Growth of gallium nitride(GaN)inverted pyramids on c-plane sapphire substrates is benefit for fabricating novel devices as it forms the semipolar facets.In this work,GaN inverted pyramids are directly grown on c-plane...Growth of gallium nitride(GaN)inverted pyramids on c-plane sapphire substrates is benefit for fabricating novel devices as it forms the semipolar facets.In this work,GaN inverted pyramids are directly grown on c-plane patterned sapphire substrates(PSS)by metal organic vapor phase epitaxy(MOVPE).The influences of growth conditions on the surface morphol-ogy are experimentally studied and explained by Wulff constructions.The competition of growth rate among{0001},{1011},and{1122}facets results in the various surface morphologies of GaN.A higher growth temperature of 985 ℃ and a lowerⅤ/Ⅲratio of 25 can expand the area of{}facets in GaN inverted pyramids.On the other hand,GaN inverted pyramids with almost pure{}facets are obtained by using a lower growth temperature of 930℃,a higherⅤ/Ⅲratio of 100,and PSS with pattern arrangement perpendicular to the substrate primary flat.展开更多
采用 Al N插入层技术在 Si(1 1 1 )衬底上实现无微裂 Ga N MOCVD生长 .通过对 Ga N外延层的 a,c轴晶格常数的测量 ,得到了 Ga N所受张应力与 Al N插入层厚度的变化关系 .当 Al N厚度在 7～ 1 3nm范围内 ,Ga N所受张应力最小 ,甚至变为...采用 Al N插入层技术在 Si(1 1 1 )衬底上实现无微裂 Ga N MOCVD生长 .通过对 Ga N外延层的 a,c轴晶格常数的测量 ,得到了 Ga N所受张应力与 Al N插入层厚度的变化关系 .当 Al N厚度在 7～ 1 3nm范围内 ,Ga N所受张应力最小 ,甚至变为压应力 .因此 ,Ga N微裂得以消除 .同时研究了 Al N插入层对 Ga N晶体质量的影响 ,结果表明 ,许多性能相比于没有 Al N插入层的 Ga展开更多
基金the National Key Research and Development Program(2021YFA0716400)the National Natural Science Foundation of China(62225405,62350002,61991443)+1 种基金the Key R&D Project of Jiangsu Province,China(BE2020004)the Collaborative Innovation Centre of Solid-State Lighting and Energy-Saving Electronics.
文摘Growth of gallium nitride(GaN)inverted pyramids on c-plane sapphire substrates is benefit for fabricating novel devices as it forms the semipolar facets.In this work,GaN inverted pyramids are directly grown on c-plane patterned sapphire substrates(PSS)by metal organic vapor phase epitaxy(MOVPE).The influences of growth conditions on the surface morphol-ogy are experimentally studied and explained by Wulff constructions.The competition of growth rate among{0001},{1011},and{1122}facets results in the various surface morphologies of GaN.A higher growth temperature of 985 ℃ and a lowerⅤ/Ⅲratio of 25 can expand the area of{}facets in GaN inverted pyramids.On the other hand,GaN inverted pyramids with almost pure{}facets are obtained by using a lower growth temperature of 930℃,a higherⅤ/Ⅲratio of 100,and PSS with pattern arrangement perpendicular to the substrate primary flat.
文摘采用 Al N插入层技术在 Si(1 1 1 )衬底上实现无微裂 Ga N MOCVD生长 .通过对 Ga N外延层的 a,c轴晶格常数的测量 ,得到了 Ga N所受张应力与 Al N插入层厚度的变化关系 .当 Al N厚度在 7～ 1 3nm范围内 ,Ga N所受张应力最小 ,甚至变为压应力 .因此 ,Ga N微裂得以消除 .同时研究了 Al N插入层对 Ga N晶体质量的影响 ,结果表明 ,许多性能相比于没有 Al N插入层的 Ga
