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离子源辅助电弧离子镀制备MoSx自润滑涂层 被引量:1
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作者 李助军 刘怡飞 +3 位作者 田灿鑫 杨兵 付德君 苏峰华 《粉末冶金材料科学与工程》 EI 北大核心 2018年第2期186-191,共6页
以Ar为输送气体,H_2S为S源,纯金属Mo为Mo源,采用中空阴极弧光离子源结合电弧离子镀系统,在单晶Si(100)和硬质合金衬底上制备MoSx自润滑涂层,系统研究H_2S流量对MoSx自润滑涂层结构及性能的影响,为电弧离子镀技术制备MoSx自润滑涂层积累... 以Ar为输送气体,H_2S为S源,纯金属Mo为Mo源,采用中空阴极弧光离子源结合电弧离子镀系统,在单晶Si(100)和硬质合金衬底上制备MoSx自润滑涂层,系统研究H_2S流量对MoSx自润滑涂层结构及性能的影响,为电弧离子镀技术制备MoSx自润滑涂层积累实验数据。结果表明,H_2S流量对MoSx自润滑涂层的晶体结构、硬度及摩擦因数具有明显影响。随H_2S流量升高,MoSx自润滑涂层中Mo晶粒尺寸逐渐减小,没有明显的硫化物结晶相,MoSx涂层硬度逐渐减小,摩擦因数也逐渐减小,且均小于0.35(对磨材料硬质合金)。H_2S可以作为S源通过中空阴极离子源离化作用为MoSx自润滑涂层的制备提供S元素;电弧离子镀制备出的MoSx自润滑涂层为金属Mo纳米晶粒与非晶MoS、MoS_2组成的纳米复合结构。 展开更多
关键词 自润滑涂层 中空阴极弧光离子源 电弧离子镀 mosx涂层 力学性能
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Effect of Substrate Type and Temperature on the Tribological Properties of MoS_x Coatings
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作者 WANGJi-hui WieersE +1 位作者 StalsLM CelisJP 《材料热处理学报》 EI CAS CSCD 北大核心 2004年第05B期1304-1308,共5页
MoS coatings were prepared by means of bipolar-pulsed DC magnetron sputtering on different substrate type at various temperature. The structure and fretting behavior of MoS, coatings have been determined respectively ... MoS coatings were prepared by means of bipolar-pulsed DC magnetron sputtering on different substrate type at various temperature. The structure and fretting behavior of MoS, coatings have been determined respectively by XRD and fretting tester in air of 10% to 90% RH and under the load of 1 to 10 N. With increasing substrate temperature, the edge orientation evolves in the MoSx coating, and the relative content of edge-to-basal orientation becomes large. The tribological performance of coatings gets deteriorated. Compared with MoS, coatings on TiN/H13, CrN/H13 and MoS /Ti multilayer, MoS coating on H13 substrate has a lower load bearing capacity, and worn away easily under higher normal load 5N or ION and in air of 90% RH during the fretting process. The friction and wear properties of MoS, coatings on TiN/H13 and CrN/H13 (dual-layer) are slight better than that of MoS, /Ti multilayer under the normal load tested and in air of<10%to90%RH. 展开更多
关键词 mosx涂层 磨损 XRD 基底类型
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