A theoretical compensation method for polygonized mesa structures on（100） silicon substrate during the anisotropic etching process has been developed,which contains four stages as follows：prepare the information of...A theoretical compensation method for polygonized mesa structures on（100） silicon substrate during the anisotropic etching process has been developed,which contains four stages as follows：prepare the information of the etching condition;predict the structure＇s undercutting profile;construct the topological structure of compensation patterns; and generate practical compensation patterns from the topological structure.The reasoning process is clearly stated,and detailed steps for the undercutting prediction and topological structure construction are summarized.Conclusions are also drawn about the rules which must be obeyed during the pattern generation process.The simulation and experimental results of some polygon structures are finally given to prove this method＇s validity and reliability.展开更多
An optical micro electron mechanical system （MEMS） pressure sensor with a mesa membrane is presented. The operating principle of the MEMS pressure sensor is expatiated by the Fabry-Perot （F-P） interference and the...An optical micro electron mechanical system （MEMS） pressure sensor with a mesa membrane is presented. The operating principle of the MEMS pressure sensor is expatiated by the Fabry-Perot （F-P） interference and the relation between deflection and pressure is analyzed. Both the mechanical model of the mesa structure diaphragm and the signal averaging effect is validated by simulation, which declares that the mesa structure diaphragm is superior to the planar one on the parallelism and can reduce the signal averaging effect. Experimental results demonstrate that the mesa structure sensor has a reasonable linearity and sensitivity.展开更多
文摘A theoretical compensation method for polygonized mesa structures on（100） silicon substrate during the anisotropic etching process has been developed,which contains four stages as follows：prepare the information of the etching condition;predict the structure＇s undercutting profile;construct the topological structure of compensation patterns; and generate practical compensation patterns from the topological structure.The reasoning process is clearly stated,and detailed steps for the undercutting prediction and topological structure construction are summarized.Conclusions are also drawn about the rules which must be obeyed during the pattern generation process.The simulation and experimental results of some polygon structures are finally given to prove this method＇s validity and reliability.
文摘An optical micro electron mechanical system （MEMS） pressure sensor with a mesa membrane is presented. The operating principle of the MEMS pressure sensor is expatiated by the Fabry-Perot （F-P） interference and the relation between deflection and pressure is analyzed. Both the mechanical model of the mesa structure diaphragm and the signal averaging effect is validated by simulation, which declares that the mesa structure diaphragm is superior to the planar one on the parallelism and can reduce the signal averaging effect. Experimental results demonstrate that the mesa structure sensor has a reasonable linearity and sensitivity.
