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Effect of Axial Magnetic Field on the Microstructure and Mechanical Properties of CrN Films Deposited by Arc Ion Plating 被引量:2
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作者 Yan-Hui Zhao Li Xu +3 位作者 Chao-Qian Guo Wen-Jin Yang Guo-Qiang Lin Bao-Hai Yu 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 2016年第6期546-553,共8页
CrN films were deposited on the high-speed-steel substrates by arc ion plating. The effect of an axial magnetic field on the microstructure and mechanical properties was investigated. The chemical composition, microst... CrN films were deposited on the high-speed-steel substrates by arc ion plating. The effect of an axial magnetic field on the microstructure and mechanical properties was investigated. The chemical composition, microstructure, surface morphology, surface roughness, hardness and film/substrate adhesion of the film were characterized by X-ray photoelectron spectroscopy, X-ray diffraction, scanning electron microscope(SEM), surface morphology analyzer, Vickers microhardness test and scratch test. The results showed that the magnetic field puts much effect on the microstructure,chemical composition, hardness and film/substrate adhesion of the Cr N films. The N content increases and Cr content decreases when the magnetic flux density increases from 0 to 30 m T. All of the Cr N films were found to be substoichiometric. With an increase in the magnetic flux density, the film structures change in such way: Cr_2N →Cr_(2-N)+CrN→CrN+Cr_2N→CrN.The SEM results showed that the number of macroparticles(MPs) on the film surface is significantly reduced when the magnetic flux density increases to 10 mT or higher. The surface roughness decreases with the magnetic field, which is attributed to the fewer MPs and sputtered craters on the film surface. The hardness value increases from 2074 HV_(0.025) at 0 mT(without magnetic field) and reaches a maximum value of 2509 HV_(0.025) at 10 m T.The further increase in the magnetic flux density leads to a decrease in the film hardness. The critical load of film/substrate adhesion shows a monotonous increase with the increase in magnetic flux density. 展开更多
关键词 magnetic field arc ion plating crn films hardness adhesion
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Effect of Axial Magnetic Field on the Microstructure, Hardness and Wear Resistance of TiN Films Deposited by Arc Ion Plating 被引量:4
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作者 Yan-Hui Zhao Wen-Jin Yang +3 位作者 Chao-Qian Guo Yu-Qiu Chen Bao-Hai Yu Jin-Quan Xiao 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 2015年第8期984-993,共10页
