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Formation and Oxidation Resistance of Silicide Coatings for Mo and Mo-Based Alloys
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作者 Yu WANG , Yunpeng LI and Xingfang HU Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2001年第4期479-481,共3页
The forming process of silicide coatings on pure Mo and Mo-base alloys, obtained by the gas- phase deposition method. has been studied by examining the microstructure of coatings and the relationship between coating t... The forming process of silicide coatings on pure Mo and Mo-base alloys, obtained by the gas- phase deposition method. has been studied by examining the microstructure of coatings and the relationship between coating thickness and process parameters. It was shown that the growth of coatings was diffusion-controlled, the diffusion of silicon to be coated into Mo or Mo-base alloys was mainly responsible for the formation of silicide. The relationship between initial silicide thickness and oxidation resistance was also investigated, and the equation of service life of the coatings at high temperature in air is presented. 展开更多
关键词 mo Formation and Oxidation Resistance of silicide Coatings for mo and mo-Based Alloys
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Mo SILTCIDE SYNTHISIS BY DUAL ION BEAM DEPOSITION 被引量:74
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作者 T.H. Zhang, Z.Z. Yi, X. Y. Wu, S.J. Zhang, Y. G. Wu, X. Zhang, H.X. Zhang, A.D. Liu and X.J. Zhang Key Laboratory for Radiation Beam Technology and Material Modification, Institute of Low Energy Nuclear Physics, Beijing Normal University, Beijing Radiatio 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 2002年第2期187-190,共4页
Mo silicides Mo_5Si_3 with high quality were prepared using ion beamdeposition equipment with two Filter Metal Vacuum Are Deposition (FMEVAD). When the number ofalternant deposition times was 198, total thickness of t... Mo silicides Mo_5Si_3 with high quality were prepared using ion beamdeposition equipment with two Filter Metal Vacuum Are Deposition (FMEVAD). When the number ofalternant deposition times was 198, total thickness of the coating is 40nm. The coatings withdroplet free can be readily obtained, so the surface is smooth. TEM observation shows that Mo and Sialternant deposition coating is compact structure. The fine Mo silicide grains densely distributedin the coating. The coating adherence on silicon is excellent. 展开更多
关键词 mo silicide ion alternant deposition SILICON
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Microstructure of Si Cones Prepared by Ar^+-Sputtering Si/Mo Target
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作者 X.L.Ma N.G.Shang 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2002年第2期173-175,共3页
关键词 Si cones Ordered structure mo silicide
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