MgxZn1-xO thin films have been prepared on silicon substrates by radio frequency magnetron sputtering at 60℃. The thin films have hexagonal wurtzite single-phase structure and a preferred orientation with the c-axis ...MgxZn1-xO thin films have been prepared on silicon substrates by radio frequency magnetron sputtering at 60℃. The thin films have hexagonal wurtzite single-phase structure and a preferred orientation with the c-axis perpendicular to the substrates. The refractive indices of MgxZn1-xO films are studied at room temperature by spectroscopic ellipsometry over the wavelength range of 400-760nm at the incident angle of 70°. Both absorption coefficients and optical band gaps of MgxZn1-xO films are determined by the transmittance spectra. While Mg content is increasing, the absorption edges of MgxZn1-xO films shift to higher energies and band gaps linearly increase from 3.24. eV at x=0 to 3.90 eV at x=0.30. These results provide important information for the design and modelling of ZnO/ MgxZn1-xO heterostructure optoelectronic devices.展开更多
High-quality MgxZn1-xO thin films were grown on sapphire（0001 ） substrates with a ZnO buffer layer of different thicknesses by means of metal-organic chemical vapor deposition. Diethyl zinc, bis-cyclopentadienyl-Mg ...High-quality MgxZn1-xO thin films were grown on sapphire（0001 ） substrates with a ZnO buffer layer of different thicknesses by means of metal-organic chemical vapor deposition. Diethyl zinc, bis-cyclopentadienyl-Mg and oxygen were used as the precursor materials. The crystalline quality, surface morphologies and optical properties of the Mg, Zn1-xO films were investigated by X-ray diffraction, atomic force microscopy and photoluminescence spectrometry. It was shown that the quality of the MgxZn1-xO thin films depends on the thickness of the ZnO buffer layer and an Mg, Zn1-xO thin film with a ZnO buffer layer whose thickness was 20 nm exhibited the best crystal-quality, optical properties and a flat and dense surface.展开更多
We investigate the magnesium（Mg） incorporation efficiencies in MgxZn1-xO films on c-plane Zn-face ZnO substrates by using metalorganic chemical vapor deposition（MOCVD） technique. In order to deposit high quality M...We investigate the magnesium（Mg） incorporation efficiencies in MgxZn1-xO films on c-plane Zn-face ZnO substrates by using metalorganic chemical vapor deposition（MOCVD） technique. In order to deposit high quality MgxZn1-xO films,atomically smooth epi-ready surfaces of the hydrothermal grown ZnO substrates are achieved by thermal annealing in O2 atmosphere and characterized by atomic force microscope（AFM）. The AFM, scanning electron microscope（SEM）,and x-ray diffraction（XRD） studies demonstrate that the MgxZn1-xO films each have flat surface and hexagonal wurtzite structure without phase segregation at up to Mg content of 34.4%. The effects of the growth parameters including substrate temperature, reactor pressure and Ⅵ/Ⅱ ratio on Mg content in the films are investigated by XRD analysis based on Vegard＇s law, and confirmed by photo-luminescence spectra and x-ray photoelectron spectroscopy as well. It is indicated that high substrate temperature, low reactor pressure, and high Ⅵ/Ⅱratio are good for obtaining high Mg content.展开更多
The structural and surface properties of high-quality epitaxial cubic MgxZn1-xO films deposited by pulsed laser deposition (PLD) were studied by X-ray diffracti on and atomic force microscopy respectively. For films o...The structural and surface properties of high-quality epitaxial cubic MgxZn1-xO films deposited by pulsed laser deposition (PLD) were studied by X-ray diffracti on and atomic force microscopy respectively. For films of about 500nm thick, sca ns over a 30μm × 30μm area revealed a surface roughness Ra of about 100nm. Th is relatively large surface roughness is primarily attributed to the particulate and outgrowth during the PLD process. A good epitaxial growth on LaAlO3 (LAO ) (100) substrates, however has been obtained for composition x = 0.9, 0.7 and 0 .5 with the heteroepitaxial relationship of (100)■∥(100)LAO (out-of-plane) and (011)■∥(010)LAO (in-plane). These structural qualities suggest that cubic Mgx Zn1-xO alloys films have good potential in a variety of optoelectronic device ap plications.展开更多