TiN films were deposited on stainless steel substrates by arc ion plating. The influence of an axial magnetic field was examined with regard to the microstructure, chemical elemental composition, mechanical properties... TiN films were deposited on stainless steel substrates by arc ion plating. The influence of an axial magnetic field was examined with regard to the microstructure, chemical elemental composition, mechanical properties and wear resistance of the films. The results showed that the magnetic field puts much effect on the preferred orientation, chemical composition, hardness and wear resistance of TiN films. The preferred orientation of the TiN films changed from(111) to(220) and finally to the coexistence of(111) and(220) texture with the increase in the applied magnetic field intensity. The concentration of N atoms in the TiN films increases with the magnetic field intensity, and the concentration of Ti atoms shows an opposite trend. At first, the hardness and elastic modulus of the TiN films increase and reach a maximum value at 5 m T and then decrease with the further increase in the magnetic field intensity. The high hardness was related to the N/Ti atomic ratio and to a well-pronounced preferred orientation of the(111) planes in the crystallites of the film parallel to the substrate surface. The wear resistance of the Ti N films was significantly improved with the application of the magnetic field, and the lowest wear rate was obtained at magnetic field intensity of 5 m T. Moreover, the wear resistance of the films was related to the hardness H and the H3/E*2 ratio in the manner that a higher H3/E*2 ratio was conducive to the enhancement of the wear resistance. 展开更多
关键词 magnetic field arc ion plating TiN films hardness Wear resistance
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Effects of Substrate Pulse Bias Duty Cycle on the Microstructure and Mechanical Properties of Ti–Cu–N Films Deposited by Magnetic Field-Enhanced Arc Ion Plating 被引量:4
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作者 Sheng-Sheng Zhao Yan-Hui Zhao +4 位作者 Lv-Sha Cheng Vladimir Viktorovich Denisov Nikolay Nikolaevich Koval Bao-Hai Yu Hai-Juan Mei 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 2017年第2期176-184,共9页
Ti–Cu–N films were deposited on 316 L stainless steel substrates by magnetic field-enhanced arc ion plating.The effect of substrate pulse bias duty cycle on the chemical composition,microstructure,surface morphology... Ti–Cu–N films were deposited on 316 L stainless steel substrates by magnetic field-enhanced arc ion plating.The effect of substrate pulse bias duty cycle on the chemical composition,microstructure,surface morphology,mechanical and tribological properties of the films was systemically investigated.The results showed that,with increasing the duty cycle,Cu content decreases from 3.3 to 0.58 at.%.XRD results showed that only Ti N phase is observed for all the deposited films and the preferred orientation transformed from Ti N(200) to Ti N(111) plane with the increase in duty cycle.The surface roughness and deposition rate showed monotonous decrease with increasing the duty cycle.The residual stress and hardness firstly increase and then decrease afterwards with the increase in duty cycle,while the variation of critical load shows reverse trend.Except for the film with duty cycle of 10%,others perform the better wear resistance. 展开更多
关键词 magnetic field arc ion plating Ti-Cu-N film Residual stress hardness
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轴向磁场对电弧离子镀CrN薄膜显微组织及耐腐蚀性能的影响 被引量:1
