Study on Extended Gate Field Effect Transistor with Nano-TiO-2 Sensing Membrane by Sol-Gel Method

The nano-titanium dioxide (nano-TiO_2) sensing membrane,fabricated by sol-gel technology,was used as the pH-sensing layer of the extended gate field effect transistor (EGFET) device.The objective of this research is the preparation of titanium dioxide materials by sol-gel method using Ti(OBu)_4 as the precursor.In this study,we fabricated a nano-titanium dioxide sensing layer on the ITO glass by dip coating.In order to examine the sensitivity of the nano-TiO_2 films applied to the EGFET devices,we adopted the ITO glass as substrate,and measured theⅠ_(DS)-Ⅴ_G curves of the nano-titanium dioxide separative structure EGFET device in the pH buffer solutions that have different pH values by the Keithley 236 Instrument.By the experimental results,we can obtain the pH sensitivities of the EGFET with nano-TiO_2 sensing membrane prepared by sol-gel method,which is 59.86mV/pH from pH 1 to pH 9.

Evaluation of a gate-first process for AlGaN/GaN metal-oxide-semiconductor heterostructure field-effect transistors with low ohmic annealing temperature

In this paper, TiN/A1Ox gated A1GaN/GaN metal-oxide-semiconductor heterostructure field-effect transistors （MOS- HFETs） were fabricated for gate-first process evaluation. By employing a low temperature ohmic process, ohmic contact can be obtained by annealing at 600 ℃ with the contact resistance approximately 1.6 Ω.mm. The ohmic annealing process also acts as a post-deposition annealing on the oxide film, resulting in good device performance. Those results demonstrated that the TiN/A1Ox gated MOS-HFETs with low temperature ohmic process can be applied for self-aligned gate AIGaN/GaN MOS-HFETs.

One-dimensional(1D) micro/nanostructures of organic semiconductors for field-effect transistors

Organic semiconductors have gradually become the super stars on the stage of optoelectronic materials, due to their low cost, flexibility and solution processability. Numerous organic semiconductors, including small molecules and conjugated polymers, have been designed and synthesized to explore the potential of organic materials in optoelectronic industry. One-dimensional micro/nanostructures of organic semiconductors generally have more ordered packing structure with fewer defects compared with thin films, and are thus thought to show intrinsic carrier mobility of organic materials. Moreover, the packing structure in micro/nanostructures is clear and relatively easy to analyze, which makes these micro/nanostructures a good platform to study structure-property relationship. Therefore, design of suitable organic molecules to form micro-/nanostructures and methods to obtain ideal micro/nanostructures for functional devices will be fully discussed in this mini review. Finally, the perspective and opportunity of 1D micro/nanostructured organic materials based OFETs in the near future are also addressed.

Organic single crystals or crystalline micro/nanostructures: Preparation and field-effect transistor applications

Organic single crystals hold great promise for the development of organic semiconductor materials,because they could reveal the intrinsic electronic properties of these materials,providing high-performance electronic devices and probing the structureproperty relationships.This article reviews the preparation methods for organic single crystals or crystalline micro/nanostructures,including vapor phase growth methods and solution-processed methods,and summarizes a few methods employed in the fabrication of field-effect transistors along with dozens of examples concerning both small molecules and polymers with high field-effect performance.

氧等离子处理的二硫化钼场效应晶体管表面掺杂和湿度传感研究

二维半导体过渡金属二硫属化物(transition metal dichalcogenide,TMD)具有独特的电学、光学和力学性能,在数字电路、光伏器件和能量存储等多个领域中具有巨大的应用潜力。通过表面掺杂控制TMD的电学性能为实现灵敏传感提供了有效的方法。本文开展了氧等离子体对二硫化钼(MoS_(2))掺杂特性的研究。首先,测试了MoS_(2)场效应晶体管(field-effect transistor,FET)的输运特性,发现氧等离子体处理对FET具有p型掺杂作用。随后,通过拉曼光谱研究了掺杂机制的成因,并证实了沟道表面类MoO_(3)缺陷的形成。最后,研究了经等离子体处理的晶体管的湿度传感特性,由于氧等离子体处理使得沟道对水分子的吸收中心增加,在潮湿环境下晶体管具有十分灵敏的响应特性,源漏电流值变化了约54%。这项工作不仅提供了一种调控TMD电学性能的简单方法,也展示了低维材料化学传感器的发展潜力。

