The demand to enhance the optical resolution, to structure and observe ever smaller details, has pushed the way towards the EUV and soft X-rays. Induced mainly by the production of more powerful electronic circuits wi...The demand to enhance the optical resolution, to structure and observe ever smaller details, has pushed the way towards the EUV and soft X-rays. Induced mainly by the production of more powerful electronic circuits with the aid of projection lithography, optics developments in recent years can be characterized by the use of electromagnetic radiation with smaller wavelength. The good prospects of the EUV and soft X-rays for next generation lithography systems (λ=13.5 nm), microscopy in the “water window” (λ=2.3～4.4 nm), astronomy (λ=5～31 nm), spectroscopy, plasma diagnostics and EUV/soft X-ray laser research have led to considerable progress in the development of different multilayer optics. Since optical systems in the EUV/soft X-ray spectral region consist of several mirror elements a maximum reflectivity of each multilayer is essential for a high throughput. This paper covers recent results of the enhanced spectral behavior of Mo/Si, Cr/Sc and Sc/Si multilayer optics.展开更多
A random method used for improving light throughput of a soft X-ray multilayer has been developed in the 18-20 nm spectral region, based on the traditional theory of periodic multilayer, and an 8% gain in integrated r...A random method used for improving light throughput of a soft X-ray multilayer has been developed in the 18-20 nm spectral region, based on the traditional theory of periodic multilayer, and an 8% gain in integrated reflectance is obtained. The ensemble calculation is presented at the same time, and the multilayer is fabricated by magnetron sputtering.展开更多
The multilayer Laue lens(MLL) is a diffractive focusing optical element which can focus hard X-rays down to the nanometer scale. In this study, a WSi_(2)/Si multilayer structure consisting of 1736 layers, with a 7.2-n...The multilayer Laue lens(MLL) is a diffractive focusing optical element which can focus hard X-rays down to the nanometer scale. In this study, a WSi_(2)/Si multilayer structure consisting of 1736 layers, with a 7.2-nm-thick outermost layer and a total thickness of 17 μm, is prepared by DC magnetron sputtering. Regarding the thin film growth rate calibration, we correct the long-term growth rate drift from 2 to 0.6%, as measured by the grazing incidence X-ray reflectivity(GIXRR). A one-dimensional line focusing resolution of 64 nm was achieved,while the diffraction efficiency was 38% of the-1 order of the MLL Shanghai Synchrotron Radiation Facility(SSRF) with the BL15U beamline.展开更多
In the present work, a series of [FesoNi20-O/SiO2]n multilayer thin films is fabricated using a reactive magnetron sputtering equipment. The thickness of SiO2 interlayer is fixed at 3 nm, while the thickness values of...In the present work, a series of [FesoNi20-O/SiO2]n multilayer thin films is fabricated using a reactive magnetron sputtering equipment. The thickness of SiO2 interlayer is fixed at 3 nm, while the thickness values of FesoNi20-O magnetic films range from 10 nm to 30 nm. All films present obvious in-plane uniaxial magnetic anisotropy. With increasing the FesoNi20-O layer thickness, the saturation magnetization increases slightly and the coercivity becomes larger due to the enlarged grain size, which could weaken the soft magnetic property. The results of high frequency magnetic permeability characterization show that films with thin magnetic layer are more suitable for practical applications. When the thickness of FesoNi20-O layer is 10 nm, the multilayer film exhibits the most comprehensive high-frequency magnetic property with a real permeability of 300 in gigahertz range.展开更多
The design,fabrication and characterization of the X-ray supermirrors are discussed in this paper.Using the local optimization method of simplex algorithm and the global one of simulated annealing algorithm with diffe...The design,fabrication and characterization of the X-ray supermirrors are discussed in this paper.Using the local optimization method of simplex algorithm and the global one of simulated annealing algorithm with different initial multilayer structures,we designed the broad angular band supermirrors with different grazing incidence angle intervals at the energy of 8.0 keV(the Kαline of Cu)and the broad energetic band supermirrors with different energy intervals at fixed grazing incidence angles.The fabricating techniques for depositing non-periodic multilayers are also studied.The W/C and W/Si supermirrors are deposited on silicon substrates and characterized by a high resolution X-ray D1 diffractometer from Bede Company,UK.Choosing the interface roughness and the densities of the materials as independent variables,some measured reflectivity curves are fitted using the Debye-Waller factor with interface roughness.The experimental results show that the optical performances of the fabricated supermirrors are in agreement with the designed ones.展开更多
文摘The demand to enhance the optical resolution, to structure and observe ever smaller details, has pushed the way towards the EUV and soft X-rays. Induced mainly by the production of more powerful electronic circuits with the aid of projection lithography, optics developments in recent years can be characterized by the use of electromagnetic radiation with smaller wavelength. The good prospects of the EUV and soft X-rays for next generation lithography systems (λ=13.5 nm), microscopy in the “water window” (λ=2.3～4.4 nm), astronomy (λ=5～31 nm), spectroscopy, plasma diagnostics and EUV/soft X-ray laser research have led to considerable progress in the development of different multilayer optics. Since optical systems in the EUV/soft X-ray spectral region consist of several mirror elements a maximum reflectivity of each multilayer is essential for a high throughput. This paper covers recent results of the enhanced spectral behavior of Mo/Si, Cr/Sc and Sc/Si multilayer optics.