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作者 赵彦辉 李天书 +2 位作者 于宝海 肖金泉 林国强 《中国有色金属学报》 EI CAS CSCD 北大核心 2015年第8期2190-2195,共6页
采用磁场增强电弧离子镀技术,通过改变位于靶材后方的轴向磁场强度,在2024Al合金表面沉积CrN薄膜,研究磁场强度对薄膜显微组织、显微硬度及耐腐蚀性能的影响。结果表明:随着磁场强度的增加,CrN薄膜结构由Cr2N与CrN的混合相逐渐转变为Cr... 采用磁场增强电弧离子镀技术,通过改变位于靶材后方的轴向磁场强度,在2024Al合金表面沉积CrN薄膜,研究磁场强度对薄膜显微组织、显微硬度及耐腐蚀性能的影响。结果表明:随着磁场强度的增加,CrN薄膜结构由Cr2N与CrN的混合相逐渐转变为CrN的单一相结构;磁场强度对薄膜表面形貌有明显影响,随着磁场强度的增加,薄膜表面小颗粒的数量逐渐减少,较大尺寸颗粒的数量有所增加;CrN薄膜的显微硬度和弹性模量在磁场强度为7960 A/m时达到最大值,分别为23.9 GPa与392.6 GPa;CrN薄膜的阳极极化曲线的腐蚀电位随着磁场强度的增加先增加而后降低,在磁场强度为3184 A/m时,具有最大值,即具有较好的抗腐蚀性。 展开更多
关键词 crn薄膜 磁场 电弧离子镀 显微组织 耐腐蚀性
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磁场强度对内燃机用高温Ti600合金表面离子镀TiN/Cu膜性能的影响
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作者 黄凯旋 陈涵洽 《材料保护》 CAS CSCD 北大核心 2018年第12期95-97,142,共4页
外部磁场对电弧等离子及膜结构影响明显,而目前关于磁场强度对离子镀TiN/Cu膜的力学及摩擦磨损性能影响的研究不多。以轴向磁场增强电弧离子镀方法在内燃机用高温Ti600合金表面沉积TiN/Cu膜,分析了不同轴向磁场强度下所得TiN/Cu膜的微... 外部磁场对电弧等离子及膜结构影响明显,而目前关于磁场强度对离子镀TiN/Cu膜的力学及摩擦磨损性能影响的研究不多。以轴向磁场增强电弧离子镀方法在内燃机用高温Ti600合金表面沉积TiN/Cu膜,分析了不同轴向磁场强度下所得TiN/Cu膜的微观结构、化学组成、力学特性。结果表明:TiN/Cu膜表面生成了很多尺寸较大的颗粒,磁场强度增大后,颗粒数量减少,而溅射坑数量上升,粗糙度表现为先降低后上升;当磁场强度升高后,膜中的Cu含量上升,TiN/Cu膜硬度与弹性模量均先增大后下降;磁场强度上升后,膜摩擦系数并未发生明显变化,膜磨损率先降低后上升。 展开更多
关键词 TiN/Cu膜 轴向磁场 电弧离子镀 硬度 耐磨性
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轴向磁场强度对真空电弧离子镀TiN薄膜的影响
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作者 徐焱良 王向红 +3 位作者 赵彦辉 高斌 肖金泉 于宝海 《南昌大学学报(理科版)》 CAS 北大核心 2014年第5期458-462,共5页
采用电弧离子镀方法在不锈钢基体上沉积了TiN薄膜,考察了弧靶与基体之间等离子通道上的轴向磁场强度(0-300高斯)对薄膜表面形貌、组织结构、硬度及弹性模量的影响。结果表明,随着轴向磁场的不断增强,等离子体密度及能量密度不断增大,阴... 采用电弧离子镀方法在不锈钢基体上沉积了TiN薄膜,考察了弧靶与基体之间等离子通道上的轴向磁场强度(0-300高斯)对薄膜表面形貌、组织结构、硬度及弹性模量的影响。结果表明,随着轴向磁场的不断增强,等离子体密度及能量密度不断增大,阴极靶斑点处被熔化的靶材区域增大,阴极斑点附近局部蒸气压升高,薄膜表面较大尺寸的大颗粒数、凹坑数量会因此增多,薄膜粗糙度会因此增大;生长取向由(111)面择优转为(220)面择优并最终趋向无择优取向;薄膜表面硬度及弹性模量均呈现先增大后减小的趋势。 展开更多
关键词 电弧离子镀 轴向磁场 TIN薄膜 硬度
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轴向磁场对电弧离子镀TiN/Cu薄膜性能的影响 被引量:6
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作者 赵升升 赵彦辉 +2 位作者 陈伟 费加喜 王铁钢 《材料研究学报》 EI CAS CSCD 北大核心 2018年第5期381-387,共7页
使用加可调轴向磁场的电弧离子镀设备在不锈钢基体上制备TiN/Cu薄膜,研究了轴向磁场强度对薄膜微观结构、化学成分、力学性能和耐磨性能的影响。结果表明,在不同强度的磁场下TiN/Cu薄膜具有相同的TiN结构,且以沿TiN(111)面的择优取向为... 使用加可调轴向磁场的电弧离子镀设备在不锈钢基体上制备TiN/Cu薄膜,研究了轴向磁场强度对薄膜微观结构、化学成分、力学性能和耐磨性能的影响。结果表明,在不同强度的磁场下TiN/Cu薄膜具有相同的TiN结构,且以沿TiN(111)面的择优取向为主。随着磁场强度的提高(111)面衍射峰的强度逐渐提高、TiN/Cu薄膜表面的粗糙度先降低后提高、薄膜中Cu的含量逐渐提高、硬度和弹性模量也逐渐提高、薄膜的磨损率先降低后提高。当磁场强度为80 Gs时薄膜的硬度达到约为36 GPa的最大值,耐磨性能最高。 展开更多
关键词 TiN/Cu薄膜 轴向磁场 电弧离子镀 硬度 耐磨性
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轴对称磁场对电弧离子镀TiN-Cu纳米复合膜性能的影响 被引量:1
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作者 宋贵宏 肖金泉 +1 位作者 杜昊 陈立佳 《材料研究学报》 EI CAS CSCD 北大核心 2015年第10期787-793,共7页
在电弧离子镀靶后端加入轴对称线圈磁场,制备了TiN-Cu纳米复合膜。观察线圈磁场强度对靶表面电弧斑点游动速率和弧柱形状的影响,及其对沉积薄膜的表面形貌、沉积速率、纳米压痕硬度和弹性模量的影响。结果表明,提高线圈磁场强度可提高... 在电弧离子镀靶后端加入轴对称线圈磁场,制备了TiN-Cu纳米复合膜。观察线圈磁场强度对靶表面电弧斑点游动速率和弧柱形状的影响,及其对沉积薄膜的表面形貌、沉积速率、纳米压痕硬度和弹性模量的影响。结果表明,提高线圈磁场强度可提高电弧斑点的游动速率,进而降低靶表面金属液滴喷射几率,减小沉积薄膜中大颗粒的尺寸和数量。X射线衍射(XRD)谱显示,沉积薄膜只含有TiN相,未出现金属Cu或其化合物的衍射峰;薄膜呈现明显的(111)晶面择优取向。随着线圈磁场强度的提高薄膜沉积速率、压痕硬度和弹性模量先增加,达到最大值后又略有减少,其最大硬度和弹性模量分别达到35.46GPa和487.61GPa。 展开更多
关键词 复合材料 TiN—Cu纳米复合膜 硬度 电弧离子镀 磁场强度 大颗粒 沉积速率
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