09× 1017+ 0.2×1017 cm-3. This is in very good agreement with the TALIF measurement, which is equal to 2.0×101T cm-3. 展开更多
关键词 TALIF microwave air plasma atomic oxygen concentration actinometry optical emission spectroscopy
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Determination of Non-Maxwellian Electron Energy Distributions in Low-Pressure Plasmas by Using the Optical Emission Spectroscopy and a Collisional-Radiative Model 被引量:1
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作者 朱悉铭 蒲以康 《Plasma Science and Technology》 SCIE EI CAS CSCD 2011年第3期267-278,共12页
A Maxwellian electron energy distribution function (EEDF) is often assumed when using the optical emission line-ratio method to determine the electron temperature in low- temperature plasmas. However, in many cases,... A Maxwellian electron energy distribution function (EEDF) is often assumed when using the optical emission line-ratio method to determine the electron temperature in low- temperature plasmas. However, in many cases, non-Maxwellian EEDFs can be formed due to the non-local electron heating or the inelastic-collisional energy loss processes. In this work, with a collisional-radiative model, we propose an approach to obtain the non-Maxwellian EEDF with a 'two-temperature structure' from the emission line-ratios of Paschen 2p levels of argon and kryp- ton atoms. For applications of this approach in reactive gas (CF4, O2, etc) discharges that contain argon and krypton, recommendations of some specific emission line-ratios are provided, according to their sensitivities to the EEDF variation. The kinetic processes of the relevant excited atoms are also discussed in detail. 展开更多
关键词 plasma diagnostics optical emission spectroscopy non-Maxwellian EEDF collisional-radiative model
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Characteristics of Laser Produced Plasmas Obtained by Fast ICCD Photography, Schlieren Photography and Optical Emission Spectroscopy 被引量:2
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作者 WEI Wenfu WU Jian LI Xingwen JIA Shenli QIU Aici 《高电压技术》 EI CAS CSCD 北大核心 2013年第9期2173-2179,共7页
Pulsed laser produced plasmas(LPP)are important for industrial applications and fundamental researches,and their complex,multi-physical and cross-chemical processes need to be investigated more comprehensively.In this... Pulsed laser produced plasmas(LPP)are important for industrial applications and fundamental researches,and their complex,multi-physical and cross-chemical processes need to be investigated more comprehensively.In this work,images of the luminous plasma,the spatial density distribution,and the plasma parameters are experimentally investigated by using fast ICCD photography,schlieren photography,and optical emission spectroscopy.Plasmas are produced by a 1 064 nm,15 ns Nd:YAG laser.Free expanding and splitting phenomena are observed in vacuum(at the pressure of about 1×10 3Pa)and air(at the pressure of 20 Pa)using fast photography,respectively.Meanwhile,shock waves formed in the atmospheric laser produced plasma are visualized by schlieren photography.The formation of shock waves is interpreted with the Sedov-Taylor theory,and an averaged expansion velocity about 375 m/s of the shock waves is estimated during 200~1 000 ns.Atmospheric air is found to have significant confinement effects on the plasma expansions compared to that in vacuum or low pressure ambient.Based on the optical emission spectroscopy,after 1 000 ns,at 0.6 mm above the target,the plasma temperature is about 7 800 K and the electron number density is approximately 0.64×1016cm-3. 展开更多
关键词 等离子体密度 发射光谱仪 纹影摄影 激光产生 ICCD 生产 特性 等离子体参数
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Study on the Effect of Base Pressure on Magnetron Sputtering Discharge Plasma by Optical Emission Spectroscopy
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作者 S.YUGESWARAN K.SURESH V.SELVARAJAN 《Plasma Science and Technology》 SCIE EI CAS CSCD 2010年第1期35-40,共6页
Argon plasma was generated by DC magnetron sputtering discharge at a constant input power and sputtering pressure. The emission spectra of the argon plasma, in a region of 300 nm to 800 nm, were recorded with three di... Argon plasma was generated by DC magnetron sputtering discharge at a constant input power and sputtering pressure. The emission spectra of the argon plasma, in a region of 300 nm to 800 nm, were recorded with three different base pressures (4×10^-4 Pa, 13×10^-4 Pa and 26×10^-4 Pa). From the spectra, the Boltzmann temperature (TB) was calculated by using the atomic Boltzmann plot method. The intensity ratio of N and N2 lines provided the information on the changes in the degree of dissociation of nitrogen molecules. The obtained results showed that with the increase in base pressure the dissociation of N2 increased and the Boltzmann temperature (TB) decreased. 展开更多
关键词 argon plasma magnetron sputtering emission spectroscopy Boltzmann temperature
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Characteristics of C_2 Radical in CHF_3 and CF_4 Electron Cyclotron Resonance Plasmas Studied by Optical Emission Spectroscopy
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作者 杜伟 叶超 +1 位作者 程珊华 宁兆元 《Plasma Science and Technology》 SCIE EI CAS CSCD 2002年第6期1535-1540,共6页