Terahertz Plasma Waves in Two Dimensional Quantum Electron Gas with Electron Scattering

We investigate the Terahertz （THz） plasma waves in a two-dimensional （2D） electron gas in a nanometer field effect transistor （FET） with quantum effects, the electron scattering, the thermal motion of electrons and electron exchange-correlation. We find that, while the elec- tron scattering, the wave number along y direction and the electron exchange-correlation suppress the radiation power, but the thermal motion of electrons and the quantum effects can amplify the radiation power. The radiation frequency decreases with electron exchange-correlation con- tributions, but increases with quantum effects, motion of electrons. It is worth mentioning that radiation frequency. These properties could be plasma oscillations in nanometer FET. the wave number along y direction and thermal the electron scattering has scarce influence on the of great help to the realization of practical THz

The instability of terahertz plasma waves in cylindrical FET

In this paper,the Dyakonov-Shur instability of terahertz(THz)plasma waves has been analyzed in gated cylindrical field effect transistor(FET).In the cylindrical FET,the hydrodynamic equations in cylindrical coordinates are used to describe the THz plasma wave in twodimensional electronic gas.The research results show that the oscillation frequency of the THz plasma wave is increased by increasing the component of wave in the circumferential direction,but in stability increment of the THz plasma wave are in creased by increasing the radius of channel.

The Instability of Terahertz Plasma Waves in Two Dimensional Gated and Ungated Quantum Electron Gas

The instability of terahertz（THz）plasma waves in two-dimensional（2D）quantum electron gas in a nanometer field effect transistor（FET）with asymmetrical boundary conditions has been investigated.We analyze THz plasma waves of two parts of the 2D quantum electron gas：gated and ungated regions.The results show that the radiation frequency and the increment（radiation power）in 2D ungated quantum electron gas are much higher than that in 2D gated quantum electron gas.The quantum effects always enhance the radiation power and enlarge the region of instability in both cases.This allows us to conclude that 2D quantum electron gas in the transistor channel is important for the emission and detection process and both gated and ungated parts take part in that process.

Abnormal oxidation in nickel silicide and nickel germanosilicide in sub-micro CMOS

After post-silicidation annealing at various temperatures for 30 min, abnormal oxidation and agglomeration in nickel silicide and nickel germanosilicide are investigated under different conditions of NiSi, with As-, In-, and Sb-doped Si substrates of nickel germanosilicide without any dopants. The NiSi thickness, dopant species, doping concentration, and silicide process conditions are dominant factors for abnormal oxidation and NiSi agglomeration. Larger dopants than Si, thinner NiSi thickness and SiGe suhstrates, and higher dopant concentrations promote abnormal oxidation and agglomeration.

10 nm金属氧化物半导体场效应晶体管中的热噪声特性分析

随着金属氧化物半导体场效应晶体管(MOSFET)器件等比例缩小至纳米级的较小尺寸,一方面导致的短沟道效应已严重影响热噪声;另一方面使栅、源、漏区及衬底区的热噪声占有比越来越高,而传统热噪声模型主要考虑较大尺寸器件的沟道热噪声,且其模型未考虑到沟道饱和区.本文针对小尺寸纳米级MOSFET器件,并根据器件结构特征和热噪声的基本特性,建立了10 nm器件的热噪声模型,该模型体现沟道区、衬底区及栅、源、漏区,同时考虑到沟道饱和区的热噪声.在模型的基础上,分析沟道热噪声、总热噪声随偏置参量及器件参数之间的关系,验证了沟道饱和区热噪声的存在,并与已有实验结果一致,所得结论有助于提高纳米级小尺寸MOSFET器件的工作效率、寿命及响应速度等.