文摘A random method used for improving light throughput of a soft X-ray multilayer has been developed in the 18-20 nm spectral region, based on the traditional theory of periodic multilayer, and an 8% gain in integrated reflectance is obtained. The ensemble calculation is presented at the same time, and the multilayer is fabricated by magnetron sputtering.
基金the National Natural Science Foundation of China(Nos.12005250,U1932167,and U1432244).
文摘The multilayer Laue lens(MLL) is a diffractive focusing optical element which can focus hard X-rays down to the nanometer scale. In this study, a WSi_(2)/Si multilayer structure consisting of 1736 layers, with a 7.2-nm-thick outermost layer and a total thickness of 17 μm, is prepared by DC magnetron sputtering. Regarding the thin film growth rate calibration, we correct the long-term growth rate drift from 2 to 0.6%, as measured by the grazing incidence X-ray reflectivity(GIXRR). A one-dimensional line focusing resolution of 64 nm was achieved,while the diffraction efficiency was 38% of the-1 order of the MLL Shanghai Synchrotron Radiation Facility(SSRF) with the BL15U beamline.
基金Project supported by the National Basic Research Program of China(Grant No.2012CB933103)the National Natural Science Foundation of China(Grant Nos.51371154,51301145,51171158,and 50825101)the Fundamental Research Funds for the Central Universities of China(Grant No.201212G001)
文摘In the present work, a series of [FesoNi20-O/SiO2]n multilayer thin films is fabricated using a reactive magnetron sputtering equipment. The thickness of SiO2 interlayer is fixed at 3 nm, while the thickness values of FesoNi20-O magnetic films range from 10 nm to 30 nm. All films present obvious in-plane uniaxial magnetic anisotropy. With increasing the FesoNi20-O layer thickness, the saturation magnetization increases slightly and the coercivity becomes larger due to the enlarged grain size, which could weaken the soft magnetic property. The results of high frequency magnetic permeability characterization show that films with thin magnetic layer are more suitable for practical applications. When the thickness of FesoNi20-O layer is 10 nm, the multilayer film exhibits the most comprehensive high-frequency magnetic property with a real permeability of 300 in gigahertz range.
基金supported by the National Natural Science Foundation of China(Grant No.60178023)the Shanghai Development Foundation of Science and Technology(Grant No.0352nm090).
文摘The design,fabrication and characterization of the X-ray supermirrors are discussed in this paper.Using the local optimization method of simplex algorithm and the global one of simulated annealing algorithm with different initial multilayer structures,we designed the broad angular band supermirrors with different grazing incidence angle intervals at the energy of 8.0 keV(the Kαline of Cu)and the broad energetic band supermirrors with different energy intervals at fixed grazing incidence angles.The fabricating techniques for depositing non-periodic multilayers are also studied.The W/C and W/Si supermirrors are deposited on silicon substrates and characterized by a high resolution X-ray D1 diffractometer from Bede Company,UK.Choosing the interface roughness and the densities of the materials as independent variables,some measured reflectivity curves are fitted using the Debye-Waller factor with interface roughness.The experimental results show that the optical performances of the fabricated supermirrors are in agreement with the designed ones.