The characteristics of CHF3 and CF4 electron cyclotron resonance (ECR) plasma have been studied by optical emission spectroscopy (OES) and Langmuir probe. It is found that C2 radical is one of main compositions in bot... The characteristics of CHF3 and CF4 electron cyclotron resonance (ECR) plasma have been studied by optical emission spectroscopy (OES) and Langmuir probe. It is found that C2 radical is one of main compositions in both of the two plasmas. We investigated the relative concentration of C2 radical as a function of F (H) radical and ion density. The formation mechanism of C2 radical is analyzed. 展开更多
关键词 ECR plasma optical emission spectroscopy fluorocarbon gas
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Analysis of optical emission spectroscopy data during silicon etching in SF_(6)/O_(2)/Ar plasma
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作者 Dong Hwan KIM Jeong Eun CHOI Sang Jeen HONG 《Plasma Science and Technology》 SCIE EI CAS CSCD 2021年第12期117-127,共11页
Silicon etching is an essential process in various applications,and a major challenge for etching process is anisotropic high aspect ratio etching characteristics.The etch profile is determined by the plasma parameter... Silicon etching is an essential process in various applications,and a major challenge for etching process is anisotropic high aspect ratio etching characteristics.The etch profile is determined by the plasma parameters and process parameters.In this study,the plasma state with each process parameters were analyzed through the optical emission spectroscopy(OES)plasma diagnostic sensor by both chemical and physical approaches.Electron temperature and electron density were additionally acquired using the corona model with OES data that provides chemical species information,and the etch profile was evaluated through scanning electron microscope measurement data.The results include changes in profile with gas ratio,bias power,and pressure.We figure out that factors like ion energy and ion angular distribution as well as chemical reaction affect the anisotropic profile. 展开更多
关键词 silicon etching PROFILE optical emission spectroscopy plasma in-formation corona model
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Diagnostics of Argon Inductively Coupled Plasma and Dielectric Barrier Discharge Plasma by Optical Emission Spectroscopy
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作者 张家良 俞世吉 +1 位作者 马滕才 邓新绿 《Plasma Science and Technology》 SCIE EI CAS CSCD 2001年第4期883-890,共8页
An experimental setup was built up to carry out radio frequency (RF) inductively coupled plasma (ICP) and dielectric barrier discharge (DBD), and to depict the optical emission spectra (OES) of the discharges. OES fro... An experimental setup was built up to carry out radio frequency (RF) inductively coupled plasma (ICP) and dielectric barrier discharge (DBD), and to depict the optical emission spectra (OES) of the discharges. OES from argon ICP and DBD plasmas in visible and near ultraviolet region were measured. For argon ICP, the higher RF power input (higher than 500 W for our machine), the higher degree of argon plasma ionization. But that doesn't mean a higher mean electron energy. With the increase in the power input, the mean electron energy increases slightly, whereas the density of electron increases apparently On the contrary, argon DBD discharge behaves in the manner of a pulsed DC discharge on optical emission spectroscopy and V-I characteristics. DBD current is composed of a series of pulses equally spaced in temporal domain. The Kinetics of DBD emission strength is mainly governed by the frequency of the current pulse. 展开更多
关键词 In ICP Diagnostics of Argon Inductively Coupled plasma and Dielectric Barrier Discharge plasma by Optical emission spectroscopy
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Comparison of heating mechanisms of argon helicon plasma in different wave modes with and without blue core 被引量:1
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作者 崔瑞林 张天亮 +3 位作者 袁倩 何锋 韩若愚 欧阳吉庭 《Plasma Science and Technology》 SCIE EI CAS CSCD 2023年第1期53-66,共14页
In this work,we investigated the discharge characteristics and heating mechanisms of argon helicon plasma in different wave coupled modes with and without blue core.Spatially resolved spectroscopy and emission intensi... In this work,we investigated the discharge characteristics and heating mechanisms of argon helicon plasma in different wave coupled modes with and without blue core.Spatially resolved spectroscopy and emission intensity of argon atom and ion lines were measured via local optical emission spectroscopy,and electron density was measured experimentally by an RFcompensated Langmuir probe.The relation between the emission intensity and the electron density was obtained and the wavenumbers of helicon and’Trivelpiece-Gould’(TG)waves were calculated by solving the dispersion relation in wave modes.The results show that at least two distinct wave coupled modes appear in argon helicon plasma at increasing RF power,i.e.blue core(or BC)mode with a significant bright core of blue lights and a normal wave(NW)mode without blue core.The emission intensity of atom line 750.5 nm(lArⅠ750.5nm)is related to the electron density and tends to be saturated in wave coupled modes due to the neutral depletion,while the intensity of ion line 480.6 nm(IArⅡ480.6nm)is a function of the electron density and temperature,and increases dramatically as the RF power is increased.Theoretical analysis shows that TG waves are strongly damped at the plasma edge in NW and/or BC modes,while helicon waves are the dominant mechanism of power deposition or central heating of electrons in both modes.The formation of BC column mainly depends on the enhanced central electron heating by helicon waves rather than TG waves since the excitation of TG waves would be suppressed in this special anti-resonance region. 展开更多
