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Light induced microstructure transformation in a-Si:H films
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作者 刘国汉 丁毅 +3 位作者 张文理 陈光华 贺德衍 邓金祥 《Chinese Physics B》 SCIE EI CAS CSCD 2007年第4期1125-1128,共4页
A series of a-Si:H films are deposited by hot wire assisted microwave electron cyclotron resonant chemical vapour deposition (HW-MWECR-CVD), subsequently exposed under simulated illumination for three hours. This p... A series of a-Si:H films are deposited by hot wire assisted microwave electron cyclotron resonant chemical vapour deposition (HW-MWECR-CVD), subsequently exposed under simulated illumination for three hours. This paper studies the microstructure change during illumination by Fourier Transformation Infrared (FTIR) spectra. There are two typical transformation tendencies of microstructure after illumination. It proposes a model of light induced structural change based on the experimental results. It is found that all samples follow the same mechanism during illumination, and intrinsic structure of samples affect the total H content. 展开更多
关键词 hydrogenated amorphous silicon Staebler-Wronski effect microwave electron cyclotron resonant chemical vapour deposition
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