多场耦合非热平衡低温等离子体与微纳米结构材料的相互作用

低温等离子体是制备微纳米材料和调控其结构特性的最重要方法之一,其中材料结构及特性的改变是等离子体电磁场、热场、化学场等多场耦合综合作用的结果.本文系统而简要地回顾了如下主要内容:电源的频率及其调制、施加方式对等离子体放电特性与稳定性的影响;大气压等离子体物理化学反应动力学;等离子体场对微纳米颗粒的聚集态结构与运动的调控、以及对沉积薄膜微纳米结构的影响.总结并得出如下主要结论:放电频率、脉冲调制功率、容性或者感性耦合方式、单体种类、基片温度等对等离子体活性粒子成分与特性具有主要影响,在kHz~MHz范围可以实现稳定放电和微纳米颗粒制备和薄膜沉积;微纳米颗粒/颗粒膜结构形貌随时间和空间而发生动态变化;低温等离子体多场调制可以快速实现微纳米颗粒的结晶,并调控微纳米颗粒的成分、尺度、带隙、晶型、晶面比例及其形貌特征;引入微颗粒可以在鞘层位置悬浮形成规则的二维等离子体晶格与无序的等离子体非晶,在介观尺度研究复杂系统的结构与动理学过程.

High-performance multilayer WSe2 field-effect transistors with carrier type control

In this stud high-performance multilayer WSe2 field-effect transistor （FET） devices with carrier type control are demonstrated via thickness modulation and a remote oxygen plasma surface treatment. Carrier type control in multilayer WSe2 FET devices with Cr/Au contacts is initially demonstrated by modulating the WSe2 thickness. The carrier type evolves with increasing WSe2 channel thickness, being p-type, ambipolar, and n-type at thicknesses 〈 3, - 4, and 〉 5 nm, respectively. The thickness-dependent carrier type is attributed to changes in the bandgap of WSe2 as a function of the thickness and the carrier band offsets relative to the metal contacts. Furthermore, we present a strong hole carrier doping effect via remote oxygen plasma treatment. It non-degenerately converts n-type characteristics into p-type and enhances field-effect hole mobility by three orders of magnitude. This work demonstrates progress towards the realization of high-performance multilayer WSe2 FETs with carrier type control, potentially extendable to other transition metal dichalcogenides, for future electronic and oDtoelectronic alpplications.

整形高功率激光装置的任意电脉冲发生器设计(英文)

基于GaAs场效应管电压控制电流和开关的特性,设计了一种任意电脉冲发生器,并成功应用于激光脉冲整形装置。该电脉冲发生器利用超宽带窄脉冲触发多个GaAs场效应管,产生多路负脉冲,通过模拟延时线依次将各路负脉冲延迟一定时间后经微带线耦合输出多路负脉冲叠加的波形;通过多路不同幅度的脉冲堆积效应来获得形状任意可调的整形电脉冲。为了满足惯性约束聚变(ICF)实验中对电脉冲幅度不能过小的要求,在电路的输出端接入增益可调的超宽带电压放大器,使脉冲幅度达到实验要求。利用设计的任意电脉冲发生器实现了脉冲幅度0～5 V可调、脉宽0～10ns可调、时域调节精度为330 ps,整形方波脉冲下降沿为330 ps、上升沿为240 ps。实验结果表明,将产生的电脉冲注入光波导调制器,可获得理想形状的整形激光脉冲,提高激光脉冲的输出能量。

MEMS工艺制备pH-ISFET/REFET功能膜研究

微电子技术的快速发展,促使硅基传感器向着集成化、微型化、可批量加工方向发展.对于pH-ISFET集成芯片而言,如何以MEMS工艺制备性能优良的pH功能膜,是其发展的关键.目的:以适合批量加工的MEMS工艺研制pH功能膜;方法:在小尺寸集成芯片的基础上,以MEMS工艺分别制备Ta2O5材料的pH敏感膜,PTFE材料的pH钝化膜;结果:在pH1～12范围内,Ta2O5膜pH-ISFET对H+的灵敏度达56mV/pH,PTFE膜REFET对H+的响应仅为0.13mV/pH;结论:采用MEMS工艺,可对以标准CMOS技术加工的ISFET集成芯片系统,进行后续加工,从而实现传感器芯片系统的全过程批量加工.

