Metal vapor behavior in double electrodes TIG welding

In present paper, the metal vapour behavior in double electrodes TIG welding was investigated by a numerical model, including the arc plasma and weld pool. The thermodynamic parameters and transport coefficients of the arc plasma were dependent on both the local temperature and the mass ratio of the metal vapour. A second viscosity approximation was used to formulate the diffusion coefficient of the metal vapour in the arc plasma. The temperature and flow fields together with the metal vapour concentration were simulated, and the influences of metal vapour on the arc plasma and the weld pool were analyzed. It was found that the metal vapour transport in the arc plasma was significantly influenced by the flow of the arc plasma, and the distribution of the metal vapour was more extended in the direction perpendicular to the line through the double electrodes tips. Both the arc plasma and the heat flux at the weld pool were constricted by the presence of the metal vapour, while the metal vapour had a minor effect on the total heat input to the work piece and the weld pool profile as a whole.

Metal Organic Chemical Vapour Deposited Thin Films of Cobalt Oxide Prepared via Cobalt Acetylacetonate

The single solid source precursor, cobalt （Ⅱ） acetylacetonate was prepared and characterized by infrared spectroscopy. Thin films of cobalt oxide were deposited on soda lime glass substrates through the pyrolysis （metal organic chemical vapour deposition （MOCVD）） of single solid source precursor, cobalt acetylacetonate, Co[C5H7O2]2 at a temperature of 420℃. The compositional characterization carried out by rutherford backscattering spectroscopy and X-ray diffraction （XRD）, showed that the films have a stoichiometry of Co2O3 and an average thickness of 227±0.2 nm. A direct energy gap of 2,15±0.01 eV was calculated by the data obtained by optical absorption spectroscopy. The morphology of the films obtained by scanning electron microscopy, showed that the grains were continuous and uniformly distributed at various magnifications, while the average grain size was less than i micron for the deposited thin films of cobalt oxide.

Effects of InGaN barriers with low indium content on internal quantum efficiency of blue InGaN multiple quantum wells

Blue In0.2Ga0.8N multiple quantum wells （MQWs） with InxGa1-xN （x = 0.01 - 0.04） barriers are grown by metal organic vapour phase epitaxy. The internal quantum efficiencies （IQEs） of these MQWs are studied in a way of temperature-dependent photoluminescenee spectra. Furthermore, a 2-channel Arrhenius model is used to analyse the nonradiative recombination centres （NRCs）. It is found that by adopting the InGaN barrier beneath the lowest well, it is possible to reduce the strain hence the NRCs in InGaN MQWs. By optimizing the thickness and the indium content of the InGaN barriers, the IQEs of InGaN/InGaN MQWs can be increased by about 2.5 times compared with conventional InGaN/GaN MQWs. On the other hand, the incorporation of indium atoms into the intermediate barriers between adjacent wells does not improve IQE obviously. In addition, the indium content of the intermediate barriers should match with that of the lowest barrier to avoid relaxation.

Optical and structural investigation of a-plane GaN layers on r-plane sapphire with nucleation layer optimization

Nonpolar a-plane GaN epilayers are grown on several r-plane sapphire substrates by metal organic chemical vapour deposition using different nucleation layers： （A） a CaN nucleation layer deposited at low temperature （LT）; （B） an A1N nucleation layer deposited at high temperature; or （C） an LT thin AIN nucleation layer with an AIN layer and an A1N/A1CaN superlattice both subsequently deposited at high temperature. The samples have been characterized by Xray diffraction （XRD）, atomic force microscopy and photoluminescence. The GaN layers grown using nucleation layers B and C show narrower XRD rocking curves than that using nucleation layer A, indicating a reduction in crystal defect density. Furthermore, the GaN layer grown using nucleation layer C exhibits a surface morphology with triangular defect pits eliminated completely. The improved optical property, corresponding to the enhanced crystal quality, is also confirmed by temperature-dependent and excitation power-dependent photoluminescence measurements.

Characterisation of Zinc Oxynitride Thin Films Prepared Using Zinc(II) Complex of Hexamethylenetetramine as the Precursor

A Zinc(II) complex of hexamethylenetetramine was prepared as a single source precursor and used to deposit zinc oxynitride thin films. The thin films were deposited on soda-lime glass substrates using the Metal Organic Chemical Vapour Deposition (MOCVD) technique at the deposition temperature of 370°C and 390°C, respectively. The Fourier Transform Infrared Spectroscopy (FTIR) was used to determine the functional groups in the precursor, with stretching frequency for O-H, N-H, and C-H observed. The deposited films were characterized using UV-Visible Spectroscopy, Scanning Electron Microscopy (SEM), Elemental diffraction X-ray (EDX), and X-ray Diffractometer (XRD). A direct bandgap of 3.15 eV and 3.18 eV was obtained from the film deposited at 370°C and 390°C, respectively, using the Envelope Method. In comparison, a bandgap of 3.19 eV and 3.21 eV was obtained using the absorption spectrum fitting (ASF) method. The SEM revealed that the film is homogeneous, dense, and compact, composed of cluster grains. The EDX confirmed the presence of Zinc, Nitrogen and Oxygen. The X-ray Diffraction indicated the polycrystalline nature of the film.

Synthesis and Some Properties of Metal Organic Chemical Vapour Deposited Molybdenum Oxysulphide Thin Films

Molybdenum oxodithiocarbamate was prepared as thin films which were deposited on sodalime glass a single solid source precursor for molybdenum oxysulphide substrates using metal organic chemical vapour deposition （MOCVD） technique at a temperature of 420~C. Rutherford backscattering spectroscopy （RBS） was used to determine the elemental composition of the film which showed that the films contained large amounts of oxygen. The large amount of oxygen was attributed to the large abundance of oxygen in the starting material. A direct optical energy gap of 3.31 eV was obtained from the analysis of the absorption spectrum. The scanning electron microscopy （SEM） micrographs of the films showed that the films were continuous and porous. An estimated average size of the grains was below 5 #m. X-ray diffraction （XRD） showed that the deposited films were crystalline in nature.