Cubic phase MgxZn1-x O/MgO multilayer heterostructures （c-Mgx Zn1-xO/MgO MHs） are grown on Si（100） and quartz substrates by reactive electron beam evaporation at low temperature （250℃）. Cross-sectional morpholo...Cubic phase MgxZn1-x O/MgO multilayer heterostructures （c-Mgx Zn1-xO/MgO MHs） are grown on Si（100） and quartz substrates by reactive electron beam evaporation at low temperature （250℃）. Cross-sectional morphology observations by field-emission scanning electron microscopy show the legible interfaces of c-MgxZn1-x O/MgO MHs. X-ray diffraction demonstrates that c-MgxZn1-xO/MgO MHs are of highly （100）-oriented. Optical trans- mission investigations of c-Mgx Zn1-x O/MgO MHs on quartz substrates reveal the coexistence of the two phases, c-MgxZn1-xO and MgO. Photoluminescence examination indicates the emergence of deep-ultraviolet emission centred at about 290nm along with the blue shift of the ultraviolet emission from 405nm to 39Gnm when the nominal thickness of c-MgxZn1-xO well layers of MHs is diminished to 3nm, which is probably originated from quantum confinement effect.展开更多
Homogeneous, crack-free SrNbxTi1-xO3 thin films on （110） silicon substrates were successfully fabricated by sol-gel processing. The optimum route and conditions were systematically investigated. Sr（OAc）2 glacial a...Homogeneous, crack-free SrNbxTi1-xO3 thin films on （110） silicon substrates were successfully fabricated by sol-gel processing. The optimum route and conditions were systematically investigated. Sr（OAc）2 glacial acetic acid solution, after being refluxed and reacted with tartrate, formed Sr（OAc）2（C4H6O6）2; Ti（OBu）4 formed Ti（OAc）4-x（AcAc）x. after having the ligand partially exchanged with AcAc, while Nb（OC2H5）5 formed （OAc）2Nb（AcAc） （C4H606）by exchanging of ligand in glacial acetic acid with （CH3CO）2O. All the metal species after undergoing partial hydrolysis and polymerization with hydroxyl or oxygen, formed SrNb,Ti1-xO3 cluster sol. Methyl cellulose （MCL） caused SrNbxTi1-xO3 sol to have polymeric structure and easily form films. SrNbxTi1-xO3 films with perovskite were subsequently formed after being annealed at 650-750 ℃ for 60 min in 25% N2＋75% H2 （volume ratio） atmosphere. Resistivity of the SrNb0.1 Ti0.9O3 films at room temperature was 64 μΩ·cm, a particular T2 temperature dependence of the resistivity, from 25 K up to room temperature, was observed.展开更多
文摘MgxZn1-xO thin films have been prepared on silicon substrates by radio frequency magnetron sputtering at 60℃. The thin films have hexagonal wurtzite single-phase structure and a preferred orientation with the c-axis perpendicular to the substrates. The refractive indices of MgxZn1-xO films are studied at room temperature by spectroscopic ellipsometry over the wavelength range of 400-760nm at the incident angle of 70°. Both absorption coefficients and optical band gaps of MgxZn1-xO films are determined by the transmittance spectra. While Mg content is increasing, the absorption edges of MgxZn1-xO films shift to higher energies and band gaps linearly increase from 3.24. eV at x=0 to 3.90 eV at x=0.30. These results provide important information for the design and modelling of ZnO/ MgxZn1-xO heterostructure optoelectronic devices.
文摘High-quality MgxZn1-xO thin films were grown on sapphire（0001 ） substrates with a ZnO buffer layer of different thicknesses by means of metal-organic chemical vapor deposition. Diethyl zinc, bis-cyclopentadienyl-Mg and oxygen were used as the precursor materials. The crystalline quality, surface morphologies and optical properties of the Mg, Zn1-xO films were investigated by X-ray diffraction, atomic force microscopy and photoluminescence spectrometry. It was shown that the quality of the MgxZn1-xO thin films depends on the thickness of the ZnO buffer layer and an Mg, Zn1-xO thin film with a ZnO buffer layer whose thickness was 20 nm exhibited the best crystal-quality, optical properties and a flat and dense surface.