纳米级MOSFET亚阈值区电流特性模型

基于纳米级金属氧化物半导体场效应晶体管(MOSFET)器件结构,从基本的漂移扩散方程出发,分别建立了亚阈值区漏极电流模型和栅极电流模型。其中将频率与偏置依赖性的影响显式地体现在模型中。通过对比分析发现亚阈值区漏极电流模型具有等比例缩小的可行性,栅极电流具有跟随性和频率依赖性。同时将所建模型的仿真结果与实验结果进行了比较,验证了模型准确性。

半导体传感器在生物分析科学中的应用(英文)

回顾了半导体生化传感器 (ISFET 和 LA PS)在医学监测、免疫检测、免疫分析、D N A 杂交以及细胞培养等方面应用的进展。为使半导体器件适用于生化检测,对其中所采用的检测手段和取得的研究结果进行了分析。展望了通过与微流体网络相结合,基于半导体传感器的实验室芯片化的可行性。

参比场效应晶体管(REFET)及其与ISFET集成化的研究

本文介绍为实现带有参比电极的ISFET测量探头微型化而研制成的一种新型探头。采用等离子聚合方法在ISFET敏感栅上覆盖一层聚苯烯薄膜(PPS),使其成为对H^+不敏感的参比场效应晶体管(REFET)。而后采用IC艺,将ISFET,REFET和伪参比电极集成化,得到可用于微量溶液测量的微型探头,将探头中的ISFET和REFET按差分对管方式连接于差放线路中,由于两管对溶液中pH值响应不同,可输出随pH值变化的差模信号。研制的REFET在pH4～pH11范围内几乎无响应,表明了PPS膜具有较少的表面态及良好的H^+掩蔽性。用集成化探头测量pH值,灵敏度可达55mV/pH。

碳基纳电子的新进展

集成电路技术进入后摩尔时代后,自下而上发展的分子电子学碳基纳电子的技术突破引起人们的高度关注。目前碳基纳电子的发展基于一维的碳纳米管和二维的石墨烯两种碳基材料。介绍了碳纳米管电子学、射频碳纳米管场效应晶体管(RF CNFET)、射频石墨烯FET(RF GFET)、GFET微波单片集成电路(MMIC)和石墨烯纳带(GNR)基逻辑电路等的发展来由和最新进展;包括碳基半导体特有的材料和工艺关键技术突破,抑制缺陷的新电路设计方法,CNFET与互补金属氧化物半导体(CMOS)技术的三维(3D)集成应用,晶圆规模的石墨烯外延材料制备,洁净石墨烯材料工艺,GFET混频器、放大器、THz探测器和弹道整流器等MMIC的设计与制备,石墨烯柔性电子学,石墨烯双极基逻辑电路的设计与制备,GNR制备以及GNR基逻辑电路的设计等。综述了碳基纳电子各方面的创新点和进步点,以及总体发展态势。

用于FET的PECVD SiN_x掺杂MoS_2的有效性与可控性

通过化学气相沉积(CVD)工艺成功生长出少层MoS_2薄膜,用Raman光谱仪对材料进行表征,验证了三层MoS_2材料的存在。基于CVD生长出的三层MoS_2薄膜材料完成了背栅场效应晶体管(FET)的制作工艺研发。对MoS_2FET器件进行了电学特性表征,研制的MoS_2FET器件的开关比可达到1.45×10~6,器件的电子载流子场效应迁移率约为1 cm^2·V^(-1)·s^(-1)。对等离子增强化学气相沉积(PECVD)氮化硅(SiN_x)工艺掺杂MoS_2材料进行了研究,掺杂后器件的驱动电流提高了3倍多,验证了SiN_x掺杂MoS_2材料的有效性。通过控制PECVD SiN_x时间工艺参数对SiN_x薄膜厚度与掺杂浓度的关系进行了研究,随着SiN_x薄膜厚度增加器件的驱动电流逐渐增强,验证了SiN_x掺杂MoS_2材料的可控性。最后,对PECVD SiN_x工艺掺杂MoS_2材料的机理进行了讨论。