By using two PM2.5 automatic monitors,the protective effects of five common masks against PM2.5 were synchronously tested under actual ambient air conditions for a whole day. The results showed that not all masks had ...By using two PM2.5 automatic monitors,the protective effects of five common masks against PM2.5 were synchronously tested under actual ambient air conditions for a whole day. The results showed that not all masks had protective effects on PM2.5,and the protective effects of masks N95 and N90,which were designed specially for dust-proof,were superior among the five tested masks.展开更多
As mask features scale to smaller dimensions, the so-called ＂3-D mask effects＂ which have mostly been neglected before, become important. This paper properly models the 3-D thick mask effects, and then analyses the ...As mask features scale to smaller dimensions, the so-called ＂3-D mask effects＂ which have mostly been neglected before, become important. This paper properly models the 3-D thick mask effects, and then analyses the object-based inverse lithography technique using a simulated annealing algorithm to determine the mask shapes that produce the desired on-wafer results. Evaluations against rigorous simulations show that the synthesized masks provide good image fidelity up to 0.94, and this approach gives improved accuracy and faster results than existing methods.展开更多
基金Supported by the Monitoring Scientific Research Foundation of Jiangsu Province,China in 2013(1321)
文摘By using two PM2.5 automatic monitors,the protective effects of five common masks against PM2.5 were synchronously tested under actual ambient air conditions for a whole day. The results showed that not all masks had protective effects on PM2.5,and the protective effects of masks N95 and N90,which were designed specially for dust-proof,were superior among the five tested masks.
基金Supported by the National Key Basic Research and Development(973) Program of China (No. 2006CB302700)the Basic Research Foundation of Tsinghua National Laboratory for Information Science and Technology (TNList)
文摘As mask features scale to smaller dimensions, the so-called ＂3-D mask effects＂ which have mostly been neglected before, become important. This paper properly models the 3-D thick mask effects, and then analyses the object-based inverse lithography technique using a simulated annealing algorithm to determine the mask shapes that produce the desired on-wafer results. Evaluations against rigorous simulations show that the synthesized masks provide good image fidelity up to 0.94, and this approach gives improved accuracy and faster results than existing methods.
