This paper presents Atmospheric Pressure Metalorganic Chemical Vapor Deposition(AP-MOCVD) growth of GaAs/Al-xGa_(1-x)As multiquantum wells for the study of intersubband transition.The multiple quantum well structures ...This paper presents Atmospheric Pressure Metalorganic Chemical Vapor Deposition(AP-MOCVD) growth of GaAs/Al-xGa_(1-x)As multiquantum wells for the study of intersubband transition.The multiple quantum well structures are characterized by using cross-sectional transmission electron microscopy(TEM) and low temperature photoluminescence(PL),which are in consistent with the designed parameters.The in- frared absorption from intersubband transitions between the bounded- ground state and the extended excited state in GaAs/AtGaAs quantum wells shows peak at 10 μm with FWHM 250 cm^(-1).The absorption peak positions are in agreement with the calculated results based on the envelope function approximation.展开更多
We demonstrate high-performance In0.23 Ga0.77 As channel metal-oxide-semiconductor field-effect transistors （ MOS- FETs） with high on-current to off-current （Ion/Ioff） ratio grown on semi-insulating GaAs wafers by...We demonstrate high-performance In0.23 Ga0.77 As channel metal-oxide-semiconductor field-effect transistors （ MOS- FETs） with high on-current to off-current （Ion/Ioff） ratio grown on semi-insulating GaAs wafers by metal-organic chemical vapor deposition （MOCVD）. The 2μm channel-length devices exhibit a peak extrinsic transeonductance of 150 mS/mm and a drain current up to 500 mA/mm. The maximum effective mobility is 1680 cm2/Vs extracted by the split C-V method. Furthermore, the Ion/Ioff ratio is significantly improved from approximately 4.5 × 10^3 up to approximately 4.32 × 10^4 by controlling the etch thickness of In0.49Ga0.51P, The high drain current and high Ion/Ioff ratio of the In0.23Ga0.77As channel MOSFETs are achieved due to the high effective mobility and the low gate leakage current density.展开更多
This paper presents metalorganic chemical vapour deposition (MOCVD) growth of GaAs / Al_x Ga_(1-x) Assuperlattices and their application in HEMT (high electron mobility transistor). SEED (self eletrooptic ef-fect devi...This paper presents metalorganic chemical vapour deposition (MOCVD) growth of GaAs / Al_x Ga_(1-x) Assuperlattices and their application in HEMT (high electron mobility transistor). SEED (self eletrooptic ef-fect device) devices. Superlattice structures are characterized by using crosssectional transmission electronmicroscopy (XTEM). X-ray diffraction and low temperature photoluminescence (PL), and the results showthat they are in agreement with the designed parameters. The superlattice used as buffer layer in HEMTcan smooth out interface roughness. This smoothing effect is related to the migration of Ga and Al specieson the growing surface and the anisotropic growth rate of GaAs on different facets. High qualitysuperlattice with 27 satellite peaks measured by X- ray diffraction is obtained. Based on the structureparameters determined by TEM and X- ray diffraction. the calculated emission peak position of thesuperlattice is in agreement with PL results.展开更多
The influences of growth techniques of AP-MOCVD GaAs/AlGaAs silicon-doped multi-quantum wells (MQWs), heterostructure bipolar transistors (HBTs), double barrier resonant tunneling diodes(DBRTDs) on their structures an...The influences of growth techniques of AP-MOCVD GaAs/AlGaAs silicon-doped multi-quantum wells (MQWs), heterostructure bipolar transistors (HBTs), double barrier resonant tunneling diodes(DBRTDs) on their structures and performances were studied. Continuously grown MQWs, that is, no growth interruption at the heterointerfaces, shown blue-shifted, narrower and stronger photoluminescence(PL) compared with interruptedly grown ones.TEM examination of the interrupted interfaces revealed a bright line corresponding to the compositional fluctuation and impurity adsorption, and indicated noncommutative structures of AlGaAs/GaAs and GaAs/AlGaAs interfaces. High performance HBTs and DBRTDs were obtained by continuously grown method while growth interruption caused performance degradation. It was concluded that growth interruption may cause accumulation of residua1 impurities in the ambient as well as compositional fluctuation while continuous growth at very low growth rates can overcome such problems.展开更多
基金Work supported by the National Natural Science Foundation of China.
文摘This paper presents Atmospheric Pressure Metalorganic Chemical Vapor Deposition(AP-MOCVD) growth of GaAs/Al-xGa_(1-x)As multiquantum wells for the study of intersubband transition.The multiple quantum well structures are characterized by using cross-sectional transmission electron microscopy(TEM) and low temperature photoluminescence(PL),which are in consistent with the designed parameters.The in- frared absorption from intersubband transitions between the bounded- ground state and the extended excited state in GaAs/AtGaAs quantum wells shows peak at 10 μm with FWHM 250 cm^(-1).The absorption peak positions are in agreement with the calculated results based on the envelope function approximation.
文摘We demonstrate high-performance In0.23 Ga0.77 As channel metal-oxide-semiconductor field-effect transistors （ MOS- FETs） with high on-current to off-current （Ion/Ioff） ratio grown on semi-insulating GaAs wafers by metal-organic chemical vapor deposition （MOCVD）. The 2μm channel-length devices exhibit a peak extrinsic transeonductance of 150 mS/mm and a drain current up to 500 mA/mm. The maximum effective mobility is 1680 cm2/Vs extracted by the split C-V method. Furthermore, the Ion/Ioff ratio is significantly improved from approximately 4.5 × 10^3 up to approximately 4.32 × 10^4 by controlling the etch thickness of In0.49Ga0.51P, The high drain current and high Ion/Ioff ratio of the In0.23Ga0.77As channel MOSFETs are achieved due to the high effective mobility and the low gate leakage current density.
文摘This paper presents metalorganic chemical vapour deposition (MOCVD) growth of GaAs / Al_x Ga_(1-x) Assuperlattices and their application in HEMT (high electron mobility transistor). SEED (self eletrooptic ef-fect device) devices. Superlattice structures are characterized by using crosssectional transmission electronmicroscopy (XTEM). X-ray diffraction and low temperature photoluminescence (PL), and the results showthat they are in agreement with the designed parameters. The superlattice used as buffer layer in HEMTcan smooth out interface roughness. This smoothing effect is related to the migration of Ga and Al specieson the growing surface and the anisotropic growth rate of GaAs on different facets. High qualitysuperlattice with 27 satellite peaks measured by X- ray diffraction is obtained. Based on the structureparameters determined by TEM and X- ray diffraction. the calculated emission peak position of thesuperlattice is in agreement with PL results.
文摘The influences of growth techniques of AP-MOCVD GaAs/AlGaAs silicon-doped multi-quantum wells (MQWs), heterostructure bipolar transistors (HBTs), double barrier resonant tunneling diodes(DBRTDs) on their structures and performances were studied. Continuously grown MQWs, that is, no growth interruption at the heterointerfaces, shown blue-shifted, narrower and stronger photoluminescence(PL) compared with interruptedly grown ones.TEM examination of the interrupted interfaces revealed a bright line corresponding to the compositional fluctuation and impurity adsorption, and indicated noncommutative structures of AlGaAs/GaAs and GaAs/AlGaAs interfaces. High performance HBTs and DBRTDs were obtained by continuously grown method while growth interruption caused performance degradation. It was concluded that growth interruption may cause accumulation of residua1 impurities in the ambient as well as compositional fluctuation while continuous growth at very low growth rates can overcome such problems.