关键词 argon helicon plasma wave coupled mode optical emission spectroscopy helicon waves TG waves
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Measurement of electron density and electron temperature of a cascaded arc plasma using laser Thomson scattering compared to an optical emission spectroscopic approach 被引量:2
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作者 王勇 李聪 +2 位作者 石劼霖 吴兴伟 丁洪斌 《Plasma Science and Technology》 SCIE EI CAS CSCD 2017年第11期23-30,共8页
As advanced linear plasma sources, cascaded arc plasma devices have been used to generate steady plasma with high electron density, high particle flux and low electron temperature. To measure electron density and elec... As advanced linear plasma sources, cascaded arc plasma devices have been used to generate steady plasma with high electron density, high particle flux and low electron temperature. To measure electron density and electron temperature of the plasma device accurately, a laser Thomson scattering(LTS) system, which is generally recognized as the most precise plasma diagnostic method, has been established in our lab in Dalian University of Technology. The electron density has been measured successfully in the region of 4.5?×10^19m^-3 to7.1?×10^20m^-3 and electron temperature in the region of 0.18 eV to 0.58 eV. For comparison,an optical emission spectroscopy(OES) system was established as well. The results showed that the electron excitation temperature(configuration temperature) measured by OES is significantly higher than the electron temperature(kinetic electron temperature) measured by LTS by up to 40% in the given discharge conditions. The results indicate that the cascaded arc plasma is recombining plasma and it is not in local thermodynamic equilibrium(LTE). This leads to significant error using OES when characterizing the electron temperature in a non-LTE plasma. 展开更多
关键词 laser Thomson scattering optical emission spectroscopy cascaded arc plasma electron density electron temperature electron excitation temperature
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Time-Resolved Emission Spectroscopic Study of Laser-Induced Steel Plasmas 被引量:1
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作者 M.L.SHAH A.K.PULHANI +1 位作者 B.M.SURI G.P.GUPTA 《Plasma Science and Technology》 SCIE EI CAS CSCD 2013年第6期546-551,共6页
Laser-induced steel plasma is generated by focusing a Q-switched Nd:YAG visible laser(532 nm wavelength) with an irradiance of 1 x 109 W/cm2 on a steel sample in air at atmospheric pressure.An Echelle spectrograph ... Laser-induced steel plasma is generated by focusing a Q-switched Nd:YAG visible laser(532 nm wavelength) with an irradiance of 1 x 109 W/cm2 on a steel sample in air at atmospheric pressure.An Echelle spectrograph coupled with a gateable intensified charge-coupled detector is used to record the plasma emissions.Using time-resolved spectroscopic measurements of the plasma emissions,the temperature and electron number density of the steel plasma are determined for many times of the detector delay.The validity of the assumption by the spectroscopic methods that the laser-induced plasma(LIP) is optically thin and is also in local thermodynamic equilibrium(LTE) has been evaluated for many delay times.From the temporal evolution of the intensity ratio of two Fe I lines and matching it with its theoretical value,the delay times where the plasma is optically thin and is also in LTE are found to be 800 ns,900 ns and 1000 ns. 展开更多
关键词 laser-induced plasma STEEL emission spectroscopy plasma temperature and electron number density
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A comparison among optical emission spectroscopic methods of determining electron temperature in low pressure argon plasmas 被引量:3
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作者 牛田野 曹金祥 +4 位作者 刘磊 刘金英 王艳 王亮 吕铀 《Chinese Physics B》 SCIE EI CAS CSCD 2007年第9期2757-2763,共7页
关键词 等离子体 气体流量 光谱学 电子温度
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Optical Emission Spectroscopic Studies of ICP Ar Plasma
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作者 齐雪莲 任春生 +1 位作者 张健 马腾才 《Plasma Science and Technology》 SCIE EI CAS CSCD 2007年第5期578-581,共4页
