采用金属有机化学气相沉积(MOCVD)方法在Si衬底上实现了立方结构的Mg0.25Zn0.75O薄膜生长。在此基础上,实现了Mg0.25Zn0.75O/n-Si异质结型日盲紫外探测器。该探测器在-5 V偏压下,器件暗电流为0.02 m A。在0 V偏压下的峰值响应位于大约28...采用金属有机化学气相沉积(MOCVD)方法在Si衬底上实现了立方结构的Mg0.25Zn0.75O薄膜生长。在此基础上,实现了Mg0.25Zn0.75O/n-Si异质结型日盲紫外探测器。该探测器在-5 V偏压下,器件暗电流为0.02 m A。在0 V偏压下的峰值响应位于大约280 nm处,响应度为1.2 m A/W。展开更多
The energy band structures, density of states, and optical properties of IliA-doped wurtzite Mg0.25Zn0.75O （IIIA= A1, Ga, In） are investigated by a first-principles method based on the density functional theory. The...The energy band structures, density of states, and optical properties of IliA-doped wurtzite Mg0.25Zn0.75O （IIIA= A1, Ga, In） are investigated by a first-principles method based on the density functional theory. The calculated results show that the optical bandgaps of Mg0.25Zn0.75O：IIIA are larger than those of Mg0.25Zn0.75O because of the Burstein-Moss effect and the bandgap renormalization effect. The electron effective mass values of Mg0.25Zn0.75O：IIIA are heavier than those of Mgo.25Zno.750, which is in agreement with the previous experimental result. The formation energies of MgZnO：Al and MgZnO：Ga are smaller than that of MgZnO：In, while their optical bandgaps are larger, so MgZnO：Al and MgZnO：Ga are suitable to be fabricated and used as transparent conductive oxide films in the ultra-violet （UV） and deep UV optoelectronic devices.展开更多
文摘采用金属有机化学气相沉积(MOCVD)方法在Si衬底上实现了立方结构的Mg0.25Zn0.75O薄膜生长。在此基础上,实现了Mg0.25Zn0.75O/n-Si异质结型日盲紫外探测器。该探测器在-5 V偏压下,器件暗电流为0.02 m A。在0 V偏压下的峰值响应位于大约280 nm处,响应度为1.2 m A/W。
基金Project supported by the National Natural Science Foundation of China(Grant No.61078046)the Special Funds for Provincial Strategic and Emerging Industries Projects of Guangdong Province,China(Grant No.2012A080304016)the Youth Foundation of South China Normal University,China(Grant No.2012KJ018)
文摘The energy band structures, density of states, and optical properties of IliA-doped wurtzite Mg0.25Zn0.75O （IIIA= A1, Ga, In） are investigated by a first-principles method based on the density functional theory. The calculated results show that the optical bandgaps of Mg0.25Zn0.75O：IIIA are larger than those of Mg0.25Zn0.75O because of the Burstein-Moss effect and the bandgap renormalization effect. The electron effective mass values of Mg0.25Zn0.75O：IIIA are heavier than those of Mgo.25Zno.750, which is in agreement with the previous experimental result. The formation energies of MgZnO：Al and MgZnO：Ga are smaller than that of MgZnO：In, while their optical bandgaps are larger, so MgZnO：Al and MgZnO：Ga are suitable to be fabricated and used as transparent conductive oxide films in the ultra-violet （UV） and deep UV optoelectronic devices.