基金supported by the National Natural Science Foundation of China(Grant No.61474121)and the Major Scientific Project of Fujian Province,China(Grant No.2014NZ0002-2)
文摘We investigate the magnesium（Mg） incorporation efficiencies in MgxZn1-xO films on c-plane Zn-face ZnO substrates by using metalorganic chemical vapor deposition（MOCVD） technique. In order to deposit high quality MgxZn1-xO films,atomically smooth epi-ready surfaces of the hydrothermal grown ZnO substrates are achieved by thermal annealing in O2 atmosphere and characterized by atomic force microscope（AFM）. The AFM, scanning electron microscope（SEM）,and x-ray diffraction（XRD） studies demonstrate that the MgxZn1-xO films each have flat surface and hexagonal wurtzite structure without phase segregation at up to Mg content of 34.4%. The effects of the growth parameters including substrate temperature, reactor pressure and Ⅵ/Ⅱ ratio on Mg content in the films are investigated by XRD analysis based on Vegard＇s law, and confirmed by photo-luminescence spectra and x-ray photoelectron spectroscopy as well. It is indicated that high substrate temperature, low reactor pressure, and high Ⅵ/Ⅱratio are good for obtaining high Mg content.
文摘The structural and surface properties of high-quality epitaxial cubic MgxZn1-xO films deposited by pulsed laser deposition (PLD) were studied by X-ray diffracti on and atomic force microscopy respectively. For films of about 500nm thick, sca ns over a 30μm × 30μm area revealed a surface roughness Ra of about 100nm. Th is relatively large surface roughness is primarily attributed to the particulate and outgrowth during the PLD process. A good epitaxial growth on LaAlO3 (LAO ) (100) substrates, however has been obtained for composition x = 0.9, 0.7 and 0 .5 with the heteroepitaxial relationship of (100)■∥(100)LAO (out-of-plane) and (011)■∥(010)LAO (in-plane). These structural qualities suggest that cubic Mgx Zn1-xO alloys films have good potential in a variety of optoelectronic device ap plications.
基金Supported by the National Natural Science Foundation of China under Grant No 50472058.
文摘Cubic phase MgxZn1-x O/MgO multilayer heterostructures （c-Mgx Zn1-xO/MgO MHs） are grown on Si（100） and quartz substrates by reactive electron beam evaporation at low temperature （250℃）. Cross-sectional morphology observations by field-emission scanning electron microscopy show the legible interfaces of c-MgxZn1-x O/MgO MHs. X-ray diffraction demonstrates that c-MgxZn1-xO/MgO MHs are of highly （100）-oriented. Optical trans- mission investigations of c-Mgx Zn1-x O/MgO MHs on quartz substrates reveal the coexistence of the two phases, c-MgxZn1-xO and MgO. Photoluminescence examination indicates the emergence of deep-ultraviolet emission centred at about 290nm along with the blue shift of the ultraviolet emission from 405nm to 39Gnm when the nominal thickness of c-MgxZn1-xO well layers of MHs is diminished to 3nm, which is probably originated from quantum confinement effect.
基金Project (No. 2002CB613305) supported by the National Basic Re-search Program (973) of China
文摘Homogeneous, crack-free SrNbxTi1-xO3 thin films on （110） silicon substrates were successfully fabricated by sol-gel processing. The optimum route and conditions were systematically investigated. Sr（OAc）2 glacial acetic acid solution, after being refluxed and reacted with tartrate, formed Sr（OAc）2（C4H6O6）2; Ti（OBu）4 formed Ti（OAc）4-x（AcAc）x. after having the ligand partially exchanged with AcAc, while Nb（OC2H5）5 formed （OAc）2Nb（AcAc） （C4H606）by exchanging of ligand in glacial acetic acid with （CH3CO）2O. All the metal species after undergoing partial hydrolysis and polymerization with hydroxyl or oxygen, formed SrNb,Ti1-xO3 cluster sol. Methyl cellulose （MCL） caused SrNbxTi1-xO3 sol to have polymeric structure and easily form films. SrNbxTi1-xO3 films with perovskite were subsequently formed after being annealed at 650-750 ℃ for 60 min in 25% N2＋75% H2 （volume ratio） atmosphere. Resistivity of the SrNb0.1 Ti0.9O3 films at room temperature was 64 μΩ·cm, a particular T2 temperature dependence of the resistivity, from 25 K up to room temperature, was observed.