The ion line of 434.8 nm and atom line of 419.8 nm of Ar plasma produced by an inductively coupled plasma (ICP) were measured by optical emission spectroscopy and the influences from the working gas pressure, radio-... The ion line of 434.8 nm and atom line of 419.8 nm of Ar plasma produced by an inductively coupled plasma (ICP) were measured by optical emission spectroscopy and the influences from the working gas pressure, radio-frequency (RF) power and different positions in the discharge chamber on the line intensities were investigated in this study. It was found that the intensity of Ar atom line increased firstly and then saturated with the increase of the pressure. The line intensity of Ar^+, on the other hand, reached a maximum value and then decreased along with the pressure. The intensity of the line in an RF discharge also demonstrated a jumping mode and a hysteresis phenomenon with the RF power. When the RF power increased to 400 W, the discharge jumped from the E-mode to the H-mode where the line intensity of Ar atom demonstrated a sudden increase, while the intensity of Ar^+ ion only changed slightly. If the RF power decreased from a high value, e.g., 1000 W, the discharge would jump from the H-mode back to the E-mode at a power of 300 W. At this time the intensities of Ar and Ar^+ lines would also decrease sharply. It was also noticed in this paper that the intensity of the ion line depended on the detective location in the chamber, namely at the bottom of the chamber the line was more intense than that in the middle of the chamber, but less intense than at the top, which is considered to be related to the capacitance coupling ability of the ICP plasma in different discharge areas. 展开更多
关键词 optical emission spectroscopy inductively coupled plasma spectral line intensity AR
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Optical Emission Spectroscopic Study During the Evaporation of Aluminium in the Thermal Plasma Reactor
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作者 I.BANERJEE N.V.KULKARNI +3 位作者 S.KARMAKER V.L.MATHE S.V.BHORASKAR A.K.DAS 《Plasma Science and Technology》 SCIE EI CAS CSCD 2010年第1期27-30,共4页
The oxidation of aluminium was studied using optical emission spectroscopy (OES) during the evaporation of aluminium in traces of oxygen in a thermal plasma reactor. The ratio of the measured line intensities of Al-... The oxidation of aluminium was studied using optical emission spectroscopy (OES) during the evaporation of aluminium in traces of oxygen in a thermal plasma reactor. The ratio of the measured line intensities of Al-O with that of Al follows the exact trend as of that obtained from the corresponding line intensities in X-ray diffraction spectra of the synthesized samples. In this paper the inherent capacity of emission spectroscopy in evaluating the growth processes under plasma induced reactions is presented. 展开更多
关键词 thermal plasma reactor aluminium OXIDAtiON optical emission spectroscopy X-ray diffraction
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Measurement of the O_2 Dissociation Fraction in RF Low Pressure O_2/Ar Plasma Using Optical Emission Spectrometry
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作者 刘忠伟 李森 +2 位作者 陈强 杨丽珍 王正铎 《Plasma Science and Technology》 SCIE EI CAS CSCD 2011年第4期458-461,共4页
Measurement of the oxygen dissociation fraction in RF low pressure oxygen/argon plasma using optical emission spectrometry is presented. The oxygen dissociation fraction and its evolutions as functions of operational ... Measurement of the oxygen dissociation fraction in RF low pressure oxygen/argon plasma using optical emission spectrometry is presented. The oxygen dissociation fraction and its evolutions as functions of operational parameters were determined using argon as the actinometer. At a pressure of 30 Pa, the oxygen dissociation fraction decreased from 13.4% to 9.5% as the input power increased from 10 W to 70 W. At an input power of 50 W, the oxygen dissociation fraction decreased from 12.3% to 7.7% when the gas pressure increased from 10 Pa to 40 Pa. The influences of operational parameters on the generation of atomic oxygen were also discussed. 展开更多
关键词 optical emission spectroscopy RF O2/Ar plasma ACtiNOMETRY
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A Study on the Determination of Copper by Microwave Induced Plasma Atomic Emission Spectrometry (MIP-AES)
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作者 Zhang Hanqi, Yu Shirong, Zhang Xiaohui, Lu Hui and Jin Qinhan (Department of Chemistry, Jilin University, Changchun) 《Chemical Research in Chinese Universities》 SCIE CAS CSCD 1990年第3期177-182,共6页
The determination of copper by MIP-AES was investigated in detail. Aqueous samples were introduced from an ultrasonic nebulizer and the solvent was removed by a desolvation device before introduction of the aerosol in... The determination of copper by MIP-AES was investigated in detail. Aqueous samples were introduced from an ultrasonic nebulizer and the solvent was removed by a desolvation device before introduction of the aerosol into the MIP. The desolvation system consisted of a condenser associated with a concentrated H2SO4 absorption cell. Various experimental conditions and interferences from easily ionised elements (EIEs) were also studied and some practical samples were analyzed. 展开更多
关键词 COPPER Microwave induced plasma atomic emission spectroscopy Easly ionised elements
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